JPH01137687A - Gas laser device - Google Patents
Gas laser deviceInfo
- Publication number
- JPH01137687A JPH01137687A JP29727287A JP29727287A JPH01137687A JP H01137687 A JPH01137687 A JP H01137687A JP 29727287 A JP29727287 A JP 29727287A JP 29727287 A JP29727287 A JP 29727287A JP H01137687 A JPH01137687 A JP H01137687A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- electrode pair
- oscillator chamber
- hole
- pin electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
本発明はガスレーザ装置に関し、更に詳しくは、主電極
対間のレーザ放電に先立って、ピン電極対間の放電によ
り発生する紫外光で媒体ガスを予備電離するタイプのガ
スレーザ装置に関する。Detailed Description of the Invention <Industrial Application Field> The present invention relates to a gas laser device, and more specifically, prior to laser discharge between a pair of main electrodes, ultraviolet light generated by a discharge between a pair of pin electrodes is used to stimulate a medium gas. This invention relates to a type of gas laser device that pre-ionizes.
〈従来の技術〉
エキシマ−ガスを媒体ガスとするレーザ装置、いわゆる
エキシマ−レーザ装置では、ガスを高速かつ高密度に励
起する必要があるため、主放電(レーザ放電)に先立っ
て媒体ガスを予備電離することが行われている。<Prior art> In laser devices that use excimer gas as a medium gas, so-called excimer laser devices, it is necessary to excite the gas at high speed and with high density. Ionization is being carried out.
予備電離の方法としては、紫外光予備電離法とX線予備
電離法があるが、市販品としては主として前者の方法が
採用されている。Pre-ionization methods include an ultraviolet light pre-ionization method and an X-ray pre-ionization method, and the former method is mainly used for commercially available products.
第4図に紫外線予備電離法を採用した公知のレーザ装置
の構成例を示す。媒体ガスが充填された発振器チャンバ
41内に、レーザ放電用の主電極対42に加えて、予備
電離用の複数のビン電極対43を配設している。そして
各電極対42.43は図に示すような電荷移行型高圧パ
ルス発生回路に接続され、主電極対42の放電に先立っ
てピン電極対43が自動的にアーク放電し、そのスパー
クによる紫外光により媒体ガスが電離される。すなわち
、コンデンサC0は高電圧H,V、により充電され、サ
イラトロン等のスイッチング素子44がONになるとそ
のコンデンサC3に′充電された電荷がコン≠ンサC2
に移行してゆき、コンデンサC2の電圧が増大してゆく
。コンデンサC2の電圧が主電極対42の放電開始電圧
に達する前に、ピン電極対43にアーク放電が生じ、こ
れに伴う紫外光によって主電極対42間に初期電子が生
成され、その状態で主放電が起こる。なお、45および
46はガス冷却用の熱交換器および主電極対42間に高
速のガス流を生起させるためのクロスフローファンであ
る。FIG. 4 shows an example of the configuration of a known laser device that employs the ultraviolet pre-ionization method. In addition to a main electrode pair 42 for laser discharge, a plurality of bottle electrode pairs 43 for pre-ionization are arranged in an oscillator chamber 41 filled with a medium gas. Each electrode pair 42, 43 is connected to a charge transfer type high-voltage pulse generation circuit as shown in the figure, and the pin electrode pair 43 automatically arc discharges before the main electrode pair 42 discharges, and the spark generates ultraviolet light. ionizes the medium gas. That is, the capacitor C0 is charged with high voltages H and V, and when the switching element 44 such as a thyratron is turned on, the charge charged in the capacitor C3 is transferred to the capacitor C2.
, and the voltage of capacitor C2 increases. Before the voltage of the capacitor C2 reaches the discharge starting voltage of the main electrode pair 42, an arc discharge occurs in the pin electrode pair 43, and the accompanying ultraviolet light generates initial electrons between the main electrode pair 42, and in this state, the main electrode A discharge occurs. Note that 45 and 46 are a heat exchanger for gas cooling and a cross flow fan for generating a high-speed gas flow between the main electrode pair 42.
ところで、以上のようなピン電極対43間のアーク放電
はビン表面を傷つけ、不純物生成の一因となる。この不
純物は発振器チャンバ41内でレーザ光を散乱する等、
レーザ出力低下の原因となり、ガス寿命を短くする。そ
こで、従来、発振器チャンバ41内のガスを循環ポンプ
47で吸引し、低温トラップや静電集塵機、あるいはモ
レキュラーシープ等のガス精製装置48に導き、再び発
振機チャンバ41内に戻す、ガス精製用環流路49を設
けて不純物を除去する対策が採られている。Incidentally, the arc discharge between the pin electrode pair 43 as described above damages the bottle surface and becomes a cause of impurity generation. This impurity scatters the laser light within the oscillator chamber 41, etc.
This causes a decrease in laser output and shortens the gas life. Therefore, conventionally, the gas in the oscillator chamber 41 is sucked by a circulation pump 47, guided to a gas purification device 48 such as a low temperature trap, an electrostatic precipitator, or a molecular sheep, and then returned to the oscillator chamber 41. Measures are taken to remove impurities by providing a channel 49.
〈発明が解決しようとする問題点〉
以上のような従来のガス精製手段では、ある程度の不純
物の除去はできるものの、効率的であるとは言えず、媒
体ガス寿命は依然として短いのが実状である。<Problems to be solved by the invention> Although the conventional gas purification methods described above can remove impurities to a certain extent, they cannot be said to be efficient, and the actual gas life of the medium is still short. .
本発明の目的は、アーク放電により生じた不純物を効率
的に除去し、もって媒体ガスの長寿命化を計ることにあ
る。An object of the present invention is to efficiently remove impurities generated by arc discharge, thereby extending the life of the medium gas.
〈問題点を解決するための手段〉
上記の目的を達成するための構成を、実施例に対応する
第1図〜第3図を参照しつつ説明すると、本発明は、発
振器チャンバ1内の媒体ガスを吸引して不純物を除去し
、再び発振器チャンバ1内に戻すガス精製用環流路10
を設けるとともに、予備電離用のピン電極対3の少くと
も一方(3a)に、その先端から軸方向に沿って伸び、
発振器チャンバ1外に連通ずる孔りを形成し、その孔り
をガス精製用環流路10の吸引側に接続したことによっ
て、特徴づけられる。<Means for Solving the Problems> A configuration for achieving the above object will be described with reference to FIGS. 1 to 3 corresponding to the embodiment. Gas purification circulation path 10 that sucks gas, removes impurities, and returns it back into the oscillator chamber 1
and extending along the axial direction from the tip of at least one (3a) of the pin electrode pair 3 for pre-ionization,
It is characterized by forming a communicating hole outside the oscillator chamber 1 and connecting the hole to the suction side of the gas purification circulation path 10.
〈作用〉
ピン電極対3におけるアーク放電によって生じた不純物
は、一方のピン電極3aの先端から孔りを介して直ちに
ガス精製用環流路10内に送り込まれ、発振器チャンバ
1内に拡散しに((、効率的に除去される。<Operation> Impurities generated by arc discharge in the pin electrode pair 3 are immediately sent into the gas purification circulation path 10 from the tip of one pin electrode 3a through the hole, and diffused into the oscillator chamber 1 ( (, effectively removed.
〈実施例〉 本発明の実施例を、以下、図面に基づいて説明する。<Example> Embodiments of the present invention will be described below based on the drawings.
第1図は本発明実施例の構成図で、第2図はその主電極
対2およびピン電極対3・・・3近傍の拡大斜視図であ
る。FIG. 1 is a block diagram of an embodiment of the present invention, and FIG. 2 is an enlarged perspective view of the vicinity of the main electrode pair 2 and pin electrode pairs 3...3.
媒体ガスが充填された発振器チャンバ1内には、レーザ
放電用の主電極対2に近接して、その長手方向に沿って
上下に複数のピン電極対3・・・3が配設されている。In the oscillator chamber 1 filled with a medium gas, a plurality of pin electrode pairs 3 . . . 3 are arranged above and below the main electrode pair 2 along its longitudinal direction in close proximity to the main electrode pair 2 for laser discharge. .
各電極対2.−3・・・3は、第4図に示した従来と同
様の電荷移行型高圧パルス発生回路に接続される。すな
わち、主電極対2の一方2aおよびピン電極対3・・・
3の一方3a・・・3aはそれぞれコンデンサCIを介
して高電圧側に接続され、また主電極対2の他方2bは
支持柱20を介して、ピン電極対3・・・3の他方3b
・・・3bはコンデンサC2を介して、それぞれアース
側である発振器チャンバ1の壁体に接続される。Each electrode pair 2. -3...3 are connected to a charge transfer type high voltage pulse generation circuit similar to the conventional one shown in FIG. That is, one side 2a of the main electrode pair 2 and the pin electrode pair 3...
3 are connected to the high voltage side through capacitors CI, and the other 2b of the main electrode pair 2 is connected to the other 3b of the pin electrode pair 3 through the support column 20.
...3b are each connected to the wall of the oscillator chamber 1, which is the ground side, via a capacitor C2.
発振器チャンバ1内にはまた、従来装置と同様、熱交換
器5とクロスフローファン6が配設されている。Also arranged within the oscillator chamber 1 are a heat exchanger 5 and a cross-flow fan 6, similar to the conventional device.
上述した各一方のピン電極3a・・・3aは、それぞれ
複数本づつ支持体30にねし止めされており、第3図に
ピン電極3a・・・3aと支持体30の断面図を示すよ
うに、各ピン電極3a・・・3aにはその軸心に沿って
両端に貫通する孔りが穿たれており、また、各支持体3
0・・・30にも孔h・・・hに連通する孔Hが形成さ
れている。そして、各支持体30・・・30の孔H・・
・Hはニップル等によって互いに連結され、管10dま
たは10eによって発振器チャンバ1の外部に導かれて
ポンプ13の吸入口に接続されている。このポンプ13
の吐出口は、第4図に示す従来装置と同様のガス精製用
環流路10の吸引側に接続されている。A plurality of each of the above-mentioned pin electrodes 3a...3a are screwed to the support 30, and as shown in FIG. In addition, each pin electrode 3a...3a has a hole penetrating it at both ends along its axis, and each support 3a...
Holes H communicating with holes h...h are also formed at holes 0...30. And the hole H of each support body 30...30...
- H are connected to each other by nipples or the like, led to the outside of the oscillator chamber 1 by a pipe 10d or 10e, and connected to the inlet of the pump 13. This pump 13
The discharge port is connected to the suction side of a gas purification circulation path 10 similar to the conventional device shown in FIG.
すなわち、ガス精製用環流路10は、循環ポンプ11と
、静電集塵機等のガス精製装置12と、発振器チャンバ
i内と循環ポンプ11を接続する管10a、循環ポンプ
11とガス精製装置12の入口を結ぶ管10b、および
ガス精製装置12の出口と発振器チャンバ1内を結ぶ管
10c等によって構成され、上述したポンプ13の吐出
口は管10fによって循環ポンプ11の吸入口に連通し
ている。That is, the gas purification circulation path 10 includes a circulation pump 11, a gas purification device 12 such as an electrostatic precipitator, a pipe 10a connecting the inside of the oscillator chamber i and the circulation pump 11, and an inlet of the circulation pump 11 and the gas purification device 12. and a pipe 10c that connects the outlet of the gas purification device 12 and the inside of the oscillator chamber 1, and the discharge port of the pump 13 described above is communicated with the suction port of the circulation pump 11 through a pipe 10f.
以上の本発明実施例によると、発振器チャンバ1内の媒
体ガスは管10aから吸引されて従来と同様ガス精製装
置12に送り込まれるとともに、ピン電極対3・・・3
におけるアーク放電によって生じた不純物は、その一方
のピン電極3a・・・3aの先端から孔h・・・hを介
してポンプ13によって直ちに吸引されてガス精製装置
12へ導かれることになる。According to the embodiment of the present invention described above, the medium gas in the oscillator chamber 1 is sucked from the pipe 10a and sent to the gas purification device 12 as in the conventional case, and the pin electrode pairs 3...
The impurities generated by the arc discharge in are immediately sucked by the pump 13 from the tip of one of the pin electrodes 3a through the holes h...h and guided to the gas purification device 12.
なお、以上の実施例では、循環ポンプ11のほかにポン
プ13を設けて、このポンプ13でピン電極3a・・・
3aの孔h・・・hからガスを吸引するよう構成したが
、ポンプ13を設けず循環ポンプ11で直接吸引するよ
う構成してもよい。In addition, in the above embodiment, a pump 13 is provided in addition to the circulation pump 11, and this pump 13 operates the pin electrodes 3a...
Although the configuration is such that gas is sucked through the holes h...h of 3a, the configuration may be such that the pump 13 is not provided and the gas is sucked directly by the circulation pump 11.
〈発明の効果〉
以上説明したように、本発明によれば、予備電離用のピ
ン電極対の少くとも一方に、その先端から発振器チャン
バ外に連通ずる孔を形成し、その孔をガス精製用環流路
の吸引側に接続したから、ピン電極対のアーク放電によ
って生じた不純物は発振器チャンバ内に拡散する前に優
先的にガス精製装置に導かれることになり、ガス精製の
効率が著しく向上し、媒体ガスの長寿命化を達成するこ
とができる。<Effects of the Invention> As explained above, according to the present invention, a hole communicating with the outside of the oscillator chamber from its tip is formed in at least one of the pair of pin electrodes for pre-ionization, and the hole is used for gas purification. Since it is connected to the suction side of the circulation path, impurities generated by the arc discharge of the pin electrode pair are preferentially guided to the gas purification device before being diffused into the oscillator chamber, significantly improving the efficiency of gas purification. , it is possible to achieve a longer service life of the medium gas.
第1図は本発明実施例の構成図、
第2図はその主電極対2およびピン電極対3・・・3近
傍の拡大斜視図、
第3図はその一方のピン電極3a・・・3aと支持体3
0の断面図である。
第4図は紫外光子備電離法を採用した従来装置の構成図
である。
1・・・発振器チャンバ
2・・・主電極対
3・・・3・・・ピン電極対
3a・・・3a、3b・・・3b・・・ピン電極10・
・・ガス精製用環流路
11・・・循環ポンプ
12・・・ガス精製装置
13・・・ポンプ
特許出願人 株式会社島津製作所代 理 人
弁理士 西1)新
築1図
第2図
30 F−1Fig. 1 is a configuration diagram of an embodiment of the present invention, Fig. 2 is an enlarged perspective view of the vicinity of the main electrode pair 2 and pin electrode pairs 3...3, and Fig. 3 is one of the pin electrodes 3a...3a. and support 3
FIG. FIG. 4 is a block diagram of a conventional device employing the ultraviolet photon ionization method. 1... Oscillator chamber 2... Main electrode pair 3... 3... Pin electrode pair 3a... 3a, 3b... 3b... Pin electrode 10.
... Gas purification circulation path 11 ... Circulation pump 12 ... Gas purification device 13 ... Pump patent applicant Agent of Shimadzu Corporation
Patent Attorney Nishi 1) New construction Figure 1 Figure 2 30 F-1
Claims (1)
用の主電極対と、この主電極対間の放電に先立って放電
して媒体ガスを予備電離するピン電極対が配設されてな
るレーザ装置において、上記発振器チャンバ内の媒体ガ
スを吸引して不純物を除去し、再び上記発振器チャンバ
内に戻すガス精製用環流路を設けるとともに、上記ピン
電極対の少くとも一方に、その先端から軸方向に沿って
伸び、上記発振器チャンバ外に連通する孔を形成し、そ
の孔を上記ガス精製用環流路の吸引側に接続したことを
特徴とする、ガスレーザ装置。A laser device comprising a main electrode pair for laser discharge and a pin electrode pair that pre-ionizes the medium gas by discharging prior to the discharge between the main electrode pair, in an oscillator chamber filled with a medium gas. A gas purification circulation path is provided in which the medium gas in the oscillator chamber is sucked to remove impurities and returned to the oscillator chamber again, and at least one of the pair of pin electrodes is provided with a gas purification path extending axially from the tip thereof. A gas laser device, further comprising a hole extending along the oscillator chamber and communicating with the outside of the oscillator chamber, the hole being connected to a suction side of the gas purification circulation path.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29727287A JPH01137687A (en) | 1987-11-24 | 1987-11-24 | Gas laser device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29727287A JPH01137687A (en) | 1987-11-24 | 1987-11-24 | Gas laser device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01137687A true JPH01137687A (en) | 1989-05-30 |
Family
ID=17844373
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29727287A Pending JPH01137687A (en) | 1987-11-24 | 1987-11-24 | Gas laser device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01137687A (en) |
-
1987
- 1987-11-24 JP JP29727287A patent/JPH01137687A/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE69200247T2 (en) | Discharge-pumped gas laser with baffle separation for controlled gas flow at pre-ionizers. | |
| JPH01137687A (en) | Gas laser device | |
| JP3171899B2 (en) | Gas laser equipment | |
| JPH02240978A (en) | Gas laser device | |
| JPH02288385A (en) | Gas laser device | |
| JPH06237029A (en) | Discharge excited excimer laser device | |
| JPH03278487A (en) | Gas laser oscillator device | |
| JPS63304683A (en) | Excimer laser system | |
| JPS63227084A (en) | Highly repetitive pulse laser oscillator | |
| JP2579671Y2 (en) | Excimer laser device | |
| JP2685930B2 (en) | Gas laser device | |
| JP2734191B2 (en) | Laser device | |
| JPH0445268Y2 (en) | ||
| JPS63228776A (en) | Gas laser device | |
| RU2030275C1 (en) | Device for delivery of cutting medium | |
| JP2581377B2 (en) | Excimer laser device | |
| JPH03183177A (en) | Gas laser oscillator | |
| JP2001274484A (en) | Gas laser device | |
| JPH05175581A (en) | High repetition pulse laser electrode | |
| WO1987006773A1 (en) | Gas laser device | |
| JPS6218781A (en) | Laser oscillator | |
| JPH05335671A (en) | Discharge circuit for laser device | |
| JPH03147382A (en) | Excimer laser generator | |
| JPS637681A (en) | Gas laser system | |
| JPH0774412A (en) | Capacitor and pulse laser device |