JPH01168048A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH01168048A
JPH01168048A JP32628187A JP32628187A JPH01168048A JP H01168048 A JPH01168048 A JP H01168048A JP 32628187 A JP32628187 A JP 32628187A JP 32628187 A JP32628187 A JP 32628187A JP H01168048 A JPH01168048 A JP H01168048A
Authority
JP
Japan
Prior art keywords
chip
heat sink
brazing material
protrusion
crystal lattice
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP32628187A
Other languages
Japanese (ja)
Inventor
Teruichi Iwaida
輝市 祝田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP32628187A priority Critical patent/JPH01168048A/en
Publication of JPH01168048A publication Critical patent/JPH01168048A/en
Pending legal-status Critical Current

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  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

PURPOSE:To reduce a distortion generated in the crystal lattice of a chip by providing a protrusion partly on a heat sink, and adhering it to the part of the rear face of the chip. CONSTITUTION:A protrusion 10a is formed at the center of a heat sink 10, a leading electrode pattern 10b is formed on the surface, and a chip 3 is adhered to the top of the protrusion 10a of the sink 10 with a brazing material 11. In this case, since the top of the protrusion 10a has a relatively small area, the material 11 is adhered only to the center of the rear face electrode of the chip 3. As a result, when the material 11 is cooled to be contracted, its volumetric change is small, the chip 3 is not pulled, and a distortion generated in a crystal lattice is small. Accordingly, a dark spot is scarcely generated at a light emitting unit 3b.

Description

【発明の詳細な説明】 〔概要〕 放熱体(ヒートシンク)に半導体チップがロウ付けされ
てなる半導体装置に関し、 半導体デツプとヒートシンク(放熱体)とを接6するロ
ウ材の収縮による結晶格子の歪を少なくなることを目的
とし、 ヒートシンク上の一部に凸部を設け、凸部の頂部と半導
体チップの背面の一部とをロウ材で接着した構成とする
[Detailed Description of the Invention] [Summary] Regarding a semiconductor device in which a semiconductor chip is brazed to a heat radiator (heat sink), distortion of the crystal lattice due to contraction of the brazing material that connects the semiconductor depth and the heat sink (heat radiator) 6 In order to reduce this, a convex portion is provided on a portion of the heat sink, and the top of the convex portion and a portion of the back surface of the semiconductor chip are bonded with a brazing material.

〔産業上の利用分野〕[Industrial application field]

本発明は、放熱体(ヒートシンク)に半導体チップがロ
ウ付けされてなる半導体装置に関する。
The present invention relates to a semiconductor device in which a semiconductor chip is brazed to a heat sink.

例えば表面発光LED等、ヒートシンク上にチップをロ
ウ材で接着するものでは、ロウ材が冷えて収縮する時に
チップの結晶格子に歪を生じる。
For example, in a device such as a surface-emitting LED in which a chip is bonded onto a heat sink using a brazing material, distortion occurs in the crystal lattice of the chip when the brazing material cools and contracts.

ここで、この歪を極力少なく抑えてダークスポットをな
くし、高品質の表面光素子を得ることが必要である。
Here, it is necessary to suppress this distortion as much as possible to eliminate dark spots and obtain a high-quality surface optical element.

〔従来の技術〕[Conventional technology]

第4図は一般の表面光素子の概略図を示す。同図におい
て、ステム1上にシリコン等のヒートシンク2が接着さ
れており、ヒートシンク2上に例えば発光LEDチップ
3が導電体のロウ材で接着されている。チップ3は従来
周知の如く、背面電極上にガリウム・ヒ素(GaAs)
 FFi、クラッド層、活性層、コンタクト層、金(八
〇)電極を積層形成され、両電極間に電圧を印加するこ
とにより活性層より発光する。デツプ3の表面の金電極
3aからボンディングワイヤ4が引出されてボスト5に
接続されている一方、ヒートシンク2の表面に形成され
た引出し電極パターン2aからボンディングワイヤ6が
引出されてボスト7に接続されている。この場合、チッ
プ3をヒートシンク2に接着するに際し、第5図に示す
如く、ロウ材8を使用する。
FIG. 4 shows a schematic diagram of a general surface photodiode. In the figure, a heat sink 2 made of silicon or the like is bonded onto a stem 1, and a light-emitting LED chip 3, for example, is bonded onto the heat sink 2 with a conductive brazing material. As is conventionally known, the chip 3 has gallium arsenide (GaAs) on the back electrode.
FFi, a cladding layer, an active layer, a contact layer, and a gold (80) electrode are laminated, and light is emitted from the active layer by applying a voltage between both electrodes. A bonding wire 4 is drawn out from the gold electrode 3a on the surface of the depth 3 and connected to the post 5, while a bonding wire 6 is drawn out from the lead-out electrode pattern 2a formed on the surface of the heat sink 2 and connected to the post 7. ing. In this case, when bonding the chip 3 to the heat sink 2, a brazing material 8 is used as shown in FIG.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

上記構成になる従来例は、チップ3をヒートシンク2に
接着するためのロウ材8が多過ぎるとチップ3の背面電
極全面にロウ材8が広がり、ロウ材8が冷却して収縮す
る時に第6図に示すようにチップ3′が引張られてその
結晶格子に歪を生じる。この結果、第5図に丞す発光部
3bにダークスポットを生じ易く、第β図に示すように
約30%もの製品が不良となる問題点があっに0そこで
、この問題点を解決するために、第7図に示す如く、ヒ
ートシンク2の中央に四部2bを設け、ここにロウ材を
充填してチップに対する接着面積を小にし、チップの結
晶格子の歪を少なくすることが考えられる。然るにこの
ものは、凹部の形状は実際には凹部2b’のようにテー
パ状に広がってしまい、凹部の大きさを精度よく形成す
ることは困難であり、(の結果、ロウ材が多過ぎる場合
には第6図に示すもののようにチップの背面電極全面に
ロウ材が広がり、一方、[1つ材が少な過ぎる場合には
チップを確実に接着し得ない問題点がある。
In the conventional example with the above configuration, if there is too much brazing material 8 for bonding the chip 3 to the heat sink 2, the brazing material 8 will spread over the entire surface of the back electrode of the chip 3, and when the brazing material 8 cools and contracts, the sixth As shown in the figure, the chip 3' is stretched and its crystal lattice is strained. As a result, there is a problem that dark spots are likely to occur in the light emitting part 3b shown in Fig. 5, and about 30% of the products are defective as shown in Fig. β. Therefore, in order to solve this problem, As shown in FIG. 7, it is conceivable to provide a four part 2b in the center of the heat sink 2 and fill this part with a brazing material to reduce the bonding area to the chip and to reduce distortion of the crystal lattice of the chip. However, in this case, the shape of the recess actually widens into a tapered shape like recess 2b', and it is difficult to form the recess with high precision. In this case, as shown in FIG. 6, the brazing material spreads over the entire surface of the back electrode of the chip.On the other hand, if there is too little brazing material, there is a problem that the chip cannot be bonded securely.

又、上記問題点を解決するために、使用するロウ材の吊
を少なくする方法も考えられるが、現在のロウ材ペレッ
トの製作技術では例えば0.3 #W口xO,025履
1の寸法よりも小さくすることは困難であり、この方法
も好ましくない。
In addition, in order to solve the above problem, a method of reducing the suspension of the brazing material used may be considered, but with the current production technology of brazing material pellets, It is difficult to make the size smaller, and this method is also not preferable.

本発明は、所定おのロウ材を用いながらヒートシンクの
形状を工夫することにより、ロウ材の収縮による結晶格
子の歪を少なくすることを目的とする。
An object of the present invention is to reduce distortion of the crystal lattice due to shrinkage of the brazing material by devising the shape of the heat sink while using a predetermined brazing material.

〔問題点を解決するための手段〕[Means for solving problems]

本発明になる半導体装置は、ヒートシンク上の一部に凸
部を設けられており、凸部の頂部と半導体チップの背面
の一部とをロウ材で接着してなる。
The semiconductor device according to the present invention has a convex portion provided on a portion of the heat sink, and the top of the convex portion and a portion of the back surface of the semiconductor chip are bonded together with a brazing material.

【作用〕[Effect]

本発明では、チップの背面電極の一部にのみ口つ材が付
着するため、ロウ材の冷却による収縮時′  にその体
積変化が少なく、チップの結晶格子に歪を生じることは
少ない。
In the present invention, since the spout is attached only to a part of the back electrode of the chip, there is little change in volume when the brazing material shrinks due to cooling, and distortion is less likely to occur in the crystal lattice of the chip.

〔実施例〕〔Example〕

第1図は本発明の一実施例の構成図を示す。同図中、1
0はヒートシンクで、第2図に示す如く、中央部に凸部
10aが設けられており、かつ、(の表面に引出し電極
パターン10bが設けられている。11はロウ材で、凸
部10aの頂部にあってデツプ3をヒートシンク10に
接着する。ロウ材11は、現在のロウ材のベレット製負
技術で容易に製作できる大きさのものを用いている。
FIG. 1 shows a configuration diagram of an embodiment of the present invention. In the same figure, 1
0 is a heat sink, as shown in FIG. 2, a convex portion 10a is provided in the center, and an extraction electrode pattern 10b is provided on the surface of At the top, the depth 3 is bonded to the heat sink 10.The solder metal 11 is of a size that can be easily manufactured using the current technique of making a beret of solder metal.

この場合、凸部10aの頂部は比較的小さい面積である
ので、第5図に示す従来例と異なり、デツプ3の背面電
極中央部のみにロウ材11が付着することになり、この
結果、ロウ材11が冷却して収縮する時にはその体積変
化が少なく、デツプ3はそれ程引張られることはなく、
結晶格子に生じる歪ら少ない。従って、発光部3bにダ
ークスポットを生じることは少なく、第3図に示すよう
に高々約14%程度の製品が不良となるだけである。
In this case, since the top of the convex portion 10a has a relatively small area, unlike the conventional example shown in FIG. When the material 11 cools and contracts, its volume changes little, and the depth 3 is not stretched so much.
Less distortion occurs in the crystal lattice. Therefore, dark spots are less likely to occur in the light emitting part 3b, and as shown in FIG. 3, only about 14% of the products are defective.

なお、一つのヒートシンク(ヒートシンク10と同じ大
ぎさのもの)に多数の凸部を設けるように構成すれば、
凸部1個当りの面積を小にでき、更にロウ材の接着面積
を小にできて結晶格子に生じる歪を少なくできる。又、
例えばヒートシンク10と同じ大きさのヒートシンクに
多数の凸部を設けるように構成すれば、チップ3よりも
大きい形状の大型チップにも適用でき、しかも放熱面積
が大になるので放熱性の向上をπ1り得る。
Note that if one heat sink (one of the same size as the heat sink 10) is configured to have many convex parts,
The area of each convex portion can be made small, and the bonding area of the brazing material can also be made small, thereby making it possible to reduce distortion occurring in the crystal lattice. or,
For example, if a heat sink of the same size as the heat sink 10 is configured to have a large number of convex parts, it can be applied to a large chip that is larger than the chip 3, and the heat dissipation area is increased, so the heat dissipation performance can be improved by π1. can be obtained.

また、本発明は前記した光素子に限るもので無く、他の
半導体素子に適用し得ることは、明白である。
Furthermore, it is clear that the present invention is not limited to the above-described optical device, but can be applied to other semiconductor devices.

〔発明の効果〕〔Effect of the invention〕

以上説明した如く、本発明によれば、ヒートシンク上の
一部に凸部を設けてこれとチップの背面の一部とを接着
するようにしているので、ロウ材をチップ背面電極全面
に付着する構成の従来例に比してロウ材のチップに対す
る付着面積が少なく、これにより、ロウ材の冷却による
収縮時にその体積変化が従来例に比して少なく、チップ
の結晶格子に生じる歪が少なく、特に光素子においては
、ダークスポットを生じることはない。
As explained above, according to the present invention, a convex portion is provided on a portion of the heat sink and a portion of the back surface of the chip is bonded to the convex portion, so that the brazing material is attached to the entire surface of the back electrode of the chip. Compared to conventional configurations, the adhesion area of the brazing material to the chip is smaller, and as a result, when the brazing material shrinks due to cooling, its volume changes less than in the conventional example, and there is less distortion in the crystal lattice of the chip. Particularly in optical devices, dark spots do not occur.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の構成図、 第2図は本発明に用いられるヒートシンクの構成図、 第3図は従来例と本発明との不良率を比較する図、 第4図は一般の表面光素子の概略図、 第5図は従来の構成図、 第6図は第5図に示す従来例において生じる歪を示す図
、 第7図は従来考えられる構成図である。 図において、 3は発光LEDチップ(表面光チップ)、3bは発光部
、 10はヒートシンク、 10aは凸部、 10bは引出し電極パターン、 11はロウ材 を示す。 檗2.X 第3ス 簿4図 第5図 第6図 W&7図
Fig. 1 is a block diagram of the present invention; Fig. 2 is a block diagram of a heat sink used in the present invention; Fig. 3 is a diagram comparing the defective rate between the conventional example and the present invention; Fig. 4 is a typical surface optical element. FIG. 5 is a schematic diagram of a conventional configuration; FIG. 6 is a diagram showing distortion occurring in the conventional example shown in FIG. 5; FIG. 7 is a conventional configuration diagram. In the figure, 3 is a light emitting LED chip (front surface optical chip), 3b is a light emitting part, 10 is a heat sink, 10a is a convex part, 10b is an extraction electrode pattern, and 11 is a brazing material. Hinoki 2. X Figure 3 Figure 4 Figure 5 Figure 6 Figure W&7

Claims (1)

【特許請求の範囲】  ヒートシンク(10)と半導体チップ(3)とをロウ
材(11)で接着してなる構造の半導体装置において、 上記ヒートシンク(10)上の一部に凸部 (10a)を設け、該凸部(10a)の頂部と上記半導
体チップ(3)の背面の一部とを上記ロウ材(11)で
接着してなることを特徴とする半導体装置。
[Claims] In a semiconductor device having a structure in which a heat sink (10) and a semiconductor chip (3) are bonded together with a brazing material (11), a convex portion (10a) is provided on a part of the heat sink (10). A semiconductor device characterized in that the top of the convex portion (10a) and a part of the back surface of the semiconductor chip (3) are bonded together with the brazing material (11).
JP32628187A 1987-12-23 1987-12-23 Semiconductor device Pending JPH01168048A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32628187A JPH01168048A (en) 1987-12-23 1987-12-23 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32628187A JPH01168048A (en) 1987-12-23 1987-12-23 Semiconductor device

Publications (1)

Publication Number Publication Date
JPH01168048A true JPH01168048A (en) 1989-07-03

Family

ID=18186013

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32628187A Pending JPH01168048A (en) 1987-12-23 1987-12-23 Semiconductor device

Country Status (1)

Country Link
JP (1) JPH01168048A (en)

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