JP7084595B2 - RhoGDIβ抑制剤 - Google Patents
RhoGDIβ抑制剤 Download PDFInfo
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- JP7084595B2 JP7084595B2 JP2017194818A JP2017194818A JP7084595B2 JP 7084595 B2 JP7084595 B2 JP 7084595B2 JP 2017194818 A JP2017194818 A JP 2017194818A JP 2017194818 A JP2017194818 A JP 2017194818A JP 7084595 B2 JP7084595 B2 JP 7084595B2
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Description
配合成分 配合量(重量%)
スクワラン 5.0
オクチルドデカノール 4.5
ミリスチン酸オクチルドデシル 3.5
ジメチコン 2.0
セタノール 4.0
ミツロウ 1.5
ステアリン酸グリセリル 2.5
3-O-セチルアスコルビン酸 1.0
(アクリル酸Na/アクリロイルジメチルタウリン)コポリマー 0.7
1,3-ブチレングリコール 5.0
濃グリセリン 4.0
ポリソルベート60 2.0
イソヘキサデカン 0.4
パーム脂肪酸グルタミン酸Na 0.5
パラオキシ安息香酸メチル 0.2
ポリソルベート80 0.1
オレイン酸ソルビタン 0.05
エデト酸二ナトリウム 0.1
精製水 残部
ビタミンC誘導体の修飾基(グリセリン、リン酸塩、アルキル基)の違いによるRhoGDIβの抑制作用について、被験物質として、下記表1に示す各種ビタミンC誘導体を用いて、RhoGDIβに対する抑制作用を比較検討した。なお、表1には、各種修飾基を有するビタミンC誘導体の化合物名と、各ビタミンC誘導体の修飾基、修飾位置を示している。
24well培養プレートに、正常ヒト表皮角化細胞(NHEK細胞)(クラボウ社製)を、1×105 cells/wellで播種し、37度、5%CO2下で、24時間培養した。なお、培地として、HuMedia‐KG2(クラボウ社製)を使用した。
図1(a)~図1(c)に示すように、グリセリルアスコルビン酸、3‐グリセリルアスコルビン酸、ビスグリセリルアスコルビン酸、ヘキシル3‐グリセリルアスコルビン酸及びリン酸L‐アスコルビルMgについては、コントロールに比し、全ての濃度において、RhoGDIβの発現が同等又は増加した。また、テトラ2‐ヘキシルデカン酸アスコルビル及びジパルミチン酸アスコルビルについても、コントロールに比し、全ての濃度において、RhoGDIβの発現が同等又は増加していた。
上述のように、直鎖アルキル基を有するビタミンC誘導体のみが、表皮細胞のRhoGDIβの発生を抑制したことから、次に、アルキル基中の炭素数及び修飾位置に着目した。すなわち、ビタミンC誘導体のうち、修飾基として、2位又は3位の修飾位置のみに、異なる炭素数のアルキル基を有し、かつ修飾基としてグリセリンを有さないビタミンC誘導体について、それぞれ、検討した。
12well培養プレートに、正常ヒト表皮角化細胞(NHEK細胞)(クラボウ社製)を、1×105 cells/wellで播種し、37度、5%CO2下で、24時間培養した。なお、培地として、HuMedia‐KG2(クラボウ社製)を使用した。
RhoGDIβ fw :GAG ACA GAG GCA CCC CGG ACA
RhoGDIβ rv :CAG GGA CTT CTG TGG TGG AGG C
GAPDH fw :GCT CTC TGC TCC TCC TGT TC
GAPDH rv :ACG ACC AAA TCC GTT GAC TC
図2に示すように、2位の修飾位置にアルキル基を有するビタミンC誘導体について、RhoGDIβの相対発現量においては、コントロールに比し、炭素数C12以上のアルキル基を有するビタミンC誘導体(C12,C18)が、それぞれ、25μM以上の濃度で、RhoGDIβの発生を抑制(それぞれ、約0.55倍、約0.75倍)したことが分かる。なお、2位の修飾位置に炭素数C16のアルキル基を有するビタミンC誘導体については、市販されておらず容易に入手できないため、評価していない。しかしながら、2位の修飾位置に炭素数C16のアルキル基を有するビタミンC誘導体についても、他のビタミンC誘導体の結果から推察すると、同様のRhoGDIβの抑制作用を有すると考えられる。
次に、3D皮膚モデルを用いて、RhoGDIβ抑制作用を示すビタミンC誘導体(3‐O‐セチルアスコルビン酸)(炭素数C16のアルキル基)が、実際に細胞分裂方向に与える作用を評価した。
6well培養プレート(FALCON社製、型番353046)に、短期培養用の培地として、KGF含有のEPI‐100培地(クラボウ社製)を添加し、培地中に、皮膚3次元モデル(EPI‐200)(クラボウ社製)を入れて、1時間プレ培養を行った。
(a)(コントロール(EPI‐100‐NMM培地のみ)
(b)UVB100mJ/cm2(500μW/cm2で3分20秒、以下同様)
(c)UVB200mJ/cm2(500 μW/cm2で6分40秒、以下同様)
(d)5μMの3‐O‐セチルアスコルビン酸を添加
(e)UVB100mJ/cm2 +3‐O‐セチルアスコルビン酸 5μM
(f)UVB200mJ/cm2 +3‐O‐セチルアスコルビン酸 5μM
(g)10μMの3‐O‐セチルアスコルビン酸を添加
(h)UVB100mJ/cm2+3‐O‐セチルアスコルビン酸 10μM
(i)UVB200mJ/cm2+3‐O‐セチルアスコルビン酸 10μM
図3(a)~(c)に示すように、3‐O‐セチルアスコルビン酸を添加しない場合、UVB照射強度に比例して、垂直方向(80~90°)の分裂細胞数が減少していた。
Claims (2)
- 皮膚の基底層における細胞分裂の方向性を整えるためにビタミンCの2位又は3位のヒドロキシ基のうち、いずれか一方のヒドロキシ基の水素基のみが、炭素数12,16,18のいずれかの直鎖アルキル基に置換され、他方のヒドロキシ基の水素基は置換されていないビタミンC誘導体を含む、RhoGDIβ抑制剤。
- 前記ビタミンC誘導体は、3‐O‐セチルアスコルビン酸または2‐O‐セチルアスコルビン酸のいずれかである、請求項1に記載のRhoGDIβ抑制剤。
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| WO2009025328A1 (ja) | 2007-08-22 | 2009-02-26 | Seiwa Kasei Company, Limited | アスコルビン酸誘導体又はその塩、その製造方法、及び化粧料 |
| JP2011195461A (ja) | 2010-03-17 | 2011-10-06 | Nikko Chemical Co Ltd | ポリオキシアルキレンステロールエーテル誘導体及び/又はポリオキシアルキレンスタノールエーテル誘導体、及びそれを含有する外用剤組成物 |
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| JP2011195461A (ja) | 2010-03-17 | 2011-10-06 | Nikko Chemical Co Ltd | ポリオキシアルキレンステロールエーテル誘導体及び/又はポリオキシアルキレンスタノールエーテル誘導体、及びそれを含有する外用剤組成物 |
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