JPH01129981A - Method for metallizing enamel strongly bonded state and metallized enamel - Google Patents
Method for metallizing enamel strongly bonded state and metallized enamelInfo
- Publication number
- JPH01129981A JPH01129981A JP63227666A JP22766688A JPH01129981A JP H01129981 A JPH01129981 A JP H01129981A JP 63227666 A JP63227666 A JP 63227666A JP 22766688 A JP22766688 A JP 22766688A JP H01129981 A JPH01129981 A JP H01129981A
- Authority
- JP
- Japan
- Prior art keywords
- enamel
- metallized
- carried out
- roughening
- wetting agent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 210000003298 dental enamel Anatomy 0.000 title claims abstract description 32
- 238000000034 method Methods 0.000 title claims description 18
- 230000004913 activation Effects 0.000 claims abstract description 8
- 238000007788 roughening Methods 0.000 claims abstract description 8
- 239000000080 wetting agent Substances 0.000 claims abstract description 7
- 125000000129 anionic group Chemical group 0.000 claims abstract description 3
- 125000002091 cationic group Chemical group 0.000 claims abstract description 3
- 239000000126 substance Substances 0.000 claims abstract 3
- 239000000243 solution Substances 0.000 claims description 14
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 8
- 239000002253 acid Substances 0.000 claims description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 4
- 230000001143 conditioned effect Effects 0.000 claims description 4
- 229910052763 palladium Inorganic materials 0.000 claims description 4
- 150000003839 salts Chemical class 0.000 claims description 4
- 239000002585 base Substances 0.000 claims description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 2
- 239000007864 aqueous solution Substances 0.000 claims description 2
- 238000009210 therapy by ultrasound Methods 0.000 claims 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims 1
- 229910019142 PO4 Inorganic materials 0.000 claims 1
- 150000007513 acids Chemical class 0.000 claims 1
- 229910001854 alkali hydroxide Inorganic materials 0.000 claims 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 claims 1
- 239000000908 ammonium hydroxide Substances 0.000 claims 1
- 229910052500 inorganic mineral Inorganic materials 0.000 claims 1
- 239000011707 mineral Substances 0.000 claims 1
- 150000007522 mineralic acids Chemical class 0.000 claims 1
- 150000007524 organic acids Chemical class 0.000 claims 1
- 239000010452 phosphate Substances 0.000 claims 1
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 claims 1
- 230000003750 conditioning effect Effects 0.000 abstract description 7
- 239000000463 material Substances 0.000 abstract description 3
- 229910052751 metal Inorganic materials 0.000 description 12
- 239000002184 metal Substances 0.000 description 12
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 8
- 229910052802 copper Inorganic materials 0.000 description 8
- 239000010949 copper Substances 0.000 description 8
- LDDQLRUQCUTJBB-UHFFFAOYSA-O azanium;hydrofluoride Chemical compound [NH4+].F LDDQLRUQCUTJBB-UHFFFAOYSA-O 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 229910000831 Steel Inorganic materials 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- 238000002604 ultrasonography Methods 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 238000001465 metallisation Methods 0.000 description 3
- 238000000527 sonication Methods 0.000 description 3
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- 239000012190 activator Substances 0.000 description 2
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- RILZRCJGXSFXNE-UHFFFAOYSA-N 2-[4-(trifluoromethoxy)phenyl]ethanol Chemical compound OCCC1=CC=C(OC(F)(F)F)C=C1 RILZRCJGXSFXNE-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 241000234435 Lilium Species 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 239000010431 corundum Substances 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 150000004673 fluoride salts Chemical class 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000002241 glass-ceramic Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000002739 metals Chemical group 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- -1 palladium ions Chemical class 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000002525 ultrasonication Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1851—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
- C23C18/1872—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
- C23C18/1886—Multistep pretreatment
- C23C18/1893—Multistep pretreatment with use of organic or inorganic compounds other than metals, first
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
- C03C17/10—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals by deposition from the liquid phase
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1851—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
- C23C18/1855—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by mechanical pretreatment, e.g. grinding, sanding
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/05—Insulated conductive substrates, e.g. insulated metal substrate
- H05K1/053—Insulated conductive substrates, e.g. insulated metal substrate the metal substrate being covered by an inorganic insulating layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/381—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the substrate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
Landscapes
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- ing And Chemical Polishing (AREA)
- Chemically Coating (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明はエナメルを付着強固にメタライジングする方法
に関する。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method for metallizing enamel in a highly adhesive manner.
従来の技術
付着強固な金、鵡層をエナメルに施すことは既に公知で
ある。これは肉厚ペーストを焼付けることにより行なう
(西ドイツ国特許公開第6535972号明細書)。こ
の場合、メタライソングの焼付けのための高い温度並び
に好適な金属ペーストの製造に経費がかかることが欠点
である。BACKGROUND OF THE INVENTION 2. Description of the Prior Art It is already known to apply a strong gold layer to enamel. This is done by baking a thick paste (DE 65 35 972). Disadvantages here include the high temperatures for baking the metal lily songs and the complicated production of suitable metal pastes.
プリント配線構造のいくつかの平面を金属的に結合する
には、前記のペーストは殆んど好適ではない。一般に、
ペーストは低い導電性を呈し、層厚(導体高さ)は最高
10μmに制限されている。Said pastes are hardly suitable for metallically bonding several planes of a printed wiring structure. in general,
The paste exhibits low conductivity and the layer thickness (conductor height) is limited to a maximum of 10 μm.
発明が解決しようとする課題
本発明の課題は、工業的に簡単な、エナメルの付着強固
なメタライソングを可能にする方法を開示することであ
る。OBJECTS OF THE INVENTION An object of the present invention is to disclose an industrially simple method that enables metal ligatures with strong enamel adhesion.
課題を解決するための手段
この課題は特許請求の範囲に記載の方法により解決され
る。Means for Solving the Problem This problem is solved by the method described in the claims.
本発明方法により、エナメル製の任意の形状の工材、即
ち凡打及び管材を付着強固にメタライジングすることが
でき、このことは工業的に極めて重要である。更に、引
続いて行なう電気メツキにより任意の金属又は金属層を
その都度所望の品質及び厚さで施すことができるので、
エナメル表面上に任意の金属構造を形成することが初め
て可能である。By the method of the present invention, it is possible to firmly adhere and metallize enamel workpieces of any shape, ie, flat and pipe materials, which is extremely important industrially. Furthermore, any metal or metal layer can be applied in each case with the desired quality and thickness by subsequent electroplating;
For the first time, it is possible to form arbitrary metallic structures on the enamel surface.
エナメルとしては、化学的にはポリ珪酸の塩でありかつ
425℃を1廻る温度で焼付けることにより鋼又は銅の
ような金属と接合している特殊ガラスを使用することが
できる。この塩の閉鎖構造は一部アルカリー及び/又は
アルカリ土類酸化物により開放されている。アルミニウ
ム、鉛、硼素、コバルト、ニッケル、チタン、亜鉛及び
/又はジルコニウムのような多゛価元素の酸化物も同様
にあるいは硫化物、弗化物及び/又は砒化物のような無
機添加物も珪酸網状構造中に導入す。ることかできる。As the enamel, it is possible to use special glasses which are chemically salts of polysilicic acid and which are bonded to metals such as steel or copper by baking at temperatures below 425°C. The closed structure of this salt is partially opened by alkali and/or alkaline earth oxides. Oxides of multivalent elements such as aluminium, lead, boron, cobalt, nickel, titanium, zinc and/or zirconium or inorganic additives such as sulfides, fluorides and/or arsenides can also be used in the silicic acid network. Introduced into the structure. I can do that.
エナメルはガラス状構造又は部分結晶構造で存在してよ
い。Enamels may be present in a glassy or partially crystalline structure.
エナメル表面の粗面化は機械的に及び/又は化学的に行
なう。機械化学的粗面化は、初めにエナメル表面をサン
ドブラスト掛けにより拡大し、かつその後エツチング溶
液、例えば弗化水素アンモニウム溶液を用い・て機械的
応力又は微小亀裂に沿って狭幅溝をエナメル中にエツチ
ングして実施することができ有利である。一般に、必要
な微小粗面性はエツチング工程だけで達成され、このた
めには特に弗化水素アンモニウム溶液が好適であり、場
合によってはこれに引続いて酸混合物中での処理を行な
ってもよい。Roughening of the enamel surface is carried out mechanically and/or chemically. Mechanochemical roughening involves first enlarging the enamel surface by sandblasting and then using an etching solution, e.g. ammonium hydrogen fluoride solution, to create narrow grooves in the enamel along mechanical stresses or microcracks. Advantageously, it can be carried out by etching. In general, the required microroughness is achieved by an etching step alone, for which ammonium hydrogen fluoride solutions are particularly suitable, and this may optionally be followed by treatment in acid mixtures. .
粗面化に引続いて超音波処理を行ない、これはルーズな
材料をエナメル表面から除去するのに有用である。次に
析出させる金属のエナメル表面に対する十分な付着強さ
にはこの工程が無条件に必要である。超音波エネルギー
は既にエツチング工程の間にあるいはその後で、例えば
洗浄工程で、超音波発振器を包含する浴中に浸漬するこ
とにより工材に与える。たいていの場合に例えば5分間
という短い滞留時間で十分である。超音波処理は室温で
あるいは若干高めた温度で実施する。Roughening is followed by sonication, which is useful for removing loose material from the enamel surface. This step is absolutely necessary for sufficient adhesion strength of the subsequently deposited metal to the enamel surface. Ultrasonic energy is applied to the workpiece already during or after the etching process, for example in a cleaning process, by immersion in a bath containing an ultrasonic generator. Short residence times of, for example, 5 minutes are sufficient in most cases. Ultrasonication is carried out at room temperature or at a slightly elevated temperature.
粗面化したエナメルを後で活性化するために湿潤剤で状
態調整する。このためには約1%溶液のアニオン性・カ
チオン性並びに非イオン性の湿潤剤が好適である。溶液
の両値は絶対的なものではない。良好な結果は、2%の
硫酸である状態調整溶液で達成することができる。状態
調整時間には5分間が最適である。状態調整は室温又は
若干高めた温度で行なう。The roughened enamel is conditioned with a wetting agent for subsequent activation. Approximately 1% solutions of anionic, cationic and nonionic wetting agents are suitable for this purpose. Both values of the solution are not absolute. Good results can be achieved with a conditioning solution that is 2% sulfuric acid. The optimum conditioning time is 5 minutes. Conditioning is performed at room temperature or at a slightly elevated temperature.
この状態調整に引続いて表面の活性化をパラジウム核に
よ9行なう。このために、殊に…値が10.5であるパ
ラジウム錯体の水溶液を使用し、これによりエナメル表
面は活性剤の作用を受けない。活性化は若干高められた
温度(約40°C)で行ない、優れた処理時間はこの場
合にも約5分間である。パラジウムイオンの金属核への
還元後にエナメル表面を外部電流のない還元浴中で化学
的にメタライジングすることができる。This conditioning is followed by activation of the surface with palladium nuclei. For this purpose, in particular an aqueous solution of a palladium complex with a value of 10.5 is used, so that the enamel surface is not affected by the activator. Activation is carried out at a slightly elevated temperature (approximately 40° C.), and the preferred treatment time is again approximately 5 minutes. After the reduction of palladium ions to metal nuclei, the enamel surface can be chemically metallized in a reduction bath without external current.
本発明に、c9メタライジングしたエナメル部材は電気
工学及び電子工学で使用される。According to the invention, the C9 metallized enamel parts are used in electrical and electronic engineering.
実施例
例 1
ガラス状のコバルト含有エナメルで被覆した付
鋼心材を粒径50μmの鋼玉粒子を吹けて、エナメル表
面を均一に艶消しした。引続いて、このように処理し几
工材を室温で5分間弗化水素アンモニウムからの5易−
溶液中で超音波処理下にエツチングし、超音波下にすす
いで付着している弗化物を除去しかつ150℃で乾燥さ
せた。その後、部材を酸のコンディショナー中、40°
Cで5分間処理して、活性化の用意をして、中間洗浄後
に活性剤溶液中に5分間浸漬することにより活性化し、
洗浄し、表面上のPd”+を好適な還元剤を用いて5分
間で金属に還元し、次いで化学的に還元して銅PI3μ
mで被覆した。Example 1 A steel core coated with glassy cobalt-containing enamel was blown with corundum particles having a particle size of 50 μm to uniformly matt the enamel surface. Subsequently, the wood treated in this way was treated with a 50% solution of ammonium hydrogen fluoride for 5 minutes at room temperature.
It was etched in solution under sonication, rinsed under sonication to remove adhering fluoride and dried at 150°C. The parts were then placed in an acid conditioner at 40°.
Prepared for activation by treatment with C for 5 minutes and activated by immersion in an activator solution for 5 minutes after intermediate washing,
Clean and reduce the Pd''+ on the surface to metal using a suitable reducing agent for 5 minutes and then chemically reduce the copper PI3μ
coated with m.
この金属層はエナメルに対して付着強さ0.75N /
mrti (剥離試験)を有していた。This metal layer has an adhesion strength of 0.75N/
mrti (peel test).
例 2
アルカリ分の少ないエナメルで塗装した銅孔板をアルカ
リ性界面活性剤で脱脂しかつ室温で5分間超音波下に2
%−弗化水素アンモニウム溶液中に浸漬し、引続いて超
音波の作用下に洗浄した。例1に記載したように、表面
を状態調整し、活性化しかつメタライジングした。エナ
メルと銅メツキとの間の付着強さは剥離試験で1.2N
/朋であった。Example 2 A copper hole plate painted with enamel with a low alkali content is degreased with an alkaline surfactant and exposed to ultrasonic waves for 5 minutes at room temperature.
% ammonium hydrogen fluoride solution and subsequently cleaned under the action of ultrasound. The surface was conditioned, activated and metallized as described in Example 1. The adhesion strength between enamel and copper plating was 1.2N in a peel test.
/It was my friend.
例 3 鋼孔版を再結晶ガラスセラミックで電気泳動塗装した。Example 3 The steel hole plate was electrophoretically painted with recrystallized glass ceramic.
この板材を初めに1%−弗化水素アンモニウム溶液で4
0°Cで10分間粗面化し、その後、10%−カセイソ
ーダ中で超音波下に後処理した。エナメルを前記のよう
に状態調整し、活性化しかつメタライジングした。この
メタライジング後に、銅/エナメルー付着強さ0.6
N /朋が測定された。This board was first treated with 1% ammonium hydrogen fluoride solution.
The surface was roughened for 10 minutes at 0°C and then worked up in 10% caustic soda under ultrasound. The enamel was conditioned, activated and metallized as described above. After this metallization, the copper/enamel adhesion strength was 0.6
N/I was measured.
例 4
例6と同様にして絶縁した金属板を初めに5分間フルオ
ル硼酸とメタンスルホン酸(20%)からの混合物を用
いて室温で超音波下に処理しかつ洗浄した。状態調整、
活性化及びメタライジング後に付着強さ1.4 N /
朋が測定された。Example 4 A metal plate insulated as in Example 6 was first treated under ultrasound for 5 minutes with a mixture of fluoroboric acid and methanesulfonic acid (20%) at room temperature and cleaned. condition adjustment,
Adhesion strength after activation and metallization 1.4 N/
I was measured.
例 5
鋼孔板をアルカリ分の少ない再結晶エナメルで塗装し、
引続いて洗浄剤のアルカリ性溶液中に浸漬することによ
り脱脂し、かつ超音波作用下に2%−弗化水素アンモニ
ウム溶液中で可溶性にした。表面を洗浄し、状態調整し
かつ活性化した後で化学的に還元してその表面上に3μ
m厚さの銅層を析出させた。この銅表面上にフォトレゾ
ストを積層させかつ原稿を通して露光した。レジストの
現像後に、露出した金属表面を電気メツキにより銅で補
強しかつニッケルと金とからの最終層を電気メツキによ
り施した。レジストを除去しかつベースメタライソング
を除去した後で、このようにして得られた導体板に常用
の配線構造素子を装着した。Example 5 A steel perforated plate is painted with recrystallized enamel with low alkali content,
It was subsequently degreased by immersion in an alkaline solution of a detergent and made soluble in a 2% ammonium hydrogen fluoride solution under ultrasound action. After cleaning, conditioning and activating the surface, chemically reducing the 3μ
A copper layer of m thickness was deposited. A photoresist was laminated onto the copper surface and exposed through the original. After development of the resist, the exposed metal surfaces were reinforced with copper by electroplating and a final layer of nickel and gold was applied by electroplating. After removing the resist and removing the base metallization song, the conductor plate thus obtained was fitted with customary interconnect structure elements.
Claims (11)
にあるいはそれに引続いて超音波処理を行ない、その後
表面を湿潤剤で状態調整し、引続いて活性化し、かつそ
の後化学的にメタライジングすることを特徴とする、エ
ナメルの付着強固なメタライジング法。1. The enamel surface is first roughened, simultaneously with or following this roughening, an ultrasonic treatment is carried out, the surface is then conditioned with a wetting agent, subsequently activated, and then chemically metallized. A metallizing method that provides strong enamel adhesion.
1記載の方法。2. 2. The method according to claim 1, wherein the roughening is carried out mechanically and/or chemically.
請求項2記載の方法。3. 3. The method according to claim 2, wherein the chemical roughening is carried out by the action of acids, bases or salts.
リ又は水酸化アンモニウム及び塩としてリン酸塩又は弗
化物を使用する、請求項3記載の方法。4. 4. The process as claimed in claim 3, wherein the acid is a mineral or organic acid, the base is an alkali hydroxide or ammonium hydroxide, and the salt is a phosphate or a fluoride.
載の方法。5. 2. The method according to claim 1, wherein the ultrasonic treatment is performed using an ultrasonic oscillator.
使用する請求項1記載の方法。8. 2. The method according to claim 1, wherein an anionic, cationic or nonionic wetting agent is used.
。9. 9. A method according to claim 8, wherein the wetting agent is used in a sulfuric acid solution.
記載の方法。10. Claim 1, wherein the activation is carried out using a palladium complex.
Method described.
により製造したメタライジングされたエナメル。11. Metallized enamel produced by the method according to any one of claims 1 to 10.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19873731167 DE3731167A1 (en) | 1987-09-14 | 1987-09-14 | METHOD FOR ADHESIVE METALIZATION OF EMAILS |
| DE3731167.0 | 1987-09-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01129981A true JPH01129981A (en) | 1989-05-23 |
Family
ID=6336172
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63227666A Pending JPH01129981A (en) | 1987-09-14 | 1988-09-13 | Method for metallizing enamel strongly bonded state and metallized enamel |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4948674A (en) |
| EP (1) | EP0307585A3 (en) |
| JP (1) | JPH01129981A (en) |
| DE (1) | DE3731167A1 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3907902A1 (en) * | 1989-03-08 | 1990-09-13 | Siemens Ag | METHOD FOR CHEMICALLY METALLIZING CERAMIC BODIES |
| US5380564A (en) * | 1992-04-28 | 1995-01-10 | Progressive Blasting Systems, Inc. | High pressure water jet method of blasting low density metallic surfaces |
| US10465295B2 (en) * | 2014-05-20 | 2019-11-05 | Alpha Assembly Solutions Inc. | Jettable inks for solar cell and semiconductor fabrication |
| CN108779556B (en) * | 2016-03-25 | 2020-06-12 | 三菱重工发动机和增压器株式会社 | Plating method for fiber-reinforced components |
| CN110423995B (en) * | 2019-08-26 | 2022-01-04 | 惠州市安泰普表面处理科技有限公司 | Stainless steel product barrel plating method and activating solution |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0067257B1 (en) * | 1981-06-15 | 1986-02-05 | Asahi Glass Company Ltd. | Heat radiation reflecting glass and preparation thereof |
| US4532015A (en) * | 1982-08-20 | 1985-07-30 | Phillips Petroleum Company | Poly(arylene sulfide) printed circuit boards |
| DE3332029C2 (en) * | 1982-09-16 | 1994-04-28 | Licentia Gmbh | Process for coating a solid body |
| JPS61209926A (en) * | 1985-03-14 | 1986-09-18 | Hitachi Chem Co Ltd | Process for forming metallic film |
-
1987
- 1987-09-14 DE DE19873731167 patent/DE3731167A1/en not_active Withdrawn
-
1988
- 1988-07-22 EP EP19880111820 patent/EP0307585A3/en not_active Withdrawn
- 1988-09-07 US US07/241,594 patent/US4948674A/en not_active Expired - Fee Related
- 1988-09-13 JP JP63227666A patent/JPH01129981A/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DE3731167A1 (en) | 1989-05-11 |
| EP0307585A2 (en) | 1989-03-22 |
| US4948674A (en) | 1990-08-14 |
| EP0307585A3 (en) | 1990-06-27 |
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