JP6285449B2 - 感光性樹脂組成物及びその硬化物、並びに光学部品 - Google Patents
感光性樹脂組成物及びその硬化物、並びに光学部品 Download PDFInfo
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- JP6285449B2 JP6285449B2 JP2015537922A JP2015537922A JP6285449B2 JP 6285449 B2 JP6285449 B2 JP 6285449B2 JP 2015537922 A JP2015537922 A JP 2015537922A JP 2015537922 A JP2015537922 A JP 2015537922A JP 6285449 B2 JP6285449 B2 JP 6285449B2
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- 125000002723 alicyclic group Chemical group 0.000 description 69
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- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
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- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 3
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- 230000001678 irradiating effect Effects 0.000 description 1
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- RXOHFPCZGPKIRD-UHFFFAOYSA-N naphthalene-2,6-dicarboxylic acid Chemical compound C1=C(C(O)=O)C=CC2=CC(C(=O)O)=CC=C21 RXOHFPCZGPKIRD-UHFFFAOYSA-N 0.000 description 1
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- CBXCPBUEXACCNR-UHFFFAOYSA-N tetraethylammonium Chemical compound CC[N+](CC)(CC)CC CBXCPBUEXACCNR-UHFFFAOYSA-N 0.000 description 1
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- QQFYJXKKHBDLQV-UHFFFAOYSA-N tetrakis(2-methoxyphenyl)phosphanium Chemical compound COC1=CC=CC=C1[P+](C=1C(=CC=CC=1)OC)(C=1C(=CC=CC=1)OC)C1=CC=CC=C1OC QQFYJXKKHBDLQV-UHFFFAOYSA-N 0.000 description 1
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- USFPINLPPFWTJW-UHFFFAOYSA-N tetraphenylphosphonium Chemical compound C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 USFPINLPPFWTJW-UHFFFAOYSA-N 0.000 description 1
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- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
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- 125000005409 triarylsulfonium group Chemical group 0.000 description 1
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- CZMCQLHUFVDMLM-UHFFFAOYSA-N triethyl(phenacyl)phosphanium Chemical compound CC[P+](CC)(CC)CC(=O)C1=CC=CC=C1 CZMCQLHUFVDMLM-UHFFFAOYSA-N 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- MGACORKJUSACCA-UHFFFAOYSA-N trinaphthalen-1-ylsulfanium Chemical compound C1=CC=C2C([S+](C=3C4=CC=CC=C4C=CC=3)C=3C4=CC=CC=C4C=CC=3)=CC=CC2=C1 MGACORKJUSACCA-UHFFFAOYSA-N 0.000 description 1
- HKDYXDHJQBAOAC-UHFFFAOYSA-N trinaphthalen-2-ylsulfanium Chemical compound C1=CC=CC2=CC([S+](C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 HKDYXDHJQBAOAC-UHFFFAOYSA-N 0.000 description 1
- MDCWDBMBZLORER-UHFFFAOYSA-N triphenyl borate Chemical compound C=1C=CC=CC=1OB(OC=1C=CC=CC=1)OC1=CC=CC=C1 MDCWDBMBZLORER-UHFFFAOYSA-N 0.000 description 1
- NLSXASIDNWDYMI-UHFFFAOYSA-N triphenylsilanol Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(O)C1=CC=CC=C1 NLSXASIDNWDYMI-UHFFFAOYSA-N 0.000 description 1
- WLOQLWBIJZDHET-UHFFFAOYSA-N triphenylsulfonium Chemical compound C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 WLOQLWBIJZDHET-UHFFFAOYSA-N 0.000 description 1
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- AXYQQAVHPAUFQX-UHFFFAOYSA-N tris(2-methylphenyl)sulfanium Chemical compound CC1=CC=CC=C1[S+](C=1C(=CC=CC=1)C)C1=CC=CC=C1C AXYQQAVHPAUFQX-UHFFFAOYSA-N 0.000 description 1
- WGKLOLBTFWFKOD-UHFFFAOYSA-N tris(2-nonylphenyl) phosphite Chemical compound CCCCCCCCCC1=CC=CC=C1OP(OC=1C(=CC=CC=1)CCCCCCCCC)OC1=CC=CC=C1CCCCCCCCC WGKLOLBTFWFKOD-UHFFFAOYSA-N 0.000 description 1
- MAOCPIDAEMTJLK-UHFFFAOYSA-N tris(4-fluorophenyl)sulfanium Chemical compound C1=CC(F)=CC=C1[S+](C=1C=CC(F)=CC=1)C1=CC=C(F)C=C1 MAOCPIDAEMTJLK-UHFFFAOYSA-N 0.000 description 1
- XUWXFPUSCUUNPR-UHFFFAOYSA-O tris(4-hydroxyphenyl)sulfanium Chemical compound C1=CC(O)=CC=C1[S+](C=1C=CC(O)=CC=1)C1=CC=C(O)C=C1 XUWXFPUSCUUNPR-UHFFFAOYSA-O 0.000 description 1
- WUKMCKCDYKBLBG-UHFFFAOYSA-N tris(4-methoxyphenyl)sulfanium Chemical compound C1=CC(OC)=CC=C1[S+](C=1C=CC(OC)=CC=1)C1=CC=C(OC)C=C1 WUKMCKCDYKBLBG-UHFFFAOYSA-N 0.000 description 1
- QKFJVDSYTSWPII-UHFFFAOYSA-N tris(4-methylphenyl)sulfanium Chemical compound C1=CC(C)=CC=C1[S+](C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 QKFJVDSYTSWPII-UHFFFAOYSA-N 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 125000006839 xylylene group Chemical group 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
- C08G59/687—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used containing sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/24—Di-epoxy compounds carbocyclic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/02—Elements
- C08K3/04—Carbon
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J163/00—Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
- G02B3/0018—Reflow, i.e. characterized by the step of melting microstructures to form curved surfaces, e.g. manufacturing of moulds and surfaces for transfer etching
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/003—Light absorbing elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Optics & Photonics (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Epoxy Resins (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Description
また、本発明の他の目的は、被着体表面に塗布し、光を照射することにより速やかに硬化して、優れた遮光性、接着性、及びリフロー耐熱性を有する硬化物を形成することができる感光性樹脂組成物を提供することにある。
さらに、本発明の他の目的は、前記感光性樹脂組成物を硬化して得られる硬化物、及び該硬化物を含む光学部品を提供することにある。
また、硬化性化合物として上記カチオン重合性化合物と共に特定の水酸基含有化合物を使用すると、より一層硬化性を向上させることができ、更に、接着性(特にガラスに対する接着性)を向上させることができること、得られる硬化物に可撓性を付与することができ、それにより被着体の表面形状に対する良好な追従性が得られ、リフロー処理に付しても被着体表面からの剥離を防止することができることを見出した。
本発明は、これらの知見に基づいて完成されたものである。
成分(A):脂環式エポキシ基を有し、且つエステル結合を有しない化合物を少なくとも含むカチオン重合性化合物
成分(B):カチオン部と、ホウ素原子を含むアニオン部とからなる光カチオン重合開始剤
成分(C):遮光性材料
で表されるアニオンである前記の感光性樹脂組成物を提供する。
で表されるアニオンである前記の感光性樹脂組成物を提供する。
[1]下記成分(A)、成分(B)、及び成分(C)を含む感光性樹脂組成物。
成分(A):脂環式エポキシ基を有し、且つエステル結合を有しない化合物(脂環式エポキシ化合物)を少なくとも含むカチオン重合性化合物
成分(B):カチオン部と、ホウ素原子を含むアニオン部とからなる光カチオン重合開始剤
成分(C):遮光性材料
[2]成分(A)における脂環式エポキシ化合物が、脂環式エポキシ基を一分子内に1〜6個有する化合物である[1]に記載の感光性樹脂組成物。
[3]成分(A)における脂環式エポキシ基を有し、且つエステル結合を有しない化合物(脂環式エポキシ化合物)が、下記式(a-1)で表される化合物である[1]又は[2]に記載の感光性樹脂組成物。
[4]成分(A)が、脂環式エポキシ化合物以外にも他のカチオン重合性化合物を含む[1]〜[3]のいずれか1つに記載の感光性樹脂組成物。
[5]前記他のカチオン重合性化合物が、脂環式エポキシ化合物以外のエポキシ化合物、分子内に1個以上のオキセタニル基を有する化合物、及び分子内に1個以上のビニルエーテル基を有する化合物からなる群より選択される少なくとも1種である[4]に記載の感光性樹脂組成物。
[6]脂環式エポキシ化合物以外のエポキシ化合物が、後述の式(a-4)で表される化合物である[5]に記載の感光性樹脂組成物。
[7]分子内にエステル結合を含むエポキシ化合物の使用量が、成分(A)全量(100重量%)の40重量%以下である[1]〜[6]のいずれか1つに記載の感光性樹脂組成物。
[8](iii)脂環式エポキシ基及びエステル結合を有する化合物の含有量(配合量)が、成分(A)全量(100重量%)に対して、0〜12重量%である[1]〜[7]のいずれか1つに記載の感光性樹脂組成物。
[9]脂環式エポキシ化合物の含有量と脂環式エポキシ基及びエステル結合を有する化合物との含有量の差([脂環式エポキシ化合物の含有量(重量部)]−[脂環式エポキシ基及びエステル結合を有する化合物の含有量(重量部)])が、0重量部より大きい[1]〜[8]のいずれか1つに記載の感光性樹脂組成物。
[10]成分(A)が、分子内に1個以上のオキセタニル基を有する化合物を含む[1]〜[9]のいずれか1つに記載の感光性樹脂組成物。
[11]感光性樹脂組成物全量(100重量%)における成分(A)の含有量が、20〜99重量%である[1]〜[10]のいずれか1つに記載の感光性樹脂組成物。
[12]感光性樹脂組成物が後述の成分(D)を含む場合、該感光性樹脂組成物全量(100重量%)における成分(A)の含有量が、20〜90重量%である[1]〜[11]のいずれか1つに記載の感光性樹脂組成物。
[13]感光性樹脂組成物が後述の成分(D)を含まない場合、該感光性樹脂組成物全量(100重量%)における硬化性化合物の全量の含有量(配合量)が、75〜99重量%である[1]〜[11]のいずれか1つに記載の感光性樹脂組成物。
[14]成分(A)全量(100重量%)における脂環式エポキシ化合物の含有量が、20〜90重量%である[1]〜[13]のいずれか1つに記載の感光性樹脂組成物。
[15]成分(A)全量(100重量%)における他のカチオン重合性化合物の含有量が、10〜80重量%である[4]〜[14]のいずれか1つに記載の感光性樹脂組成物。
[16]成分(A)全量(100重量%)における分子内に1個以上のオキセタニル基を有する化合物の含有量が、1〜80重量%である[5]〜[15]のいずれか1つに記載の感光性樹脂組成物。
[17]成分(B)のアニオン部が、上記式(1)[式(1)中、Rは1価の炭化水素基又は1価のフッ化炭化水素基を示す。nは1〜4の整数を示す。]で表されるアニオンである[1]〜[16]のいずれか1つに記載の感光性樹脂組成物。
[18]成分(B)のアニオン部が、上記式(2)[式(2)中、X1〜X4は、同一又は異なって、0〜5の整数を示し、X1〜X4の全ての合計は1以上である。]で表されるアニオンである[1]〜[17]のいずれか1つに記載の感光性樹脂組成物。
[19]成分(B)の含有量が、成分(A)100重量部に対して、0.1〜30重量部である[1]〜[18]のいずれか1つに記載の感光性樹脂組成物。
[20]成分[C]の平均粒子径(動的光散乱測定法による)が、5〜500nmである[1]〜[19]のいずれか1つに記載の感光性樹脂組成物。
[21]成分(C)の含有量が、硬化性成分の全量(成分(D)を含む場合には、成分(A)と成分(D)の合計量)100重量部に対して、0.5〜50重量部である[1]〜[20]のいずれか1つに記載の感光性樹脂組成物。
[22]成分(C)の含有量(配合量)が、感光性樹脂組成物の総量(100重量%)に対して、0.5〜20重量%である[1]〜[21]のいずれか1つに記載の感光性樹脂組成物。
[23]成分(C)がカーボンブラックである[1]〜[22]のいずれか1つに記載の感光性樹脂組成物。
[24]さらに、下記成分(D)を含む[1]〜[23]のいずれか1つに記載の感光性樹脂組成物。
成分(D):分子量が500以上の水酸基含有化合物
[25]成分(D)が1分子内に含有する水酸基の数が、2個以上である[24]に記載の感光性樹脂組成物。
[26]成分(D)が、分子内にポリカーボネート骨格を有する水酸基含有化合物、分子内にポリエステル骨格を有する水酸基含有化合物、及び分子内にポリジエン骨格を有する水酸基含有化合物からなる群より選択される少なくとも1種である[24]又は[25]に記載の感光性樹脂組成物。
[27]成分(D)として、分子内にポリカーボネート骨格を有する水酸基含有化合物と分子内にポリジエン骨格を有する水酸基含有化合物を組み合わせて含有する[24]〜[26]のいずれか1つに記載の感光性樹脂組成物。
[28]感光性樹脂組成物に含まれる硬化性成分の全量(成分(D)を含む場合には、成分(A)と成分(D)の合計量)(100重量%)における成分(D)の配合量が、5〜80重量%である[24]〜[27]のいずれか1つに記載の感光性樹脂組成物。
[29]分子内にポリカーボネート骨格を有する水酸基含有化合物と分子内にポリジエン骨格を有する水酸基含有化合物の使用割合[前者/後者(重量比)]が、1/99〜99/1である[27]又は[28]に記載の感光性樹脂組成物。
[30]25℃における粘度が、100〜100000mPa・sである[1]〜[29]のいずれか1つに記載の感光性樹脂組成物。
[31][1]〜[30]のいずれか1つに記載の感光性樹脂組成物を硬化して得られる硬化物。
[32]紫外線を200mW/cm2で15秒間照射した時点における接着力(対ガラス板)が、1MPa以上である[31]に記載の硬化物。
[33]厚み20μmの成形体(硬化物)の遮光率が、85%以上である[31]又は[32]に記載の硬化物。
[34]厚み10μmの成形体(硬化物)の全光線透過率が0〜1.5%である[31]〜[33]のいずれか1つに記載の硬化物。
[35]ガラス転移温度(Tg)が、70〜250℃である[31]〜[34]のいずれか1つに記載の硬化物。
[36]25℃における貯蔵弾性率が、0.1〜10GPaである[31]〜[35]のいずれか1つに記載の硬化物。
[37][31]〜[36]のいずれか1つに記載の硬化物を含む光学部品。
[38]硬化物の厚み(例えば、遮光膜若しくは遮光層の厚み)が、50μm以下である[37]に記載の光学部品。
成分(A):脂環式エポキシ基を有し、且つエステル結合を有しない化合物を少なくとも含むカチオン重合性化合物
成分(B):カチオン部と、ホウ素原子を含むアニオン部とからなる光カチオン重合開始剤
成分(C):遮光性材料
本発明の成分(A)は感光性樹脂組成物に含まれる硬化性成分(硬化性化合物)の一つであり、一分子内に脂環式エポキシ基を1個以上有し、且つエステル結合を有しない化合物(以後、「脂環式エポキシ化合物」と称する場合がある)を少なくとも含むカチオン重合性化合物である。尚、本明細書において「脂環式エポキシ基」とは、脂環を構成する隣り合う2つの炭素原子が1つの酸素原子と共に環を形成してなる基である。前記脂環式エポキシ化合物は硬化性に優れる。
[脂環式エポキシ化合物の含有量]>[(iii) 脂環式エポキシ基及びエステル結合を有する化合物の含有量]
即ち、脂環式エポキシ化合物の含有量と(iii) 脂環式エポキシ基及びエステル結合を有する化合物の含有量の差([脂環式エポキシ化合物の含有量(重量部)]−[(iii) 脂環式エポキシ基及びエステル結合を有する化合物の含有量(重量部)])は、0重量部より大きいことが好ましく、より好ましくは5重量部以上、さらに好ましくは10重量部以上である。上記差が0重量部以下である場合には、感光性樹脂組成物の硬化性が低下し、硬化不良が生じやすくなる場合がある。
本発明の成分(B)である光カチオン重合開始剤は、光の照射によってカチオン種を発生して、感光性樹脂組成物に含まれるカチオン重合性化合物等の硬化反応を開始させる化合物であり、カチオン部と、ホウ素原子(ホウ素元素)を含むアニオン部とからなる光カチオン重合開始剤である。
本発明の成分(C)は遮光性材料であり、感光性樹脂組成物及びその硬化物中に分散して遮光性を付与する材料である。本発明においては顔料や染料等を好適に使用することができる。
本発明の感光性樹脂組成物は、さらに、下記成分(D)を含んでいてもよい。成分(D)を含む場合、硬化促進作用、ガラス等への接着性向上作用、及び得られる硬化物に可撓性を付与し、被着体の表面形状に対して良好に追従し、被着体との接着性を向上する作用が奏される。
成分(D):分子量が500以上の水酸基含有化合物
本発明の感光性樹脂組成物は、重合開始剤として成分(B)以外にも、さらに熱重合開始剤を含んでいてもよい。上記熱重合開始剤としては、公知乃至慣用の熱重合開始剤(加熱によりカチオン重合性化合物の重合反応を開始させることができる化合物)を使用することができるが、例えば、加熱によりカチオン種を発生して、これにより重合を開始させる熱カチオン重合開始剤などが挙げられる。なお、熱重合開始剤は1種を単独で、又は2種以上を組み合わせて使用することができる。
本発明の感光性樹脂組成物は、上述の成分以外にも、さらに酸化防止剤を含んでいてもよい。上記酸化防止剤としては、公知乃至慣用の酸化防止剤を使用することができ、特に限定されないが、例えば、フェノール系酸化防止剤、リン系酸化防止剤、硫黄系酸化防止剤などを挙げることができる。なお、酸化防止剤は1種を単独で、又は2種以上を組み合わせて使用することができる。
本発明の感光性樹脂組成物は、光を照射して該感光性樹脂組成物中の成分(A)のカチオン重合反応(さらに、成分(D)を含む場合には成分(A)と成分(D)との反応)を進行させることによって硬化物を形成することができる。当該重合反応を進行させるための光(活性エネルギー線)としては、特に限定されず、例えば、赤外線、可視光線、紫外線、X線、電子線、α線、β線、γ線等のいずれを使用することもできる。なかでも、取り扱い性に優れる点で、紫外線が好ましい。
遮光率[%]=100[%]−全光線透過率[%]
本発明の光学部品は、本発明の感光性樹脂組成物によって形成された高い遮光性を有する硬化物を含むため(例えば遮光膜若しくは遮光層として含むため)、優れた品質を発揮できる。
表1に示す配合組成(単位:重量部)に従って、各成分(硬化性成分、光カチオン重合開始剤、遮光性材料)を配合し、自転公転型ミキサーで攪拌・混合することにより、均一な感光性樹脂組成物を得た。得られた感光性樹脂組成物について、以下の方法で測定及び評価を行った。得られた測定結果及び評価結果は、表1に示した。
上記で得られた感光性樹脂組成物を、アプリケーターを用いてガラス上に20μmの厚みで塗布した。次いで、塗布した感光性樹脂組成物に対して、紫外線照射装置(UVもしくはUV−LED照射装置)を用いて紫外線を照射し[照射強度:200mW/cm2、積算照射量(積算光量):3000mJ/cm2、照射時間:15秒]、硬化物(硬化樹脂)を作製した。
上記により得たガラスと硬化物の積層体を遮光性評価用サンプルとして使用し、当該遮光性評価用サンプルの全光線透過率を測定して、下記の式から遮光率を算出して遮光性を評価した。
遮光率[%]=100[%]−全光線透過率[%]
なお、全光線透過率は、濁度計(日本電色工業(株)製、商品名「NDH2000」)を用いて測定した。
まず、厚み10μmの印刷が施してあるガラス板(松浪硝子工業(株)製、アールラインスライドガラス、品番RCS−01;以下、単に「ガラス板」とする)を印刷部が上面になるように配置し、ドットが印刷されている側の端から1cmの箇所に上記で得られた感光性樹脂組成物2mgを塗布した。次いで、もう1枚のガラス板を、該ガラス板の印刷部が塗布液(塗布された感光性樹脂組成物)と接するように、2枚のガラス板の重なる幅が2cm程度になるように被せ、重なる部分をクリップで固定した。この時、感光性樹脂組成物は2枚のガラス板の間で直径1mm程度に濡れ広がり、厚みが18〜22μmとなった。その後、当該感光性樹脂組成物に対して、紫外線照射装置(UVもしくはUV−LED照射装置)を用いて紫外線を照射し[照射強度:200mW/cm2、積算照射量(積算光量):3000mJ/cm2、紫外線照射時間:15秒]、感光性樹脂組成物を硬化させ、接着性評価用サンプルを作製した。
上記接着性評価用サンプルについて、テンシロンRTF−1350(エー・アンド・ディ社製)を用いて、感光性樹脂組成物の硬化物(厚み:18〜22μm)によるガラス板のせん断方向の接着強度(初期接着力)(MPa)を測定して初期接着性を評価した。
なお、初期接着力が強く、測定時にガラス板の破断が起こった場合には、表1において「>15」(即ち、15MPaを超える値)と記載した。一方、上記条件にて紫外線を照射しても感光性樹脂組成物が硬化せず初期接着力の測定ができなかった場合には、表1において「硬化せず」と記載した。
<硬化性成分(硬化性化合物)>
(カチオン重合性化合物)
EHPE3150:2,2−ビス(ヒドロキシメチル)−1−ブタノールの1,2−エポキシ−4−(2−オキシラニル)シクロヘキセン付加物、(株)ダイセル製
3,4,3',4'−ジエポキシビシクロヘキシル
OXT221:3−エチル−3−([(3−エチルオキセタン−3−イル)メトキシ]メチル)オキセタン、商品名「アロンオキセタン OXT221」、東亞合成(株)製
PB3600:エポキシ化ポリブタジエン、商品名「エポリード PB3600」、(株)ダイセル製
(分子量が500以上の水酸基含有化合物)
CD220PL:ポリカーボネートジオール、数平均分子量:2000、商品名「プラクセル CD220PL」、(株)ダイセル製
<光カチオン重合開始剤>
b−1:ジフェニル[4−(フェニルチオフェニル)]スルホニウム テトラキス(ペンタフルオロフェニル)ボラート
b−2:[1,1'−ビフェニル]−4−イル[4−(1,1'−ビフェニル)−4−イルチオフェニル]フェニルスルホニウム テトラキス(ペンタフルオロフェニル)ボラート
b−3:ジフェニル[4−(フェニルチオフェニル)]スルホニウム ヘキサフルオロホスファート
<遮光性材料>
カーボンブラック:平均粒子径24nm、商品名「MA100R」、三菱化学(株)製
Claims (7)
- 成分(D)における分子量が500以上の水酸基含有化合物が、分子内にポリカーボネート骨格を有する水酸基含有化合物、分子内にポリエステル骨格を有する水酸基含有化合物、及び分子内にポリジエン骨格を有する水酸基含有化合物からなる群から選ばれる少なくとも1つである請求項1に記載の感光性樹脂組成物。
- 成分(C)がカーボンブラックである請求項1〜4のいずれか一項に記載の感光性樹脂組成物。
- 請求項1〜5のいずれか一項に記載の感光性樹脂組成物の硬化物。
- 請求項6に記載の硬化物を含む光学部品。
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| KR101979200B1 (ko) * | 2014-10-16 | 2019-05-17 | 주식회사 엘지화학 | 광학 필름 코팅용 조성물 및 이를 포함하는 광학 필름 |
| CN107533957A (zh) * | 2015-05-29 | 2018-01-02 | 株式会社大赛璐 | 纳米压印用光固化性组合物 |
| JP6762745B2 (ja) * | 2016-03-29 | 2020-09-30 | 株式会社Adeka | 硬化性組成物 |
| KR102391634B1 (ko) * | 2017-07-13 | 2022-04-27 | 엘지디스플레이 주식회사 | 베젤 패턴이 형성된 표시 장치 및 이의 제조 방법 |
| EP3677619A4 (en) * | 2017-09-01 | 2021-04-21 | Sekisui Chemical Co., Ltd. | COMPOSITE PARTICLES, COMPOSITE PARTICLE POWDER AND LIGHT MODULATING MATERIAL |
| JP6745295B2 (ja) * | 2018-04-25 | 2020-08-26 | 株式会社ダイセル | 遮光フィルム及び遮光フィルムの製造方法 |
| KR102918991B1 (ko) * | 2019-09-12 | 2026-01-28 | 다이요 홀딩스 가부시키가이샤 | 잉크젯용 경화성 조성물 |
| JP7516081B2 (ja) * | 2020-03-23 | 2024-07-16 | ヘンケルジャパン株式会社 | デュアル硬化型接着剤組成物 |
| TWI857067B (zh) * | 2020-05-29 | 2024-10-01 | 奇美實業股份有限公司 | 黑色感光性樹脂組成物、黑色圖案、彩色濾光片以及液晶顯示裝置 |
| JP7774569B2 (ja) * | 2020-09-17 | 2025-11-21 | 株式会社Adeka | 組成物、硬化物及び硬化物の製造方法 |
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| JP2879685B2 (ja) | 1988-09-06 | 1999-04-05 | ダイセル化学工業株式会社 | ポリカーボネートジオール |
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| JPH0971636A (ja) | 1995-09-07 | 1997-03-18 | Mitsubishi Rayon Co Ltd | 活性エネルギー線硬化性組成物 |
| KR20030007186A (ko) * | 2001-07-17 | 2003-01-23 | 미쯔이카가쿠 가부시기가이샤 | 광 양이온성 경화가능 수지 조성물 및 그 용도 |
| TWI312800B (en) * | 2002-09-05 | 2009-08-01 | Daicel Chem | Process for the preparation of an alicyclic diepoxy compound, a curable epoxy resin composition, an epoxy resin composition for encapsulating electronics parts, a stabilizer for electrically insulating oils, and an epoxy resin composition for casting |
| JP2004099467A (ja) | 2002-09-05 | 2004-04-02 | Daicel Chem Ind Ltd | 脂環式エポキシ化合物の製造方法 |
| JP2005187636A (ja) | 2003-12-25 | 2005-07-14 | Sekisui Chem Co Ltd | 光硬化性樹脂組成物、表示素子用接着剤、接着方法および表示素子 |
| JP2006099027A (ja) | 2004-03-09 | 2006-04-13 | Sekisui Chem Co Ltd | 液晶滴下工法用遮光シール剤、上下導通材料、及び、液晶表示素子 |
| JP4555611B2 (ja) | 2004-05-26 | 2010-10-06 | 積水化学工業株式会社 | 有機エレクトロルミネッセンス素子封止剤及びトップエミッション方式の有機エレクトロルミネッセンス素子 |
| JP2006063261A (ja) | 2004-08-30 | 2006-03-09 | Asahi Kasei Chemicals Corp | 感光性組成物 |
| JP4683933B2 (ja) * | 2005-01-19 | 2011-05-18 | ダイセル化学工業株式会社 | 硬化性樹脂組成物および層間絶縁膜 |
| WO2006087979A1 (ja) * | 2005-02-17 | 2006-08-24 | Mitsui Chemicals, Inc. | シール材樹脂組成物、シール材、シール方法およびエレクトロルミネッセンスディスプレイ |
| JP4809006B2 (ja) * | 2005-07-05 | 2011-11-02 | 太陽ホールディングス株式会社 | 着色感光性樹脂組成物及びその硬化物 |
| JP5129924B2 (ja) | 2005-10-31 | 2013-01-30 | 協立化学産業株式会社 | 遮光性を有する光硬化性樹脂組成物及びその硬化物 |
| JP4979963B2 (ja) * | 2006-03-10 | 2012-07-18 | 株式会社Adeka | 光学材料用硬化性組成物及び光導波路 |
| JP5354868B2 (ja) | 2006-07-06 | 2013-11-27 | 株式会社ダイセル | 脂環式ジエポキシ化合物の製造方法、エポキシ樹脂組成物の製造方法、及び硬化物の製造方法 |
| JP4937806B2 (ja) * | 2007-03-24 | 2012-05-23 | 株式会社ダイセル | ナノインプリント用光硬化性樹脂組成物 |
| JP5137674B2 (ja) | 2008-04-26 | 2013-02-06 | 日本化薬株式会社 | Mems用感光性樹脂組成物及びその硬化物 |
| JP4991648B2 (ja) * | 2008-06-30 | 2012-08-01 | 積水化学工業株式会社 | 有機エレクトロルミネッセンス素子封止剤 |
| JP5444702B2 (ja) | 2008-12-05 | 2014-03-19 | デクセリアルズ株式会社 | 新規なスルホニウムボレート錯体 |
| JP2011170334A (ja) | 2010-01-20 | 2011-09-01 | Fujifilm Corp | ウエハレベルレンズ用黒色硬化性組成物、及びウエハレベルレンズ |
| JP5183754B2 (ja) | 2010-02-12 | 2013-04-17 | キヤノン株式会社 | 光学素子 |
| US8828525B2 (en) * | 2010-09-13 | 2014-09-09 | Kaneka Corporation | Flexible printed circuit board integrated with reinforcing plate, and method for manufacturing flexible printed circuit board integrated with reinforcing plate |
| EP2826799A4 (en) | 2012-03-13 | 2015-11-25 | Daicel Corp | LIGHT-SENSITIVE RESIN COMPOSITION, HARDENED PRODUCT, AND OPTICAL COMPONENT |
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2014
- 2014-09-16 WO PCT/JP2014/074423 patent/WO2015041210A1/ja not_active Ceased
- 2014-09-16 JP JP2015537922A patent/JP6285449B2/ja not_active Expired - Fee Related
- 2014-09-16 KR KR1020167009645A patent/KR20160056923A/ko not_active Withdrawn
- 2014-09-16 EP EP14845998.5A patent/EP3048122A4/en not_active Withdrawn
- 2014-09-16 US US15/023,174 patent/US9932439B2/en active Active
- 2014-09-16 CN CN201480061494.2A patent/CN105705547A/zh active Pending
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Also Published As
| Publication number | Publication date |
|---|---|
| EP3048122A1 (en) | 2016-07-27 |
| JPWO2015041210A1 (ja) | 2017-03-02 |
| US20160289370A1 (en) | 2016-10-06 |
| TWI634152B (zh) | 2018-09-01 |
| KR20160056923A (ko) | 2016-05-20 |
| US9932439B2 (en) | 2018-04-03 |
| WO2015041210A1 (ja) | 2015-03-26 |
| CN105705547A (zh) | 2016-06-22 |
| EP3048122A4 (en) | 2017-05-17 |
| TW201522487A (zh) | 2015-06-16 |
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