JP6002158B2 - 半導体材料とストレージデバイス - Google Patents
半導体材料とストレージデバイス Download PDFInfo
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- JP6002158B2 JP6002158B2 JP2013554636A JP2013554636A JP6002158B2 JP 6002158 B2 JP6002158 B2 JP 6002158B2 JP 2013554636 A JP2013554636 A JP 2013554636A JP 2013554636 A JP2013554636 A JP 2013554636A JP 6002158 B2 JP6002158 B2 JP 6002158B2
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/654—Aromatic compounds comprising a hetero atom comprising only nitrogen as heteroatom
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/13—Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/85—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group III-V materials, e.g. GaAs
- H10D62/852—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group III-V materials, e.g. GaAs being Group III-V materials comprising three or more elements, e.g. AlGaN or InAsSbP
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/50—Bistable switching devices
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N80/00—Bulk negative-resistance effect devices
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0009—RRAM elements whose operation depends upon chemical change
- G11C13/0014—RRAM elements whose operation depends upon chemical change comprising cells based on organic memory material
- G11C13/0016—RRAM elements whose operation depends upon chemical change comprising cells based on organic memory material comprising polymers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/02—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using elements whose operation depends upon chemical change
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/20—Carbon compounds, e.g. carbon nanotubes or fullerenes
- H10K85/221—Carbon nanotubes
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- Engineering & Computer Science (AREA)
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- Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Materials Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Theoretical Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Semiconductor Memories (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Organic Insulating Materials (AREA)
Description
イオン液体は、水又は有機溶媒に絶縁体ポリマーを溶解し、混合物に1又は複数のイオン液体を添加することにより、絶縁体ポリマーに添加される。混合物は、1〜30分間、撹拌される。他の実施形態において、1又は複数のイオン液体は、1又は複数の溶融した絶縁体ポリマーに混合されてもよい。イオン液体は、溶融したポリマーに添加され、溶融物をフィルムに成形されてもよい。絶縁体ポリマーに添加されるイオン液体の割合は、半導体に要求される伝導率ニーズのレベルによって決まる。例えば、PVA/PAAと0.1グリセロールの混合物は高伝導率をもたらす。
Claims (17)
- 少なくとも2つの絶縁体ポリマーと、少なくとも1つのイオン液体とを含む半導体材料であって、
前記少なくとも2つの絶縁体ポリマーは、ポリアクリル酸、エチルセルロース、非ペプチドポリアミン、ポリアミド、ポリビニルエーテル、ポリグリコリド、セルロースエーテル、ポリヒドロキシアルカノエート、ポリ酸無水物、エチルセルロース、ポリ(ε−カプロラクトン)、ポリ(d,l−乳酸)、ポリ(d,l−乳酸−コ−グリコール酸)、及びこれらの共重合体からなる群から選択され、
前記少なくとも2つの絶縁体ポリマーと前記少なくとも1つのイオン液体との均質な混合物であることを特徴とする半導体材料。 - 少なくとも2つの絶縁体ポリマーと、少なくとも1つのイオン液体とを含む半導体材料であって、
前記少なくとも1つのイオン液体は、1−アルキル−3−アラルキル−イミダゾリウム、グリセロール、キシリトール、ソルビトール、コリンクロリド、及び、藻類油のエステル交換反応中に形成されたグリセロールからなる群から選択され、
前記少なくとも2つの絶縁体ポリマーと前記少なくとも1つのイオン液体との均質な混合物であることを特徴とする半導体材料。 - 請求項2記載の半導体材料であって、
前記少なくとも2つの絶縁体ポリマーは、ポリアクリル酸、エチルセルロース、非ペプチドポリアミン、ポリアミド、ポリビニルエーテル、ポリグリコリド、セルロースエーテル、ポリヒドロキシアルカノエート、ポリ酸無水物、エチルセルロース、ポリ(ε−カプロラクトン)、ポリ(d,l−乳酸)、ポリ(d,l−乳酸−コ−グリコール酸)、及びこれらの共重合体からなる群から選択されることを特徴とする半導体材料。 - 請求項1〜3のいずれか1項記載の半導体材料であって、
前記少なくとも1つのイオン液体は少なくとも2つのイオン液体を含むことを特徴とする半導体材料。 - 請求項1〜3のいずれか1項記載の半導体材料であって、
前記少なくとも2つの絶縁体ポリマー及び前記少なくとも1つのイオン液体はフィルムを形成することを特徴とする半導体材料。 - 請求項5記載の半導体材料であって、
前記フィルムは所定の厚さであることを特徴とする半導体材料。 - 請求項1〜3のいずれか1項記載の半導体材料であって、
前記少なくとも2つの絶縁体ポリマー及び前記少なくとも1つのイオン液体とから形成された前記半導体材料が、少なくとも1つの繊維状のものを形成することを特徴とする半導体材料。 - 請求項1〜3のいずれか1項記載の半導体材料であって、
前記少なくとも1つのイオン液体は、前記半導体材料中に最高で10重量%含むことを特徴とする半導体材料。 - 請求項1〜3のいずれか1項記載の半導体材料であって、
前記少なくとも1つのイオン液体は、前記半導体材料中に最高で5重量%含むことを特徴とする半導体材料。 - 第1面上の第1絶縁層と、前記第1面と反対側にある第2面上の第2絶縁層との間に配置された導電層から形成される少なくとも1つのデバイスと、
前記第1絶縁層の外面に結合した半導体フィルム層とを備え、
前記半導体フィルム層は、請求項1〜4のいずれか1項に記載の半導体材料から形成されることを特徴とするストレージデバイス。 - 請求項10記載のストレージデバイスであって、
前記半導体フィルム層は、ポリ酢酸ビニルで少なくとも部分的に形成されることを特徴とするストレージデバイス。 - 請求項10記載のストレージデバイスであって、
前記第1絶縁層は有機材料から形成されることを特徴とするストレージデバイス。 - 請求項12記載のストレージデバイスであって、
前記第1絶縁層は有機材料のポリメタクリル酸メチルから形成されることを特徴とするストレージデバイス。 - 請求項10記載のストレージデバイスであって、
前記第2絶縁層は有機材料から形成されることを特徴とするストレージデバイス。 - 請求項14記載のストレージデバイスであって、
前記第2絶縁層は有機材料のポリメタクリル酸メチルから形成されることを特徴とするストレージデバイス。 - 請求項10〜15のいずれか1項記載のストレージデバイスであって、
前記半導体フィルム層の外面に接続した第1電極と、前記第2絶縁層の外面に接続した第2電極とをさらに備えることを特徴とするストレージデバイス。 - 請求項16記載のストレージデバイスであって、
前記第1電極及び前記第2電極はアルミニウムから形成されることを特徴とするストレージデバイス。
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161444704P | 2011-02-19 | 2011-02-19 | |
| US61/444,704 | 2011-02-19 | ||
| PCT/US2012/025654 WO2012112893A1 (en) | 2011-02-19 | 2012-02-17 | Semiconducting polymer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2014509080A JP2014509080A (ja) | 2014-04-10 |
| JP6002158B2 true JP6002158B2 (ja) | 2016-10-05 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013554636A Active JP6002158B2 (ja) | 2011-02-19 | 2012-02-17 | 半導体材料とストレージデバイス |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US8796673B2 (ja) |
| EP (1) | EP2676303A4 (ja) |
| JP (1) | JP6002158B2 (ja) |
| CN (1) | CN103380503B (ja) |
| WO (1) | WO2012112893A1 (ja) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102964524B (zh) * | 2012-11-28 | 2015-05-13 | 东华大学 | 以离子液体为溶剂双螺杆挤出原位接枝改性纤维素的方法 |
| US20190058108A1 (en) * | 2015-10-28 | 2019-02-21 | Sabic Global Technologies B.V. | Ion dipoles containing polymer compositions |
| CN105482327B (zh) * | 2015-12-29 | 2018-02-27 | 太原理工大学 | (1‑乙烯基‑3‑乙基咪唑硼酸盐)聚离子液体/聚乙烯醇聚合物复合材料及其制备方法 |
| CN105633283A (zh) * | 2016-03-14 | 2016-06-01 | 深圳大学 | 一种透明、柔性的光电传感器及其制备方法 |
| US11545614B2 (en) * | 2018-07-03 | 2023-01-03 | Sabic Global Technologies, B.V. | Ionic polymer compositions |
| CN109513039B (zh) * | 2019-01-08 | 2021-05-14 | 大连工业大学 | 一种含咪唑溴盐的抗菌水凝胶敷料及其制备方法和应用 |
| CN119039561B (zh) * | 2024-08-26 | 2025-10-10 | 北京理工大学 | 一种超柔离子液体导电自修复聚氨酯弹性体及其制备方法 |
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| EP1007349B1 (en) * | 1995-11-22 | 2004-09-29 | THE GOVERNMENT OF THE UNITED STATES OF AMERICA, as represented by THE SECRETARY OF THE NAVY | Patterned conducting polymer surfaces and process for preparing the same and devices containing the same |
| US6812509B2 (en) * | 2002-06-28 | 2004-11-02 | Palo Alto Research Center Inc. | Organic ferroelectric memory cells |
| JP4637446B2 (ja) * | 2002-09-06 | 2011-02-23 | ケミプロ化成株式会社 | 全固体アクチュエータ |
| JP4289852B2 (ja) * | 2002-09-18 | 2009-07-01 | 大日本印刷株式会社 | エレクトロルミネッセント素子の製造方法 |
| US7075105B2 (en) * | 2003-03-19 | 2006-07-11 | Masataka Kano | Organic bistable element, organic bistable memory device using the same, and method for driving said organic bistable element and organic bistable memory device |
| US8014128B2 (en) * | 2003-07-31 | 2011-09-06 | Kaneka Corporation | Method for forming oxide film on metal surface using ionic liquid, electrolytic capacitor and electrolyte thereof |
| JP4443944B2 (ja) * | 2004-01-20 | 2010-03-31 | 独立行政法人科学技術振興機構 | トランジスタとその製造方法 |
| JP2005223967A (ja) * | 2004-02-03 | 2005-08-18 | Matsushita Electric Ind Co Ltd | 柔軟アクチュエータ |
| NO321555B1 (no) * | 2004-03-26 | 2006-05-29 | Thin Film Electronics Asa | Organisk elektronisk innretning og fremgangsmate til fremstilling av en slik innretning |
| US7554111B2 (en) * | 2004-05-20 | 2009-06-30 | The Regents Of The University Of California | Nanoparticle-polymer bistable devices |
| US20060021647A1 (en) * | 2004-07-28 | 2006-02-02 | Gui John Y | Molecular photovoltaics, method of manufacture and articles derived therefrom |
| US20060083694A1 (en) * | 2004-08-07 | 2006-04-20 | Cabot Corporation | Multi-component particles comprising inorganic nanoparticles distributed in an organic matrix and processes for making and using same |
| WO2006083326A2 (en) * | 2004-08-07 | 2006-08-10 | Cabot Corporation | Gas dispersion manufacture of nanoparticulates and nanoparticulate-containing products and processing thereof |
| US7732229B2 (en) * | 2004-09-18 | 2010-06-08 | Nanosolar, Inc. | Formation of solar cells with conductive barrier layers and foil substrates |
| US8926933B2 (en) * | 2004-11-09 | 2015-01-06 | The Board Of Regents Of The University Of Texas System | Fabrication of twisted and non-twisted nanofiber yarns |
| US7438832B2 (en) * | 2005-03-29 | 2008-10-21 | Eastman Kodak Company | Ionic liquid and electronically conductive polymer mixtures |
| FR2889620B1 (fr) * | 2005-08-02 | 2007-11-30 | Commissariat Energie Atomique | Polyoxometallates dans des dispositifs de memoire |
| KR101224768B1 (ko) * | 2006-02-02 | 2013-01-21 | 삼성전자주식회사 | 유기 메모리 소자 및 그의 제조방법 |
| JP5156940B2 (ja) * | 2006-06-08 | 2013-03-06 | 国立大学法人福井大学 | 高分子アクチュエータおよびその製造方法 |
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| WO2008097300A2 (en) * | 2007-02-08 | 2008-08-14 | Regents Of The University Of Minnesota | Ion gels and electronic devices utilizing ion gels |
| JP4946570B2 (ja) * | 2007-03-29 | 2012-06-06 | Tdk株式会社 | 高分子アクチュエータ |
| GB2449928A (en) | 2007-06-08 | 2008-12-10 | Seiko Epson Corp | Electrochemical thin-film transistor |
| JP5298680B2 (ja) * | 2007-07-24 | 2013-09-25 | 住友化学株式会社 | 有機トランジスタ絶縁膜用組成物 |
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| JP2011524908A (ja) * | 2008-06-19 | 2011-09-08 | スリーエム イノベイティブ プロパティズ カンパニー | 溶液処理可能な有機半導体 |
| JP4936405B2 (ja) * | 2009-03-30 | 2012-05-23 | 独立行政法人国立高等専門学校機構 | ポリウレタンエラストマー・アクチュエータ |
| KR101295888B1 (ko) * | 2010-05-10 | 2013-08-12 | 한국전자통신연구원 | 저항형 메모리 장치 및 그 제조 방법 |
-
2012
- 2012-02-17 CN CN201280009379.1A patent/CN103380503B/zh active Active
- 2012-02-17 JP JP2013554636A patent/JP6002158B2/ja active Active
- 2012-02-17 EP EP12747815.4A patent/EP2676303A4/en not_active Withdrawn
- 2012-02-17 WO PCT/US2012/025654 patent/WO2012112893A1/en not_active Ceased
- 2012-02-17 US US13/399,460 patent/US8796673B2/en active Active
-
2014
- 2014-07-11 US US14/328,942 patent/US20140319503A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| CN103380503B (zh) | 2017-07-28 |
| JP2014509080A (ja) | 2014-04-10 |
| EP2676303A4 (en) | 2017-04-19 |
| US8796673B2 (en) | 2014-08-05 |
| US20140319503A1 (en) | 2014-10-30 |
| EP2676303A1 (en) | 2013-12-25 |
| CN103380503A (zh) | 2013-10-30 |
| WO2012112893A1 (en) | 2012-08-23 |
| US20120211732A1 (en) | 2012-08-23 |
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