JP6837795B2 - 親水性材料、加熱機器 - Google Patents
親水性材料、加熱機器 Download PDFInfo
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- JP6837795B2 JP6837795B2 JP2016193645A JP2016193645A JP6837795B2 JP 6837795 B2 JP6837795 B2 JP 6837795B2 JP 2016193645 A JP2016193645 A JP 2016193645A JP 2016193645 A JP2016193645 A JP 2016193645A JP 6837795 B2 JP6837795 B2 JP 6837795B2
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- hydrophilic material
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Description
の成分で構成されている必要がある。
11 台
11a 天板
12 加熱部
13 親水性材料
21 コンロバーナ
22 五徳
31 基材
Claims (3)
- 加熱機器を構成する高熱が繰り返し加わる温度環境下で用いられる基材の表層に形成された親水性材料において、Siと、Kとを含有し、
0.12≦(上記Kの含有量のK2O質量換算値の合計)/(上記Siの含有量のSiO2質量換算値の合計)≦0.18であり、
その膜厚は、1〜2μmであることを特徴とする親水性材料。 - 台上に設置された加熱部を備え、請求項1記載の親水性材料が上記台の天板に被覆されていることを特徴とする加熱機器。
- 筐体内に加熱部を備え、請求項1記載の親水性材料が上記筐体内又は筐体内の基材に被覆されていることを特徴とする加熱機器。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| JP2016193645A JP6837795B2 (ja) | 2016-09-30 | 2016-09-30 | 親水性材料、加熱機器 |
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| Application Number | Priority Date | Filing Date | Title |
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| JP2016193645A JP6837795B2 (ja) | 2016-09-30 | 2016-09-30 | 親水性材料、加熱機器 |
Publications (2)
| Publication Number | Publication Date |
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| JP2018053343A JP2018053343A (ja) | 2018-04-05 |
| JP6837795B2 true JP6837795B2 (ja) | 2021-03-03 |
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| JP2016193645A Active JP6837795B2 (ja) | 2016-09-30 | 2016-09-30 | 親水性材料、加熱機器 |
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| JP (1) | JP6837795B2 (ja) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7391748B2 (ja) * | 2020-03-27 | 2023-12-05 | リンナイ株式会社 | コンロバーナ、およびコンロバーナを搭載したガス加熱調理器 |
| KR20240041163A (ko) * | 2022-09-22 | 2024-03-29 | 삼성전자주식회사 | 조리기기용 친수성 법랑 및 그 제조방법 |
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| JP2018053343A (ja) | 2018-04-05 |
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