JP7128281B2 - 蒸着装置及び蒸着方法 - Google Patents
蒸着装置及び蒸着方法 Download PDFInfo
- Publication number
- JP7128281B2 JP7128281B2 JP2020535209A JP2020535209A JP7128281B2 JP 7128281 B2 JP7128281 B2 JP 7128281B2 JP 2020535209 A JP2020535209 A JP 2020535209A JP 2020535209 A JP2020535209 A JP 2020535209A JP 7128281 B2 JP7128281 B2 JP 7128281B2
- Authority
- JP
- Japan
- Prior art keywords
- solid phase
- vapor
- supply
- heating unit
- section
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C18/00—Alloys based on zinc
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/543—Controlling the film thickness or evaporation rate using measurement on the vapor source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/548—Controlling the composition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
Description
図3の実施例の装置をもって実験した結果は、次のとおりである。固相体としては、純亜鉛と純マグネシウムの2種類を使用し、目標コーティング層は、亜鉛とマグネシウム(重量比:10.8wt%Mg)合金コーティングである。
Claims (13)
- 基板に2以上の化合物又は元素をコーティングさせる蒸着装置であって、
前記2以上の化合物又は元素を複数の固相体として供給する供給部と、
前記供給部から供給される固相体を溶融及び蒸発させて蒸気を形成する加熱部と、
前記加熱部に連結され、前記蒸気が留まって以前に発生した蒸気と混合されるバッファ部と、
前記バッファ部に連結され、基板に向かって開口が形成されたノズルと
を含み、
前記供給部は、供給管を介して前記加熱部に固相体を供給し、
前記供給管は、前記加熱部の溶湯の内部まで延長する加熱部側端部を含み、
前記供給部は、第1固相体を供給する第1供給部と、前記第1固相体と元素又は化合物が異なる第2固相体を供給する第2供給部とを含み、
前記第1供給部と前記第2供給部は、一つの前記供給管を介して前記加熱部に固相体を供給する、蒸着装置。 - 前記供給管の加熱部側端部には、供給された固相体が前記溶湯により少なくとも一部溶融した後に前記供給管から抜け出るように、前記固相体の断面より小さい開口が形成されることを特徴とする、請求項1に記載の蒸着装置。
- 前記加熱部はルツボを含み、
前記バッファ部は、前記ノズルと前記ルツボを連結する空間であり、前記ルツボの断面より前記開口の面積が小さいことを特徴とする、請求項1又は2に記載の蒸着装置。 - 前記第1供給部と前記第2供給部は、前記加熱部より上側に位置して、前記供給管から前記固相体は自重によって前記加熱部に供給されることを特徴とする、請求項1乃至3のいずれか一項に記載の蒸着装置。
- 前記加熱部は、ルツボと、前記ルツボの内側又は外側に配置される電磁気コイルと、を含むことを特徴とする、請求項1又は2に記載の蒸着装置。
- 前記電磁気コイルは、非浮揚型誘導加熱ユニットであることを特徴とする、請求項5に記載の蒸着装置。
- 前記電磁気コイルは、垂直方向に巻線されたことを特徴とする、請求項5に記載の蒸着装置。
- 前記第1固相体と前記第2固相体のそれぞれは、亜鉛、マグネシウム、アルミニウム、リチウム、インジウム、銀、及び銅のうちいずれか一つ以上を含むことを特徴とする、請求項1に記載の蒸着装置。
- 2以上の互いに元素又は化合物が異なる固相体を同時に一つの供給管を介して一つの加熱部に供給する供給段階と、
前記固相体を溶融及び蒸発させて蒸気を形成する蒸気形成段階と、
前記蒸気と以前に形成された蒸気とが混合される緩衝段階と、
混合された蒸気を基板に向かって噴射する噴射段階と
を含む、蒸着方法。 - 前記固相体は、亜鉛、マグネシウム、アルミニウム、リチウム、インジウム、銀、及び銅のうちいずれか一つ以上を含み、
前記混合された蒸気と前記固相体とは、互いに異なる組成を有することを特徴とする、請求項9に記載の蒸着方法。 - 前記供給段階で供給される固相体全体の組成比は、目標コーティング層の組成比と一致することを特徴とする、請求項10に記載の蒸着方法。
- 前記供給段階で前記固相体は、前記固相体が収容されて溶融及び蒸発するルツボの溶湯内部に延長した前記供給管を介して供給され、
前記蒸気形成段階で前記固相体は、少なくとも一部が溶融した後、前記供給管から抜け出て溶湯に混合されることを特徴とする、請求項9に記載の蒸着方法。 - 前記固相体のそれぞれは、亜鉛、マグネシウム、アルミニウム、リチウム、インジウム、銀、及び銅のうちいずれか一つのみを含み、
前記供給段階で供給される固相体全体の組成比は、目標コーティング層の組成比と一致することを特徴とする、請求項9に記載の蒸着方法。
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020170179178A KR102098455B1 (ko) | 2017-12-26 | 2017-12-26 | 연속 증착 장치 및 연속 증착 방법 |
| KR10-2017-0179178 | 2017-12-26 | ||
| PCT/KR2018/012451 WO2019132206A1 (ko) | 2017-12-26 | 2018-10-19 | 증착 장치 및 증착 방법 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2021509146A JP2021509146A (ja) | 2021-03-18 |
| JP7128281B2 true JP7128281B2 (ja) | 2022-08-30 |
Family
ID=67064199
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020535209A Active JP7128281B2 (ja) | 2017-12-26 | 2018-10-19 | 蒸着装置及び蒸着方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20210017640A1 (ja) |
| EP (1) | EP3733926A4 (ja) |
| JP (1) | JP7128281B2 (ja) |
| KR (1) | KR102098455B1 (ja) |
| CN (1) | CN111542644B (ja) |
| WO (1) | WO2019132206A1 (ja) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019239192A1 (en) * | 2018-06-15 | 2019-12-19 | Arcelormittal | Vacuum deposition facility and method for coating a substrate |
| GB2586635B (en) * | 2019-08-30 | 2024-01-24 | Dyson Technology Ltd | Deposition system |
| CN112575308B (zh) | 2019-09-29 | 2023-03-24 | 宝山钢铁股份有限公司 | 一种能在真空下带钢高效镀膜的真空镀膜装置 |
| CN117344289A (zh) * | 2023-11-06 | 2024-01-05 | 甬江实验室 | 化学气相沉积设备 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008038821A1 (fr) | 2006-09-29 | 2008-04-03 | Tokyo Electron Limited | appareil de déposition, appareil de commande d'appareil de déposition, procédé de commande d'appareil de déposition, appareil de déposition utilisant ce procédé et procédé de fabrication de sortie |
| JP2017500449A (ja) | 2013-12-19 | 2017-01-05 | ポスコPosco | 加熱装置及びこれを含むコーティング器具 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2611746B1 (fr) * | 1987-03-06 | 1989-06-30 | Centre Nat Etd Spatiales | Dispositif d'evaporation sous vide d'un metal en continu |
| JPH02125866A (ja) * | 1988-11-04 | 1990-05-14 | Kobe Steel Ltd | 合金蒸着めっき装置 |
| JP2507804B2 (ja) * | 1989-04-19 | 1996-06-19 | 東洋インキ製造株式会社 | 連続蒸着方法および装置 |
| DE19527515C1 (de) | 1995-07-27 | 1996-11-28 | Fraunhofer Ges Forschung | Verfahren zur Herstellung von korrosionsgeschütztem Stahlblech |
| JP4219476B2 (ja) * | 1999-04-05 | 2009-02-04 | パナソニック株式会社 | 薄膜形成方法及び薄膜形成装置 |
| EP1174526A1 (en) | 2000-07-17 | 2002-01-23 | Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek TNO | Continuous vapour deposition |
| NL1020059C2 (nl) * | 2002-02-21 | 2003-08-25 | Corus Technology B V | Werkwijze en inrichting voor het bekleden van een substraat. |
| US7501151B2 (en) * | 2004-09-21 | 2009-03-10 | Eastman Kodak Company | Delivering particulate material to a vaporization zone |
| US20070231490A1 (en) * | 2006-03-29 | 2007-10-04 | Eastman Kodak Company | Uniformly vaporizing metals and organic materials |
| US20090020070A1 (en) * | 2007-07-19 | 2009-01-22 | Michael Schafer | Vacuum evaporation apparatus for solid materials |
| KR20090092627A (ko) | 2008-02-27 | 2009-09-01 | 성균관대학교산학협력단 | 상황정보 기반의 보안 장치 및 그 방법 |
| EP2199425A1 (fr) * | 2008-12-18 | 2010-06-23 | ArcelorMittal France | Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique (II) |
| KR101379646B1 (ko) * | 2009-12-09 | 2014-03-28 | 가부시키가이샤 알박 | 유기 박막의 성막 장치 및 유기 재료 성막 방법 |
| KR101171535B1 (ko) * | 2010-07-09 | 2012-08-07 | 아주대학교산학협력단 | 박막의 부착력 향상을 위한 전처리 장치 및 전처리 방법 |
| KR101207590B1 (ko) * | 2010-12-27 | 2012-12-03 | 주식회사 포스코 | 금속증기 발생장치 |
| KR101461738B1 (ko) * | 2012-12-21 | 2014-11-14 | 주식회사 포스코 | 가열장치 및 이를 포함하는 코팅 시스템 |
| WO2015067662A1 (en) * | 2013-11-05 | 2015-05-14 | Tata Steel Nederland Technology B.V. | Method and apparatus for controlling the composition of liquid metal in an evaporator device |
-
2017
- 2017-12-26 KR KR1020170179178A patent/KR102098455B1/ko active Active
-
2018
- 2018-10-19 JP JP2020535209A patent/JP7128281B2/ja active Active
- 2018-10-19 EP EP18895724.5A patent/EP3733926A4/en active Pending
- 2018-10-19 WO PCT/KR2018/012451 patent/WO2019132206A1/ko not_active Ceased
- 2018-10-19 US US16/957,507 patent/US20210017640A1/en not_active Abandoned
- 2018-10-19 CN CN201880084151.6A patent/CN111542644B/zh active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008038821A1 (fr) | 2006-09-29 | 2008-04-03 | Tokyo Electron Limited | appareil de déposition, appareil de commande d'appareil de déposition, procédé de commande d'appareil de déposition, appareil de déposition utilisant ce procédé et procédé de fabrication de sortie |
| JP2017500449A (ja) | 2013-12-19 | 2017-01-05 | ポスコPosco | 加熱装置及びこれを含むコーティング器具 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN111542644B (zh) | 2023-05-30 |
| KR20190077741A (ko) | 2019-07-04 |
| CN111542644A (zh) | 2020-08-14 |
| EP3733926A1 (en) | 2020-11-04 |
| JP2021509146A (ja) | 2021-03-18 |
| WO2019132206A1 (ko) | 2019-07-04 |
| KR102098455B1 (ko) | 2020-04-07 |
| US20210017640A1 (en) | 2021-01-21 |
| EP3733926A4 (en) | 2021-05-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP7128281B2 (ja) | 蒸着装置及び蒸着方法 | |
| RU2456372C2 (ru) | Способ нанесения покрытия на подложку и устройство вакуумного осаждения металлического сплава | |
| US11781213B2 (en) | Apparatus and method for vacuum deposition | |
| JP6412186B2 (ja) | 直接液体堆積 | |
| EP4029968B1 (en) | Vacuum coating device | |
| US20190211440A1 (en) | Coating process using gas screen | |
| EP3092324B1 (en) | Coating process using gas screen | |
| JP2019516863A (ja) | 溶融素材供給ユニット及びそれを含む乾式コーティング装置 | |
| KR100833014B1 (ko) | 합금 증착용 증발 장치 | |
| KR100824328B1 (ko) | 국부적인 양압과 마이크로 액적을 이용한 양압 코팅 방법및 그 장치 | |
| JP2004063715A (ja) | 半導体装置の製造方法および基板処理装置 | |
| BR112018076292B1 (pt) | Instalação de deposição a vácuo e processo para revestir um substrato | |
| KR20140011883A (ko) | 박막 증착 장치 및 그것을 이용한 박막 증착 방법 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20200728 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20210730 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20210907 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20211206 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20220421 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20220719 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20220802 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20220818 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 7128281 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
| S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
| R371 | Transfer withdrawn |
Free format text: JAPANESE INTERMEDIATE CODE: R371 |
|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |