JP7500545B2 - 光学検査システム向けマルチモダリティ多重化照明 - Google Patents
光学検査システム向けマルチモダリティ多重化照明 Download PDFInfo
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- JP7500545B2 JP7500545B2 JP2021512758A JP2021512758A JP7500545B2 JP 7500545 B2 JP7500545 B2 JP 7500545B2 JP 2021512758 A JP2021512758 A JP 2021512758A JP 2021512758 A JP2021512758 A JP 2021512758A JP 7500545 B2 JP7500545 B2 JP 7500545B2
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/70—Circuitry for compensating brightness variation in the scene
- H04N23/74—Circuitry for compensating brightness variation in the scene by influencing the scene brightness using illuminating means
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
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- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/50—Depth or shape recovery
- G06T7/55—Depth or shape recovery from multiple images
- G06T7/586—Depth or shape recovery from multiple images from multiple light sources, e.g. photometric stereo
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N5/00—Details of television systems
- H04N5/222—Studio circuitry; Studio devices; Studio equipment
- H04N5/262—Studio circuits, e.g. for mixing, switching-over, change of character of image, other special effects ; Cameras specially adapted for the electronic generation of special effects
- H04N5/265—Mixing
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
- G01N2021/8812—Diffuse illumination, e.g. "sky"
- G01N2021/8816—Diffuse illumination, e.g. "sky" by using multiple sources, e.g. LEDs
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
- G01N2021/8835—Adjustable illumination, e.g. software adjustable screen
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
- G01N2021/8848—Polarisation of light
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8887—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N2021/9513—Liquid crystal panels
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N2021/95638—Inspecting patterns on the surface of objects for PCB's
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N2021/95638—Inspecting patterns on the surface of objects for PCB's
- G01N2021/95646—Soldering
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- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
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Description
Claims (22)
- 検査システムであって、
照明サブシステムと、
像感知サブシステムとを備え、
上記照明サブシステムが複数の照明モダリティを提供し、
対象物のうち少なくとも3個のエリアを上記複数の照明モダリティのうち別々なもので以て同時照明し、上記像感知サブシステムの単一センサ形成部分によりそれらの像を捕捉し、
上記照明サブシステムが、上記複数の照明モダリティのうち上記別々なもので以て上記対象物のうち上記少なくとも3個のエリアを、走査方向に沿ってそれぞれ異なる角度で同時照明することで、前記走査方向に沿い全体で少なくとも±約45°に亘る覆域がもたらされる、少なくとも3個のライトモジュールを備え、
上記少なくとも3個のライトモジュールが、上記走査方向に沿ったギャップにより互いに物理的に空間分離されており、上記複数の照明モダリティが異なる角度照明モダリティを含み、
上記少なくとも3個のエリアからの照明を上記センサの方に差し向けるビームスプリッタを更に備え、そのビームスプリッタが、自身の縁が上記ギャップ内に存するよう位置決めされる検査システム。 - 請求項1に記載された検査システムであって、上記センサがエリアセンサを備える検査システム。
- 請求項1に記載された検査システムであって、上記対象物のうち上記少なくとも3個のエリアが相互非連接的な検査システム。
- 請求項1に記載された検査システムであって、上記対象物及び自検査システムが、走査方向に沿い、少なくとも近連続的に相対運動する検査システム。
- 請求項4に記載された検査システムであって、上記照明サブシステムをストロボ動作させることで、上記少なくとも近連続的な相対運動中に上記対象物のうち上記少なくとも3個のエリアを照明する検査システム。
- 請求項1に記載された検査システムであって、上記少なくとも3個のライトモジュールそれぞれが、上記走査方向に対し概ね直交するクロス走査方向に沿い少なくとも二つの付加的照明モダリティを提供する検査システム。
- 請求項6に記載された検査システムであって、上記少なくとも二つの付加的照明モダリティが異なる波長符号化モダリティ、異なる時間モダリティ、及び/又は異なる偏光符号化モダリティを含む検査システム。
- 請求項1に記載された検査システムであって、上記照明サブシステムが、少なくとも1個の透過型集光素子または少なくとも1個の反射型集光素子の方に光を差し向ける複数個の光源を備える検査システム。
- 請求項8に記載された検査システムであって、上記複数個の光源が、対応する光導波路アレイへと光を出射する光源アレイと、光整形素子のアレイを備え、上記光導波路アレイの光導波路のうち少なくとも1個が各光整形素子へと光を出射する検査システム。
- 請求項1に記載された検査システムであって、上記像を処理する画像処理サブシステムを更に備える検査システム。
- 請求項10に記載された検査システムであって、上記処理が上記像の相互位置合わせ、及び/又は上記像の多重分離を含む検査システム。
- 対象物を検査する方法であって、
対象物のうち少なくとも3個のエリアを、複数の照明モダリティのうち別々なもので以て同時照明し、
上記少なくとも3個のエリアの像を単一のセンサにより捕捉し、
上記複数の照明モダリティのうち上記別々なもので以て上記対象物のうち上記少なくとも3個のエリアを、走査方向に沿ってそれぞれ異なる角度で同時照明することで、前記走査方向に沿い全体で少なくとも±約45°に亘る覆域がもたらされる、少なくとも3個のライトモジュールを備え、
上記少なくとも3個のライトモジュールが、上記走査方向に沿ったギャップにより互いに物理的に空間分離されており、上記複数の照明モダリティが異なる角度照明モダリティを含み、
上記少なくとも3個のエリアからの照明を上記センサの方に差し向けるビームスプリッタを更に備え、そのビームスプリッタが、自身の縁が上記ギャップ内に存するよう位置決めされる方法。 - 請求項12に記載された方法であって、上記センサがエリアセンサを備える方法。
- 請求項12に記載された方法であって、上記対象物のうち上記少なくとも3個のエリアが相互非連接的な方法。
- 請求項12に記載された方法であって、上記対象物及び上記少なくとも3個のライトモジュールが、走査方向に沿い、少なくとも近連続的に相対運動する方法。
- 請求項15に記載された方法であって、上記照明に際し、上記少なくとも近連続的な相対運動中に上記少なくとも3個のライトモジュールをストロボ動作させる方法。
- 請求項12に記載された方法であって、更に、上記走査方向に対し概ね直交するクロス走査方向に沿い、少なくとも二つの付加的照明モダリティで以て、上記対象物のうち上記少なくとも3個のエリアを照明する方法。
- 請求項17に記載された方法であって、上記少なくとも二つの付加的照明モダリティが異なる波長符号化モダリティ、異なる時間モダリティ、及び/又は異なる偏光符号化モダリティを含む方法。
- 請求項12に記載された方法であって、少なくとも1個の透過型集光素子または少なくとも1個の反射型集光素子の方に光を差し向ける複数個の光源によって、上記照明を実行する方法。
- 請求項19に記載された方法であって、上記複数個の光源が、対応する光導波路アレイへと光を出射する光源アレイを備え、上記光導波路アレイの光導波路のうち少なくとも1個が光整形素子のアレイの各光整形素子に光を出射する方法。
- 請求項12に記載された方法であって、更に、上記捕捉の後、上記像を処理する方法。
- 請求項21に記載された方法であって、上記処理に際し、上記像を相互位置合わせする、及び/又は上記像を多重分離させる方法。
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201862727561P | 2018-09-06 | 2018-09-06 | |
| US62/727,561 | 2018-09-06 | ||
| PCT/IL2019/050958 WO2020049551A1 (en) | 2018-09-06 | 2019-08-27 | Multimodality multiplexed illumination for optical inspection systems |
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| Publication Number | Publication Date |
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| JP2022501580A JP2022501580A (ja) | 2022-01-06 |
| JP2022501580A5 JP2022501580A5 (ja) | 2022-09-01 |
| JP7500545B2 true JP7500545B2 (ja) | 2024-06-17 |
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| JP2021512758A Active JP7500545B2 (ja) | 2018-09-06 | 2019-08-27 | 光学検査システム向けマルチモダリティ多重化照明 |
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| Country | Link |
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| US (1) | US11974046B2 (ja) |
| EP (1) | EP3847446A4 (ja) |
| JP (1) | JP7500545B2 (ja) |
| KR (1) | KR102831958B1 (ja) |
| CN (1) | CN112888936A (ja) |
| WO (1) | WO2020049551A1 (ja) |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| IT201900005536A1 (it) * | 2019-04-10 | 2020-10-10 | Doss Visual Solution S R L | Metodo di acquisizione immagini per una macchina di ispezione ottica |
| US12429430B2 (en) * | 2021-08-26 | 2025-09-30 | Emage Equipment Pte. Ltd. | Adaptive lighting system and method for inspection of complex objects |
| CN114813761B (zh) * | 2022-06-27 | 2022-10-14 | 浙江双元科技股份有限公司 | 一种基于双光频闪的薄膜针孔和亮斑缺陷识别系统及方法 |
| US12511731B2 (en) * | 2023-05-09 | 2025-12-30 | Orbotech Ltd. | System and method for three-dimensional imaging of samples using a machine learning algorithm |
| TWI881588B (zh) * | 2023-12-11 | 2025-04-21 | 家碩科技股份有限公司 | 可消除電路表面金屬紋路的光學檢測系統 |
| EP4682487A1 (de) * | 2024-07-18 | 2026-01-21 | IPAC Improve Process Analytics and Control GmbH | Farbmesssystem und verfahren für ortsaufgelöste spektrale farbmessungen einer strukturierten und bedruckten oberfläche |
| DE102024208944A1 (de) * | 2024-09-18 | 2026-03-19 | Isra Vision Gmbh | Beleuchtungseinrichtung zum Erzeugen einer Linienbeleuchtung |
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| JP2014130130A (ja) | 2013-09-30 | 2014-07-10 | Djtech Co Ltd | 検査装置 |
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| IL131284A (en) * | 1999-08-05 | 2003-05-29 | Orbotech Ltd | Illumination for inspecting surfaces of articles |
| US20020186878A1 (en) | 2001-06-07 | 2002-12-12 | Hoon Tan Seow | System and method for multiple image analysis |
| WO2004063668A2 (en) * | 2003-01-09 | 2004-07-29 | Orbotech Ltd. | Method and apparatus for simultaneous 2-d and topographical inspection |
| US7641365B2 (en) | 2006-10-13 | 2010-01-05 | Orbotech Ltd | Linear light concentrator |
| JP4932595B2 (ja) | 2007-05-17 | 2012-05-16 | 新日本製鐵株式会社 | 表面疵検査装置 |
| US8462329B2 (en) | 2010-07-30 | 2013-06-11 | Kla-Tencor Corp. | Multi-spot illumination for wafer inspection |
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| CN104685843B (zh) * | 2013-09-30 | 2018-02-23 | 华为技术有限公司 | 一种天线和通信设备 |
| US9989480B2 (en) | 2015-04-21 | 2018-06-05 | Camtek Ltd. | Inspection system having an expanded angular coverage |
-
2019
- 2019-08-27 JP JP2021512758A patent/JP7500545B2/ja active Active
- 2019-08-27 EP EP19856761.2A patent/EP3847446A4/en active Pending
- 2019-08-27 WO PCT/IL2019/050958 patent/WO2020049551A1/en not_active Ceased
- 2019-08-27 US US17/274,046 patent/US11974046B2/en active Active
- 2019-08-27 CN CN201980062633.6A patent/CN112888936A/zh active Pending
- 2019-08-27 KR KR1020217009889A patent/KR102831958B1/ko active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014009969A (ja) | 2012-06-27 | 2014-01-20 | Sumitomo Metal Mining Co Ltd | 画像処理装置、画像処理方法、及び露光パターン検査装置 |
| JP2014130130A (ja) | 2013-09-30 | 2014-07-10 | Djtech Co Ltd | 検査装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| US11974046B2 (en) | 2024-04-30 |
| EP3847446A1 (en) | 2021-07-14 |
| WO2020049551A1 (en) | 2020-03-12 |
| KR102831958B1 (ko) | 2025-07-08 |
| JP2022501580A (ja) | 2022-01-06 |
| US20210360140A1 (en) | 2021-11-18 |
| CN112888936A (zh) | 2021-06-01 |
| EP3847446A4 (en) | 2022-06-01 |
| KR20210050565A (ko) | 2021-05-07 |
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