JP5837751B2 - テープ状酸化物超電導線材の製造方法及び熱処理装置 - Google Patents

テープ状酸化物超電導線材の製造方法及び熱処理装置 Download PDF

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Publication number: JP5837751B2
Authority: JP; Japan
Prior art keywords: tape; gas; rotating body; furnace core; heat treatment
Prior art date: 2011-02-03
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Active

Application number

JP2011022116A

Other languages

English (en)

Japanese (ja)

Other versions

JP2012164443A (ja

Inventor

勉小泉

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

International Superconductivity Technology Center

SWCC Corp

Original Assignee

International Superconductivity Technology Center

SWCC Showa Cable Systems Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2011-02-03

Filing date

2011-02-03

Publication date

2015-12-24

2011-02-03 Application filed by International Superconductivity Technology Center, SWCC Showa Cable Systems Co Ltd filed Critical International Superconductivity Technology Center

2011-02-03 Priority to JP2011022116A priority Critical patent/JP5837751B2/ja

2012-02-01 Priority to PCT/JP2012/000652 priority patent/WO2012105244A1/fr

2012-02-01 Priority to CN201280007641.9A priority patent/CN103339692B/zh

2012-02-02 Priority to TW101103393A priority patent/TWI509635B/zh

2012-08-30 Publication of JP2012164443A publication Critical patent/JP2012164443A/ja

2015-12-24 Application granted granted Critical

2015-12-24 Publication of JP5837751B2 publication Critical patent/JP5837751B2/ja

Status Active legal-status Critical Current

2031-02-03 Anticipated expiration legal-status Critical

Links

238000010438 heat treatment Methods 0.000 title claims description 59
238000004519 manufacturing process Methods 0.000 title claims description 22
238000005192 partition Methods 0.000 claims description 38
239000002243 precursor Substances 0.000 claims description 23
238000006243 chemical reaction Methods 0.000 claims description 17
229910052751 metal Inorganic materials 0.000 claims description 15
239000002184 metal Substances 0.000 claims description 15
239000011259 mixed solution Substances 0.000 claims description 14
239000000758 substrate Substances 0.000 claims description 14
-1 organic acid salt Chemical class 0.000 claims description 7
239000003960 organic solvent Substances 0.000 claims description 5
238000007599 discharging Methods 0.000 claims description 4
150000002736 metal compounds Chemical class 0.000 claims description 2
125000005609 naphthenate group Chemical group 0.000 claims description 2
238000000638 solvent extraction Methods 0.000 claims description 2
230000000087 stabilizing effect Effects 0.000 claims description 2
229910052727 yttrium Inorganic materials 0.000 claims description 2
YPIFGDQKSSMYHQ-UHFFFAOYSA-M 7,7-dimethyloctanoate Chemical compound CC(C)(C)CCCCCC([O-])=O YPIFGDQKSSMYHQ-UHFFFAOYSA-M 0.000 claims 1
241000954177 Bangana ariza Species 0.000 claims 1
YVJLCSBNFHDUCX-UHFFFAOYSA-N CC(O)=O.F.F.F Chemical compound CC(O)=O.F.F.F YVJLCSBNFHDUCX-UHFFFAOYSA-N 0.000 claims 1
229910052693 Europium Inorganic materials 0.000 claims 1
229910052688 Gadolinium Inorganic materials 0.000 claims 1
229910052689 Holmium Inorganic materials 0.000 claims 1
229910052779 Neodymium Inorganic materials 0.000 claims 1
229910052772 Samarium Inorganic materials 0.000 claims 1
WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 claims 1
239000007789 gas Substances 0.000 description 158
238000000034 method Methods 0.000 description 23
KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 22
239000000463 material Substances 0.000 description 20
229910000040 hydrogen fluoride Inorganic materials 0.000 description 16
239000002994 raw material Substances 0.000 description 13
238000010304 firing Methods 0.000 description 12
239000000243 solution Substances 0.000 description 11
YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 7
229910052731 fluorine Inorganic materials 0.000 description 7
239000011737 fluorine Substances 0.000 description 7
239000002887 superconductor Substances 0.000 description 6
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
239000000919 ceramic Substances 0.000 description 4
238000000576 coating method Methods 0.000 description 4
230000000052 comparative effect Effects 0.000 description 4
239000002131 composite material Substances 0.000 description 4
238000003618 dip coating Methods 0.000 description 4
229910000856 hastalloy Inorganic materials 0.000 description 4
229910001026 inconel Inorganic materials 0.000 description 4
150000002739 metals Chemical class 0.000 description 4
150000003839 salts Chemical class 0.000 description 4
238000000926 separation method Methods 0.000 description 4
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
229910000990 Ni alloy Inorganic materials 0.000 description 3
DTQVDTLACAAQTR-UHFFFAOYSA-M Trifluoroacetate Chemical compound [O-]C(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-M 0.000 description 3
239000011248 coating agent Substances 0.000 description 3
238000004891 communication Methods 0.000 description 3
238000002425 crystallisation Methods 0.000 description 3
230000008025 crystallization Effects 0.000 description 3
238000000151 deposition Methods 0.000 description 3
238000004544 sputter deposition Methods 0.000 description 3
238000004804 winding Methods 0.000 description 3
MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
239000002253 acid Substances 0.000 description 2
230000004323 axial length Effects 0.000 description 2
230000015572 biosynthetic process Effects 0.000 description 2
238000005229 chemical vapour deposition Methods 0.000 description 2
230000008021 deposition Effects 0.000 description 2
229910001882 dioxygen Inorganic materials 0.000 description 2
VFRSADQPWYCXDG-LEUCUCNGSA-N ethyl (2s,5s)-5-methylpyrrolidine-2-carboxylate;2,2,2-trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F.CCOC(=O)[C@@H]1CC[C@H](C)N1 VFRSADQPWYCXDG-LEUCUCNGSA-N 0.000 description 2
239000011261 inert gas Substances 0.000 description 2
238000007735 ion beam assisted deposition Methods 0.000 description 2
239000012528 membrane Substances 0.000 description 2
125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
239000012495 reaction gas Substances 0.000 description 2
239000007921 spray Substances 0.000 description 2
DTQVDTLACAAQTR-UHFFFAOYSA-N trifluoroacetic acid Substances OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
YPIFGDQKSSMYHQ-UHFFFAOYSA-N 7,7-dimethyloctanoic acid Chemical class CC(C)(C)CCCCCC(O)=O YPIFGDQKSSMYHQ-UHFFFAOYSA-N 0.000 description 1
229910016036 BaF 2 Inorganic materials 0.000 description 1
238000001354 calcination Methods 0.000 description 1
229910052802 copper Inorganic materials 0.000 description 1
239000013078 crystal Substances 0.000 description 1
150000002222 fluorine compounds Chemical class 0.000 description 1
239000012535 impurity Substances 0.000 description 1
238000002347 injection Methods 0.000 description 1
239000007924 injection Substances 0.000 description 1
125000005608 naphthenic acid group Chemical class 0.000 description 1
238000001556 precipitation Methods 0.000 description 1
238000000197 pyrolysis Methods 0.000 description 1
238000005204 segregation Methods 0.000 description 1

Images

Classifications

- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G47/00—Compounds of rhenium
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
- H10N60/0324—Processes for depositing or forming copper oxide superconductor layers from a solution

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Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Engineering & Computer Science (AREA)
Manufacturing & Machinery (AREA)
Inorganic Chemistry (AREA)
Superconductors And Manufacturing Methods Therefor (AREA)
Inorganic Compounds Of Heavy Metals (AREA)

JP2011022116A 2011-02-03 2011-02-03 テープ状酸化物超電導線材の製造方法及び熱処理装置 Active JP5837751B2 (ja)

Priority Applications (4)

Application Number	Priority Date	Filing Date	Title
JP2011022116A JP5837751B2 (ja)	2011-02-03	2011-02-03	テープ状酸化物超電導線材の製造方法及び熱処理装置
PCT/JP2012/000652 WO2012105244A1 (fr)	2011-02-03	2012-02-01	Procédé de production d'un fil supraconducteur à base d'oxyde sous forme de bande, et dispositif de traitement thermique
CN201280007641.9A CN103339692B (zh)	2011-02-03	2012-02-01	带状氧化物超导线材的制造方法及热处理装置
TW101103393A TWI509635B (zh)	2011-02-03	2012-02-02	帶狀氧化物超電導線材的製造方法及熱處理裝置

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP2011022116A JP5837751B2 (ja)	2011-02-03	2011-02-03	テープ状酸化物超電導線材の製造方法及び熱処理装置

Publications (2)

Publication Number	Publication Date
JP2012164443A JP2012164443A (ja)	2012-08-30
JP5837751B2 true JP5837751B2 (ja)	2015-12-24

Family

ID=46602467

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP2011022116A Active JP5837751B2 (ja)	2011-02-03	2011-02-03	テープ状酸化物超電導線材の製造方法及び熱処理装置

Country Status (4)

Country	Link
JP (1)	JP5837751B2 (fr)
CN (1)	CN103339692B (fr)
TW (1)	TWI509635B (fr)
WO (1)	WO2012105244A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
KR102591747B1 (ko) *	2023-07-07	2023-10-23	주식회사 마루엘앤씨	선재 증착 장치
KR102593634B1 (ko) *	2023-07-07	2023-10-26	주식회사 마루엘앤씨	선재 증착 장치

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH02208209A (ja) *	1989-02-08	1990-08-17	Furukawa Electric Co Ltd:The	酸化物超電導体前駆物質の製造方法
JP2511320Y2 (ja) *	1989-12-11	1996-09-25	横河電機株式会社	酸化物高温超伝導体の製造装置
JP3789341B2 (ja) *	2001-10-12	2006-06-21	財団法人国際超電導産業技術研究センター	雰囲気制御型熱処理炉
CN1296943C (zh) *	2002-05-24	2007-01-24	住友电气工业株式会社	氧化物超导线材的制造方法
JP4401992B2 (ja) *	2005-03-25	2010-01-20	財団法人国際超電導産業技術研究センター	テープ状酸化物超電導線の製造方法及びその製造装置
CN100372140C (zh) *	2005-03-29	2008-02-27	清华大学	一种大面积均匀薄膜或长超导导线的制备方法及其装置
JP4468901B2 (ja) *	2006-01-13	2010-05-26	財団法人国際超電導産業技術研究センター	酸化物超電導線材の熱処理装置。
CN100575540C (zh) *	2006-08-28	2009-12-30	北京有色金属研究总院	批量化制备双面高温超导薄膜装置
JP4876044B2 (ja) *	2007-08-16	2012-02-15	財団法人国際超電導産業技術研究センター	酸化物超電導線材の熱処理装置及びその製造方法
CN101471161B (zh) *	2007-12-28	2010-12-08	北京有色金属研究总院	一种三氟酸盐-金属有机沉积制备高温超导薄膜的方法

2011
- 2011-02-03 JP JP2011022116A patent/JP5837751B2/ja active Active
2012
- 2012-02-01 WO PCT/JP2012/000652 patent/WO2012105244A1/fr not_active Ceased
- 2012-02-01 CN CN201280007641.9A patent/CN103339692B/zh active Active
- 2012-02-02 TW TW101103393A patent/TWI509635B/zh not_active IP Right Cessation

Also Published As

Publication number	Publication date
CN103339692A (zh)	2013-10-02
TW201237889A (en)	2012-09-16
CN103339692B (zh)	2016-01-20
WO2012105244A1 (fr)	2012-08-09
TWI509635B (zh)	2015-11-21
JP2012164443A (ja)	2012-08-30

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