JP5114816B2 - Siloxane-modified cyanate resin composition, and adhesive film, metal foil with resin, and multilayer printed wiring board using the same - Google Patents
Siloxane-modified cyanate resin composition, and adhesive film, metal foil with resin, and multilayer printed wiring board using the same Download PDFInfo
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- JP5114816B2 JP5114816B2 JP2001114235A JP2001114235A JP5114816B2 JP 5114816 B2 JP5114816 B2 JP 5114816B2 JP 2001114235 A JP2001114235 A JP 2001114235A JP 2001114235 A JP2001114235 A JP 2001114235A JP 5114816 B2 JP5114816 B2 JP 5114816B2
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- resin
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- resin composition
- thermosetting resin
- component
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- 229920005989 resin Polymers 0.000 title claims description 53
- 239000011347 resin Substances 0.000 title claims description 53
- 239000011342 resin composition Substances 0.000 title claims description 33
- 239000002184 metal Substances 0.000 title claims description 18
- 229910052751 metal Inorganic materials 0.000 title claims description 18
- 239000011888 foil Substances 0.000 title claims description 16
- 150000001913 cyanates Chemical class 0.000 title claims description 9
- 239000002313 adhesive film Substances 0.000 title claims description 8
- 229920001187 thermosetting polymer Polymers 0.000 claims description 31
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 27
- 239000003822 epoxy resin Substances 0.000 claims description 26
- 229920000647 polyepoxide Polymers 0.000 claims description 26
- 150000001875 compounds Chemical class 0.000 claims description 24
- 239000004643 cyanate ester Substances 0.000 claims description 23
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 17
- 229920001955 polyphenylene ether Polymers 0.000 claims description 11
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical group C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 claims description 7
- 229920005992 thermoplastic resin Polymers 0.000 claims description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- AHZMUXQJTGRNHT-UHFFFAOYSA-N [4-[2-(4-cyanatophenyl)propan-2-yl]phenyl] cyanate Chemical compound C=1C=C(OC#N)C=CC=1C(C)(C)C1=CC=C(OC#N)C=C1 AHZMUXQJTGRNHT-UHFFFAOYSA-N 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 6
- 125000003700 epoxy group Chemical group 0.000 claims description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 125000001651 cyanato group Chemical group [*]OC#N 0.000 claims description 4
- 150000002430 hydrocarbons Chemical group 0.000 claims description 4
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 claims description 3
- 238000010030 laminating Methods 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 3
- 229920003192 poly(bis maleimide) Polymers 0.000 claims description 3
- 229920001721 polyimide Polymers 0.000 claims description 3
- 239000004696 Poly ether ether ketone Substances 0.000 claims description 2
- 239000004697 Polyetherimide Substances 0.000 claims description 2
- 239000004734 Polyphenylene sulfide Substances 0.000 claims description 2
- 229920000180 alkyd Polymers 0.000 claims description 2
- UMIVXZPTRXBADB-UHFFFAOYSA-N benzocyclobutene Chemical compound C1=CC=C2CCC2=C1 UMIVXZPTRXBADB-UHFFFAOYSA-N 0.000 claims description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- 239000005011 phenolic resin Substances 0.000 claims description 2
- 229920001230 polyarylate Polymers 0.000 claims description 2
- 239000004417 polycarbonate Substances 0.000 claims description 2
- 229920000515 polycarbonate Polymers 0.000 claims description 2
- 229920001225 polyester resin Polymers 0.000 claims description 2
- 239000004645 polyester resin Substances 0.000 claims description 2
- 229920002530 polyetherether ketone Polymers 0.000 claims description 2
- 229920001601 polyetherimide Polymers 0.000 claims description 2
- 239000009719 polyimide resin Substances 0.000 claims description 2
- 229920000069 polyphenylene sulfide Polymers 0.000 claims description 2
- 229920005749 polyurethane resin Polymers 0.000 claims description 2
- 229920002050 silicone resin Polymers 0.000 claims description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- -1 polysiloxane Polymers 0.000 description 27
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 18
- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate Chemical compound [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 description 17
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 14
- 239000000203 mixture Substances 0.000 description 13
- 239000002904 solvent Substances 0.000 description 13
- 238000006243 chemical reaction Methods 0.000 description 10
- 125000000524 functional group Chemical group 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 7
- 238000001723 curing Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 229920003986 novolac Polymers 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 6
- 229920001296 polysiloxane Polymers 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 238000005553 drilling Methods 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 150000002989 phenols Chemical class 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- FYGHSUNMUKGBRK-UHFFFAOYSA-N 1,2,3-trimethylbenzene Chemical compound CC1=CC=CC(C)=C1C FYGHSUNMUKGBRK-UHFFFAOYSA-N 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 4
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 4
- 239000003063 flame retardant Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000011572 manganese Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- QBDSZLJBMIMQRS-UHFFFAOYSA-N p-Cumylphenol Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=CC=C1 QBDSZLJBMIMQRS-UHFFFAOYSA-N 0.000 description 4
- 239000002966 varnish Substances 0.000 description 4
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 230000001476 alcoholic effect Effects 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 239000011889 copper foil Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000011256 inorganic filler Substances 0.000 description 3
- 229910003475 inorganic filler Inorganic materials 0.000 description 3
- 125000005439 maleimidyl group Chemical group C1(C=CC(N1*)=O)=O 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 2
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 239000005456 alcohol based solvent Substances 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- LJCFOYOSGPHIOO-UHFFFAOYSA-N antimony pentoxide Chemical compound O=[Sb](=O)O[Sb](=O)=O LJCFOYOSGPHIOO-UHFFFAOYSA-N 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 125000001246 bromo group Chemical group Br* 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000013007 heat curing Methods 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- SGGOJYZMTYGPCH-UHFFFAOYSA-L manganese(2+);naphthalene-2-carboxylate Chemical compound [Mn+2].C1=CC=CC2=CC(C(=O)[O-])=CC=C21.C1=CC=CC2=CC(C(=O)[O-])=CC=C21 SGGOJYZMTYGPCH-UHFFFAOYSA-L 0.000 description 2
- 125000002524 organometallic group Chemical group 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- 125000004437 phosphorous atom Chemical group 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 150000003018 phosphorus compounds Chemical class 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 description 1
- BDFBPPCACYFGFA-UHFFFAOYSA-N 2,4,6-tris(2,4,6-tribromophenoxy)-1,3,5-triazine Chemical compound BrC1=CC(Br)=CC(Br)=C1OC1=NC(OC=2C(=CC(Br)=CC=2Br)Br)=NC(OC=2C(=CC(Br)=CC=2Br)Br)=N1 BDFBPPCACYFGFA-UHFFFAOYSA-N 0.000 description 1
- OBETXYAYXDNJHR-UHFFFAOYSA-N 2-Ethylhexanoic acid Chemical compound CCCCC(CC)C(O)=O OBETXYAYXDNJHR-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- QOXOZONBQWIKDA-UHFFFAOYSA-N 3-hydroxypropyl Chemical group [CH2]CCO QOXOZONBQWIKDA-UHFFFAOYSA-N 0.000 description 1
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- IGFHQQFPSIBGKE-UHFFFAOYSA-N Nonylphenol Natural products CCCCCCCCCC1=CC=C(O)C=C1 IGFHQQFPSIBGKE-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- SIZDMAYTWUINIG-UHFFFAOYSA-N [4-[1-(4-cyanatophenyl)ethyl]phenyl] cyanate Chemical compound C=1C=C(OC#N)C=CC=1C(C)C1=CC=C(OC#N)C=C1 SIZDMAYTWUINIG-UHFFFAOYSA-N 0.000 description 1
- MGURRWJWGJUVEM-UHFFFAOYSA-N [4-[2,6-di(propan-2-yl)phenyl]phenyl] cyanate Chemical class CC(C)C1=CC=CC(C(C)C)=C1C1=CC=C(OC#N)C=C1 MGURRWJWGJUVEM-UHFFFAOYSA-N 0.000 description 1
- INHGSGHLQLYYND-UHFFFAOYSA-N [4-[2-(4-cyanatophenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]phenyl] cyanate Chemical compound C=1C=C(OC#N)C=CC=1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(OC#N)C=C1 INHGSGHLQLYYND-UHFFFAOYSA-N 0.000 description 1
- BQPNUOYXSVUVMY-UHFFFAOYSA-N [4-[2-(4-diphenoxyphosphoryloxyphenyl)propan-2-yl]phenyl] diphenyl phosphate Chemical compound C=1C=C(OP(=O)(OC=2C=CC=CC=2)OC=2C=CC=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OP(=O)(OC=1C=CC=CC=1)OC1=CC=CC=C1 BQPNUOYXSVUVMY-UHFFFAOYSA-N 0.000 description 1
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical class CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000003934 aromatic aldehydes Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 150000001649 bromium compounds Chemical class 0.000 description 1
- SHZIWNPUGXLXDT-UHFFFAOYSA-N caproic acid ethyl ester Natural products CCCCCC(=O)OCC SHZIWNPUGXLXDT-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
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- 239000004927 clay Substances 0.000 description 1
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- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
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- 238000004132 cross linking Methods 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
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- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
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- 238000001465 metallisation Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 125000005609 naphthenate group Chemical group 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910017464 nitrogen compound Inorganic materials 0.000 description 1
- 150000002830 nitrogen compounds Chemical class 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- SNQQPOLDUKLAAF-UHFFFAOYSA-N nonylphenol Chemical compound CCCCCCCCCC1=CC=CC=C1O SNQQPOLDUKLAAF-UHFFFAOYSA-N 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-M octanoate Chemical compound CCCCCCCC([O-])=O WWZKQHOCKIZLMA-UHFFFAOYSA-M 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
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Description
【0001】
【発明の属する技術分野】
本発明は、耐衝撃性を改善したシロキサン変性シアネート樹脂を含む熱硬化性樹脂組成物ならびに該組成物を用いた接着フィルム、樹脂付き金属箔および多層プリント配線板に関する。
【0002】
【従来の技術】
近年のプリント基板においては、信号伝播遅延時間の短縮および誘電体損失の低減を目的として、使用される樹脂の低誘電率化が要求されてきている。このような要求から、プリント配線板用材料として誘電特性に優れるシアネート樹脂が用いられるようになってきている。現在、一般的に用いられているシアネート樹脂モノマーとして、2,2−ビス(4−シアナトフェニル)プロパンが挙げられるが、この単独硬化物は、脆いために耐衝撃性が劣るという欠点がある。これを克服するために、従来よりビスマレイミド樹脂やエポキシ樹脂による変性が行われてきたが、このような変性を行うことによって、シアネート樹脂が本来有する優れた誘電特性が大きく損なわれてしまう。また、誘電特性が良好なポリブタジエンやポリシロキサンを配合して耐衝撃性を向上させようとしても、シアネート樹脂との相溶性が低いため、これらを混合した場合は、ワニスが分離したり、硬化物の耐熱性が低下したりする。
【0003】
【発明が解決しようとする課題】
本発明の課題は、シアネート樹脂の優れた誘電特性を損なうことなく、硬化物の耐衝撃性を改善した熱硬化性樹脂組成物、ならびに該組成物を用いた接着フィルム、樹脂付き金属箔および多層プリント配線板を提供することである。
【0004】
【課題を解決するための手段】
本発明者らは、上記の課題を解決するために検討を重ねた結果、シアネートエステル化合物を、該シアネートエステル化合物のシアナト基と反応しうる炭素官能性基を有する反応性ポリオルガノシロキサンと反応させることによってシロキサン変性シアネート樹脂を合成し、それを主成分とする熱硬化性樹脂組成物を用いて、接着フィルム、樹脂付き金属箔および多層プリント配線板を製造することによって、その課題を達成できることを見出して、本発明を完成するに至った。
【0005】
すなわち、本発明は、(A)後述の一般式〔1〕で示されるシアネートエステル化合物と、(B)一般式〔2〕で示される反応性ポリオルガノシロキサンとを反応させることで得られるシロキサン変性シアネート樹脂を含む熱硬化性樹脂組成物に関する。また、本発明は、該組成物を用いた接着フィルム、樹脂付き金属箔および多層プリント配線板に関する。
【0006】
上記の(A)シアネートエステル化合物は、一般式〔1〕:
【0007】
【化4】
【0008】
(式中、R1は、
【0009】
【化5】
【0010】
を表し;
R2およびR3は、たがいに同一でも異なっていてもよく、水素原子またはメチル基を表す)
で示される。
【0011】
また、反応性ポリオルガノシロキサンは、一般式〔2〕:
【0012】
【化6】
【0013】
(式中、mおよびnは、たがいに独立して0または正の数であり;
RaおよびRbは、たがいに独立してメチル基またはRcであり、Rcは、たがいに同一でも異なっていてもよく、シアネートエステル化合物と反応する炭素官能性基、好ましくはシアナト基、フェノール性水酸基、アルコール性水酸基、アミノ基、エポキシ基、マレイミド基、およびカルボキシル基で置換され、酸素原子または窒素原子で中断されていてもよい1価の炭化水素基を表す)
で示され、分子中に少なくとも1個のRcを有する。
【0014】
【発明の実施の形態】
本発明によると、シアネートエステル化合物と、フェノール性水酸基などのような炭素官能性基を有する反応性ポリオルガノシロキサンとを反応させることにより、架橋点間の一部が適度にポリシロキサンで置換されたシロキサン変性シアネート樹脂を得ることができる。ポリシロキサンは屈曲性に富むため、硬化物の耐衝撃性が向上し、また、ポリシロキサンは、元来、誘電特性に優れるため、樹脂硬化物の誘電特性を損なうことはない。
【0015】
本発明で使用される(A)シアネートエステル化合物は、前記一般式〔1〕で示される、1分子中にシアナト基を2個有するものである。
【0016】
一般式〔1〕で示される化合物としては、たとえば、2,2−ビス(4−シアナトフェニル)プロパン、ビス(4−シアナトフェニル)エタン、2,2−ビス(3,5−ジメチル−4−シアナトフェニル)メタン、2,2−ビス(4−シアナトフェニル)−1,1,1,3,3,3−ヘキサフルオロプロパン、α,α′−ビス(4−シアナトフェニル)−m−ジイソプロピルベンゼン、ジシクロペンタジエン骨格を有するシアネートエステル化合物等が挙げられる。その中でも、2,2−ビス(4−シアナトフェニル)プロパンは、硬化物の誘電特性と硬化性のバランスが特に良好であり、安価に入手できることから好ましい。シアネートエステル化合物は、1種類を単独で用いてもよく、2種類以上を混合して用いてもよい。また、あらかじめ一部が、三量体や五量体にオリゴマー化されていてもよい。
【0017】
本発明で使用される(B)ポリオルガノシロキサンは、前記一般式〔2〕で示される、1分子中に、(A)シアネートエステル化合物のシアナト基と反応する官能基を少なくとも1個有するものである。
【0018】
反応性ポリオルガノシロキサンのRa、Rbおよび/またはRcに含まれる炭素官能性基は、シアネートエステル化合物のシアナト基と反応する基であり、たがいに同一でも異なっていてもよく、優れた反応性が得られることから、シアナト基、フェノール性水酸基、アルコール性水酸基、アミノ基、エポキシ基、マレイミド基およびカルボキシル基が好ましい。シアネートエステル化合物と反応する官能基の中でもフェノール性水酸基は、シアネートエステル化合物との反応性が高いことから最も好ましい。この場合、シアナト基とフェノール性水酸基の割合を100/1〜100/50にすることにより、耐衝撃性と誘電特性および耐熱性のバランスの良好な硬化物が得られる。このようなフェノール性水酸基を有する反応性ポリオルガノシロキサンとしては、たとえば、両末端にフェノール性水酸基を有するX−22−1821(フェノール性水酸基価、30KOHmg/g、信越化学工業株式会社製)、X−22−1822(フェノール性水酸基価、20KOHmg/g、信越化学工業株式会社製)などを用いることができる。
【0019】
シアネートエステル化合物と反応する上記の官能基は、ケイ素原子に結合する1価の炭化水素基に、置換基として結合して、Ra、Rbおよび/またはRcを形成する。該炭化水素基は、アルキル鎖のような脂肪族性炭素鎖を有するもの、シクロヘキサン環のような脂肪族性環を有するもの、ベンゼン環のような芳香環を有するもの、またはそれらの2種以上の構造を併せて有するもののいずれであってもよく、脂肪族性炭素鎖は、酸素原子または窒素原子で中断されていてもよい。脂肪族性炭素鎖の場合、該官能基がケイ素原子からβ−位に存在すると安定性が悪いので、該官能基は、通常、ケイ素原子から3個以上の炭素原子を介して結合する。このようなRa、Rbおよび/またはRcの例として、3−シアナトプロピル、4−ヒドロキシフェニル、2−(4−ヒドロキシフェニル)エチル、3−(4−ヒドロキシフェニル)プロピル、3−(4−ヒドロキシフェニルオキシ)プロピル、3−(4−ヒドロキシフェニルメチルオキシ)プロピル、3−〔3−(4−ヒドロキシフェニルオキシ)−2−ヒドロキシ〕プロピル、3−(2−ヒドロキシ−3−t−ブチルフェニル)プロピル、3−(4−ヒドロキシ−3,5−ジ−t−ブチルフェニル)プロピル、3−ヒドロキシプロピル、3−(2−ヒドロキシエチルオキシ)プロピル、3−アミノプロピル、N−(2−アミノエチル)−3−アミノプロピル、3−グリシドキシプロピル、2−(3,4−エポキシシクロヘキシル)エチル、3−マレイミドプロピル、2−(ヒドロキシカルボニル)エチル、10−(ヒドロキシカルボニル)デシルなどが例示されるが、本発明は、これらに限定されるものではない。
【0020】
該反応性ポリオルガノシロキサンは、1分子中に少なくとも1個の、上記の官能基を有している。たとえば該官能基が上記のRaまたはRbのいずれかに存在し、他方のRaまたはRbがメチル基である場合、該反応性ポリオルガノシロキサンは片末端反応性ポリオルガノシロキサンであり、RaおよびRbの両方に存在する場合、両末端反応性ポリオルガノシロキサンであり、1分子中に3個以上の官能基が存在する場合、多官能反応性ポリオルガノシロキサンである。
【0021】
本発明の樹脂組成物は、(A)シアネートエステル化合物と(B)反応性ポリオルガノシロキサンを反応させて得られるシロキサン変性シアネート樹脂を含む。この反応は、溶液中で行ってもよい。また、混合物をフィルムや金属箔に塗布する際に行ってもよいし、混合物を基板に積層した後の熱硬化の際に行ってもよい。反応を溶液中で行う場合、反応は、通常60〜180℃の範囲で行う。溶媒としては、主としてベンゼン、トルエン、キシレン、トリメチルベンゼンのような芳香族炭化水素系溶媒が用いられる。反応系の粘度を調整する場合や、あらかじめ溶解させる熱可塑性樹脂の溶解性を向上させる場合には、ケトン系溶媒、エーテル系溶媒、アルコール系溶媒、エーテルアルコール系溶媒またはアミド系溶媒のような、反応に不活性な溶媒を併用してもよい。反応時間は、反応系の濃度、触媒量などによって、適宜、調整することができる。なお、溶液中で反応させる場合は、シアネートエステル化合物のトリアジン環への転化率T(%)を、溶液の粘度が大きくなって取扱いが困難になることを防ぐために、0≦T≦60の範囲に制御することが好ましい。
【0022】
また、上記のポリシロキサン変性シアネート樹脂を含む本発明の熱硬化性組成物に、さらに、(C)熱硬化性樹脂の1種以上を配合してもよい。熱硬化性樹脂としては、エポキシ樹脂、フェノール樹脂、アルキド樹脂、ポリエステル樹脂、ポリイミド樹脂、ポリウレタン樹脂、シリコーン樹脂、ビスマレイミド樹脂、ベンゾシクロブテン樹脂などが例示される。特にエポキシ樹脂を混合した場合は、硬化物の耐湿性が大きく向上するので好ましい。エポキシ樹脂としては、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビスフェノールS型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、アルキルフェノールノボラック型エポキシ樹脂、ビフェノール型エポキシ樹脂、ナフタレン型エポキシ樹脂、ジシクロペンタジエン骨格を有するエポキシ樹脂、フェノール類とフェノール性水酸基を有する芳香族アルデヒドとの縮合物であるエポキシ化物、トリグリシジルイソシアヌレート、脂環式エポキシ樹脂など公知のものを、単独で、または2種以上を組み合わせて使用することができる。また、テトラブロモビスフェノールAのジグリシジルエーテルやその同族体、ブロモ含有フェノールノボラックのグリシジルエーテルのような臭素化されたエポキシ樹脂、リン含有フェノールノボラック型エポキシ樹脂のようなリン原子を含むエポキシ樹脂など、難燃性の高いエポキシ樹脂を、その一部または全部として用いてもよい。これらのエポキシ樹脂を配合すると、誘電特性やTgが低下する場合もあるが、ジシクロペンタジエン骨格を有するエポキシ樹脂を用いると、このような物性の低下が少ないのでさらに好ましい。ジシクロペンタジエン骨格を有するエポキシ樹脂の配合量は、誘電特性と耐湿性のバランスに優れる硬化物が得られることから、シアナト基とエポキシ基の当量比が100/20〜100/100になる量が特に好ましい。
【0023】
本発明の熱硬化性樹脂組成物に、さらに、(D)熱可塑性樹脂の1種以上を配合してもよい。熱可塑性樹脂としては、フッ素樹脂、ポリフェニレンエーテル、ポリフェニレンスルフィド、ポリカーボネート、ポリエーテルイミド、ポリエーテルエーテルケトン、ポリアリレートなどが例示される。そのうち、ポリフェニレンエーテルを配合すると、硬化物の誘電特性が向上するのでさらに好ましい。ポリフェニレンエーテル樹脂としては、たとえば、ポリ(2,6−ジメチル−1,4−フェニレン)エーテルおよびポリ(2,6−ジブロモ−1,4−フェニレン)エーテルが挙げられ、さらに、ポリ(2,6−ジメチル−1,4−フェニレン)エーテルとポリスチレンのポリマーアロイ、およびポリ(2,6−ジメチル−1,4−フェニレン)エーテルとスチレン−ブタジエンコポリマのポリマーアロイのように、ポリマーアロイを形成したものが挙げられる。ポリフェニレンエーテルの配合量は、シアネートエステル化合物とポリフェニレンエーテルの重量比は、誘電特性と耐熱性のバランスのよい樹脂が得られることから、100/20〜100/150が特に好ましい。
【0024】
なお、このような熱可塑性樹脂を、(A)シアネートエステル化合物と(B)反応性ポリオルガノシロキサンを反応させる際に、あらかじめ配合しておくと、反応によって容易にセミIPN構造が構築され、樹脂組成物のモルホロジーを制御できる効果があるが、本発明は、これに限定されるものではない。
【0025】
硬化反応を促進させるために、本発明の熱硬化性樹脂組成物に、硬化触媒や硬化促進剤を配合してもよい。硬化触媒としては、マンガン、鉄、コバルト、ニッケル、銅、亜鉛などの金属の化合物が用いられ、具体的には、オクタン酸塩、2−エチルヘキサン酸塩、ナフテン酸塩などの有機金属塩;およびアセチルアセトン錯体などの有機金属錯体が用いられる。これらは、単独で使用しても、2種以上を混合して使用してもよい。硬化促進剤としては、フェノール類を使用することが望ましく、ノニルフェノール、パラクミルフェノールなどの単官能フェノール類や、ビスフェノールA、ビスフェノールF、ビスフェノールSなどの二官能フェノール類、またはフェノールノボラック、クレゾールノボラックなどの多官能フェノール類などを用いることができる。これらは、単独で使用しても、2種以上を混合して使用してもよい。
【0026】
また、本発明の熱硬化性樹脂組成物に、無機フィラーを混合してもよい。無機フィラーとしては、アルミナ、水酸化アルミニウム、水酸化マグネシウム、溶融シリカ、石英粉、酸化亜鉛、クレー、タルク、三酸化アンチモン、五酸化アンチモン、ガラス粉、シラスバルーンなどが挙げられる。これら無機フィラーは、単独で使用しても、2種類以上を混合して使用してもよい。
【0027】
さらに、必要に応じて、難燃剤を任意に添加してもよい。難燃剤としては、分子中に臭素や塩素などを含むハロゲン化合物や、リン化合物、窒素化合物、金属水酸化物、金属複酸化物などを挙げることができる。代表的な臭化物としては、デカブロモジフェニレンエーテル、トリス(トリブロモフェノキシ)トリアジンのほか、前述の臭素化されたエポキシ樹脂が挙げられる。代表的なリン化合物としては、リン酸トリフェニル、ビスフェノールAビス(ジフェニルホスフアート)、リン酸レゾルシニルジフェニル、前述のリン原子を含むエポキシ樹脂などが挙げられる。これらの難燃剤のうち、シアナト基、フェノール性水酸基、アルコール性水酸基、アミノ基、エポキシ基、マレイミド基、カルボキシル基などの反応性官能基を有するものは、高温におけるブリードやめっき液の汚染を防ぐことができるため、特に望ましい。このような反応性基を有する難燃剤の代表的なものとして、テトラブロモビスフェノールAのジグリシジルエーテル、ブロモ含有フェノールノボラックのグリシジルエーテル、リン酸レゾルシニルジフェニル、リン含有フェノールノボラック型エポキシ樹脂などが挙げられる。
【0028】
本発明の熱硬化性樹脂組成物を、樹脂ワニスとして用いるために、有機溶媒を含有してもよい。有機溶媒としては、通常、主としてベンゼン、トルエン、キシレン、トリメチルベンゼンのような芳香族炭化水素系溶媒が用いられる。ワニスの粘度を調整する場合や、あらかじめ溶解させる熱可塑性樹脂の溶解性を向上させる場合には、必要に応じて、アセトン、メチルエチルケトン、メチルイソブチルケトンのようなケトン系溶媒;テトラヒドロフランのようなエーテル系溶媒;イソプロパノール、ブタノールのようなアルコール系溶媒;2−メトキシエタノール、2−ブトキシエタノールのようなエーテルアルコール系溶媒;N−メチルピロリドン、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミドのようなアミド系溶媒などを、適宜、併用してもよい。
【0029】
次に、本発明の熱硬化性樹脂組成物を用いた多層プリント配線板の製造法について説明する。まず、本発明の熱硬化性樹脂組成物をパターン加工された内層回路基板上に積層する。その方法は、有機溶媒を含む該樹脂組成物を、内層回路基板に塗布し、乾燥後、加熱硬化させるか、または本発明の樹脂組成物からなる接着フィルムを用いて、加圧、加熱条件下で基板上に積層し、またはプレスし、ついで支持フィルムを剥離した後、加熱硬化させる。なお、内層回路基板としては、ガラスエポキシ基板、ポリエステル基板、ポリイミド基板、BTレジン基板、熱硬化型PPE基板、金属基板などを使用することができる。回路表面は、あらかじめ粗化処理してもよい。加熱硬化の条件は、通常120℃以上、好ましくは170〜220℃の温度で、通常15〜300分、好ましくは60〜150分かければ充分である。上記のように基板上に本発明の熱硬化性樹脂組成物を積層して硬化させた後、ドリルおよび/またはレーザを用いて穴あけを行い、スルーホールやバイアホールを形成させる。レーザ穴明け機には、炭酸ガスレーザ、YAGレーザ、エキシマレーザなどを用いることができる。その後、サンドブラスト処理、プラズマ処理、過マンガン酸塩や重クロム酸塩などの酸化剤を用いた薬品処理などを行なって、表面を粗化する。この工程では、レーザ穴あけの際に発生する樹脂残さも、同時に除去される。さらに無電解銅めっき、金属蒸着、スパッタリング、イオンプレーティングなどの手法を用いて、内層と外層の電気的導通を得た後は、通常のビルドアップ配線板における回路形成方法を用いて、積層した本発明の熱硬化性樹脂組成物の表面に回路形成を行う。
【0030】
本発明の熱硬化性樹脂組成物を、金属箔に塗布し、樹脂付き金属箔として使用することもできる。まず、樹脂付き金属箔を加圧、加熱条件下で基板上に積層し、またはプレスして加熱硬化させる。その後、使用する金属箔が薄い場合は、金属箔と樹脂を同時に穴あけでき。この場合、金属箔表面は、粗化処理されてあってもよい。使用する金属箔が厚い場合は、コンフォーマルマスク法またはラージウィンド法を用いて窓穴を形成した後、レーザ穴あけを行う。穴あけ後は、先に記述したような樹脂残さの除去を行い、内層と外層の電気的導通を得た後、通常のビルドアップ配線板における回路形成方法を用いて、積層した本発明の熱硬化性樹脂組成物の表面に回路形成を行う。
【0031】
【実施例】
以下に、実施例および比較例を示して、本発明を具体的に説明する。本発明は、これらの実施例に限定されるものではない。
【0032】
実施例1
温度計、冷却管、攪拌装置を備えた1リットルの4つ口セパラブルフラスコに、トルエン100g、2,2−ビス(4−シアナトフェニル)プロパン(ArocyB−10、旭チバ株式会社製商品名)100gおよび両末端フェノール変性ポリオルガノシロキサン(X−22−1822、信越化学株式会社製商品名)88gを投入して溶解した後、ナフテン酸マンガン(Mn含有量=6重量%、日本化学産業株式会社製)をトルエンでMn分1%に希釈した溶液0.2gを添加し、105℃で4時間反応させ、本発明のシロキサン変性シアネート樹脂を得た。得られた樹脂組成物を銅箔(GTS−12、古河サーキットフォイル株式会社製商品名)に塗布した後、樹脂面を貼り合わせ、200℃で90分プレスして、樹脂硬化物を作製した。銅箔をエッチングした後、樹脂硬化物の伸び率を、島津製作所株式会社製オートグラフAC−100Cを用い、引張り速度50mm/minで測定したところ、2.5%であった。また、樹脂硬化物の1GHzにおける比誘電率および誘電正接をヒューレットパッカード株式会社製インピーダンス−マテリアルアナライザHP4291Bで測定したところ、比誘電率は2.95、誘電正接は0.0055であった。
【0033】
実施例2
温度計、冷却管、攪拌装置を備えた1リットルの4つ口セパラブルフラスコに、トルエン117gとポリフェニレンエーテル(ノニルPKN4752、日本ジーイープラスチックス株式会社製商品名)20gを投入し、攪拌しつつ80℃に加熱して溶解した。次に2,2−ビス(4−シアナトフェニル)プロパン(ArocyB−10、旭チバ株式会社製商品名)40gおよび両末端フェノール変性ポリオルガノシロキサン(X−22−1822、信越化学株式会社製商品名)36gを投入して溶解した後、ナフテン酸マンガン(Mn含有量=6重量%、日本化学産業株式会社製)をトルエンでMn分1%に希釈した溶液0.24gを添加し、還流温度で8時間反応させた。室温まで冷却し、ジシクロペンタジエン骨格を有するエポキシ樹脂(EXA7200L、大日本インキ化学株式会社製商品名)42gを加え、本発明のシロキサン変性シアネートを含む樹脂組成物を得た。実施例1と同様にして測定した樹脂硬化物の伸び率は4.8%、1GHzにおける比誘電率は2.59、誘電正接は0.0053であった。
【0034】
比較例1
実施例1で使用した両末端フェノール変性ポリオルガノシロキサンの代わりに、p−(α−クミル)フェノール(サンテクノケミカル株式会社製)12gを使用する以外は実施例1と同様にして、樹脂硬化物を得た。フェノール配合量が実施例1と異なるのは、フェノール当量が異なるためであり、シアナト基とフェノール性水酸基の当量比が実施例1と等しくなるように配合した。実施例1と同様にして測定した樹脂硬化物の伸び率は0.08%で、1GHzにおける比誘電率は2.93、誘電正接は0.0056であった。
【0035】
比較例2
実施例2で使用した両末端フェノール変性ポリオルガノシロキサンの代わりに、p−(α−クミル)フェノール(サンテクノケミカル株式会社製)5gを使用する以外は実施例1と同様にして、樹脂硬化物を得た。フェノール配合量が実施例2と異なるのは、フェノール当量が異なるためであり、シアナト基とフェノール性水酸基の当量比が実施例2と等しくなるように配合した。実施例1と同様にして測定した樹脂硬化物の伸び率は1.9%で、1GHzにおける比誘電率は2.50、誘電正接は0.0056であった。
【0036】
比較例3
実施例1で使用した両末端フェノール変性ポリオルガノシロキサンの代わりに、p−(α−クミル)フェノール(サンテクノケミカル株式会社製)12gを使用し、さらに、有機樹脂との相溶性が良好とされる長鎖アルキル変性ポリオルガノシロキサン(KF−414、信越化学株式会社製商品名)88gを配合した。それ以外は実施例1と同様にした。フェノール配合量が実施例1と異なっているのは、フェノール当量が異なるためであり、シアナト基とフェノール性水酸基の当量比が実施例1と等しくなるように配合した。配合後のワニスは、相分離してしまい、銅箔に塗布したが、溶媒の揮発とともにポリオルガノシロキサンが樹脂表面に浮き出てきてしまった。
【0037】
【発明の効果】
実施例1と比較例1の比較により、本発明のように反応性ポリオルガノシロキサンとシアネートエステル化合物を反応させることにより、伸び率が大きく上昇することがわかる。このことにより、従来のシアネート樹脂の欠点であった硬化物の脆さが改善され、靭性が向上した。また、ポリシロキサンの誘電特性は元来優れているため、硬化物の誘電特性を低下させることはない。
【0038】
さらに、実施例2と比較例2の比較から、本発明の効果はポリフェニレンエーテルなどの熱可塑性樹脂やジシクロペンタジエン骨格を有するエポキシ樹脂などの熱硬化性樹脂を配合した場合でも大きく発現されることがわかる。なお、比較例3からわかるように、アルキル変性ポリオルガノシロキサンをシアネートエステル化合物に配合しても、相溶性が大きく異なるため均一な樹脂組成物を得ることは不可能である。したがって、均一な樹脂組成物を得るためには、本発明のように反応性ポリオルガノシロキサンとシアネートエステル化合物を反応させる必要がある。
【0039】
本発明の樹脂組成物、ならびに該組成物を用いた接着フィルムおよび樹脂付き金属箔を用いることにより、コンピュータの高速化や高周波関連機器の低損失化に適した多層プリント配線板を、容易に製造することが可能となる。[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a thermosetting resin composition containing a siloxane-modified cyanate resin having improved impact resistance, an adhesive film using the composition, a metal foil with a resin, and a multilayer printed wiring board.
[0002]
[Prior art]
In recent printed boards, there has been a demand for lowering the dielectric constant of the resin used for the purpose of shortening the signal propagation delay time and reducing the dielectric loss. Due to such demands, cyanate resins having excellent dielectric properties have been used as printed wiring board materials. Currently, 2,2-bis (4-cyanatophenyl) propane is a commonly used cyanate resin monomer, but this single cured product has the disadvantage of poor impact resistance due to its brittleness. . In order to overcome this, modification with bismaleimide resin or epoxy resin has been conventionally performed. However, by performing such modification, the excellent dielectric properties inherent in the cyanate resin are greatly impaired. In addition, even if polybutadiene or polysiloxane with good dielectric properties is blended to improve impact resistance, the compatibility with cyanate resin is low, so when these are mixed, the varnish is separated or cured The heat resistance of the may decrease.
[0003]
[Problems to be solved by the invention]
An object of the present invention is to provide a thermosetting resin composition having improved impact resistance of a cured product without impairing the excellent dielectric properties of the cyanate resin, and an adhesive film, a resin-coated metal foil and a multilayer using the composition. It is to provide a printed wiring board.
[0004]
[Means for Solving the Problems]
As a result of repeated studies to solve the above problems, the present inventors react a cyanate ester compound with a reactive polyorganosiloxane having a carbon functional group capable of reacting with a cyanate group of the cyanate ester compound. By synthesizing a siloxane-modified cyanate resin and producing an adhesive film, a resin-coated metal foil, and a multilayer printed wiring board using a thermosetting resin composition containing the same as the main component, the problem can be achieved. As a result, the present invention has been completed.
[0005]
That is, the present invention provides (A) a siloxane modification obtained by reacting a cyanate ester compound represented by the following general formula [1] with a reactive polyorganosiloxane represented by (B) the general formula [2]. The present invention relates to a thermosetting resin composition containing a cyanate resin. Moreover, this invention relates to the adhesive film using this composition, metal foil with resin, and a multilayer printed wiring board.
[0006]
The above (A) cyanate ester compound is represented by the general formula [1]:
[0007]
[Formula 4]
[0008]
(Wherein R 1 is
[0009]
[Chemical formula 5]
[0010]
Represents;
R 2 and R 3 may be the same or different and each represents a hydrogen atom or a methyl group)
Indicated by
[0011]
The reactive polyorganosiloxane has a general formula [2]:
[0012]
[Chemical 6]
[0013]
Wherein m and n are each independently 0 or a positive number;
R a and R b are each independently a methyl group or R c , and R c may be the same or different from each other, and is a carbon functional group that reacts with a cyanate ester compound, preferably a cyanate group, (Represents a monovalent hydrocarbon group substituted with a phenolic hydroxyl group, an alcoholic hydroxyl group, an amino group, an epoxy group, a maleimide group, and a carboxyl group and optionally interrupted by an oxygen atom or a nitrogen atom)
And has at least one R c in the molecule.
[0014]
DETAILED DESCRIPTION OF THE INVENTION
According to the present invention, by reacting a cyanate ester compound with a reactive polyorganosiloxane having a carbon functional group such as a phenolic hydroxyl group, a part of the crosslinking points is appropriately substituted with polysiloxane. A siloxane-modified cyanate resin can be obtained. Since polysiloxane is rich in flexibility, the impact resistance of the cured product is improved, and since polysiloxane is inherently excellent in dielectric properties, the dielectric properties of the cured resin product are not impaired.
[0015]
The (A) cyanate ester compound used in the present invention has two cyanate groups in one molecule represented by the general formula [1].
[0016]
Examples of the compound represented by the general formula [1] include 2,2-bis (4-cyanatophenyl) propane, bis (4-cyanatophenyl) ethane, 2,2-bis (3,5-dimethyl- 4-cyanatophenyl) methane, 2,2-bis (4-cyanatophenyl) -1,1,1,3,3,3-hexafluoropropane, α, α'-bis (4-cyanatophenyl) -M-diisopropylbenzene, cyanate ester compounds having a dicyclopentadiene skeleton and the like. Among them, 2,2-bis (4-cyanatophenyl) propane is preferable because it has a particularly good balance between the dielectric properties and curability of the cured product and can be obtained at low cost. A cyanate ester compound may be used individually by 1 type, and 2 or more types may be mixed and used for it. Moreover, a part may be oligomerized in advance to a trimer or a pentamer.
[0017]
The polyorganosiloxane (B) used in the present invention has at least one functional group that reacts with the cyanato group of the (A) cyanate ester compound in one molecule represented by the general formula [2]. is there.
[0018]
The carbon functional group contained in R a , R b and / or R c of the reactive polyorganosiloxane is a group that reacts with the cyanate group of the cyanate ester compound, and may be the same or different, and is excellent. From the viewpoint of reactivity, a cyanate group, a phenolic hydroxyl group, an alcoholic hydroxyl group, an amino group, an epoxy group, a maleimide group and a carboxyl group are preferred. Of the functional groups that react with the cyanate ester compound, the phenolic hydroxyl group is most preferable because of its high reactivity with the cyanate ester compound. In this case, by setting the ratio of cyanate group and phenolic hydroxyl group to 100/1 to 100/50, a cured product having a good balance of impact resistance, dielectric properties and heat resistance can be obtained. Examples of such a reactive polyorganosiloxane having a phenolic hydroxyl group include X-22-1821 having a phenolic hydroxyl group at both ends (phenolic hydroxyl value, 30 KOH mg / g, manufactured by Shin-Etsu Chemical Co., Ltd.), X -22-1822 (phenolic hydroxyl value, 20 KOH mg / g, manufactured by Shin-Etsu Chemical Co., Ltd.) can be used.
[0019]
The above functional group that reacts with the cyanate ester compound is bonded as a substituent to a monovalent hydrocarbon group bonded to a silicon atom to form R a , R b and / or R c . The hydrocarbon group has an aliphatic carbon chain such as an alkyl chain, an aliphatic ring such as a cyclohexane ring, an aromatic ring such as a benzene ring, or two or more thereof. The aliphatic carbon chain may be interrupted by an oxygen atom or a nitrogen atom. In the case of an aliphatic carbon chain, the stability is poor when the functional group is present in the β-position from the silicon atom, and thus the functional group is usually bonded to the silicon atom via three or more carbon atoms. Examples of such R a , R b and / or R c include 3-cyanatopropyl, 4-hydroxyphenyl, 2- (4-hydroxyphenyl) ethyl, 3- (4-hydroxyphenyl) propyl, 3- (4-hydroxyphenyloxy) propyl, 3- (4-hydroxyphenylmethyloxy) propyl, 3- [3- (4-hydroxyphenyloxy) -2-hydroxy] propyl, 3- (2-hydroxy-3-t -Butylphenyl) propyl, 3- (4-hydroxy-3,5-di-t-butylphenyl) propyl, 3-hydroxypropyl, 3- (2-hydroxyethyloxy) propyl, 3-aminopropyl, N- ( 2-aminoethyl) -3-aminopropyl, 3-glycidoxypropyl, 2- (3,4-epoxycyclohexyl) ethyl, Examples thereof include 3-maleimidopropyl, 2- (hydroxycarbonyl) ethyl, 10- (hydroxycarbonyl) decyl and the like, but the present invention is not limited thereto.
[0020]
The reactive polyorganosiloxane has at least one of the above functional groups in one molecule. For example, when the functional group is present in either R a or R b above and the other R a or R b is a methyl group, the reactive polyorganosiloxane is a one-end reactive polyorganosiloxane; When present in both R a and R b , it is a both-end reactive polyorganosiloxane, and when there are 3 or more functional groups in one molecule, it is a polyfunctional reactive polyorganosiloxane.
[0021]
The resin composition of the present invention contains (A) a cyanate ester compound and (B) a siloxane-modified cyanate resin obtained by reacting a reactive polyorganosiloxane. This reaction may be carried out in solution. Moreover, you may carry out when apply | coating a mixture to a film or metal foil, and may carry out in the case of the thermosetting after laminating | stacking a mixture on a board | substrate. When the reaction is performed in a solution, the reaction is usually performed in the range of 60 to 180 ° C. As the solvent, aromatic hydrocarbon solvents such as benzene, toluene, xylene and trimethylbenzene are mainly used. When adjusting the viscosity of the reaction system or improving the solubility of the thermoplastic resin to be dissolved in advance, such as a ketone solvent, an ether solvent, an alcohol solvent, an ether alcohol solvent or an amide solvent, A solvent inert to the reaction may be used in combination. The reaction time can be appropriately adjusted depending on the concentration of the reaction system, the amount of catalyst, and the like. When the reaction is carried out in a solution, the conversion rate T (%) of the cyanate ester compound to the triazine ring is in the range of 0 ≦ T ≦ 60 in order to prevent the viscosity of the solution from becoming difficult to handle. It is preferable to control.
[0022]
Moreover, you may mix | blend 1 or more types of (C) thermosetting resin further to the thermosetting composition of this invention containing said polysiloxane modified cyanate resin. Examples of the thermosetting resin include epoxy resin, phenol resin, alkyd resin, polyester resin, polyimide resin, polyurethane resin, silicone resin, bismaleimide resin, benzocyclobutene resin, and the like. Particularly when an epoxy resin is mixed, the moisture resistance of the cured product is greatly improved, which is preferable. Epoxy resins include bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, phenol novolac type epoxy resin, alkylphenol novolac type epoxy resin, biphenol type epoxy resin, naphthalene type epoxy resin, dicyclopentadiene skeleton. Known epoxy resins, epoxidized products that are condensates of phenols and aromatic aldehydes having phenolic hydroxyl groups, triglycidyl isocyanurate, alicyclic epoxy resins, etc., alone or in combination of two or more Can be used. In addition, diglycidyl ether of tetrabromobisphenol A and its homologues, brominated epoxy resin such as glycidyl ether of bromo-containing phenol novolac, epoxy resin containing phosphorus atom such as phosphorus-containing phenol novolac type epoxy resin, etc. An epoxy resin having high flame retardancy may be used as a part or all of it. When these epoxy resins are blended, the dielectric properties and Tg may be lowered, but it is more preferable to use an epoxy resin having a dicyclopentadiene skeleton because such a decrease in physical properties is small. The amount of the epoxy resin having a dicyclopentadiene skeleton is such that a cured product having an excellent balance between dielectric properties and moisture resistance can be obtained, so that the equivalent ratio of cyanate group to epoxy group is 100/20 to 100/100. Particularly preferred.
[0023]
You may mix | blend 1 or more types of (D) thermoplastic resin further to the thermosetting resin composition of this invention. Examples of the thermoplastic resin include fluororesin, polyphenylene ether, polyphenylene sulfide, polycarbonate, polyether imide, polyether ether ketone, and polyarylate. Of these, the addition of polyphenylene ether is more preferable because the dielectric properties of the cured product are improved. Examples of the polyphenylene ether resin include poly (2,6-dimethyl-1,4-phenylene) ether and poly (2,6-dibromo-1,4-phenylene) ether, and poly (2,6 A polymer alloy formed such as a polymer alloy of dimethyl-1,4-phenylene) ether and polystyrene, and a polymer alloy of poly (2,6-dimethyl-1,4-phenylene) ether and styrene-butadiene copolymer. Is mentioned. The blending amount of the polyphenylene ether is particularly preferably 100/20 to 100/150, since the weight ratio of the cyanate ester compound and the polyphenylene ether can provide a resin having a good balance between dielectric properties and heat resistance.
[0024]
In addition, when such a thermoplastic resin is previously blended when (A) a cyanate ester compound and (B) a reactive polyorganosiloxane are reacted, a semi-IPN structure is easily constructed by the reaction, and the resin Although there exists an effect which can control the morphology of a composition, this invention is not limited to this.
[0025]
In order to accelerate the curing reaction, a curing catalyst or a curing accelerator may be added to the thermosetting resin composition of the present invention. As the curing catalyst, metal compounds such as manganese, iron, cobalt, nickel, copper, and zinc are used. Specifically, organometallic salts such as octanoate, 2-ethylhexanoate, and naphthenate; And organometallic complexes such as acetylacetone complexes are used. These may be used alone or in admixture of two or more. As a curing accelerator, it is desirable to use phenols, monofunctional phenols such as nonylphenol and paracumylphenol, bifunctional phenols such as bisphenol A, bisphenol F, and bisphenol S, or phenol novolac and cresol novolac. These polyfunctional phenols can be used. These may be used alone or in admixture of two or more.
[0026]
Moreover, you may mix an inorganic filler with the thermosetting resin composition of this invention. Examples of the inorganic filler include alumina, aluminum hydroxide, magnesium hydroxide, fused silica, quartz powder, zinc oxide, clay, talc, antimony trioxide, antimony pentoxide, glass powder, and shirasu balloon. These inorganic fillers may be used alone or in combination of two or more.
[0027]
Furthermore, you may add a flame retardant arbitrarily as needed. Examples of the flame retardant include halogen compounds containing bromine and chlorine in the molecule, phosphorus compounds, nitrogen compounds, metal hydroxides, metal double oxides, and the like. Representative bromides include decabromodiphenylene ether, tris (tribromophenoxy) triazine, and the above brominated epoxy resins. Typical phosphorus compounds include triphenyl phosphate, bisphenol A bis (diphenyl phosphate), resorcinyl diphenyl phosphate, and epoxy resins containing the aforementioned phosphorus atoms. Among these flame retardants, those having reactive functional groups such as cyanato group, phenolic hydroxyl group, alcoholic hydroxyl group, amino group, epoxy group, maleimide group, carboxyl group prevent bleed and plating solution contamination at high temperature. This is particularly desirable because it can be used. Typical examples of the flame retardant having such a reactive group include diglycidyl ether of tetrabromobisphenol A, glycidyl ether of bromo-containing phenol novolak, resorcinyl diphenyl phosphate, and phosphorus-containing phenol novolac-type epoxy resin. Can be mentioned.
[0028]
In order to use the thermosetting resin composition of the present invention as a resin varnish, an organic solvent may be contained. As the organic solvent, aromatic hydrocarbon solvents such as benzene, toluene, xylene and trimethylbenzene are usually used. When adjusting the viscosity of the varnish or improving the solubility of the thermoplastic resin previously dissolved, if necessary, a ketone solvent such as acetone, methyl ethyl ketone, or methyl isobutyl ketone; an ether system such as tetrahydrofuran Solvents; alcohol solvents such as isopropanol and butanol; ether alcohol solvents such as 2-methoxyethanol and 2-butoxyethanol; N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide and the like An amide solvent or the like may be used in combination as appropriate.
[0029]
Next, the manufacturing method of the multilayer printed wiring board using the thermosetting resin composition of this invention is demonstrated. First, the thermosetting resin composition of the present invention is laminated on a patterned inner layer circuit board. In the method, the resin composition containing an organic solvent is applied to an inner circuit board and dried and then heat-cured, or using an adhesive film made of the resin composition of the present invention, under pressure and heating conditions. Then, the substrate is laminated on the substrate or pressed, and then the support film is peeled off, followed by heat curing. As the inner layer circuit board, a glass epoxy board, a polyester board, a polyimide board, a BT resin board, a thermosetting PPE board, a metal board, or the like can be used. The circuit surface may be roughened in advance. The conditions for heat curing are usually 120 ° C. or higher, preferably 170 to 220 ° C., usually 15 to 300 minutes, preferably 60 to 150 minutes. After laminating and curing the thermosetting resin composition of the present invention on the substrate as described above, drilling is performed using a drill and / or a laser to form a through hole or a via hole. As the laser drilling machine, a carbon dioxide laser, a YAG laser, an excimer laser, or the like can be used. Then, the surface is roughened by performing sandblasting, plasma treatment, chemical treatment using an oxidizing agent such as permanganate or dichromate. In this step, resin residues generated during laser drilling are also removed. Furthermore, after obtaining electrical continuity between the inner layer and the outer layer using techniques such as electroless copper plating, metal deposition, sputtering, ion plating, etc., the layers were laminated using the circuit forming method in a normal build-up wiring board. Circuit formation is performed on the surface of the thermosetting resin composition of the present invention.
[0030]
The thermosetting resin composition of the present invention can be applied to a metal foil and used as a metal foil with a resin. First, a resin-coated metal foil is laminated on a substrate under pressure and heating conditions, or pressed and cured by heating. Then, if the metal foil to be used is thin, the metal foil and resin can be drilled at the same time. In this case, the metal foil surface may be roughened. When the metal foil to be used is thick, laser drilling is performed after forming a window hole using the conformal mask method or the large window method. After drilling, the resin residue as described above is removed, and after obtaining electrical continuity between the inner layer and the outer layer, using the circuit forming method in a normal build-up wiring board, the laminated thermosetting of the present invention A circuit is formed on the surface of the conductive resin composition.
[0031]
【Example】
Hereinafter, the present invention will be specifically described with reference to Examples and Comparative Examples. The present invention is not limited to these examples.
[0032]
Example 1
To a 1 liter four-necked separable flask equipped with a thermometer, a condenser, and a stirrer, 100 g of toluene, 2,2-bis (4-cyanatophenyl) propane (ArocyB-10, trade name, manufactured by Asahi Ciba Co., Ltd.) ) 100 g and 88 g of both end phenol-modified polyorganosiloxane (X-22-1822, trade name manufactured by Shin-Etsu Chemical Co., Ltd.) were added and dissolved, and then manganese naphthenate (Mn content = 6 wt%, Nippon Chemical Industry Co., Ltd.) 0.2 g of a solution prepared by diluting with a toluene to 1% Mn content was added and reacted at 105 ° C. for 4 hours to obtain a siloxane-modified cyanate resin of the present invention. After apply | coating the obtained resin composition to copper foil (GTS-12, Furukawa Circuit foil Co., Ltd. brand name), the resin surface was bonded together and it pressed at 200 degreeC for 90 minutes, and produced resin cured | curing material. After etching the copper foil, the elongation percentage of the cured resin was measured with an autograph AC-100C manufactured by Shimadzu Corporation at a pulling rate of 50 mm / min. Moreover, when the relative dielectric constant and dielectric loss tangent of the cured resin at 1 GHz were measured with an impedance-material analyzer HP4291B manufactured by Hewlett-Packard Co., the relative dielectric constant was 2.95 and the dielectric loss tangent was 0.0055.
[0033]
Example 2
To a 1 liter four-necked separable flask equipped with a thermometer, a condenser, and a stirrer, 117 g of toluene and 20 g of polyphenylene ether (Nonyl PKN4752, a trade name of Nippon GE Plastics Co., Ltd.) were added and stirred. Dissolved by heating to ° C. Next, 40 g of 2,2-bis (4-cyanatophenyl) propane (Arocy B-10, trade name manufactured by Asahi Ciba Co., Ltd.) and a phenol-modified polyorganosiloxane having both ends phenol (X-22-1822, product manufactured by Shin-Etsu Chemical Co., Ltd.) Name) After 36 g was added and dissolved, 0.24 g of a solution obtained by diluting manganese naphthenate (Mn content = 6 wt%, manufactured by Nippon Chemical Industry Co., Ltd.) with toluene to 1% Mn content was added, and the reflux temperature was For 8 hours. After cooling to room temperature, 42 g of an epoxy resin having a dicyclopentadiene skeleton (EXA7200L, trade name, manufactured by Dainippon Ink Chemical Co., Ltd.) was added to obtain a resin composition containing the siloxane-modified cyanate of the present invention. The elongation percentage of the cured resin measured in the same manner as in Example 1 was 4.8%, the relative dielectric constant at 1 GHz was 2.59, and the dielectric loss tangent was 0.0053.
[0034]
Comparative Example 1
A resin cured product was obtained in the same manner as in Example 1 except that 12 g of p- (α-cumyl) phenol (manufactured by Sun Techno Chemical Co., Ltd.) was used instead of the both-end phenol-modified polyorganosiloxane used in Example 1. Obtained. The reason why the phenol blending amount is different from that in Example 1 is that the phenol equivalent is different, so that the equivalence ratio of cyanate group and phenolic hydroxyl group is equal to that in Example 1. The elongation percentage of the cured resin measured in the same manner as in Example 1 was 0.08%, the relative dielectric constant at 1 GHz was 2.93, and the dielectric loss tangent was 0.0056.
[0035]
Comparative Example 2
A resin cured product was obtained in the same manner as in Example 1 except that 5 g of p- (α-cumyl) phenol (manufactured by Sun Techno Chemical Co., Ltd.) was used instead of the both-end phenol-modified polyorganosiloxane used in Example 2. Obtained. The reason why the phenol blending amount is different from that in Example 2 is that the phenol equivalent is different, so that the equivalence ratio of cyanate group and phenolic hydroxyl group is equal to that in Example 2. The elongation percentage of the cured resin measured in the same manner as in Example 1 was 1.9%, the relative dielectric constant at 1 GHz was 2.50, and the dielectric loss tangent was 0.0056.
[0036]
Comparative Example 3
Instead of the both-end phenol-modified polyorganosiloxane used in Example 1, 12 g of p- (α-cumyl) phenol (manufactured by Sun Techno Chemical Co., Ltd.) is used, and the compatibility with the organic resin is good. 88 g of long-chain alkyl-modified polyorganosiloxane (KF-414, trade name, manufactured by Shin-Etsu Chemical Co., Ltd.) was blended. Otherwise, the same procedure as in Example 1 was performed. The reason why the phenol blending amount is different from that in Example 1 is that the phenol equivalent is different, so that the equivalence ratio of cyanate group and phenolic hydroxyl group is equal to that in Example 1. The varnish after the blending was phase-separated and applied to the copper foil, but the polyorganosiloxane emerged on the resin surface as the solvent volatilized.
[0037]
【Effect of the invention】
From comparison between Example 1 and Comparative Example 1, it can be seen that the elongation increases greatly by reacting the reactive polyorganosiloxane and the cyanate ester compound as in the present invention. This improved the brittleness of the cured product, which was a drawback of the conventional cyanate resin, and improved toughness. Moreover, since the dielectric property of polysiloxane is originally excellent, the dielectric property of hardened | cured material is not deteriorated.
[0038]
Further, from the comparison between Example 2 and Comparative Example 2, the effect of the present invention is greatly expressed even when a thermoplastic resin such as polyphenylene ether or a thermosetting resin such as an epoxy resin having a dicyclopentadiene skeleton is blended. I understand. As can be seen from Comparative Example 3, even when the alkyl-modified polyorganosiloxane is blended with the cyanate ester compound, it is impossible to obtain a uniform resin composition because the compatibility is greatly different. Therefore, in order to obtain a uniform resin composition, it is necessary to react the reactive polyorganosiloxane and the cyanate ester compound as in the present invention.
[0039]
By using the resin composition of the present invention, and an adhesive film using the composition and a metal foil with a resin, a multilayer printed wiring board suitable for increasing the speed of computers and reducing the loss of high-frequency related equipment can be easily produced. It becomes possible to do.
Claims (8)
(B)一般式〔2〕:
反応させて得られるシロキサン変性シアネート樹脂を含む熱硬化性樹脂組成物であって、
前記成分(A)と反応する炭素官能性基がフェノール性水酸基であり、
前記成分(A)中のシアナト基と前記フェノール性水酸基の当量比が100/1〜100/50であり、
前記熱硬化性樹脂組成物が、さらに、
(D)フッ素樹脂、ポリフェニレンエーテル、ポリフェニレンスルフィド、ポリカーボネート、ポリエーテルイミド、ポリエーテルエーテルケトン、ポリアリレートからなる群より選ばれる熱可塑性樹脂を含む熱硬化性樹脂組成物。(A) General formula [1]:
(B) General formula [2]:
The carbon functional group that reacts with the component (A) is a phenolic hydroxyl group;
Ri equivalent ratio 100 / 1-100 / 50 der of the phenolic hydroxyl group and cyanato group in said component (A),
The thermosetting resin composition further comprises:
(D) A thermosetting resin composition comprising a thermoplastic resin selected from the group consisting of fluororesin, polyphenylene ether, polyphenylene sulfide, polycarbonate, polyetherimide, polyether ether ketone, and polyarylate .
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| JP2011202175A (en) * | 2011-05-27 | 2011-10-13 | Hitachi Chem Co Ltd | Siloxane-modified cyanate resin composition, adhesive film using the same, resin coated metal foil and multilayered printed wiring board |
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| JP2823653B2 (en) * | 1990-05-02 | 1998-11-11 | 住友ベークライト株式会社 | Resin composition for semiconductor encapsulation |
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| JPH1030050A (en) * | 1996-07-15 | 1998-02-03 | Hitachi Ltd | Thermosetting resin composition for semiconductor encapsulation, semiconductor device using the same, and method for producing the same |
| JP3411164B2 (en) * | 1996-10-31 | 2003-05-26 | 住友ベークライト株式会社 | Die attach paste |
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| JP2011202175A (en) * | 2011-05-27 | 2011-10-13 | Hitachi Chem Co Ltd | Siloxane-modified cyanate resin composition, adhesive film using the same, resin coated metal foil and multilayered printed wiring board |
| CN109321199A (en) * | 2017-07-31 | 2019-02-12 | 比亚迪股份有限公司 | High temperature resistant adhesive and preparation method thereof and composite insulating paper |
| CN109321199B (en) * | 2017-07-31 | 2022-02-08 | 比亚迪股份有限公司 | High-temperature-resistant adhesive, preparation method thereof and composite insulating paper |
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