JPH01127006A - Liquid circulation filter - Google Patents
Liquid circulation filterInfo
- Publication number
- JPH01127006A JPH01127006A JP28516987A JP28516987A JPH01127006A JP H01127006 A JPH01127006 A JP H01127006A JP 28516987 A JP28516987 A JP 28516987A JP 28516987 A JP28516987 A JP 28516987A JP H01127006 A JPH01127006 A JP H01127006A
- Authority
- JP
- Japan
- Prior art keywords
- air
- filter
- reservoir tank
- liquid
- bubbles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 34
- 238000001914 filtration Methods 0.000 claims abstract description 9
- 239000004065 semiconductor Substances 0.000 claims abstract description 4
- 239000000126 substance Substances 0.000 claims description 28
- 235000012431 wafers Nutrition 0.000 claims description 2
- 238000012993 chemical processing Methods 0.000 claims 1
- 239000012528 membrane Substances 0.000 abstract description 11
- 230000008595 infiltration Effects 0.000 abstract 1
- 238000001764 infiltration Methods 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 229940079593 drug Drugs 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 241000218645 Cedrus Species 0.000 description 1
- 241001214714 Niea Species 0.000 description 1
- 241000270666 Testudines Species 0.000 description 1
- 241000981595 Zoysia japonica Species 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Landscapes
- Degasification And Air Bubble Elimination (AREA)
- Weting (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、半導体ウニ八にウェットエツチング等の薬液
処理を施す工程において、この薬液をろ過器を介して循
環させろ装置に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to an apparatus for circulating a chemical solution through a filter in a process of subjecting a semiconductor surface to a chemical treatment such as wet etching.
（従来の技術）
従来の技術として、昭和６２年９月１６日提出の明細書
に開示した薬液循環ろ過装置を説明する。(Prior Art) As a conventional technology, a chemical liquid circulation filtration device disclosed in a specification submitted on September 16, 1988 will be described.
第２図において、半導体ウェハを収容した処理槽１０２
に薬液１０１が供給される。処理槽１０２からあふれた
薬液１０１は受液槽１０３に一旦貯えられた後、制御弁
１２０を有する排出管１１０を介してポンプ１３０に吸
引される。In FIG. 2, a processing tank 102 containing semiconductor wafers
The chemical solution 101 is supplied to the. The chemical solution 101 overflowing from the processing tank 102 is temporarily stored in the liquid receiving tank 103 and then sucked into the pump 130 via a discharge pipe 110 having a control valve 120.
気泡が排出管１１０内に混入し、あるいは排出管１１０
内で発泡した場合、これらの気泡は薬液１０１と共にエ
ア溜タンク１３１に送り込まれ、タンク１３１内の液面
１３４は徐々に押し下げられる。Air bubbles may enter the discharge pipe 110 or the discharge pipe 110
When bubbles are generated inside, these bubbles are sent into the air reservoir tank 131 together with the chemical solution 101, and the liquid level 134 inside the tank 131 is gradually pushed down.
液面１３４が液面下位センサ１３５の位置まで下降する
と、液面コントローラ１３７に信号が伝えられエア抜き
弁１２３が開く。エア抜き弁１２３が開（と、エアは制
御弁１２１を有するエア抜き管１１１を経てミストと共
に受液槽１０３へ還元され、液面１３４は徐々に上昇す
る。When the liquid level 134 falls to the position of the lower liquid level sensor 135, a signal is transmitted to the liquid level controller 137 and the air vent valve 123 is opened. When the air bleed valve 123 is opened, the air is returned to the liquid receiving tank 103 along with the mist through the air bleed pipe 111 having the control valve 121, and the liquid level 134 gradually rises.
液Ｍ１３４が液面上位センサ１３６に達すると、液面コ
ントローラ１３７に信号が伝えられエア抜き弁１２３が
閉じる。When the liquid M134 reaches the upper liquid level sensor 136, a signal is transmitted to the liquid level controller 137 and the air bleed valve 123 is closed.
以上の動作を繰り返すことにより、ろ過器２０３への隼
泡の侵入を抑えるものである。By repeating the above operations, it is possible to suppress the intrusion of bubbles into the filter 203.
（発明が解決しようとする問題点）
第３図に上記装置のエア溜タンク１３１及びろ過器１３
２を詳細に示す。(Problems to be Solved by the Invention) Figure 3 shows the air reservoir tank 131 and filter 13 of the above device.
2 is shown in detail.
ポンプから送りこまれた薬液１０１は、エフ溜タンク１
３１の薬液導入部１４０より下方に勢いよく導入される
。このとき気泡１５１も液流と共に液面１３４の下へ侵
入する。気泡１５１は上昇して液面１３４に達するが、
一部の深く侵入した気泡１５２はそのままろ過器１３２
内へ送りこまれる。The chemical solution 101 sent from the pump is transferred to the F reservoir tank 1.
The chemical liquid is introduced downward from the chemical liquid introduction part 140 of No. 31 with force. At this time, the air bubbles 151 also enter below the liquid surface 134 along with the liquid flow. The bubbles 151 rise and reach the liquid level 134, but
Some of the air bubbles 152 that have penetrated deeply remain in the filter 132.
sent inside.
ろ過器１３２内へ導入された気泡は上方に集まって気泡
溜り１５３を形成するが、乱流により気泡溜り１５３か
ら分離した気泡１５４がフィルタ膜１３３に侵入し、膜
面に吸着され、ろ。The bubbles introduced into the filter 132 gather upward to form a bubble reservoir 153, but due to turbulence, bubbles 154 separated from the bubble reservoir 153 enter the filter membrane 133, are adsorbed on the membrane surface, and are filtered.
このようにして、フィルタ膜１３３のろ過面積が減少す
るエアロツク現象が起り、薬ｗ！１１０１の循環量が低
下するという問題がある。In this way, an aerobic phenomenon occurs in which the filtration area of the filter membrane 133 decreases, causing the drug w! There is a problem that the circulation amount of 1101 decreases.
本発明は、ろ過器内に気泡溜りが発生する欠点を除去し
、耐エアロツク性が向上した装置を提供することを目的
とする。SUMMARY OF THE INVENTION An object of the present invention is to provide a device which eliminates the drawback of air bubbles forming inside a filter and has improved aerodynamic resistance.
（問題点を解決するための手段）
上記問題点を解決するため本発明の薬液循環ろ過装置は
、エア抜き口を有するろ過器と、前記ろ過器の前段に接
続されたエア溜タンクと、前記ろ過器のエア抜き口とエ
ア溜タンクの薬液導入部との間に接続されたエア還元管
とを有する。(Means for Solving the Problems) In order to solve the above problems, the chemical solution circulation filtration device of the present invention includes: a filter having an air vent; an air reservoir tank connected to the front stage of the filter; It has an air return pipe connected between the air vent of the filter and the chemical solution introduction part of the air reservoir tank.
（作 用）
本発明によれば、ろ過器のエア抜き口からエア溜タンク
の薬液導入部へ向かう循環流が発生する。(Function) According to the present invention, a circulating flow is generated from the air vent of the filter toward the chemical solution introduction part of the air reservoir tank.
したがって、ろ過器内に混入し、あるいはろ過器内で発
泡した気泡は、この循環流によりエア還元管を通ってエ
ア溜タンクへ還元される。Therefore, the air bubbles that have entered the filter or bubbled inside the filter are returned to the air reservoir tank through the air return pipe by this circulating flow.
（実施例） 本発明の薬液循環装置の一実施例を第１図に示す。(Example) An embodiment of the chemical circulation device of the present invention is shown in FIG.
第１図においてこの装置は、従来装置と同様に薬液１０
１をろ過するろ過器３と、このろ過器ａの前段に接続さ
れたエア溜タンク１とを有する。In FIG. 1, this device has a chemical solution of 10
1, and an air reservoir tank 1 connected to the front stage of the filter a.
エア溜タンク１は液面上位センサ１５、液面下位センサ
１６及び液面コントローラ１９を有し、液面２の位置を
一定範囲内に制御する。液面センサとして、例えば電極
センサが用いられる。The air reservoir tank 1 has an upper liquid level sensor 15, a lower liquid level sensor 16, and a liquid level controller 19, and controls the position of the liquid level 2 within a certain range. For example, an electrode sensor is used as the liquid level sensor.
ろ過器３はフィルタ膜４を内蔵し、上部にエア抜き口１
７が設けられている。The filter 3 has a built-in filter membrane 4 and an air vent 1 at the top.
7 is provided.
ろ過器３のエア抜き口１７とエア溜タンク１の薬液導入
部７との間に、エア還元管５が接続されている。ここで
、液流の速い薬液導入部７側が液流の遅いエア抜きロ１
７側よりも低圧なので、ベー゛ルヌーイの法則によ怜、
エア抜き口１７から薬液−゛導入部７へ向かう循環流１
８が発生する。An air return pipe 5 is connected between the air vent 17 of the filter 3 and the chemical solution introduction part 7 of the air reservoir tank 1. Here, the chemical solution introduction part 7 side where the liquid flow is fast is the air vent hole 1 where the liquid flow is slow.
Since the pressure is lower than that on the 7th side, Beernoulli's law follows.
Circulating flow 1 from the air vent 17 to the chemical solution introduction section 7
8 occurs.
ろ過器３内に混入し、あるいはろ過器３内で発泡した気
泡１１は、循環流１８によりエア還元管５を通ってエア
溜タンク１へ還元される。Air bubbles 11 that have entered the filter 3 or bubbled inside the filter 3 are returned to the air reservoir tank 1 through the air return pipe 5 by the circulating flow 18 .
なお、本実施例では、エア溜タンク１への薬液導入を構
方向とし、さらに導入された薬液を乱流防止板６に当て
て気泡１０の下方向への深い侵入り上説明したように、
本発明によれば、ろ過器内に混入し、あるいはろ過器内
で発泡した気泡は、エア還元管を通ってエア溜タンクへ
還元される。In this embodiment, the chemical solution is introduced into the air reservoir tank 1 in the construction direction, and the introduced chemical solution hits the turbulence prevention plate 6 to cause the bubbles 10 to penetrate deeply downward, as described above.
According to the present invention, air bubbles that have entered the filter or bubbled inside the filter are returned to the air reservoir tank through the air return pipe.
したがって、フィルタ膜への気泡の侵入が抑えられ、フ
ィルタ膜のろ過面積が減少するエアロツク現象を防ぐこ
とができる。Therefore, the intrusion of air bubbles into the filter membrane is suppressed, and the aerodynamic phenomenon in which the filtration area of the filter membrane is reduced can be prevented.
第１図は本発明の実施例の構成図、第２図及び第３図は
従来の薬液循環処理装置の構成図。
１・・・エア溜タンク、３・・・ろ過器、４・・・フィ
ルタ膜、５・・・エア還元管、６・・・乱流防止板、７
・・・薬液導入部、１０．１１・・・気泡、１７・・・
エア抜き口、１８・・・循環流。
特許出願人 沖電気工業株式会社
２ト ４凸 ｐハ リ 吹ｉ−ｅ ４ｉｔＪ扇上図
ノｏｌ：４針浪 １ｊ／ニエア云蒙タ
ン１７（＋ ２ 二％ Ｉｌｉ’ 糟／ ３ Ｚ ：ろ
！に）０３：咬飛オ骨 ノ３り：ｊ復？
ｉＪ：ＩントＤ−ラノ３６： ｆシフ″
／４毘鬼ψ逓撓３亀５杉ろ瘍装工
昂 ２ 図
り芝泳ｆ）’Ｊ汀乏１角シ裏ろ１褒ギ
第３圓
手続補正書（睦）
１、事件の表示
昭和６２年 特 許 願第２８５１６９号２、発明の
名称
薬液循環ろ過装置
３、補正をする者
事件との関係 特 許 出 願 人住 所（
〒１０５） 東京都港区虎ノ門１丁目７番１２号４、
代理人。
住 所（〒１０８） 東京都港区芝浦４丁目１０番３
号５、補正の対象 明細書中「発明の詳細な説明」の
欄、及び図面
別紙の通り一、、、、、；ζＦ障）
６、補正の内容
６、補正の内容
（１）明細書第２頁第１１行目にｒ１３５Ｊとあるの七
ｒ１３６Ｊと補正する。
（２）同書同１頁第２０行目から第３頁第１行目にｒ２
０３Ｊとあるのｉ「１３２ Ｊと補正する。
（３）図面「第２図」を別紙の通υ補正する。
オ劇束。薬；化７省撮ろ遇駿Ｉ
第２図FIG. 1 is a block diagram of an embodiment of the present invention, and FIGS. 2 and 3 are block diagrams of a conventional chemical liquid circulation processing apparatus. DESCRIPTION OF SYMBOLS 1... Air reservoir tank, 3... Filter, 4... Filter membrane, 5... Air return pipe, 6... Turbulence prevention plate, 7
...Chemical solution introduction part, 10.11...Bubble, 17...
Air vent, 18...Circulation flow. Patent Applicant Oki Electric Industry Co., Ltd. 2t 4 convex p Hari blow ie 4itJ fan diagram nol: 4 needle wave 1j / Niea Yunmongtan 17 (+ 2 2% Ili' 糟 / 3 Z: Ro! ni) 03: Kitehi Obone ノ3ri: J revenge?
iJ: Into D-Rano 36: f shift'' /4 Biki ψ Shift 3 Turtle 5 Cedar filter sopping 2 Utsuri Shiba swim f)'J 汀po 1 corner shi Ura 1 reward 3rd round procedure Written amendment (Mutsu) 1. Indication of the case 1985 Patent Application No. 285169 2. Name of the invention Chemical liquid circulation filtration device 3. Relationship with the case of the person making the amendment Patent application Person's address (
105) 1-7-12-4 Toranomon, Minato-ku, Tokyo.
agent. Address (〒108) 4-10-3 Shibaura, Minato-ku, Tokyo
No. 5, Subject of amendment As per the "Detailed Description of the Invention" column in the specification and attached drawings, etc.) 6. Contents of amendment 6. Contents of amendment (1) Specification No. On page 2, line 11, r135J is corrected to r136J. (2) r2 from line 20 on page 1 of the same book to line 1 on page 3 of the same book.
03J is corrected to ``132 J.'' (3) The drawing ``Figure 2'' is corrected according to the attached sheet. Oh drama bunch. Medicine; 7th Ministry of Chemical Industry, Labor and Welfare I Figure 2
Claims (1)
再び前記薬液処理に提供する薬液循環ろ過装置において
、 エア抜き口を有するろ過器と、前記ろ過器の前段に接続
されたエア溜タンクと、前記エア抜き口と前記エア溜タ
ンクの薬液導入部との間に接続されたエア還元管とを有
する薬液循環ろ過装置。[Claims] Filtering a chemical solution provided for chemical processing of semiconductor wafers,
The chemical liquid circulation filtration device provided again for the chemical liquid treatment includes: a filter having an air vent, an air reservoir tank connected to the front stage of the filter, and a chemical liquid inlet between the air vent and the air reservoir tank. and an air return pipe connected between the chemical solution circulation filtration device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28516987A JPH01127006A (en) | 1987-11-13 | 1987-11-13 | Liquid circulation filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28516987A JPH01127006A (en) | 1987-11-13 | 1987-11-13 | Liquid circulation filter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01127006A true JPH01127006A (en) | 1989-05-19 |
Family
ID=17687991
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28516987A Pending JPH01127006A (en) | 1987-11-13 | 1987-11-13 | Liquid circulation filter |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01127006A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0481605U (en) * | 1990-11-27 | 1992-07-16 | ||
| JP2020088160A (en) * | 2018-11-26 | 2020-06-04 | 株式会社Ｓｃｒｅｅｎホールディングス | Substrate processing equipment |
-
1987
- 1987-11-13 JP JP28516987A patent/JPH01127006A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0481605U (en) * | 1990-11-27 | 1992-07-16 | ||
| JP2020088160A (en) * | 2018-11-26 | 2020-06-04 | 株式会社Ｓｃｒｅｅｎホールディングス | Substrate processing equipment |
| WO2020110663A1 (en) * | 2018-11-26 | 2020-06-04 | 株式会社Ｓｃｒｅｅｎホールディングス | Substrate processing device |
| TWI724641B (en) * | 2018-11-26 | 2021-04-11 | 日商斯庫林集團股份有限公司 | Substrate processing apparatus |
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