JPH0118497B2 - - Google Patents
Info
- Publication number
- JPH0118497B2 JPH0118497B2 JP56157159A JP15715981A JPH0118497B2 JP H0118497 B2 JPH0118497 B2 JP H0118497B2 JP 56157159 A JP56157159 A JP 56157159A JP 15715981 A JP15715981 A JP 15715981A JP H0118497 B2 JPH0118497 B2 JP H0118497B2
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- magnetic head
- monitor resistor
- winding
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
- G11B5/3166—Testing or indicating in relation thereto, e.g. before the fabrication is completed
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Description
【発明の詳細な説明】
本発明は研磨量の調整に係る技術的改善を施し
た薄膜磁気ヘツドの製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a thin film magnetic head with technical improvements in controlling the amount of polishing.
強磁性薄膜をフオトリングラフイー等の微細加
工技術を用いて加工することにより得られる薄膜
磁気ヘツドは、従来の強磁性体バルク材料を加工
して得られる磁気ヘツドに比して狭トラツク化、
狭ギヤツプ化が容易であるため高密度磁気記録装
置の記録用あるいは再生用ヘツドに適している。
また多素子化も容易なことから、マルチチヤンネ
ル固定ヘツド型PCM録音機用の磁気ヘツドとし
て有望視されている。 Thin-film magnetic heads obtained by processing ferromagnetic thin films using microfabrication techniques such as photolithography have narrower tracks and narrower tracks compared to magnetic heads obtained by processing conventional ferromagnetic bulk materials.
Since it is easy to narrow the gap, it is suitable for recording or reproducing heads in high-density magnetic recording devices.
In addition, since it is easy to incorporate multiple elements, it is seen as a promising magnetic head for multi-channel fixed head type PCM recorders.
上記マルチチヤンネル固定ヘツド型PCM録音
機では磁気テープの速度が遅く巻線型磁気ヘツド
では十分な再生出力が得られないため、再生用磁
気ヘツドとして磁気抵抗効果素子を用いた磁束応
答型の磁気ヘツドが用いられる。記録用磁気ヘツ
ドとしては巻線型磁気ヘツドが用いられる。 In the multi-channel fixed head type PCM recorder mentioned above, the speed of the magnetic tape is slow and the wire-wound magnetic head cannot provide sufficient playback output. used. A wire-wound magnetic head is used as the recording magnetic head.
上記の記録用あるいは再生用の薄膜磁気ヘツド
を製造する場合には蒸着、スパツタあるいはメツ
キ等の薄膜技術と微細加工技術を用いて磁気コア
あるいは磁気抵抗効果素子リード線等を形成し次
に所定の大きさに切断した後シールド・ケース等
に収納し次に磁気テープと接触する面を所定の寸
法まで研磨するという手順で製造される。しかし
上記研磨の際、特に磁気ヘツドが多素子構造を有
していると両端の素子で研磨量に差が生じこのこ
とが素子間の特性のバラツキの原因となつた。再
生用磁気ヘツドの場合には磁気抵抗効果素子自身
が研磨されるため、磁気抵抗効果素子の抵抗をモ
ニターすることによつて研磨量を決定することが
できる。しかしながら記録用磁気ヘツドの場合に
は再生用磁気ヘツドのように簡単に研磨量を決定
する方法がないため別個に研磨用モニター抵抗を
設ける必要がある。 When manufacturing the above-mentioned thin film magnetic heads for recording or reproduction, thin film techniques such as vapor deposition, sputtering, or plating and microfabrication techniques are used to form the magnetic core or magnetoresistive element lead wires, etc. The tape is manufactured by cutting it to size, storing it in a shield case, etc., and then polishing the surface that will come into contact with the magnetic tape to a predetermined size. However, during the above polishing, especially when the magnetic head has a multi-element structure, there is a difference in the amount of polishing between the elements at both ends, which causes variations in characteristics between the elements. In the case of a reproducing magnetic head, since the magnetoresistive element itself is polished, the amount of polishing can be determined by monitoring the resistance of the magnetoresistive element. However, in the case of a recording magnetic head, there is no method for determining the amount of polishing as easily as in the case of a reproducing magnetic head, and therefore it is necessary to provide a separate polishing monitor resistor.
本発明は上記の記録用磁気ヘツドの研磨用モニ
ター抵抗の形成に関するものであり、従来のヘツ
ド製造方法に比して製造プロセスの増加をともな
うことなく研磨用モニター抵抗を形成する薄膜磁
気ヘツドの製造方法を与えるものである。以下本
発明に係わる薄膜磁気ヘツドの製造方法について
説明する。 The present invention relates to the formation of a polishing monitor resistor for the above-mentioned recording magnetic head, and relates to the production of a thin film magnetic head in which the polishing monitor resistor is formed without increasing the number of manufacturing processes compared to conventional head manufacturing methods. It gives a method. A method of manufacturing a thin film magnetic head according to the present invention will be explained below.
第１図乃至第４図は本発明に係わる薄膜磁気ヘ
ツドの製造手順を示す図であり、同図ａは平面
図、同図ｂは側面図である。フエライト等の強磁
性体基板１（これは図から明らかなように下部コ
アを形成する）上にSiO2等の第１の絶縁層２を
スパツタ等で形成した後、Ti等の導電体で密着
層３を形成し、その上に巻線となる導電体層を全
面に形成する。しかる後この巻線となる導電体層
のみを選択的にエツチングして、巻線４および研
磨用モニター抵抗のリード線５となる部分を同時
に加工する（第１図）。そして密着層３を２本の
リード線５の間のモニター抵抗６となる部分のみ
を残して除去することによつて研磨用モニター抵
抗６を形成する（第２図）。この研磨用モニター
抵抗６および巻線４等の上にSiO2等の第２の絶
縁層７を第１の絶縁層２と同様に形成し続いてパ
ーマロイ等の強磁性層８をメツキあるいは蒸着ス
パツタ等で形成し、磁気コアに加工する（第３
図）。この強磁性層８を設ける前にバツクギヤツ
プとなる部分の第２の絶縁層７を除去すれば磁気
回路の抵抗値を下げることができる。次に第２の
絶縁層７の一部に巻線および研磨用モニター抵抗
とリード線を接続するための窓９を設ける（第４
図）。以上の工程によつて研磨用モニター抵抗を
形成する。密着層に比して導電体部は充分厚いた
めリードの抵抗をモニター抵抗に比して低くする
ことができる。 1 to 4 are diagrams showing the manufacturing procedure of a thin film magnetic head according to the present invention, in which FIG. 1A is a plan view and FIG. 4B is a side view. A first insulating layer 2 such as SiO 2 is formed on a ferrite or other ferromagnetic substrate 1 (which forms the lower core as is clear from the figure) by sputtering or the like, and then adhered with a conductive material such as Ti. Layer 3 is formed, and a conductor layer that will become a winding is formed on the entire surface. Thereafter, only the conductor layer that will become the winding is selectively etched, and the winding 4 and the portion that will become the lead wire 5 of the polishing monitor resistor are simultaneously processed (FIG. 1). Then, the polishing monitor resistor 6 is formed by removing the adhesive layer 3 leaving only the portion between the two lead wires 5 that will become the monitor resistor 6 (FIG. 2). A second insulating layer 7 of SiO 2 or the like is formed on the polishing monitor resistor 6 and the winding 4 in the same manner as the first insulating layer 2, and then a ferromagnetic layer 8 of permalloy or the like is plated or sputtered by vapor deposition. etc., and processed into a magnetic core (third
figure). The resistance value of the magnetic circuit can be lowered by removing the portion of the second insulating layer 7 that will become a back gap before providing the ferromagnetic layer 8. Next, a window 9 is provided in a part of the second insulating layer 7 for connecting the winding and the polishing monitor resistor to the lead wire (the fourth
figure). Through the above steps, a polishing monitor resistor is formed. Since the conductor portion is sufficiently thick compared to the adhesive layer, the resistance of the lead can be made lower than the monitor resistance.
マルチチヤンネル固定ヘツド型PCM録音機の
磁気ヘツドのように多素子構造を持つ場合には上
記研磨用モニター抵抗を磁気ヘツドの両端に２個
設けることによつて全素子を均一に研磨すること
ができる。また研磨されない部分に別のモニター
抵抗を設ければ実際に研磨されるモニター抵抗と
この研磨されないモニター抵抗とを比較すること
によつて研磨量を校正しながら研磨することがで
きる。また上記実施例ではシングルターン型の磁
気ヘツドを示しているが、本発明はマルチターン
型の磁気ヘツドについても実施可能であり、さら
に多素子型磁気ヘツド共通バイアス用のリード線
が各素子に共通して設けられた場合にも本発明を
適用できる。 If the magnetic head of a multi-channel fixed head PCM recorder has a multi-element structure, all the elements can be polished uniformly by providing two polishing monitor resistors at both ends of the magnetic head. . Furthermore, if another monitor resistor is provided in the portion that is not polished, polishing can be performed while calibrating the amount of polishing by comparing the monitor resistor that is actually polished with the monitor resistor that is not polished. Furthermore, although the above embodiment shows a single-turn type magnetic head, the present invention can also be implemented in a multi-turn type magnetic head, and furthermore, the lead wire for common bias in a multi-element type magnetic head is common to each element. The present invention can also be applied to a case where the device is provided as follows.
以上のように本発明によれば従来の薄膜磁気ヘ
ツドの製造工程を大きく変更することなく容易に
研磨用モニター抵抗を形成することができる。 As described above, according to the present invention, a polishing monitor resistor can be easily formed without significantly changing the manufacturing process of conventional thin film magnetic heads.
第１図乃至第４図は本発明に係わる薄膜磁気ヘ
ツドの製造手順を示し、同図ａは平面図、同図ｂ
は側面図である。
図中、１：強磁性体基板、２：第１の絶縁層、
３：密着層、４：巻線、５：研磨用モニター抵抗
のリード線、６：モニター抵抗、７：第２の絶縁
層、８：強磁性層、９：窓。
1 to 4 show the manufacturing procedure of a thin film magnetic head according to the present invention, in which figure a is a plan view and figure b is a plan view.
is a side view. In the figure, 1: ferromagnetic substrate, 2: first insulating layer,
3: adhesion layer, 4: winding wire, 5: lead wire of polishing monitor resistor, 6: monitor resistor, 7: second insulating layer, 8: ferromagnetic layer, 9: window.
Claims (1)
る密着層と、 磁気コアの巻線を構成する導電体層をこの順に
被覆し、 研磨用モニター抵抗のリード線と上記磁気コア
の巻線とを同時に加工し、 次に上記密着層により研磨用モニター抵抗部分
を形成したことを特徴とする薄膜磁気ヘツドの製
造方法。[Claims] 1. On the magnetic material forming the lower core, an adhesion layer for adhering the conductive layer constituting the winding of the magnetic core, and a conductive layer constituting the winding of the magnetic core in this order. A method for producing a thin film magnetic head, characterized in that the lead wire of the polishing monitor resistor and the winding of the magnetic core are simultaneously processed, and then the polishing monitor resistor portion is formed using the adhesive layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15715981A JPS5857613A (en) | 1981-09-30 | 1981-09-30 | Production of thin film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15715981A JPS5857613A (en) | 1981-09-30 | 1981-09-30 | Production of thin film magnetic head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5857613A JPS5857613A (en) | 1983-04-05 |
| JPH0118497B2 true JPH0118497B2 (en) | 1989-04-06 |
Family
ID=15643467
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15715981A Granted JPS5857613A (en) | 1981-09-30 | 1981-09-30 | Production of thin film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5857613A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2770823B2 (en) * | 1996-08-22 | 1998-07-02 | 日本電気株式会社 | Thin film magnetic head and method of manufacturing the same |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5625221A (en) * | 1979-08-07 | 1981-03-11 | Fujitsu Ltd | Manufacture of thin-film magnetic head |
-
1981
- 1981-09-30 JP JP15715981A patent/JPS5857613A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5857613A (en) | 1983-04-05 |
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