JP7418924B2 - 保持機構 - Google Patents
保持機構 Download PDFInfo
- Publication number
- JP7418924B2 JP7418924B2 JP2020084542A JP2020084542A JP7418924B2 JP 7418924 B2 JP7418924 B2 JP 7418924B2 JP 2020084542 A JP2020084542 A JP 2020084542A JP 2020084542 A JP2020084542 A JP 2020084542A JP 7418924 B2 JP7418924 B2 JP 7418924B2
- Authority
- JP
- Japan
- Prior art keywords
- air
- wafer
- bernoulli
- flow rate
- sensor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J15/00—Gripping heads and other end effectors
- B25J15/06—Gripping heads and other end effectors with vacuum or magnetic holding means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G47/00—Article or material-handling devices associated with conveyors; Methods employing such devices
- B65G47/74—Feeding, transfer, or discharging devices of particular kinds or types
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/78—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using vacuum or suction, e.g. Bernoulli chucks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J11/00—Manipulators not otherwise provided for
- B25J11/0095—Manipulators transporting wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J15/00—Gripping heads and other end effectors
- B25J15/0014—Gripping heads and other end effectors having fork, comb or plate shaped means for engaging the lower surface on a object to be transported
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J15/00—Gripping heads and other end effectors
- B25J15/06—Gripping heads and other end effectors with vacuum or magnetic holding means
- B25J15/0616—Gripping heads and other end effectors with vacuum or magnetic holding means with vacuum
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J15/00—Gripping heads and other end effectors
- B25J15/06—Gripping heads and other end effectors with vacuum or magnetic holding means
- B25J15/0616—Gripping heads and other end effectors with vacuum or magnetic holding means with vacuum
- B25J15/0625—Gripping heads and other end effectors with vacuum or magnetic holding means with vacuum provided with a valve
- B25J15/0641—Object-actuated valves
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G43/00—Control devices, e.g. for safety, warning or fault-correcting
- B65G43/08—Control devices operated by article or material being fed, conveyed or discharged
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
- H10P72/0606—Position monitoring, e.g. misposition detection or presence detection
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
- H10P72/34—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H10P72/3402—Mechanical parts of transfer devices
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Robotics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Manipulator (AREA)
- Sheets, Magazines, And Separation Thereof (AREA)
Description
4 :リンク機構
6 :第1駆動部
8 :支持部材
10 :第1リンク
11 :ウェーハ
11a :表面
11b :裏面
12 :第2リンク
13 :デバイス
14 :第2駆動部
16 :ハンド
16a :基部
16b :先端部
16c :切り欠き
16d :一面
16e :他面
18a,18b:ベルヌーイパッド
20 :ゴムパッド
22 :センサー
24 :カセット
24a :側面
24b :支持溝
24c :天板
24d :接続部
24e :開口
26 :エアーチューブ
26a :元栓
28 :エアー供給源
30 :電空レギュレータ
32 :制御部
A :距離
Claims (3)
- 板状物にエアーを吹き付けることで生じる負圧の作用によって該板状物を保持するベルヌーイパッドを備える保持機構であって、
該ベルヌーイパッドが配設されたハンドと、
該ハンドに配設され、該板状物が該ベルヌーイパッドで吸引保持されたことを検出するセンサーと、
該ハンドに配設され該板状物の横移動を規制する横移動規制部と、
該ベルヌーイパッドにエアーを供給するエアー源と該ベルヌーイパッドとを連結するチューブと、
該チューブに配設され、該ベルヌーイパッドに供給されるエアーの流量を調整する調整バルブと、
該調整バルブの動作を制御する制御部と、を備え、
該制御部は、該調整バルブから該ベルヌーイパッドに供給されるエアーの流量を徐々に増加させ、該板状物が負圧の作用を受けて該ベルヌーイパッドに吸引保持されたことを該センサーで検出したときに、エアーの流量を固定することを特徴とする保持機構。 - 該センサーは、近接センサーであり、
該センサーと該板状物との距離が所定の長さになったことを該センサーで検出したときに、該制御部は、該板状物が該ベルヌーイパッドに吸引保持されたと判断し、該調整バルブから該ベルヌーイパッドに供給されるエアーの流量を固定することを特徴とする請求項1記載の保持機構。 - 該センサーは、振動センサーであり、
エアーの流量の増加と共に徐々に増加する該板状物の振動の振幅が所定量になったことを該センサーで検出したときに、該制御部は、該板状物が該ベルヌーイパッドに吸引保持されたと判断し、該調整バルブから該ベルヌーイパッドに供給されるエアーの流量を固定することを特徴とする請求項1記載の保持機構。
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020084542A JP7418924B2 (ja) | 2020-05-13 | 2020-05-13 | 保持機構 |
| KR1020210048869A KR102927875B1 (ko) | 2020-05-13 | 2021-04-15 | 유지 기구 |
| US17/240,290 US11935778B2 (en) | 2020-05-13 | 2021-04-26 | Holding mechanism including Bernoulli pad |
| SG10202104232RA SG10202104232RA (en) | 2020-05-13 | 2021-04-26 | Holding mechanism including bernoulli pad |
| MYPI2021002289A MY206076A (en) | 2020-05-13 | 2021-04-27 | Holding mechanism including bernoulli pad |
| TW110115620A TWI850555B (zh) | 2020-05-13 | 2021-04-29 | 保持機構 |
| CN202110503926.2A CN113666089B (zh) | 2020-05-13 | 2021-05-10 | 保持机构 |
| DE102021204748.3A DE102021204748B4 (de) | 2020-05-13 | 2021-05-11 | Haltemechanismus mit bernoulli-pad |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020084542A JP7418924B2 (ja) | 2020-05-13 | 2020-05-13 | 保持機構 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2021180244A JP2021180244A (ja) | 2021-11-18 |
| JP7418924B2 true JP7418924B2 (ja) | 2024-01-22 |
Family
ID=78280727
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020084542A Active JP7418924B2 (ja) | 2020-05-13 | 2020-05-13 | 保持機構 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US11935778B2 (ja) |
| JP (1) | JP7418924B2 (ja) |
| KR (1) | KR102927875B1 (ja) |
| DE (1) | DE102021204748B4 (ja) |
| MY (1) | MY206076A (ja) |
| SG (1) | SG10202104232RA (ja) |
| TW (1) | TWI850555B (ja) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7324667B2 (ja) * | 2019-09-20 | 2023-08-10 | 株式会社Screenホールディングス | 基板処理装置 |
| TWI800174B (zh) | 2021-12-22 | 2023-04-21 | 微程式資訊股份有限公司 | 具埋入式感測器之機械手臂承載裝置 |
| JP7780335B2 (ja) * | 2021-12-28 | 2025-12-04 | ルネサスエレクトロニクス株式会社 | ウエハ保持装置および半導体装置の製造方法 |
| CN116417384A (zh) * | 2021-12-30 | 2023-07-11 | 盛美半导体设备(上海)股份有限公司 | 薄片晶圆传输方法 |
| CN114454203B (zh) * | 2022-02-17 | 2023-12-29 | 绍兴中芯集成电路制造股份有限公司 | 机械手及吸盘 |
| CN115319787A (zh) * | 2022-07-29 | 2022-11-11 | 北京京仪自动化装备技术股份有限公司 | 一种非接触式机械手吸附力的调节系统及方法 |
| TWI814679B (zh) * | 2023-02-13 | 2023-09-01 | 盛詮科技股份有限公司 | 載板懸浮手臂 |
| US12532704B2 (en) * | 2024-06-21 | 2026-01-20 | Service Support Specialties, Inc. | Wafer detection system |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009272337A (ja) | 2008-04-30 | 2009-11-19 | Ihi Corp | 非接触搬送装置及びベルヌーイチャック |
| JP2014165470A (ja) | 2013-02-28 | 2014-09-08 | Nikon Corp | 搬送システム及び搬送方法、露光装置及び露光方法、並びにデバイス製造方法 |
| JP2017062490A (ja) | 2011-12-29 | 2017-03-30 | 株式会社ニコン | 露光装置及び露光方法、並びにデバイス製造方法 |
| WO2017179296A1 (ja) | 2016-04-14 | 2017-10-19 | 三菱電機株式会社 | 基板保持装置 |
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| US6322116B1 (en) * | 1999-07-23 | 2001-11-27 | Asm America, Inc. | Non-contact end effector |
| US7055875B2 (en) | 2003-07-11 | 2006-06-06 | Asyst Technologies, Inc. | Ultra low contact area end effector |
| US7100954B2 (en) * | 2003-07-11 | 2006-09-05 | Nexx Systems, Inc. | Ultra-thin wafer handling system |
| JP4299104B2 (ja) | 2003-11-10 | 2009-07-22 | 株式会社ディスコ | ウエーハ搬送機構 |
| JP4299111B2 (ja) | 2003-11-18 | 2009-07-22 | 株式会社ディスコ | 研削装置 |
| JP4243766B2 (ja) * | 2006-10-02 | 2009-03-25 | Smc株式会社 | 非接触搬送装置 |
| US20080129064A1 (en) * | 2006-12-01 | 2008-06-05 | Asm America, Inc. | Bernoulli wand |
| KR101223543B1 (ko) * | 2010-11-01 | 2013-01-21 | 우완동 | 비접촉식 이송장치 |
| WO2013027828A1 (ja) * | 2011-08-24 | 2013-02-28 | 株式会社ハーモテック | 非接触搬送装置 |
| US8905680B2 (en) * | 2011-10-31 | 2014-12-09 | Masahiro Lee | Ultrathin wafer transport systems |
| JP6250435B2 (ja) | 2014-02-26 | 2017-12-20 | 光洋機械工業株式会社 | 両頭平面研削法 |
| JP6858041B2 (ja) * | 2017-03-16 | 2021-04-14 | 川崎重工業株式会社 | 基板搬送装置 |
| JP6818660B2 (ja) * | 2017-09-12 | 2021-01-20 | 株式会社東芝 | 物体保持装置 |
| JP7187147B2 (ja) * | 2017-12-12 | 2022-12-12 | 東京エレクトロン株式会社 | 搬送装置のティーチング方法及び基板処理システム |
| JP6924488B2 (ja) * | 2018-04-12 | 2021-08-25 | 株式会社ハーモテック | 旋回流形成体 |
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| JP7353711B2 (ja) * | 2019-08-14 | 2023-10-02 | 株式会社ディスコ | ウェーハ搬送装置 |
| JP7488062B2 (ja) * | 2020-03-02 | 2024-05-21 | 東京エレクトロン株式会社 | 接合装置、接合システム、接合方法および記憶媒体 |
-
2020
- 2020-05-13 JP JP2020084542A patent/JP7418924B2/ja active Active
-
2021
- 2021-04-15 KR KR1020210048869A patent/KR102927875B1/ko active Active
- 2021-04-26 SG SG10202104232RA patent/SG10202104232RA/en unknown
- 2021-04-26 US US17/240,290 patent/US11935778B2/en active Active
- 2021-04-27 MY MYPI2021002289A patent/MY206076A/en unknown
- 2021-04-29 TW TW110115620A patent/TWI850555B/zh active
- 2021-05-11 DE DE102021204748.3A patent/DE102021204748B4/de active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009272337A (ja) | 2008-04-30 | 2009-11-19 | Ihi Corp | 非接触搬送装置及びベルヌーイチャック |
| JP2017062490A (ja) | 2011-12-29 | 2017-03-30 | 株式会社ニコン | 露光装置及び露光方法、並びにデバイス製造方法 |
| JP2014165470A (ja) | 2013-02-28 | 2014-09-08 | Nikon Corp | 搬送システム及び搬送方法、露光装置及び露光方法、並びにデバイス製造方法 |
| WO2017179296A1 (ja) | 2016-04-14 | 2017-10-19 | 三菱電機株式会社 | 基板保持装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE102021204748A1 (de) | 2021-11-18 |
| US11935778B2 (en) | 2024-03-19 |
| CN113666089A (zh) | 2021-11-19 |
| MY206076A (en) | 2024-11-27 |
| TWI850555B (zh) | 2024-08-01 |
| TW202143374A (zh) | 2021-11-16 |
| US20210358796A1 (en) | 2021-11-18 |
| JP2021180244A (ja) | 2021-11-18 |
| DE102021204748B4 (de) | 2025-01-30 |
| KR102927875B1 (ko) | 2026-02-13 |
| SG10202104232RA (en) | 2021-12-30 |
| KR20210139144A (ko) | 2021-11-22 |
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