JP6690740B2 - パージストッカ - Google Patents

パージストッカ Download PDF

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Publication number
JP6690740B2
JP6690740B2 JP2018568012A JP2018568012A JP6690740B2 JP 6690740 B2 JP6690740 B2 JP 6690740B2 JP 2018568012 A JP2018568012 A JP 2018568012A JP 2018568012 A JP2018568012 A JP 2018568012A JP 6690740 B2 JP6690740 B2 JP 6690740B2
Authority
JP
Japan
Prior art keywords
shelf
purge
shelves
empty
storage container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2018568012A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2018150698A1 (ja
Inventor
義明 藤原
義明 藤原
豪一 佐野
豪一 佐野
光哉 徳本
光哉 徳本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Machinery Ltd
Original Assignee
Murata Machinery Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Machinery Ltd filed Critical Murata Machinery Ltd
Publication of JPWO2018150698A1 publication Critical patent/JPWO2018150698A1/ja
Application granted granted Critical
Publication of JP6690740B2 publication Critical patent/JP6690740B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q10/00—Administration; Management
    • G06Q10/08—Logistics, e.g. warehousing, loading or distribution; Inventory or stock management
    • G06Q10/087—Inventory or stock management, e.g. order filling, procurement or balancing against orders
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K13/00—Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
    • H05K13/02—Feeding of components
    • H05K13/021—Loading or unloading of containers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/19—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers
    • H10P72/1924—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers characterised by atmosphere control
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/32—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations between different workstations
    • H10P72/3218—Conveying cassettes, containers or carriers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/34—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H10P72/3402—Mechanical parts of transfer devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/34—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H10P72/3404—Storage means

Landscapes

  • Business, Economics & Management (AREA)
  • Engineering & Computer Science (AREA)
  • Economics (AREA)
  • Marketing (AREA)
  • Quality & Reliability (AREA)
  • Finance (AREA)
  • Development Economics (AREA)
  • Theoretical Computer Science (AREA)
  • Entrepreneurship & Innovation (AREA)
  • Human Resources & Organizations (AREA)
  • General Physics & Mathematics (AREA)
  • Operations Research (AREA)
  • Accounting & Taxation (AREA)
  • Strategic Management (AREA)
  • Tourism & Hospitality (AREA)
  • Physics & Mathematics (AREA)
  • General Business, Economics & Management (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Warehouses Or Storage Devices (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Robotics (AREA)
JP2018568012A 2017-02-20 2017-12-08 パージストッカ Active JP6690740B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2017029122 2017-02-20
JP2017029122 2017-02-20
PCT/JP2017/044163 WO2018150698A1 (fr) 2017-02-20 2017-12-08 Dispositif de stockage de purge

Publications (2)

Publication Number Publication Date
JPWO2018150698A1 JPWO2018150698A1 (ja) 2019-11-07
JP6690740B2 true JP6690740B2 (ja) 2020-04-28

Family

ID=63169281

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018568012A Active JP6690740B2 (ja) 2017-02-20 2017-12-08 パージストッカ

Country Status (9)

Country Link
US (1) US10991606B2 (fr)
EP (1) EP3584827B1 (fr)
JP (1) JP6690740B2 (fr)
KR (1) KR102227379B1 (fr)
CN (1) CN109983568B (fr)
IL (1) IL267255B (fr)
SG (1) SG11201905531SA (fr)
TW (1) TWI732099B (fr)
WO (1) WO2018150698A1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7090513B2 (ja) * 2018-09-06 2022-06-24 東京エレクトロン株式会社 基板処理装置及びパージ方法
WO2020111013A1 (fr) * 2018-11-28 2020-06-04 シンフォニアテクノロジー株式会社 Dispositif de stockage de tranches
KR102256132B1 (ko) * 2020-02-18 2021-05-25 (주)캔탑스 캐리어 내부의 오염 관리 기능을 갖는 자동 반송시스템
EP4112506A4 (fr) * 2020-03-05 2024-04-03 Murata Machinery, Ltd. Étagère de stockage
KR102663006B1 (ko) * 2020-09-07 2024-05-02 세메스 주식회사 용기 보관 장치 및 방법
US11984335B2 (en) * 2021-12-29 2024-05-14 Applied Materials, Inc. FOUP or cassette storage for hybrid substrate bonding system

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11214472A (ja) * 1998-01-23 1999-08-06 Nec Corp ワーク搬送方法
JP4670808B2 (ja) * 2006-12-22 2011-04-13 ムラテックオートメーション株式会社 コンテナの搬送システム及び測定用コンテナ
JP5034594B2 (ja) * 2007-03-27 2012-09-26 東京エレクトロン株式会社 成膜装置、成膜方法及び記憶媒体
JP4692584B2 (ja) * 2008-07-03 2011-06-01 村田機械株式会社 パージ装置
US8718815B2 (en) * 2009-01-23 2014-05-06 Murata Machinery, Ltd. Automated warehouse system
JP2010241515A (ja) * 2009-04-01 2010-10-28 Murata Machinery Ltd 保管倉庫
JP5366030B2 (ja) * 2011-09-22 2013-12-11 村田機械株式会社 クリーンルーム用の自動倉庫
JP5884780B2 (ja) * 2013-06-26 2016-03-15 株式会社ダイフク 保管設備
JP5888287B2 (ja) * 2013-06-26 2016-03-16 株式会社ダイフク 処理設備
JP5884779B2 (ja) * 2013-06-26 2016-03-15 株式会社ダイフク 物品保管設備
WO2015045582A1 (fr) * 2013-09-26 2015-04-02 村田機械株式会社 Dispositif de purge et procédé de purge
CN105940487B (zh) * 2014-02-07 2018-12-04 村田机械株式会社 净化装置以及净化方法
JP5859695B2 (ja) 2014-03-27 2016-02-10 日東電工株式会社 制振材
JP6217854B2 (ja) * 2014-06-16 2017-10-25 村田機械株式会社 パージストッカ及びパージ方法
KR101903441B1 (ko) 2014-06-16 2018-10-02 무라다기카이가부시끼가이샤 퍼지 장치, 퍼지 시스템, 퍼지 방법 및 퍼지 시스템에 있어서의 제어 방법
JP2016021429A (ja) * 2014-07-11 2016-02-04 村田機械株式会社 パージストッカ
WO2017022330A1 (fr) * 2015-08-04 2017-02-09 村田機械株式会社 Dispositif de purge, accumulateur de purge, et procédé d'injection de gaz de purge
JP6414525B2 (ja) * 2015-09-02 2018-10-31 株式会社ダイフク 保管設備

Also Published As

Publication number Publication date
US10991606B2 (en) 2021-04-27
KR20190100384A (ko) 2019-08-28
WO2018150698A1 (fr) 2018-08-23
EP3584827A1 (fr) 2019-12-25
SG11201905531SA (en) 2019-09-27
CN109983568B (zh) 2023-02-28
TW201834126A (zh) 2018-09-16
CN109983568A (zh) 2019-07-05
US20190326133A1 (en) 2019-10-24
EP3584827A4 (fr) 2020-12-30
TWI732099B (zh) 2021-07-01
EP3584827B1 (fr) 2022-02-16
IL267255B (en) 2022-06-01
JPWO2018150698A1 (ja) 2019-11-07
KR102227379B1 (ko) 2021-03-11

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