JPH01133732U - - Google Patents
Info
- Publication number
- JPH01133732U JPH01133732U JP2994288U JP2994288U JPH01133732U JP H01133732 U JPH01133732 U JP H01133732U JP 2994288 U JP2994288 U JP 2994288U JP 2994288 U JP2994288 U JP 2994288U JP H01133732 U JPH01133732 U JP H01133732U
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- chamber head
- thin film
- heads
- head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 claims description 2
- 238000004140 cleaning Methods 0.000 claims 1
- 239000012495 reaction gas Substances 0.000 claims 1
- 238000005406 washing Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Description
第１図は本考案の一実施例を示す概略的斜視図
である。
１，２…チヤンバーヘツド、３…環状路、４…
チヤンバーヘツド移動手段、５…半導体ウエハ、
６…薄膜形成部、７…ＣＶＤ生成物除去部、１９
…第１洗浄部、２０…第２洗浄部、２１…乾燥部
。
FIG. 1 is a schematic perspective view showing an embodiment of the present invention. 1, 2...chamber head, 3...ring road, 4...
Chamber head moving means, 5... semiconductor wafer,
6... Thin film forming section, 7... CVD product removing section, 19
...first washing section, 20...second washing section, 21...drying section.
Claims (1)
動させるチヤンバーヘツド移動手段と、 上記環状路に沿つて設けられ、上記複数のチヤ
ンバーヘツドのうち、いずれか移動してきたチヤ
ンバーヘツドに所定の反応ガスを供給して半導体
ウエハ上に所定のＣＶＤ生成物による薄膜を形成
する薄膜形成部と、 上記環状路に沿つて設けられ、上記薄膜形成部
から移動してきたチヤンバーヘツドの内部を洗浄
して、該チヤンバーヘツドの内部に付着している
上記所定のＣＶＤ生成物を除去するＣＶＤ生成物
除去部とを、 備えてなる常圧ＣＶＤ装置。[Claims for Utility Model Registration] A plurality of chamber heads; a chamber head moving means for moving the plurality of chamber heads along a circular path; and a chamber head moving means for moving the plurality of chamber heads provided along the circular path. a thin film forming section that supplies a predetermined reaction gas to the chamber head to form a thin film of a predetermined CVD product on the semiconductor wafer; and an interior of the chamber head that is provided along the annular path and that has moved from the thin film forming section. and a CVD product removing section for cleaning the chamber head and removing the predetermined CVD product adhering to the inside of the chamber head.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2994288U JPH01133732U (en) | 1988-03-07 | 1988-03-07 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2994288U JPH01133732U (en) | 1988-03-07 | 1988-03-07 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01133732U true JPH01133732U (en) | 1989-09-12 |
Family
ID=31254561
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2994288U Pending JPH01133732U (en) | 1988-03-07 | 1988-03-07 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01133732U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06272027A (en) * | 1993-03-17 | 1994-09-27 | Fuji Photo Film Co Ltd | Method for automatically cleaning vacuum deposition tank and device therefor |
-
1988
- 1988-03-07 JP JP2994288U patent/JPH01133732U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06272027A (en) * | 1993-03-17 | 1994-09-27 | Fuji Photo Film Co Ltd | Method for automatically cleaning vacuum deposition tank and device therefor |