JPH01170946U - - Google Patents

Info

Publication number
JPH01170946U
JPH01170946U JP6687288U JP6687288U JPH01170946U JP H01170946 U JPH01170946 U JP H01170946U JP 6687288 U JP6687288 U JP 6687288U JP 6687288 U JP6687288 U JP 6687288U JP H01170946 U JPH01170946 U JP H01170946U
Authority
JP
Japan
Prior art keywords
ion beam
ion
primary
microanalyzer
primary ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6687288U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6687288U priority Critical patent/JPH01170946U/ja
Publication of JPH01170946U publication Critical patent/JPH01170946U/ja
Pending legal-status Critical Current

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  • Analysing Materials By The Use Of Radiation (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本案の一実施例で、イオンマイクロア
ナライザーの構成図、第2図aは一次イオンモニ
ターで監視されている一次イオンビームの変動お
よび途切れた場合のプロフアイルを示す図、bは
検出二次イオンのデータ補正回路で補正される前
後のプロフアイルを示す図である。 1……イオン源、2……一次イオンビーム、3
……一次イオンモニター用スリツト、4……イオ
ンビームフオーカス用静電レンズ、5……分析試
料、6……二次イオンビーム、7……セクター電
場、8……セクター磁場、9……検出器、10…
…一次イオンモニター機構、11……デイスク、
12……データ補正回路、13……デイスプレイ
Figure 1 shows an example of the present invention, and shows the configuration of the ion microanalyzer. Figure 2a shows the fluctuations and interruptions of the primary ion beam monitored by the primary ion monitor, and b shows the detection profile. FIG. 7 is a diagram showing profiles before and after being corrected by a secondary ion data correction circuit. 1...Ion source, 2...Primary ion beam, 3
... Slit for primary ion monitor, 4 ... Electrostatic lens for ion beam focus, 5 ... Analysis sample, 6 ... Secondary ion beam, 7 ... Sector electric field, 8 ... Sector magnetic field, 9 ... Detection Vessel, 10...
...Primary ion monitor mechanism, 11...Disk,
12...Data correction circuit, 13...Display.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 一次イオンビームを分析試料に照射して、その
試料表面から出てくる二次イオンビームを電場や
磁場で分離して、試料成分の同定を行なうイオン
マイクロアナライザーにおいて、一次イオンビー
ムをモニターする一次イオンビームモニター機構
と、検出した二次イオン強度を補正するデータ補
正回路とを有することを特徴とするイオンマイク
ロアナライザー。
The primary ion beam that monitors the primary ion beam in an ion microanalyzer that irradiates a primary ion beam onto an analysis sample and separates the secondary ion beam that emerges from the sample surface using an electric or magnetic field to identify sample components. An ion microanalyzer characterized by having a beam monitor mechanism and a data correction circuit that corrects detected secondary ion intensity.
JP6687288U 1988-05-23 1988-05-23 Pending JPH01170946U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6687288U JPH01170946U (en) 1988-05-23 1988-05-23

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6687288U JPH01170946U (en) 1988-05-23 1988-05-23

Publications (1)

Publication Number Publication Date
JPH01170946U true JPH01170946U (en) 1989-12-04

Family

ID=31292260

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6687288U Pending JPH01170946U (en) 1988-05-23 1988-05-23

Country Status (1)

Country Link
JP (1) JPH01170946U (en)

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