JP4974036B2 - 有機el装置の製造方法 - Google Patents
有機el装置の製造方法 Download PDFInfo
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- JP4974036B2 JP4974036B2 JP2009264214A JP2009264214A JP4974036B2 JP 4974036 B2 JP4974036 B2 JP 4974036B2 JP 2009264214 A JP2009264214 A JP 2009264214A JP 2009264214 A JP2009264214 A JP 2009264214A JP 4974036 B2 JP4974036 B2 JP 4974036B2
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- organic
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
- H10K50/125—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers specially adapted for multicolour light emission, e.g. for emitting white light
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Description
画素電極を形成する工程と、固体の第1有機材料及び前記第1有機材料よりも昇華する温度が高い固体の第2有機材料を含む混合材料を供給する工程と、前記混合材料に含まれる前記第2有機材料が昇華する温度よりも50℃以上高い温度で前記混合材料を加熱する工程と、昇華した前記混合材料を前記画素電極の上方の面に蒸着させる工程と、を具備したことを特徴とする有機EL装置の製造方法が提供される。
画素電極を形成した処理基板をチャンバ内に取り付ける工程と、固体の第1有機材料及び前記第1有機材料よりも昇華する温度が高い固体の第2有機材料を含む混合材料を加熱室に供給する工程と、前記加熱室から前記処理基板に向かう流路を閉鎖した状態で前記加熱室に供給された前記混合材料をその混合材料に含まれる前記第2有機材料が昇華する温度よりも50℃以上高い温度で加熱する工程と、前記第1有機材料及び前記第2有機材料がともに昇華した状態で前記流路を開放する工程と、昇華した前記混合材料を前記画素電極の上方の面に蒸着させる工程と、を具備したことを特徴とする有機EL装置の製造方法が提供される。
PE…画素電極 EML…発光層 CE…対向電極
1…製造装置
2…チャンバ
3…ホルダー
4…材料供給部
5…加熱室
6…シャッター
7…バルブ
Claims (5)
- 画素電極を形成する工程と、
固体の第1有機材料及び前記第1有機材料よりも昇華する温度が高い固体の第2有機材料を含む混合材料を供給する工程と、
前記混合材料に含まれる前記第2有機材料が昇華する温度よりも50℃以上高い温度で前記混合材料を加熱する工程と、
昇華した前記混合材料を前記画素電極の上方の面に蒸着させる工程と、
を具備したことを特徴とする有機EL装置の製造方法。 - 画素電極を形成した処理基板をチャンバ内に取り付ける工程と、
固体の第1有機材料及び前記第1有機材料よりも昇華する温度が高い固体の第2有機材料を含む混合材料を加熱室に供給する工程と、
前記加熱室から前記処理基板に向かう流路を閉鎖した状態で前記加熱室に供給された前記混合材料をその混合材料に含まれる前記第2有機材料が昇華する温度よりも50℃以上高い温度で加熱する工程と、
前記第1有機材料及び前記第2有機材料がともに昇華した状態で前記流路を開放する工程と、
昇華した前記混合材料を前記画素電極の上方の面に蒸着させる工程と、
を具備したことを特徴とする有機EL装置の製造方法。 - 前記加熱室は、前記処理基板と対向する空間から離れて位置し、昇華した前記第1有機材料及び前記第2有機材料を含む混合材料を前記加熱室から前記流路を通して前記空間内で前記画素電極の上方の面に蒸着させることを特徴とする請求項2に記載の有機EL装置の製造方法。
- 昇華した前記混合材料を前記画素電極の上方の面に蒸着させる間に、前記第1有機材料の昇華が終了した時点で前記流路を再び閉鎖する工程をさらに含むことを特徴とする請求項2または3に記載の有機EL装置の製造方法。
- 前記第1有機材料がホスト材料で、前記第2有機材料がドーパント材料であることを特徴とする請求項1ないし4いずれか1項に記載の有機EL装置の製造方法。
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009264214A JP4974036B2 (ja) | 2009-11-19 | 2009-11-19 | 有機el装置の製造方法 |
| US12/917,866 US8114703B2 (en) | 2009-11-19 | 2010-11-02 | Organic EL device |
| US13/341,071 US8202756B2 (en) | 2009-11-19 | 2011-12-30 | Organic EL device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009264214A JP4974036B2 (ja) | 2009-11-19 | 2009-11-19 | 有機el装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2011108552A JP2011108552A (ja) | 2011-06-02 |
| JP4974036B2 true JP4974036B2 (ja) | 2012-07-11 |
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| Application Number | Title | Priority Date | Filing Date |
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| JP2009264214A Active JP4974036B2 (ja) | 2009-11-19 | 2009-11-19 | 有機el装置の製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (2) | US8114703B2 (ja) |
| JP (1) | JP4974036B2 (ja) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20120138305A (ko) * | 2011-06-14 | 2012-12-26 | 삼성디스플레이 주식회사 | 유기 박막 증착 시스템 및 유기 박막 증착 방법 |
| JP5779804B2 (ja) * | 2011-10-12 | 2015-09-16 | 日東電工株式会社 | 有機エレクトロルミネッセンス素子の製造方法 |
| US9527107B2 (en) * | 2013-01-11 | 2016-12-27 | International Business Machines Corporation | Method and apparatus to apply material to a surface |
| EP2960059B1 (en) | 2014-06-25 | 2018-10-24 | Universal Display Corporation | Systems and methods of modulating flow during vapor jet deposition of organic materials |
| US11220737B2 (en) | 2014-06-25 | 2022-01-11 | Universal Display Corporation | Systems and methods of modulating flow during vapor jet deposition of organic materials |
| US11267012B2 (en) | 2014-06-25 | 2022-03-08 | Universal Display Corporation | Spatial control of vapor condensation using convection |
| US10566534B2 (en) | 2015-10-12 | 2020-02-18 | Universal Display Corporation | Apparatus and method to deliver organic material via organic vapor-jet printing (OVJP) |
| EP3291319B1 (en) * | 2016-08-30 | 2019-01-23 | Novaled GmbH | Method for preparing an organic semiconductor layer |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3831968B2 (ja) * | 1996-02-23 | 2006-10-11 | ソニー株式会社 | 光学的素子の製造方法 |
| JP4303814B2 (ja) * | 1998-11-25 | 2009-07-29 | Tdk株式会社 | 有機el素子の製造装置および製造方法 |
| TW593622B (en) * | 2000-05-19 | 2004-06-21 | Eastman Kodak Co | Method of using predoped materials for making an organic light-emitting device |
| JP4035372B2 (ja) * | 2001-06-15 | 2008-01-23 | キヤノン株式会社 | 発光素子 |
| JP3705237B2 (ja) | 2001-09-05 | 2005-10-12 | ソニー株式会社 | 有機電界発光素子を用いた表示装置の製造システムおよび製造方法 |
| US20040142098A1 (en) * | 2003-01-21 | 2004-07-22 | Eastman Kodak Company | Using compacted organic materials in making white light emitting oleds |
| US7501152B2 (en) * | 2004-09-21 | 2009-03-10 | Eastman Kodak Company | Delivering particulate material to a vaporization zone |
| US7288285B2 (en) * | 2004-09-21 | 2007-10-30 | Eastman Kodak Company | Delivering organic powder to a vaporization zone |
| EP1643568A1 (de) * | 2004-10-04 | 2006-04-05 | Novaled GmbH | Verfahren zum Herstellen einer Schicht aus einem dotierten Halbleitermaterial und Vorrichtung |
| JP2006199794A (ja) * | 2005-01-19 | 2006-08-03 | T Chatani & Co Ltd | 発光体の製造方法、発光体、及び発光装置 |
| JP2006225757A (ja) * | 2005-01-21 | 2006-08-31 | Mitsubishi Heavy Ind Ltd | 真空蒸着装置 |
| US7625601B2 (en) * | 2005-02-04 | 2009-12-01 | Eastman Kodak Company | Controllably feeding organic material in making OLEDs |
| US7625602B2 (en) * | 2005-05-03 | 2009-12-01 | Eastman Kodak Company | Controllably feeding powdered or granular material |
| JP4959961B2 (ja) | 2005-07-29 | 2012-06-27 | 株式会社ジャパンディスプレイセントラル | 有機el素子の製造方法 |
| US20070098891A1 (en) * | 2005-10-31 | 2007-05-03 | Eastman Kodak Company | Vapor deposition apparatus and method |
| US7638168B2 (en) * | 2005-11-10 | 2009-12-29 | Eastman Kodak Company | Deposition system using sealed replenishment container |
| US7645483B2 (en) * | 2006-01-17 | 2010-01-12 | Eastman Kodak Company | Two-dimensional aperture array for vapor deposition |
| US7951421B2 (en) * | 2006-04-20 | 2011-05-31 | Global Oled Technology Llc | Vapor deposition of a layer |
| JP5197058B2 (ja) * | 2007-04-09 | 2013-05-15 | キヤノン株式会社 | 発光装置とその作製方法 |
| US20080254217A1 (en) * | 2007-04-16 | 2008-10-16 | Boroson Michael L | Fine control of vaporized organic material |
| JP5201932B2 (ja) * | 2007-09-10 | 2013-06-05 | 株式会社アルバック | 供給装置、及び有機蒸着装置 |
| EP2168644B1 (en) * | 2008-09-29 | 2014-11-05 | Applied Materials, Inc. | Evaporator for organic materials and method for evaporating organic materials |
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2009
- 2009-11-19 JP JP2009264214A patent/JP4974036B2/ja active Active
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- 2010-11-02 US US12/917,866 patent/US8114703B2/en active Active
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- 2011-12-30 US US13/341,071 patent/US8202756B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| US8202756B2 (en) | 2012-06-19 |
| US20110117688A1 (en) | 2011-05-19 |
| US8114703B2 (en) | 2012-02-14 |
| US20120100655A1 (en) | 2012-04-26 |
| JP2011108552A (ja) | 2011-06-02 |
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