JP4969582B2 - 帯電防止性、反射防止性の被覆層を有する光学製品およびその製造方法 - Google Patents
帯電防止性、反射防止性の被覆層を有する光学製品およびその製造方法 Download PDFInfo
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- JP4969582B2 JP4969582B2 JP2008546446A JP2008546446A JP4969582B2 JP 4969582 B2 JP4969582 B2 JP 4969582B2 JP 2008546446 A JP2008546446 A JP 2008546446A JP 2008546446 A JP2008546446 A JP 2008546446A JP 4969582 B2 JP4969582 B2 JP 4969582B2
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- 238000003851 corona treatment Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 description 1
- OYWALDPIZVWXIM-UHFFFAOYSA-N dimethyl-[3-(oxiran-2-ylmethoxy)propyl]-trimethylsilyloxysilane Chemical compound C[Si](C)(C)O[Si](C)(C)CCCOCC1CO1 OYWALDPIZVWXIM-UHFFFAOYSA-N 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- GMSCBRSQMRDRCD-UHFFFAOYSA-N dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C(C)=C GMSCBRSQMRDRCD-UHFFFAOYSA-N 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- FEHYCIQPPPQNMI-UHFFFAOYSA-N ethenyl(triphenoxy)silane Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(C=C)OC1=CC=CC=C1 FEHYCIQPPPQNMI-UHFFFAOYSA-N 0.000 description 1
- MBGQQKKTDDNCSG-UHFFFAOYSA-N ethenyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(C=C)OCC MBGQQKKTDDNCSG-UHFFFAOYSA-N 0.000 description 1
- MABAWBWRUSBLKQ-UHFFFAOYSA-N ethenyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)C=C MABAWBWRUSBLKQ-UHFFFAOYSA-N 0.000 description 1
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 description 1
- DYFMAHYLCRSUHA-UHFFFAOYSA-N ethenyl-tris(2-methylpropoxy)silane Chemical compound CC(C)CO[Si](OCC(C)C)(OCC(C)C)C=C DYFMAHYLCRSUHA-UHFFFAOYSA-N 0.000 description 1
- BQRPSOKLSZSNAR-UHFFFAOYSA-N ethenyl-tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)C=C BQRPSOKLSZSNAR-UHFFFAOYSA-N 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- IADPEWNXRCIVFH-UHFFFAOYSA-N ethoxy-[3-(oxiran-2-ylmethoxy)propyl]-di(propan-2-yl)silane Chemical compound CCO[Si](C(C)C)(C(C)C)CCCOCC1CO1 IADPEWNXRCIVFH-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Chemical compound CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- 239000004811 fluoropolymer Substances 0.000 description 1
- XPBBUZJBQWWFFJ-UHFFFAOYSA-N fluorosilane Chemical class [SiH3]F XPBBUZJBQWWFFJ-UHFFFAOYSA-N 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical group FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- 229910052740 iodine Chemical group 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 229940119545 isobornyl methacrylate Drugs 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical compound C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 description 1
- ICCDZMWNLNRHGP-UHFFFAOYSA-N methyl-[3-(oxiran-2-ylmethoxy)propyl]-bis(prop-1-en-2-yloxy)silane Chemical compound CC(=C)O[Si](C)(OC(C)=C)CCCOCC1CO1 ICCDZMWNLNRHGP-UHFFFAOYSA-N 0.000 description 1
- 239000012764 mineral filler Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- RZFODFPMOHAYIR-UHFFFAOYSA-N oxepan-2-one;prop-2-enoic acid Chemical compound OC(=O)C=C.O=C1CCCCCO1 RZFODFPMOHAYIR-UHFFFAOYSA-N 0.000 description 1
- 229960004624 perflexane Drugs 0.000 description 1
- ZJIJAJXFLBMLCK-UHFFFAOYSA-N perfluorohexane Chemical class FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F ZJIJAJXFLBMLCK-UHFFFAOYSA-N 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920001709 polysilazane Polymers 0.000 description 1
- 229920002578 polythiourethane polymer Polymers 0.000 description 1
- 239000011527 polyurethane coating Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 1
- DNAJDTIOMGISDS-UHFFFAOYSA-N prop-2-enylsilane Chemical compound [SiH3]CC=C DNAJDTIOMGISDS-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000012815 thermoplastic material Substances 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- LFRDHGNFBLIJIY-UHFFFAOYSA-N trimethoxy(prop-2-enyl)silane Chemical compound CO[Si](OC)(OC)CC=C LFRDHGNFBLIJIY-UHFFFAOYSA-N 0.000 description 1
- YSIQPJVFCSCUMU-UHFFFAOYSA-N trimethyl-[methyl-[3-(oxiran-2-ylmethoxy)propyl]-trimethylsilyloxysilyl]oxysilane Chemical compound C[Si](C)(C)O[Si](C)(O[Si](C)(C)C)CCCOCC1CO1 YSIQPJVFCSCUMU-UHFFFAOYSA-N 0.000 description 1
- WCAXVXQTTCIZHD-UHFFFAOYSA-N trimethyl-[prop-2-enyl-bis(trimethylsilyloxy)silyl]oxysilane Chemical compound C[Si](C)(C)O[Si](CC=C)(O[Si](C)(C)C)O[Si](C)(C)C WCAXVXQTTCIZHD-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
- G02B1/116—Multilayers including electrically conducting layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/00009—Production of simple or compound lenses
- B29D11/00038—Production of contact lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/16—Optical coatings produced by application to, or surface treatment of, optical elements having an anti-static effect, e.g. electrically conducting coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Ophthalmology & Optometry (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Eyeglasses (AREA)
- Laminated Bodies (AREA)
Description
本発明は、帯電防止性特性を有する透明な反射防止性(AR)被覆層、該被覆層を用いて被覆された光学製品、および該光学製品の製造方法に関する。
有機レンズは、特に乾燥条件下で布を用いて清浄されると、帯電する傾向を有し、従って、レンズ上に電荷が留まっている間は埃を引き付ける可能性がある。
2つの主面を有する光学製品を準備する工程と、
前記光学製品の少なくとも1主面上に1以上の導電性の層を含む反射防止性、帯電防止性の透明被覆層を形成する工程とを含み、前記導電性の層は1以上の金属を含有すると共にその厚みは1nm以下である方法を提供することである。
HI層はTiO2、ZrO2、Nb2O5、Y2O3、HfO2、Sc2O3、Ta2O5、Pr2O3、Al2O3、Si3N4、およびそれらの混合物で作製することができるが、これに限定されるものではない。LI層は、SiO2、MgF2、またはこれらの混合物で作製することができるが、これに限定されるものではない。好ましくはSiO2である。
一官能性(メタ)アクリレート:アリル メタクリレート、2−エトキシエチル アクリレート、2−エトキシエチル メタクリレート、カプロラクトン アクリレート、イソボルニル メタクリレート、ラウリル メタクリレート、ポリプロピレン グリコール モノメタクリレート、
二官能性(メタ)アクリレート:1,4−ブタンジオール ジアクリレート、1,6−ヘキサンジオール ジアクリレート、1,6−ヘキサンジオール ジメタクリレート、ポリエチレングリコール ジアクリレート、テトラエチレン グリコール ジアクリレート、ポリエチレン グリコール ジメタクリレート、ポリエチレン グリコール ジアクリレート、エトキシル化ビスフェノールA ジアクリレート、テトラエチレン グリコール ジアクリレート、トリプロピレン グリコール ジアクリレート、ネオペンチル グリコール ジアクリレート、1,4−ブタンジオール ジメタクリレート、テトラエチレン グリコール ジメタクリレート、ジエチレン グリコール ジアクリレート:
三官能性(メタ)アクリレート:トリメチロールプロパン トリメタクリレート、トリメチロールプロパン トリアクリレート、ペンタエリトリトール トリアクリレート、エトキシル化トリメチロールプロパン トリアクリレート、トリメチロールプロパン トリメタクリレート:
四〜六官能性(メタ)アクリレート:ジペンタエリトリトール ペンタアクリレート、 ペンタエリトリトール テトラアクリレート、エトキシル化ペンタエリトリトール テトラアクリレート、ペンタアクリレート エステル。
カプリング剤の調製に用いられるエポキシアルコキシシラン(類)および不飽和アルコキシシラン(類)の量は、好ましくは下記重量比Rが0.8≦R≦1.2となる条件である。
R=エポキシアルコキシシランの重量/不飽和アルコキシシランの重量
1)アルコキシシラン類の混合。
2)好ましくは塩化水素酸などの酸の添加による、上記アルコキシシラン類の加水分解。
3)上記混合物の攪拌。
4)任意の、有機溶媒の添加。
5)1種または数種のたとえばアルミニウム アセチルアセトネートなどの触媒添加。
6)攪拌(一般的処理時間:一夜)
防汚性トップコートが液状形態下で適用される場合は、被覆層材料に少なくとも1種の溶媒を添加して、被覆層に適した濃度と粘度を有する液体被覆層溶液を準備する。成膜に続いて硬化が行われる。
−2つの主面を有する光学製品を準備する工程と、
−前記光学製品の少なくとも1主面上に1以上の導電性の層を含む反射防止性、帯電防止性の透明被覆層を形成する工程とを含み、前記導電性の層は1以上の金属を含有し、前記導電性の層の厚みは1nm以下である方法に関する。
1)−場合によってはイオンビームアシストを行う、蒸着
2)−イオンビームによる散布
3)−陰極スパッタリング、あるいは
4)−プラズマアシスト気相化学蒸着
なお、これらの実施例は本発明の説明のために用いられているものであり、本発明の範囲を限定するものと解釈すべきではない。
倍率が−2.00ディオプトリ(可能な範囲は−8.00〜+8.00ディオプトリ)であるORMARで作製された2つの眼科用レンズ上にAR帯電防止性被覆層を成膜する。ORMARはエシロール社の登録商標である。この材料はジエチレン グリコール ビス(アリルカーボネート)、一般的にはCR39Rを重合して得る。これらの2つのレンズは異なる2種の表面被覆層を有する。
およそ1μmのプライマー ポリウレタン被覆層を、レンズ基材の両面(凸面(CX))および凹面(CC))上に成膜する。次に両面をポリシロキサン耐摩耗性被覆層で被覆する。
レンズN°2はレンズN°1と同様であるが、プライマー被覆層がなく、耐摩耗性被覆層がレンズ基材上に直接成膜されている。
上述のレンズのそれぞれの両面に、帯電防止性AR積層体を成膜し、次いで、米国特許第6、183、872号に記載のフッ化防汚性トップコートの薄層を成膜し、下記の積層体を得た。
両面が光学的に被覆されたレンズの目視透過率は95%超であり、一般には、標準の反射防止性被覆層を被覆したレンズの範囲が97%超(97.2〜97.8%)あるため、得られたレンズは、積層体中のAg層の厚みが著しい透過率損を起こさなかったことを示した。
Claims (13)
- 光学製品のための反射防止性、帯電防止性の透明被覆層であって、1以上の導電性の層を備え、該各導電性の層は1以上の金属を含有すると共にその厚みが0.3nm以下である透明被覆層。
- 前記導電性の層の厚みが0.10〜0.20nmの範囲である請求項1に記載の透明被覆層。
- 前記金属は銀、金、プラチナ、またはそれらの混合物から選択される請求項1または2に記載の透明被覆層。
- 前記導電性の層は銀、金、プラチナ、またはそれらの混合物から選択される金属からなる請求項3に記載の透明被覆層。
- 前記導電性の層は銀からなる請求項4に記載の透明被覆層。
- 高屈折率層と低屈折率層が交互に積層された積層体と1以上の導電性の層とを備え、前記1以上の導電性の層は前記反射防止性被覆層の最内側層であるか、前記反射防止性被覆層の最外側層であるか、または交互の2層の間に挟まれている請求項1〜5のいずれかに記載の透明被覆層。
- 2つの主面を有する光学製品であって、少なくとも1主面上には反射防止性、帯電防止性の透明被覆層が成膜され、該透明被覆層は1以上の導電性の層を備え、該各導電性の層は1以上の金属を含有すると共にその厚みは0.3nm以下である光学製品。
- 前記光学製品の両主面は反射防止性、帯電防止性の透明被覆層によって被覆されている請求項7に記載の光学製品。
- 前記光学製品の、反対防止性被覆層である透明被覆層による可視域での吸光度は1%以下である請求項8に記載の光学製品。
- 前記光学製品の可視スペクトルにおける透過率は95%超である請求項8または9に記載の光学製品。
- 眼科用レンズである請求項7〜10のいずれかに記載の光学製品。
- 請求項7〜11のいずれかに記載の光学製品の製造方法であって、
2つの主面を有する光学製品を準備する工程と、
1以上の導電性の層を含む反射防止性、帯電防止性の透明被覆層を前記光学製品の少なくとも1主面上に形成する工程とを含み、前記各導電性の層は1以上の金属を含有すると共に厚みは0.3nm以下である方法。 - 前記1以上の導電性の層は金属源の真空蒸着によって成膜される請求項12に記載の方法。
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US75346005P | 2005-12-23 | 2005-12-23 | |
| US60/753,460 | 2005-12-23 | ||
| PCT/EP2006/070001 WO2007071723A2 (en) | 2005-12-23 | 2006-12-20 | Optical article having an antistatic, antireflection coating and method of manufacturing same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009521001A JP2009521001A (ja) | 2009-05-28 |
| JP4969582B2 true JP4969582B2 (ja) | 2012-07-04 |
Family
ID=38006800
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008546446A Active JP4969582B2 (ja) | 2005-12-23 | 2006-12-20 | 帯電防止性、反射防止性の被覆層を有する光学製品およびその製造方法 |
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| EP (1) | EP1963891B1 (ja) |
| JP (1) | JP4969582B2 (ja) |
| WO (1) | WO2007071723A2 (ja) |
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| CA2701672C (en) * | 2007-09-28 | 2017-10-24 | Nikon-Essilor Co., Ltd. | Optical component and method for manufacturing the same |
| FR2943798B1 (fr) * | 2009-03-27 | 2011-05-27 | Essilor Int | Article d'optique revetu d'un revetement antireflet ou reflechissant comprenant une couche electriquement conductrice a base d'oxyde d'etain et procede de fabrication |
| JP5565766B2 (ja) * | 2009-05-20 | 2014-08-06 | 東海光学株式会社 | 眼鏡プラスチックレンズ |
| JP5757954B2 (ja) * | 2009-11-02 | 2015-08-05 | エシロル アンテルナショナル(コンパーニュ ジェネラル ドプテーク) | 積層レンズのための三層接着剤系及びその適用法 |
| EP2563826A2 (en) | 2010-04-29 | 2013-03-06 | Battelle Memorial Institute | High refractive index composition |
| FR2968774B1 (fr) | 2010-12-10 | 2013-02-08 | Essilor Int | Article d'optique comportant un revetement antireflet a faible reflexion dans le domaine ultraviolet et le domaine visible |
| ES2354351B1 (es) * | 2011-01-21 | 2011-11-15 | Indo Internacional S.A. | Lente oftálmica y/o solar y procedimiento de fabricación correspondiente. |
| US20140166613A1 (en) | 2011-07-18 | 2014-06-19 | Merck Patent Gmbh | Structuring of antistatic and antireflection coatings and of corresponding stacked layers |
| US8939576B2 (en) | 2011-08-05 | 2015-01-27 | Nitto Denko Corporation | Optical element for correcting color blindness |
| ES2425698B1 (es) * | 2012-03-30 | 2014-08-12 | Indo Internacional S.A. | Lente que comprende un substrato polimérico, una capa endurecedora y una capa metálica |
| CA2873596C (fr) | 2012-05-16 | 2021-05-04 | Essilor International(Compagnie Generale D'optique) | Lentille ophtalmique reduisant les effets de la lumiere bleue |
| US9436005B2 (en) | 2012-08-02 | 2016-09-06 | Gentex Corporation | Amplified piezoelectric camera lens cleaner |
| US8931930B2 (en) | 2013-01-29 | 2015-01-13 | Nitto Denko Corporation | Optical element for correcting color blindness |
| KR101573016B1 (ko) * | 2014-10-22 | 2015-12-14 | 신상동 | 고농도 착색효과와 저반사효과를 갖는 다층박막 플라스틱 안경렌즈 및 이의 제조방법 |
| CN107615101A (zh) * | 2015-05-28 | 2018-01-19 | 富士胶片株式会社 | 防反射膜、光学元件以及光学系统 |
| EP3203274B1 (en) | 2016-02-04 | 2023-04-05 | Essilor International | Ophthalmic lens comprising a thin antireflective coating with a very low reflection in the visible |
| WO2017154302A1 (ja) * | 2016-03-11 | 2017-09-14 | 富士フイルム株式会社 | 光学膜、光学素子および光学系 |
| WO2018047865A1 (ja) * | 2016-09-12 | 2018-03-15 | 富士フイルム株式会社 | 反射防止膜、反射防止膜の製造方法、光学素子および光学系 |
| EP3541762B1 (en) | 2016-11-17 | 2022-03-02 | Cardinal CG Company | Static-dissipative coating technology |
| FR3060748B1 (fr) | 2016-12-20 | 2019-10-11 | Valeo Systemes Thermiques | Dispositif de detection de matiere particulaire dans un flux d'air pour vehicule automobile |
| CN110537116B (zh) * | 2017-04-20 | 2021-10-29 | 信越化学工业株式会社 | 防反射构件及其制造方法 |
| JP6882498B2 (ja) | 2017-09-21 | 2021-06-02 | 富士フイルム株式会社 | 反射防止膜、光学素子および光学系 |
| JP6851511B2 (ja) * | 2018-01-30 | 2021-03-31 | 富士フイルム株式会社 | 光学薄膜、光学素子および光学系 |
| WO2022090228A1 (en) * | 2020-10-27 | 2022-05-05 | Essilor International | Optical article to provide vision correction for devices using eye tracking device |
| JP7203147B2 (ja) * | 2020-11-09 | 2023-01-12 | ホヤ レンズ タイランド リミテッド | 眼鏡レンズの製造方法 |
| WO2022097751A1 (ja) * | 2020-11-09 | 2022-05-12 | ホヤ レンズ タイランド リミテッド | 眼鏡レンズおよび眼鏡 |
| JP7701178B2 (ja) * | 2021-03-31 | 2025-07-01 | ホヤ レンズ タイランド リミテッド | 眼鏡レンズ及び眼鏡 |
| JP7701177B2 (ja) * | 2021-03-31 | 2025-07-01 | ホヤ レンズ タイランド リミテッド | 眼鏡レンズ及び眼鏡 |
| FR3135724B1 (fr) * | 2022-05-17 | 2024-05-24 | Protech | Composition pour revêtement hydrophobe et oléophobe durable, prêt à l’emploi, applications et procédé |
| CN118307212A (zh) * | 2024-04-09 | 2024-07-09 | 咸宁南玻节能玻璃有限公司 | 一种疏水疏油易洁玻璃及其制备方法 |
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| US3637416A (en) * | 1970-02-04 | 1972-01-25 | Mbt Corp | Method of treating synthetic plastic and elastomeric materials and articles produced thereby |
| US4218500A (en) * | 1976-02-12 | 1980-08-19 | Saint-Gobain Industries | Safety glazing containing support for attachment of labels |
| GB2140581B (en) * | 1983-05-23 | 1987-03-18 | American Optical Corp | Anti-static and/or anti-reflective abrasion-resistant ophthalmic lenses |
| EP0203730B1 (en) * | 1985-04-30 | 1993-06-23 | Toray Industries, Inc. | Anti-reflection optical article and process for preparation thereof |
| IT1240796B (it) * | 1990-03-12 | 1993-12-17 | Siv Soc Italiana Vetro | Vetro per autoveicoli, atto ad essere usato come schermo solare e come combinatore di immagini. |
| US5652477A (en) * | 1995-11-08 | 1997-07-29 | Chunghwa Picture Tubes, Ltd. | Multilayer antistatic/antireflective coating for display device |
| US6111698A (en) * | 1998-03-06 | 2000-08-29 | Southwall Technologies, Inc. | Multilayer absorbing antireflective coating |
| US6876003B1 (en) * | 1999-04-15 | 2005-04-05 | Sumitomo Electric Industries, Ltd. | Semiconductor light-emitting device, method of manufacturing transparent conductor film and method of manufacturing compound semiconductor light-emitting device |
| FR2793889B1 (fr) * | 1999-05-20 | 2002-06-28 | Saint Gobain Vitrage | Substrat transparent a revetement anti-reflets |
| MXPA02007162A (es) * | 2000-01-26 | 2003-09-22 | Sola Int Holdings | Revestimiento antiestatica, antirreflejante. |
| JP4524877B2 (ja) * | 2000-07-17 | 2010-08-18 | コニカミノルタホールディングス株式会社 | 眼鏡用レンズ |
| US6589657B2 (en) * | 2001-08-31 | 2003-07-08 | Von Ardenne Anlagentechnik Gmbh | Anti-reflection coatings and associated methods |
| US7106935B2 (en) * | 2002-01-07 | 2006-09-12 | Seagate Technology Llc | Apparatus for focusing plasmon waves |
| JP2004010911A (ja) * | 2002-06-03 | 2004-01-15 | Konica Minolta Holdings Inc | 透明導電膜の形成方法及びた透明導電膜を有する物品 |
| JP2004096027A (ja) * | 2002-09-04 | 2004-03-25 | Mitsui Chemicals Inc | 電磁波遮蔽用ディスプレイ用光学フィルターの製造方法 |
| DE102004044441B3 (de) * | 2004-09-14 | 2006-06-01 | Rodenstock Gmbh | Verbesserung des Einschleif- und Anstempelverhaltens von Brillengläsern mit hydrophober Beschichtung |
-
2006
- 2006-12-20 JP JP2008546446A patent/JP4969582B2/ja active Active
- 2006-12-20 EP EP06841502.5A patent/EP1963891B1/en not_active Not-in-force
- 2006-12-20 WO PCT/EP2006/070001 patent/WO2007071723A2/en not_active Ceased
- 2006-12-22 US US11/615,198 patent/US8007901B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US8007901B2 (en) | 2011-08-30 |
| EP1963891B1 (en) | 2016-04-27 |
| JP2009521001A (ja) | 2009-05-28 |
| US20070166522A1 (en) | 2007-07-19 |
| EP1963891A2 (en) | 2008-09-03 |
| WO2007071723A2 (en) | 2007-06-28 |
| WO2007071723A3 (en) | 2007-07-26 |
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