JPH01104791A - Production of electrolytic aluminum foil - Google Patents

Production of electrolytic aluminum foil

Info

Publication number
JPH01104791A
JPH01104791A JP26239587A JP26239587A JPH01104791A JP H01104791 A JPH01104791 A JP H01104791A JP 26239587 A JP26239587 A JP 26239587A JP 26239587 A JP26239587 A JP 26239587A JP H01104791 A JPH01104791 A JP H01104791A
Authority
JP
Japan
Prior art keywords
bath
foil
aluminum
electrolytic
chloride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP26239587A
Other languages
Japanese (ja)
Inventor
Setsuko Takahashi
節子 高橋
Kikuko Akimoto
秋元 菊子
Kumiko Mori
森 久美子
Ryozo Akama
赤間 良三
Isao Saeki
功 佐伯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Nisshin Co Ltd
Original Assignee
Nisshin Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nisshin Steel Co Ltd filed Critical Nisshin Steel Co Ltd
Priority to JP26239587A priority Critical patent/JPH01104791A/en
Publication of JPH01104791A publication Critical patent/JPH01104791A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electrolytic Production Of Metals (AREA)

Abstract

PURPOSE:To produce high purity electrolytic Al foil by safe work by using an electrolytic bath consisting of aluminum chloride and alkylpyridinium chloride or further contg. an org. solvent. CONSTITUTION:An electrolytic bath consisting of 50-75mol% aluminum chloride and 25-50mol% alkylpyridinium chloride having 1-5C alkyl group or further contg. an org. solvent is prepd. An Al plate as the anode is put in the electrolytic bath and electrolysis is carried out at about 0-150 deg.C temp. of the bath and about 0.1-30A/dm<2> current density to electrodeposit Al on a substrate. The deposited Al is stripped from the substrate to obtain Al foil. This electrolytic Al foil is free from pinholes and has satisfactory ductility.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、作業的に安全な電解液を用いてアルミニウム
電解箔を安価に製造する方法に関する。
DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a method for manufacturing aluminum electrolytic foil at low cost using an electrolyte solution that is safe to work with.

(従来技術) 従来、プリント基板などに使用する銅箔は、電解により
製3mされているが、電解コンデンサーなどに使用する
アルミニウム箔は、圧延法により製造されている。
(Prior Art) Conventionally, copper foil used for printed circuit boards and the like has been produced in a length of 3 m by electrolysis, while aluminum foil used for electrolytic capacitors and the like has been produced by a rolling method.

(発明が解決しようとする問題点) しかし、圧延法によ−る製造は、圧延により加工硬化す
るため、圧延する度に焼鈍を繰り返さねばならず、gi
造が繁雑になるという欠点があった。
(Problems to be Solved by the Invention) However, in manufacturing by the rolling method, since work hardening occurs due to rolling, annealing must be repeated each time rolling is performed.
The drawback was that the structure was complicated.

また、圧延法で製造できる厚みは、3μ輪程度が限界で
、それ以上薄くすることは困難であった。
Further, the thickness that can be produced by the rolling method is limited to about 3 μm, and it has been difficult to make it thinner than that.

このため、胴箔のように電解によりアルミニウム箔を製
造すればよいのであるが、従来、作業的に安全で、しが
も安価に製造できる電解液が開発されていなかった。
For this reason, it is possible to manufacture aluminum foil by electrolysis like body foil, but until now no electrolytic solution has been developed that is safe to work with and can be manufactured at low cost.

本発明は、上記のような電解液を開発して電解法により
アルミニウム箔を製造するものである。
The present invention is to develop an electrolytic solution as described above and produce aluminum foil by an electrolytic method.

(問題点を解決するための手段) 本発明者らは、電解法によるアルミニウム箔の製造方法
を開発すべく種々研究した結果、ハロゲン化アルミニウ
ムとアルキルピリジニウムハロゲン化物の溶融塩浴によ
る方法を1m発した。すなわち、塩化アルミニウム50
〜75毫ル%とフルキルピリジニウムクロリド(アルキ
ル基はCWL1〜5のアルキル基)25〜50モル%と
からなる電解浴またはこの浴に有機溶媒を添加した電解
浴を用いて電解するのである。
(Means for Solving the Problems) As a result of various studies aimed at developing a method for producing aluminum foil using an electrolytic method, the inventors of the present invention have developed a method using a molten salt bath of aluminum halide and alkylpyridinium halide. did. That is, aluminum chloride 50
Electrolysis is carried out using an electrolytic bath consisting of ~75 mol% and 25-50 mol% of furkylpyridinium chloride (the alkyl group is an alkyl group of CWL 1 to 5), or an electrolytic bath to which an organic solvent is added.

m化?ルミニウム50〜75モル%とフルキルピリジニ
ウムクロリド25〜50モル%との混合物は、常温で溶
融する共融混合物で、電離して^1イオンを生じるので
、電解すれば、陰極部にアルミニウムを電析させること
ができる。従って、電析アルミニウムを剥離すれば、箔
にすることができる。
M version? A mixture of 50 to 75 mol% of aluminum and 25 to 50 mol% of furkylpyridinium chloride is a eutectic mixture that melts at room temperature and ionizes to produce ^1 ions, so if electrolyzed, aluminum can be electrified at the cathode. can be analyzed. Therefore, if the electrodeposited aluminum is peeled off, it can be made into foil.

塩化アルミニウムの配合割合を50〜75モル%にする
のは、50モル%未満であると、アルキルビリノニウム
イオン濃度が高くなり、電解の際、このイオンの還元反
応が同時に進行して、浴の劣化、電流効率の低下および
箔の表面外観不良を招き、75モル%を越えると、導?
Ii率が低(なり、蒸気圧ら高くなるからである。
The reason why the mixing ratio of aluminum chloride should be 50 to 75 mol% is that if it is less than 50 mol%, the concentration of alkylvinonium ions will be high, and during electrolysis, the reduction reaction of these ions will proceed at the same time, causing the bath to deteriorate. If it exceeds 75 mol%, it will cause deterioration, decrease in current efficiency, and poor surface appearance of the foil.
This is because the Ii rate becomes low (and the vapor pressure becomes high).

塩化アルミニウム配合割合を上記のようにしたj烏合、
電MWL中のフルキルピリジニウムクロリドは、残りで
あるので、25〜50モル%になる。
A mixture of aluminum chloride with the above-mentioned mixing ratio,
Furkylpyridinium chloride in the electric MWL is the remainder and therefore amounts to 25 to 50 mol%.

このビリノニウム化合物のアルキル基は、C数が多くな
ると、電解困難となるので1〜5のものにする。
The alkyl group of this bilinonium compound should have 1 to 5 carbon atoms since electrolysis becomes difficult when the number of carbon atoms increases.

この電解液は、有機溶媒を配合すると、粘性が低くなり
、電解時電流密度を高くすることができ、また、箔の外
観を鏡面光沢にすることができる。
When this electrolytic solution is blended with an organic solvent, the viscosity can be lowered, the current density during electrolysis can be increased, and the appearance of the foil can be made specular and glossy.

有機溶剤としては、芳香族炭化水素系溶媒、例え  ′
ば、トルエン、ベンゼン、キシレンなどが溶解性の関係
で好ましく、配合量は、塩化アルミニウムとフルキルピ
リジニウムクロリドの合計量に対して、10〜75vo
l%にするのが好ましい。10vol%未満であると、
配合効果が小さく、75vol%を越えると、塩化アル
ミニウムの濃度が低くなるため、電解時の電流効率が著
しく低くなる。
Examples of organic solvents include aromatic hydrocarbon solvents, such as
For example, toluene, benzene, xylene, etc. are preferable in terms of solubility, and the blending amount is 10 to 75 vol based on the total amount of aluminum chloride and furkylpyridinium chloride.
It is preferable to set it to 1%. If it is less than 10 vol%,
The blending effect is small, and when it exceeds 75 vol%, the concentration of aluminum chloride becomes low, so the current efficiency during electrolysis becomes significantly low.

電解液は、酸素や水分に触れても安全であるが、^1イ
オンの酸化防止のために、電解は、乾燥無酸素雰囲気中
(例えば、乾燥N、lfスや^「がス中)で行帆 電解は、乾燥無酸素雰囲気中で直流電流またはパルス電
流−により液温O〜150℃、電流密度0.1〜30^
/d1112で行う、浴温が0℃より低いと、電解液の
凝固が起こり、高電流密度で電解することが困難となる
。また、浴温を150℃より高くして、電流密度を30
Δ/Cl112より高くすると、箔が灰色にな乃、結品
も粗いデンドライト結品となって、外観、加工性が低下
してしまう、電流密度を30^/dm2近くにして電解
する場合は、浴温を100℃以上にするのが好ましい。
The electrolyte is safe even if it comes into contact with oxygen or moisture, but in order to prevent the oxidation of ions, electrolysis must be performed in a dry, oxygen-free atmosphere (e.g., in dry N, LF, or gas). Gyoho electrolysis uses direct current or pulsed current in a dry oxygen-free atmosphere at a liquid temperature of 0 to 150°C and a current density of 0.1 to 30°C.
/d1112, if the bath temperature is lower than 0° C., solidification of the electrolyte will occur, making it difficult to perform electrolysis at a high current density. In addition, the bath temperature was increased to higher than 150°C, and the current density was increased to 30°C.
When Δ/Cl is higher than 112, the foil becomes gray and the crystals become rough dendrite crystals, which deteriorates the appearance and workability.When electrolyzing at a current density near 30^/dm2, Preferably, the bath temperature is 100°C or higher.

工業的な連続電解法により常に均一な箔を製造するには
、電解浴に^1イオンを補給して、浴中の^1イオンを
一定の範囲に管理する必要があるが、この場合、可溶性
陽極としてアルミニウムを用いると、陽極よりアルミニ
ウムが補給され、浴中のへ1イオン濃度をほぼ一定に保
つことがでbる。不溶性陽極(例えば、Ti−PL金合
金を用いると、へ1イオンが消費されるので、塩化アル
ミニウム添加により^1イオンを補給する。この場合、
陽極表面でハロゲンが大発生反応が起こって、浴中のハ
ロゲン成分が減少する。このため、浴組成が変動し、浴
j?命が短くなる。
In order to consistently produce uniform foils using industrial continuous electrolysis, it is necessary to replenish the electrolytic bath with ^1 ions and control the ^1 ions in the bath within a certain range. When aluminum is used as the anode, aluminum is replenished from the anode, making it possible to keep the concentration of ions in the bath almost constant. When an insoluble anode (for example, Ti-PL gold alloy is used, ^1 ions are consumed, so ^1 ions are replenished by adding aluminum chloride. In this case,
A reaction occurs that generates a large amount of halogen on the anode surface, and the halogen component in the bath decreases. Because of this, the bath composition fluctuates and the bath j? Life becomes shorter.

電解の際の箔電析基材としては、金属a−ルや金属帯(
例えば、ステンレス銅帯)を用いて、電析させたアルミ
ニウム箔を剥離すればよい。
As a foil electrodeposition base material during electrolysis, metal a-ru or metal strip (
For example, the electrodeposited aluminum foil may be peeled off using a stainless steel copper strip.

なお、電解に先立って、電IW浴に金属^1を投入して
放置するか、または投入した状態で0.5^/ d t
n 2の低電流密度で電解すると、建浴時に塩化アルミ
ニウム中に含まれていたFe、 Pb、■1□0などの
不純物が金属へ1表面に電位差によす置換析出し、浴が
精58!されるので、箔の純度を高めることができる。
Prior to electrolysis, the metal ^1 is placed in the electric IW bath and left to stand, or 0.5^/d t is placed in the IW bath.
When electrolyzed at a low current density of n 2, impurities such as Fe, Pb, and ! Therefore, the purity of the foil can be increased.

未精製浴による箔の純度は、高純度塩化アルミニウムで
も不純物が含まれでいるだめ、高くても99.00%程
度であるが、この精製方法により浴を精製すると、99
.99%程度まで高めることができる。
The purity of the foil produced by an unpurified bath is about 99.00% at most, as even high-purity aluminum chloride does not contain impurities, but if the bath is purified by this purification method, the purity of the foil is about 99.00%.
.. It can be increased to about 99%.

(実施例) 実施例1 組成が塩化アルミニウム67モル%、ブチルピリジニウ
ムクロリド33モル%である電解浴を用いて、窒素雰囲
気下でアルミニウム板を陽極にして、浴温40°C1電
流密度1^/dI112で直流電流により電解し、SU
S430wI板にアルミニウムを2μIll電析させt
こ。その後、ステンレス溝板よりアルミニウムを剥離し
てアルミニウム箔とした。この箔にはピンホールが認め
られず、延性もあった。
(Example) Example 1 Using an electrolytic bath with a composition of 67 mol % aluminum chloride and 33 mol % butylpyridinium chloride, an aluminum plate was used as an anode in a nitrogen atmosphere, and the bath temperature was 40° C., the current density was 1^/ Electrolyze with DC current at dI112 and SU
Electrodeposit 2μIll of aluminum on the S430wI plate.
child. Thereafter, the aluminum was peeled off from the stainless steel grooved plate to obtain an aluminum foil. The foil showed no pinholes and was ductile.

実施例2 塩化アルミニウム60モル%、ブチルピリジニウムクロ
リド40モル%からなる電解浴を用いて、実施例1と同
要頒で3μm厚のアルミニウム箔を製造した。電解は、
浴温60℃、パルス電流(デユーティ−比1/10、平
均電流密度5Δ/cln2)で行ったが、箔のピンホー
ル、延性などは実施例1の場合と同様良好であった。
Example 2 Using an electrolytic bath consisting of 60 mol% of aluminum chloride and 40 mol% of butylpyridinium chloride, an aluminum foil with a thickness of 3 μm was produced in the same manner as in Example 1. Electrolysis is
The test was carried out at a bath temperature of 60° C. and a pulsed current (duty ratio 1/10, average current density 5Δ/cln2), and the pinholes and ductility of the foil were as good as in Example 1.

実施例3 実施例1の電解浴にベンゼンをvol%で50%添加し
俗を用いて、陽極アルミニウム板、m1語50℃、電流
密度5八/d+a2で直流電流により電解し、厚さ20
μIllのアルミニウム箔を製造した。
Example 3 50% by volume of benzene was added to the electrolytic bath of Example 1, and an anode aluminum plate was electrolyzed with a direct current at 50°C and a current density of 58/d+a2 to a thickness of 20%.
A μll aluminum foil was produced.

この箔の性能は実施例1と同様で・、硬度は3511v
であった。また、実施例1で製造したものに比べて光沢
が向上していた。
The performance of this foil is the same as in Example 1, and the hardness is 3511v.
Met. Furthermore, the gloss was improved compared to that produced in Example 1.

実施例4 実施例2の電解浴にベンゼン−トルエン混合溶媒(混合
比1:1)を50vol%添加し、この浴にて陽極アル
ミニウム板、浴温50℃でパルス電流(デユーティ−比
1/10、平均電流密度10Δ/(IIIIJで電解し
、厚さ50μmnのアルミニウム箔を製造した。
Example 4 50 vol. , and an average current density of 10Δ/(IIIJ) to produce an aluminum foil with a thickness of 50 μm.

この箔の性能は実施例3の場合と同様であった。The performance of this foil was similar to that of Example 3.

実施例5 実施例1の電解浴で浴温を80°C,′Ki流密度を2
0 A/dm”に上げて電解し、3#+J!;(のアル
ミニウム箔を91造した。
Example 5 Using the electrolytic bath of Example 1, the bath temperature was 80°C and the 'Ki flow density was 2.
0 A/dm'' and electrolyzed to produce 91 pieces of aluminum foil of 3#+J!;

実施例6 実施例1の電解浴に^1線を投入して、10時開放jn
後実施例1と同条件で電解したところ、アルミニウム箔
の純度は精製前の99.00%に一対して99.97%
であった。
Example 6 Put the ^1 wire into the electrolytic bath of Example 1 and open it at 10 o'clock jn
When electrolyzed under the same conditions as in Example 1, the purity of the aluminum foil was 99.97%, compared to 99.00% before purification.
Met.

実施例7 組成が塩化アルミニウム67モル%、メチルビソノニウ
ムクロリド33モル%である電解浴を用いて、S[I5
430wJ板に実施例1と同条件で電解し、アルミニウ
ムを2μIn電析させた。その後、ステンレス@板より
アルミニウムを剥離してアルミニウム箔とした。この箔
のピンホール、延性などは実施例1の場合と同様良好で
あった。
Example 7 S[I5
Electrolysis was carried out on a 430 wJ plate under the same conditions as in Example 1 to deposit 2 μIn of aluminum. Thereafter, the aluminum was peeled off from the stainless steel plate to obtain an aluminum foil. The pinholes and ductility of this foil were as good as in Example 1.

(発明の効果) 以上のように、本発明法によれば、電解法によりアルミ
ニウム箔を製造することができる。
(Effects of the Invention) As described above, according to the method of the present invention, aluminum foil can be manufactured by an electrolytic method.

Claims (5)

【特許請求の範囲】[Claims] (1)塩化アルミニウム50〜75モル%とアルキルピ
リジニウムクロリド(アルキル基はC数1〜5のアルキ
ル基)25〜50モル%とからなる電解浴またはこの浴
に有機溶媒を添加した電解浴を用いて、電解することを
特徴とするアルミニウム電解箔の製造方法。
(1) Using an electrolytic bath consisting of 50 to 75 mol% of aluminum chloride and 25 to 50 mol% of alkylpyridinium chloride (the alkyl group has 1 to 5 carbon atoms) or an electrolytic bath in which an organic solvent is added to this bath. 1. A method for producing aluminum electrolytic foil, which comprises electrolyzing.
(2)有機溶媒が芳香族炭化水素であることを特徴とす
る特許請求の範囲第1項に記載のアルミニウム電解箔の
製造方法。
(2) The method for producing aluminum electrolytic foil according to claim 1, wherein the organic solvent is an aromatic hydrocarbon.
(3)有機溶媒の配合割合が10〜75vol%である
ことを特徴とする特許請求の範囲第1項に記載のアルミ
ニウム電解箔の製造方法。
(3) The method for producing aluminum electrolytic foil according to claim 1, wherein the blending ratio of the organic solvent is 10 to 75 vol%.
(4)乾燥無酸素雰囲気中で直流電流もしくはパルス電
流により、浴温0〜150℃、電流密度0.1〜30A
/dm^2で電解することを特徴とする特許請求の範囲
第1項に記載のアルミニウム電解箔の製造方法。
(4) Using direct current or pulse current in a dry oxygen-free atmosphere at a bath temperature of 0 to 150°C and a current density of 0.1 to 30 A.
The method for producing aluminum electrolytic foil according to claim 1, characterized in that electrolysis is carried out at /dm^2.
(5)陽極にアルミニウム製陽極を使用することを特徴
とする特許請求の範囲第1項に記載のアルミニウム電解
箔の製造方法。
(5) The method for manufacturing an aluminum electrolytic foil according to claim 1, characterized in that an aluminum anode is used as the anode.
JP26239587A 1987-10-17 1987-10-17 Production of electrolytic aluminum foil Pending JPH01104791A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26239587A JPH01104791A (en) 1987-10-17 1987-10-17 Production of electrolytic aluminum foil

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26239587A JPH01104791A (en) 1987-10-17 1987-10-17 Production of electrolytic aluminum foil

Publications (1)

Publication Number Publication Date
JPH01104791A true JPH01104791A (en) 1989-04-21

Family

ID=17375170

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26239587A Pending JPH01104791A (en) 1987-10-17 1987-10-17 Production of electrolytic aluminum foil

Country Status (1)

Country Link
JP (1) JPH01104791A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011001932A1 (en) 2009-06-29 2011-01-06 日立金属株式会社 Method for manufacturing aluminum foil
WO2012063920A1 (en) 2010-11-11 2012-05-18 日立金属株式会社 Method for producing aluminium foil
WO2013129479A1 (en) 2012-02-29 2013-09-06 日立金属株式会社 Method for preparing low-melting-point plating solution for electrical aluminum plating, plating solution for electrical aluminum plating, method for producing aluminum foil, and method for lowering melting point of plating solution for electrical aluminum plating
WO2014045986A1 (en) * 2012-09-18 2014-03-27 住友電気工業株式会社 Method for manufacturing aluminum film and method for manufacturing aluminum foil
WO2014057747A1 (en) * 2012-10-12 2014-04-17 住友電気工業株式会社 Process for manufacturing aluminum foil and apparatus for manufacturing aluminum foil
JP2014075205A (en) * 2012-10-03 2014-04-24 Hitachi Metals Ltd Power storage device
WO2015125900A1 (en) * 2014-02-20 2015-08-27 日立金属株式会社 Electrolytic aluminum foil, production method therefor, collector for power storage device, electrode for power storage device, and power storage device
JP2017048444A (en) * 2015-09-04 2017-03-09 住友電気工業株式会社 Aluminum foil and method for producing the same

Cited By (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2450476A4 (en) * 2009-06-29 2014-01-22 Hitachi Metals Ltd PROCESS FOR PRODUCING ALUMINUM SHEET
WO2011001932A1 (en) 2009-06-29 2011-01-06 日立金属株式会社 Method for manufacturing aluminum foil
CN102471909A (en) * 2009-06-29 2012-05-23 日立金属株式会社 Method for manufacturing aluminum foil
US9219279B2 (en) 2009-06-29 2015-12-22 Hitachi Metals, Ltd. Method for producing aluminum foil
JP2014051743A (en) * 2009-06-29 2014-03-20 Hitachi Metals Ltd Aluminium foil
CN103210123B (en) * 2010-11-11 2016-03-16 日立金属株式会社 Manufacturing method of aluminum foil
US9267216B2 (en) 2010-11-11 2016-02-23 Hitachi Metals Ltd. Method for producing aluminum foil
JP5516751B2 (en) * 2010-11-11 2014-06-11 日立金属株式会社 Method for producing aluminum foil
WO2012063920A1 (en) 2010-11-11 2012-05-18 日立金属株式会社 Method for producing aluminium foil
CN103210123A (en) * 2010-11-11 2013-07-17 日立金属株式会社 Method for producing aluminium foil
WO2013129479A1 (en) 2012-02-29 2013-09-06 日立金属株式会社 Method for preparing low-melting-point plating solution for electrical aluminum plating, plating solution for electrical aluminum plating, method for producing aluminum foil, and method for lowering melting point of plating solution for electrical aluminum plating
KR20140129342A (en) 2012-02-29 2014-11-06 히타치 긴조쿠 가부시키가이샤 Method for preparing low-melting-point plating solution for electrical aluminum plating, plating solution for electrical aluminum plating, method for producing aluminum foil, and method for lowering melting point of plating solution for electrical aluminum plating
WO2014045986A1 (en) * 2012-09-18 2014-03-27 住友電気工業株式会社 Method for manufacturing aluminum film and method for manufacturing aluminum foil
JPWO2014045986A1 (en) * 2012-09-18 2016-08-18 住友電気工業株式会社 Method for producing aluminum film and method for producing aluminum foil
CN104053824A (en) * 2012-09-18 2014-09-17 住友电气工业株式会社 Aluminum film manufacturing method and aluminum foil manufacturing method
US9297091B2 (en) 2012-09-18 2016-03-29 Sumitomo Electric Industries, Ltd. Method for producing aluminum film and method for producing aluminum foil
JP2014075205A (en) * 2012-10-03 2014-04-24 Hitachi Metals Ltd Power storage device
JP2014080632A (en) * 2012-10-12 2014-05-08 Sumitomo Electric Ind Ltd Production method of aluminum foil and production apparatus of aluminum foil
WO2014057747A1 (en) * 2012-10-12 2014-04-17 住友電気工業株式会社 Process for manufacturing aluminum foil and apparatus for manufacturing aluminum foil
JP2015155565A (en) * 2014-02-20 2015-08-27 日立金属株式会社 Electrolytic aluminum foil, production method thereof, collector for storage device, electrode for storage device and storage device
WO2015125900A1 (en) * 2014-02-20 2015-08-27 日立金属株式会社 Electrolytic aluminum foil, production method therefor, collector for power storage device, electrode for power storage device, and power storage device
EP3109345A4 (en) * 2014-02-20 2017-11-01 Hitachi Metals, Ltd. Electrolytic aluminum foil, production method therefor, collector for power storage device, electrode for power storage device, and power storage device
US9991519B2 (en) 2014-02-20 2018-06-05 Hitachi Metals, Ltd. Electrolytic aluminum foil, production method therefor, current collector for electrical storage device, electrode for electrical storage device, and electrical storage device
JP2017048444A (en) * 2015-09-04 2017-03-09 住友電気工業株式会社 Aluminum foil and method for producing the same

Similar Documents

Publication Publication Date Title
JP2001505955A (en) Copper layer electrolytic deposition method
US3522021A (en) Process for metalliding aluminum surfaces
EP2855738B1 (en) Additives for producing copper electrodeposits having low oxygen content
US3167403A (en) Base materials coated with an alloy of aluminum and manganese
JPH01104791A (en) Production of electrolytic aluminum foil
US3489539A (en) Manganiding
JPS6411719B2 (en)
JPH049493A (en) Method for electrolytically tinning steel sheet
JPH0613758B2 (en) Electro aluminum plating method
US4478692A (en) Electrodeposition of palladium-silver alloys
JP2006316328A (en) Method for manufacturing two-layer flexible copper-clad laminate
EP0323520A1 (en) Process for electroplating metal plate with aluminum
US4465563A (en) Electrodeposition of palladium-silver alloys
EP0207244A2 (en) Electrodeposited copper foil
US3814673A (en) Process for tantalliding and niobiding base metal compositions
US3729396A (en) Rhodium plating composition and method for plating rhodium
US3497426A (en) Manufacture of electrode
JPH05148680A (en) Method for purifying aluminum electroplating bath and plating method
JP2540110B2 (en) Electro aluminum plating method
US3479159A (en) Process for titaniding base metals
JP2732972B2 (en) Reflow tin or reflow tin alloy plating bath
JP2657991B2 (en) Electric aluminum plating bath and plating method using the bath
JPH02254188A (en) Method for electrolyzing copper chloride solution
JP2529557B2 (en) Lead alloy insoluble anode
JPH0280589A (en) Tungsten electroplating bath and plating method using the bath