JP5248071B2 - 光半導体封止用樹脂組成物 - Google Patents
光半導体封止用樹脂組成物 Download PDFInfo
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- JP5248071B2 JP5248071B2 JP2007250198A JP2007250198A JP5248071B2 JP 5248071 B2 JP5248071 B2 JP 5248071B2 JP 2007250198 A JP2007250198 A JP 2007250198A JP 2007250198 A JP2007250198 A JP 2007250198A JP 5248071 B2 JP5248071 B2 JP 5248071B2
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- zirconium oxide
- oxide particles
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- 239000011342 resin composition Substances 0.000 title claims description 47
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- 239000004065 semiconductor Substances 0.000 title claims description 28
- 238000005538 encapsulation Methods 0.000 title claims 2
- 239000002245 particle Substances 0.000 claims description 119
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 83
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 82
- 239000000203 mixture Substances 0.000 claims description 38
- 229920000647 polyepoxide Polymers 0.000 claims description 31
- 239000003822 epoxy resin Substances 0.000 claims description 30
- 239000003566 sealing material Substances 0.000 claims description 23
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 19
- 150000002894 organic compounds Chemical class 0.000 claims description 19
- 238000002834 transmittance Methods 0.000 claims description 19
- 125000004432 carbon atom Chemical group C* 0.000 claims description 11
- 238000007789 sealing Methods 0.000 claims description 10
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- 229920000570 polyether Polymers 0.000 claims description 5
- 150000001735 carboxylic acids Chemical class 0.000 claims 1
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- 238000012360 testing method Methods 0.000 description 8
- 125000000217 alkyl group Chemical group 0.000 description 7
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical group N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
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- 238000004458 analytical method Methods 0.000 description 6
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 6
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- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 6
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- IJEFAHUDTLUXDY-UHFFFAOYSA-J 7,7-dimethyloctanoate;zirconium(4+) Chemical compound [Zr+4].CC(C)(C)CCCCCC([O-])=O.CC(C)(C)CCCCCC([O-])=O.CC(C)(C)CCCCCC([O-])=O.CC(C)(C)CCCCCC([O-])=O IJEFAHUDTLUXDY-UHFFFAOYSA-J 0.000 description 5
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- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 4
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- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 4
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- BGHCVCJVXZWKCC-UHFFFAOYSA-N tetradecane Chemical compound CCCCCCCCCCCCCC BGHCVCJVXZWKCC-UHFFFAOYSA-N 0.000 description 4
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- WWZKQHOCKIZLMA-UHFFFAOYSA-N Caprylic acid Natural products CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 230000003078 antioxidant effect Effects 0.000 description 3
- 125000003710 aryl alkyl group Chemical group 0.000 description 3
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- 125000000524 functional group Chemical group 0.000 description 3
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- 239000000395 magnesium oxide Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- WQEPLUUGTLDZJY-UHFFFAOYSA-N pentadecanoic acid Chemical compound CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 3
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- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 3
- 230000004580 weight loss Effects 0.000 description 3
- NKBWMBRPILTCRD-UHFFFAOYSA-N 2-Methylheptanoic acid Chemical compound CCCCCC(C)C(O)=O NKBWMBRPILTCRD-UHFFFAOYSA-N 0.000 description 2
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 230000006750 UV protection Effects 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- 125000002252 acyl group Chemical group 0.000 description 2
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 2
- 125000004183 alkoxy alkyl group Chemical group 0.000 description 2
- OBETXYAYXDNJHR-UHFFFAOYSA-N alpha-ethylcaproic acid Natural products CCCCC(CC)C(O)=O OBETXYAYXDNJHR-UHFFFAOYSA-N 0.000 description 2
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- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 description 2
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical group C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 2
- 239000004205 dimethyl polysiloxane Substances 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
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- 239000000706 filtrate Substances 0.000 description 2
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- KEMQGTRYUADPNZ-UHFFFAOYSA-N heptadecanoic acid Chemical compound CCCCCCCCCCCCCCCCC(O)=O KEMQGTRYUADPNZ-UHFFFAOYSA-N 0.000 description 2
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- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
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- OQWBVEQWPPRAMU-UHFFFAOYSA-L magnesium;7,7-dimethyloctanoate Chemical compound [Mg+2].CC(C)(C)CCCCCC([O-])=O.CC(C)(C)CCCCCC([O-])=O OQWBVEQWPPRAMU-UHFFFAOYSA-L 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- ZQMHJBXHRFJKOT-UHFFFAOYSA-N methyl 2-[(1-methoxy-2-methyl-1-oxopropan-2-yl)diazenyl]-2-methylpropanoate Chemical compound COC(=O)C(C)(C)N=NC(C)(C)C(=O)OC ZQMHJBXHRFJKOT-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- FBUKVWPVBMHYJY-UHFFFAOYSA-N nonanoic acid Chemical compound CCCCCCCCC(O)=O FBUKVWPVBMHYJY-UHFFFAOYSA-N 0.000 description 2
- CMOAHYOGLLEOGO-UHFFFAOYSA-N oxozirconium;dihydrochloride Chemical compound Cl.Cl.[Zr]=O CMOAHYOGLLEOGO-UHFFFAOYSA-N 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
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- SZHOJFHSIKHZHA-UHFFFAOYSA-N tridecanoic acid Chemical compound CCCCCCCCCCCCC(O)=O SZHOJFHSIKHZHA-UHFFFAOYSA-N 0.000 description 2
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- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
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- AHDSRXYHVZECER-UHFFFAOYSA-N 2,4,6-tris[(dimethylamino)methyl]phenol Chemical compound CN(C)CC1=CC(CN(C)C)=C(O)C(CN(C)C)=C1 AHDSRXYHVZECER-UHFFFAOYSA-N 0.000 description 1
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- AOBIOSPNXBMOAT-UHFFFAOYSA-N 2-[2-(oxiran-2-ylmethoxy)ethoxymethyl]oxirane Chemical compound C1OC1COCCOCC1CO1 AOBIOSPNXBMOAT-UHFFFAOYSA-N 0.000 description 1
- WTYYGFLRBWMFRY-UHFFFAOYSA-N 2-[6-(oxiran-2-ylmethoxy)hexoxymethyl]oxirane Chemical compound C1OC1COCCCCCCOCC1CO1 WTYYGFLRBWMFRY-UHFFFAOYSA-N 0.000 description 1
- HIGURUTWFKYJCH-UHFFFAOYSA-N 2-[[1-(oxiran-2-ylmethoxymethyl)cyclohexyl]methoxymethyl]oxirane Chemical compound C1OC1COCC1(COCC2OC2)CCCCC1 HIGURUTWFKYJCH-UHFFFAOYSA-N 0.000 description 1
- KUAUJXBLDYVELT-UHFFFAOYSA-N 2-[[2,2-dimethyl-3-(oxiran-2-ylmethoxy)propoxy]methyl]oxirane Chemical compound C1OC1COCC(C)(C)COCC1CO1 KUAUJXBLDYVELT-UHFFFAOYSA-N 0.000 description 1
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 1
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- LZMNXXQIQIHFGC-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C(C)=C LZMNXXQIQIHFGC-UHFFFAOYSA-N 0.000 description 1
- 125000004975 3-butenyl group Chemical group C(CC=C)* 0.000 description 1
- MECNWXGGNCJFQJ-UHFFFAOYSA-N 3-piperidin-1-ylpropane-1,2-diol Chemical compound OCC(O)CN1CCCCC1 MECNWXGGNCJFQJ-UHFFFAOYSA-N 0.000 description 1
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- IZBBZIWEZCJERX-UHFFFAOYSA-N [SiH3]N[SiH3].C[Si]([Si](C)(C)C)(C)C Chemical compound [SiH3]N[SiH3].C[Si]([Si](C)(C)C)(C)C IZBBZIWEZCJERX-UHFFFAOYSA-N 0.000 description 1
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- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- GONOPSZTUGRENK-UHFFFAOYSA-N benzyl(trichloro)silane Chemical compound Cl[Si](Cl)(Cl)CC1=CC=CC=C1 GONOPSZTUGRENK-UHFFFAOYSA-N 0.000 description 1
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- 150000001639 boron compounds Chemical group 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004063 butyryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- 229960002887 deanol Drugs 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- WNAHIZMDSQCWRP-UHFFFAOYSA-N dodecane-1-thiol Chemical compound CCCCCCCCCCCCS WNAHIZMDSQCWRP-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 238000001227 electron beam curing Methods 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004871 hexylcarbonyl group Chemical group C(CCCCC)C(=O)* 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910052747 lanthanoid Inorganic materials 0.000 description 1
- 150000002602 lanthanoids Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N n-hexanoic acid Natural products CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 125000005375 organosiloxane group Chemical group 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- LRVUGEZGBKPRRZ-UHFFFAOYSA-L oxygen(2-);zirconium(4+);dichloride Chemical compound [O-2].[Cl-].[Cl-].[Zr+4] LRVUGEZGBKPRRZ-UHFFFAOYSA-L 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000004675 pentylcarbonyl group Chemical group C(CCCC)C(=O)* 0.000 description 1
- 239000002530 phenolic antioxidant Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 150000004714 phosphonium salts Chemical group 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 238000000634 powder X-ray diffraction Methods 0.000 description 1
- 125000001844 prenyl group Chemical group [H]C([*])([H])C([H])=C(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003223 protective agent Substances 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 229910001404 rare earth metal oxide Inorganic materials 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- CASCCINXYVTVRI-UHFFFAOYSA-M sodium;7,7-dimethyloctanoate Chemical compound [Na+].CC(C)(C)CCCCCC([O-])=O CASCCINXYVTVRI-UHFFFAOYSA-M 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- TUNFSRHWOTWDNC-HKGQFRNVSA-N tetradecanoic acid Chemical compound CCCCCCCCCCCCC[14C](O)=O TUNFSRHWOTWDNC-HKGQFRNVSA-N 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- WGKLOLBTFWFKOD-UHFFFAOYSA-N tris(2-nonylphenyl) phosphite Chemical compound CCCCCCCCCC1=CC=CC=C1OP(OC=1C(=CC=CC=1)CCCCCCCCC)OC1=CC=CC=C1CCCCCCCCC WGKLOLBTFWFKOD-UHFFFAOYSA-N 0.000 description 1
- 239000000326 ultraviolet stabilizing agent Substances 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000003774 valeryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000005050 vinyl trichlorosilane Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 1
- 150000003755 zirconium compounds Chemical class 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Description
15nm以下がさらに好ましい。
RpXqSiOr
(式中、Rは独立してアルキル基、アルケニル基、アリール基またはアラルキル基を示し;Xは独立して水素原子、ハロゲン原子、OR’基(ここでR’は水素原子、アルキル基、アルケニル基、アルコキシアルキル基またはアシル基を示す)を示し;p+q+2r=4であり;1≦p+q≦2であり;1≦p≦2であり;0≦q<2であり;上記アルキル基、アルケニル基、アリール基、アラルキル基、アルコキシアルキル基およびアシル基は、エポキシ基、グリシジルエーテル基、エポキシシクロヘキシル基およびビニル基からなる群より選択される少なくとも1種の基で置換されていてもよく;また、末端部の基がエポキシ基、グリシジルエーテル基、エポキシシクロヘキシル基およびビニル基からなる群より選択される少なくとも1種の基で置換されていてもよい)。
テトラデカン600部とネオデカン酸400部を混合し、40%ネオデカン酸−テトラデカン溶液を調製した。その溶液に、酸化マグネシウムを67.5部添加し、60℃で1時間攪拌し、ネオデカン酸マグネシウム溶液を調製した。次に、オキシ塩化ジルコニウム402.8部に0.05mol/L塩酸水溶液を75部加え、純水にて溶解させて2500部とし、Zr(IV)水溶液を調製した。該Zr(IV)水溶液1125部とネオデカン酸マグネシウム溶液800部とを混合し、60℃で40分間攪拌し、ネオデカン酸ジルコニウム溶液を調製した。
合成例1で得られた酸化ジルコニウム粒子(1)10部をトルエン90部に分散させた分散液に、シランカップリング剤として2−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン(商品名:KBM−303、信越化学工業社製)を1.5部添加し、80℃で1時間還流反応を行った。反応液にアセトンを200部添加して、凝集白濁した粒子をろ過にて分離後、乾燥してシランカップリング剤にて表面処理を施した酸化ジルコニウム粒子(2)を得た。得られた酸化ジルコニウム粒子(2)のIR分析によりC−H由来の吸収およびCOOH由来の吸収、さらに、Si−O−C由来の吸収、エポキシ基由来の吸収が確認でき、酸化ジルコニウム粒子(2)は表面にネオデカン酸とシランカップリング剤により被覆された粒子であり、TG−DTA分析(熱重量−示差熱分析)による減量率よりネオデカン酸と3−メタクリロキシプロピルトリメトキシシランの総量は25.0%であった。
合成例1で得られた酸化ジルコニウム粒子(1)10部をトルエン50部に分散させた分散液に、ポリエーテルカルボン酸として2−[2−(2−メトキシエトキシ)エトキシ]酢酸を1.5部添加し、90℃で1時間還流反応を行った。反応液にアセトンを200部添加して、凝集白濁した粒子をろ過にて分離後、乾燥してポリエーテルカルボン酸にて表面処理した酸化ジルコニウム粒子(3)を得た。得られた酸化ジルコニウム粒子(3)をTG−DTA分析すると350℃付近と450℃付近に発熱ピークが確認され、減量率よりネオデカン酸とポリエーテルカルボン酸の総量は24.0%であった。
合成例1〜3で得られた酸化ジルコニウム粒子(1)〜(3)をトルエンに分散させ、該分散液に表1で示す配合量でエポキシ樹脂、硬化剤等を加え、均一に分散後、トルエンを減圧下で留去して本発明の光半導体封止用樹脂組成物(1)〜(6)および比較用の封止用樹脂組成物(1)〜(3)を得た。得られた組成物を2mmのスペーサーを挟んだガラス板で作製したケースに入れ、100℃で1時間、130℃で2時間加熱して、厚さ2mmの硬化物を得た。該硬化物を波長450nmの光を照射して、厚み方向の光線透過率を分光光度計で測定した。
実施例中の光学特性は以下の方法により測定した。
上記硬化物の屈折率は、アッベ屈折計(アタゴ社DR−M2)により測定した。
上記硬化物について、スーパーキセノンウェザーメータ(スガ試験機社製)を用い、温度:63℃(BPT)、湿度:50%RH、照度:180W/m2の条件で試験を行い、100時間後、200時間後および300時間後の波長450nmの光線透過率を測定した。
上記硬化物を150℃のオーブン中に入れ、72時間後の波長450nmの光線透過率を測定した。
(1) 酸化ジルコニム粒子の合成
40℃の純水(640g)に水酸化ナトリウム(80g、キシダ化学社製、特級)を攪拌下添加し、溶解した。次いで、ネオデカン酸(396.9g、ジャパンエポキシレジン社製)を攪拌下添加し、ネオデカン酸ナトリウム水溶液を調製した。次に、当該溶液を80℃まで加熱し、攪拌下、オキシ塩化ジルコニウム(585.99g、ZrOCl2・8H2O、第一希元素化学工業社製、ジルコゾール ZC−20)を20分間かけて投入した。その後80℃で1.5時間攪拌を続けたところ、白色で粘調なネオデカン酸ジルコニウムが生成した。水相を除去した後、当該ネオデカン酸ジルコニウムを純水で十分に水洗した。次いで、当該ネオデカン酸ジルコニウムにテトラデカン(92g)を加えて攪拌した。
合成開始前に、重量平均分子量が約5000のメタクリロイル基片末端ポリジメチルシロキサン(チッソ社製、サイラプレーンFM−0721、160g)、シクロヘキシルメタクリレート(34g)および3−メタクリロキシプロピルトリメトキシシラン(信越化学工業社製、KBM−503、6g)を混合した。以下、当該混合物を混合物Aという。また、ジメチル−2,2’−アゾビス(2−メチルプロピオネート)(和光純薬社製、V−601、13.2g)とトルエン(49g)を混合した。以下、当該混合物を混合物Bという。さらに、n−ドデシルメルカプタン(12g)とトルエン(40g)を混合した。以下、当該混合物を混合物Cという。
攪拌機、温度計、冷却管および窒素吹込み用管が備わった100mL容4つ口フラスコ中に、ヘキサン(43g)、上記(1)で得た酸化ジルコニウムナノ粒子(4.11g)および上記表面被覆剤A(2.87g)を仕込んだ。当該反応混合液を還流状態で8時間攪拌した。次いで当該反応混合液を冷却した後、沈殿物を濾別することによって、ネオデカン酸と表面被覆剤Aで被覆された酸化ジルコニウムナノ粒子(4.31g)を得た。
上記で得られた酸化ジルコニウムナノ粒子(4g)をエポキシ基側鎖型ポリジメチルシロキサン(東レダウコーニング社製、SF8411、5.34g)とを混合したところ、高粘度流動性で無色透明のシリコーン樹脂組成物が得られた。よって、上記酸化ジルコニウムナノ粒子は、高い分散性を有することが分かった。
Claims (5)
- エポキシ樹脂および酸化ジルコニウム粒子を含有し;
当該酸化ジルコニウム粒子の平均粒子径が1nm以上、30nm以下であり;
当該酸化ジルコニウム粒子の表面が、配位および/または結合可能な有機化合物により被覆され、
前記有機化合物が、炭素数6以上の脂肪族カルボン酸であり
さらに、酸化ジルコニウム粒子の表面がシランカップリング剤処理および/またはポリエーテルカルボン酸処理されていることを特徴とする光半導体封止用樹脂組成物。 - エポキシ樹脂および酸化ジルコニウム粒子を含有し;
当該酸化ジルコニウム粒子の平均粒子径が1nm以上、30nm以下であり;
当該酸化ジルコニウム粒子の表面が、配位および/または結合可能な有機化合物により被覆され、
前記有機化合物が、炭素数6以上の脂肪族カルボン酸であり、
前記有機化合物の配位量が酸化ジルコニウム粒子全体の5質量%〜50質量%であることを特徴とする光半導体封止用樹脂組成物。 - 酸化ジルコニウム粒子の表面を被覆する有機化合物の配位量が酸化ジルコニウム粒子全体の5質量%〜50質量%である請求項1に記載の光半導体封止用樹脂組成物。
- 酸化ジルコニウム粒子の表面がシランカップリング剤で処理されており、シランカップリング剤は、酸化ジルコニウム粒子100質量部に対して、1質量部〜100質量部である請求項1または3に記載の光半導体封止用樹脂組成物。
- 請求項1〜4のいずれかに記載の組成物を硬化することにより得られるものであり、且つその光線透過率が80%を超えることを特徴とする光半導体封止材。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007250198A JP5248071B2 (ja) | 2006-09-26 | 2007-09-26 | 光半導体封止用樹脂組成物 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
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| JP2006260840 | 2006-09-26 | ||
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| JP5385520B2 (ja) * | 2007-09-14 | 2014-01-08 | 株式会社日本触媒 | 樹脂組成物 |
| WO2013077218A1 (ja) * | 2011-11-25 | 2013-05-30 | 第一工業製薬株式会社 | 光半導体封止材用樹脂組成物 |
| JP2014136798A (ja) * | 2013-01-18 | 2014-07-28 | Fuji Electric Co Ltd | 樹脂組成物 |
| JP6344190B2 (ja) * | 2013-10-11 | 2018-06-20 | 住友大阪セメント株式会社 | 光半導体発光装置、照明器具、表示装置、及び光半導体発光装置の製造方法 |
| CN106574119B (zh) * | 2014-06-24 | 2020-06-12 | 国立研究开发法人产业技术综合研究所 | 湿胶及其制造方法 |
| JP7184311B1 (ja) * | 2022-02-08 | 2022-12-06 | 三笠産業株式会社 | 樹脂添加剤の製造方法および無機粒子含有樹脂組成物の製造方法 |
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