JP6742617B2 - パワーモジュール基板の生産方法および生産装置 - Google Patents
パワーモジュール基板の生産方法および生産装置 Download PDFInfo
- Publication number
- JP6742617B2 JP6742617B2 JP2016248686A JP2016248686A JP6742617B2 JP 6742617 B2 JP6742617 B2 JP 6742617B2 JP 2016248686 A JP2016248686 A JP 2016248686A JP 2016248686 A JP2016248686 A JP 2016248686A JP 6742617 B2 JP6742617 B2 JP 6742617B2
- Authority
- JP
- Japan
- Prior art keywords
- etching
- power module
- adhesive
- peeling
- self
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 title claims description 36
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 238000005530 etching Methods 0.000 claims description 109
- 239000000853 adhesive Substances 0.000 claims description 52
- 239000000463 material Substances 0.000 claims description 51
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 36
- 238000000034 method Methods 0.000 claims description 32
- 229910052751 metal Inorganic materials 0.000 claims description 29
- 239000002184 metal Substances 0.000 claims description 29
- 230000000873 masking effect Effects 0.000 claims description 28
- 230000008569 process Effects 0.000 claims description 27
- 230000001070 adhesive effect Effects 0.000 claims description 22
- 238000005219 brazing Methods 0.000 claims description 20
- 239000000919 ceramic Substances 0.000 claims description 13
- 238000000059 patterning Methods 0.000 claims description 11
- 206010040844 Skin exfoliation Diseases 0.000 description 57
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 51
- 229910052802 copper Inorganic materials 0.000 description 51
- 239000010949 copper Substances 0.000 description 51
- 239000002585 base Substances 0.000 description 30
- 238000004140 cleaning Methods 0.000 description 17
- 239000000243 solution Substances 0.000 description 12
- 239000007921 spray Substances 0.000 description 11
- 238000012545 processing Methods 0.000 description 10
- 239000007864 aqueous solution Substances 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 239000004020 conductor Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 238000013461 design Methods 0.000 description 4
- 229920013716 polyethylene resin Polymers 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 3
- 239000002313 adhesive film Substances 0.000 description 3
- 239000005038 ethylene vinyl acetate Substances 0.000 description 3
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 238000004804 winding Methods 0.000 description 3
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000002390 adhesive tape Substances 0.000 description 2
- LDDQLRUQCUTJBB-UHFFFAOYSA-O azanium;hydrofluoride Chemical compound [NH4+].F LDDQLRUQCUTJBB-UHFFFAOYSA-O 0.000 description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910017855 NH 4 F Inorganic materials 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- LDDQLRUQCUTJBB-UHFFFAOYSA-N ammonium fluoride Chemical compound [NH4+].[F-] LDDQLRUQCUTJBB-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000010893 paper waste Substances 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
Images
Landscapes
- Manufacturing Of Printed Circuit Boards (AREA)
Description
12−上側銅回路板
14−ロウ材
16−セラミックス基板
18−下側銅回路板
20−マスキングフィルム
100−スプレイエッチング装置
124−パワーモジュール母材
200−ピーリングユニット
Claims (2)
- セラミックス基板にロウ材を介して金属回路板が接合されてなるパワーモジュール基板の生産方法であって、
前記金属回路板に自己粘着型耐エッチングフィルムを貼付するマスキングステップと、
前記自己粘着型耐エッチングフィルムに対して、所望形状の回路パターンに対応するパターニング処理を施すことによって、前記自己粘着型耐エッチングフィルムにおける回路パターンに対応する領域以外を除去するパターニングステップと、
前記自己粘着型耐エッチングフィルムを粘着シートによって前記金属回路板から剥離する剥離ステップと、
を少なくとも含み、
エッチング処理の後であって前記剥離ステップの前に、前記自己粘着型耐エッチングフィルムを水酸化ナトリウム水溶液に接触させる剥離前ステップをさらに含むことを特徴とするパワーモジュール基板の生産方法。 - セラミックス基板にロウ材を介して金属回路板が接合されてなるパワーモジュール基板の生産装置であって、
前記金属回路板に自己粘着型耐エッチングフィルムが貼付されたパワーモジュール基板に対してエッチング液を接触させるエッチング手段と、
エッチング処理の後に、前記自己粘着型耐エッチングフィルムを水酸化ナトリウム水溶液に接触させる剥離前手段と、
前記自己粘着型耐エッチングフィルムを粘着シートによって前記金属回路板から剥離する剥離手段と、
を備えたことを特徴とするパワーモジュール基板の生産装置。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016248686A JP6742617B2 (ja) | 2016-12-22 | 2016-12-22 | パワーモジュール基板の生産方法および生産装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016248686A JP6742617B2 (ja) | 2016-12-22 | 2016-12-22 | パワーモジュール基板の生産方法および生産装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2018101764A JP2018101764A (ja) | 2018-06-28 |
| JP6742617B2 true JP6742617B2 (ja) | 2020-08-19 |
Family
ID=62714560
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016248686A Expired - Fee Related JP6742617B2 (ja) | 2016-12-22 | 2016-12-22 | パワーモジュール基板の生産方法および生産装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6742617B2 (ja) |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10154866A (ja) * | 1996-11-21 | 1998-06-09 | Sumitomo Kinzoku Electro Device:Kk | セラミックス回路基板の製造方法 |
| JP2003273495A (ja) * | 2002-03-19 | 2003-09-26 | Nitto Denko Corp | 配線回路基板の製造方法および製造装置 |
| JP2004060030A (ja) * | 2002-07-31 | 2004-02-26 | Nippon Tekku Kk | エッチング保護シートおよび回路の形成方法 |
| JP4484676B2 (ja) * | 2004-11-25 | 2010-06-16 | 京セラ株式会社 | セラミック回路基板およびその製造方法 |
| JP4756169B2 (ja) * | 2005-03-04 | 2011-08-24 | Dowaメタルテック株式会社 | セラミックス回路基板及びその製造方法 |
| US7776426B2 (en) * | 2005-03-04 | 2010-08-17 | Dowa Metaltech Co., Ltd. | Ceramic circuit substrate and manufacturing method thereof |
| JP2006317542A (ja) * | 2005-05-10 | 2006-11-24 | Hitachi Chem Co Ltd | 感光性フィルム、これを用いたレジストパターンの形成方法及びプリント配線板の製造方法 |
| JP4999801B2 (ja) * | 2008-08-07 | 2012-08-15 | 株式会社フジクラ | エッチング方法 |
| JP2010067697A (ja) * | 2008-09-09 | 2010-03-25 | Lemi Ltd | プリント配線板の製造方法 |
| JP2013209237A (ja) * | 2012-03-30 | 2013-10-10 | Dowa Holdings Co Ltd | 金属−セラミックス接合基板の製造方法 |
| US10149392B2 (en) * | 2015-02-16 | 2018-12-04 | Nippo Mektron, Ltd. | Manufacturing method of flexible printed wiring board |
| EP3306655B1 (en) * | 2015-05-27 | 2021-06-23 | NGK Electronics Devices, Inc. | Substrate for power modules, substrate assembly for power modules, and method for producing substrate for power modules |
-
2016
- 2016-12-22 JP JP2016248686A patent/JP6742617B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2018101764A (ja) | 2018-06-28 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6695577B2 (ja) | パワーモジュール基板およびその生産方法 | |
| KR101961521B1 (ko) | 태양 전지를 위한 에지리스 펄스 도금 및 금속 세정 방법 | |
| TW201234621A (en) | Edge isolation by lift-off | |
| JP6732239B2 (ja) | パワーモジュール基板およびその生産方法 | |
| WO2023179748A1 (zh) | 一种电池片电镀的方法与装置 | |
| CN102194763A (zh) | 半导体元件搭载用基板及其制造方法 | |
| JP3859682B1 (ja) | 基板の薄板化方法及び回路素子の製造方法 | |
| JP6742617B2 (ja) | パワーモジュール基板の生産方法および生産装置 | |
| KR20090065642A (ko) | 코어리스 기판 가공을 위한 캐리어 및 코어리스 기판 가공방법 | |
| JP2001177136A (ja) | 薄膜太陽電池の製造方法ならびに粉体噴射法による薄膜基板貫通孔加工装置およびパターニング装置 | |
| TW200922423A (en) | Manufacturing method of wiring board | |
| JP4436802B2 (ja) | 成膜装置用構成部品およびその洗浄方法 | |
| CN101166397A (zh) | 一种柔性印刷线路板剥除感光膜的方法 | |
| US20020076905A1 (en) | Method of eliminating silicon residual from wafer after dicing saw process | |
| KR101421058B1 (ko) | 부분 도금 시스템 및 방법 | |
| US11127871B2 (en) | Structures and methods for forming electrodes of solar cells | |
| JP4390491B2 (ja) | めっきレジスト用ドライフィルムおよびプリント基板の回路形成方法 | |
| JP4617826B2 (ja) | 黒化処理装置 | |
| TW512468B (en) | Method for manufacturing semiconductor carrier film | |
| JP4375166B2 (ja) | 黒化処理装置 | |
| JP3389321B2 (ja) | 基板搬送装置およびそれを用いた混成集積回路装置の製造方法 | |
| JPWO2010029880A1 (ja) | 光起電力装置及び光起電力装置の製造方法 | |
| CN107710888B (zh) | 导体形成装置以及导体制造方法 | |
| JP2004018948A (ja) | めっき被膜付きフィルムの製造方法 | |
| JP3773573B2 (ja) | 基板の搬送方法および混成集積回路装置の製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20191219 |
|
| A871 | Explanation of circumstances concerning accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A871 Effective date: 20191219 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20200423 |
|
| A975 | Report on accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A971005 Effective date: 20200708 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20200710 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20200710 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20200721 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20200721 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 6742617 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| LAPS | Cancellation because of no payment of annual fees |