JPH01201815A - Thin film magnetic head - Google Patents
Thin film magnetic headInfo
- Publication number
- JPH01201815A JPH01201815A JP2622088A JP2622088A JPH01201815A JP H01201815 A JPH01201815 A JP H01201815A JP 2622088 A JP2622088 A JP 2622088A JP 2622088 A JP2622088 A JP 2622088A JP H01201815 A JPH01201815 A JP H01201815A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- layer
- piezoelectric layer
- thin film
- voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/035—Measuring direction or magnitude of magnetic fields or magnetic flux using superconductive devices
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/35—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only having vibrating elements
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- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Measuring Magnetic Variables (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、磁気記録媒体からの情報を読み取る薄膜磁気
ヘッドに関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a thin film magnetic head for reading information from a magnetic recording medium.
情報を磁気的に記録・再生する技術は、オーディオ、ビ
デオ、コンピュータ等の広い分野に応用されており、情
報の記録・再生・消去が容易であり、記録媒体が低コス
トで作製でき、記録密度が高く、不揮発性であって、記
録媒体を容易にテープ状にし得る等の優れた特長を有す
る。The technology for recording and reproducing information magnetically is applied to a wide range of fields such as audio, video, and computers, and it is easy to record, reproduce, and erase information, and recording media can be manufactured at low cost, and recording density is high. It has excellent features such as high viscosity, non-volatility, and the ability to easily form a recording medium into a tape.
さらに、機器の小型化、記録の高密度化が進み、より飽
和磁束密度が高い小型、軽量の磁気ヘッドが必要とされ
ている。Furthermore, as devices become smaller and recording becomes more dense, there is a need for smaller, lighter magnetic heads with higher saturation magnetic flux density.
就中、オーディオの分野で急速に普及している携帯用コ
ンパクトカセットテープレコーダの小型化は顕著であっ
て、小型、軽量でありながら音質。In particular, the miniaturization of portable compact cassette tape recorders, which are rapidly becoming popular in the audio field, is remarkable.
ダイナミックレンジの優れた機器が求められている。Equipment with excellent dynamic range is required.
例えば、前述のようなコンパクトカセットテープレコー
ダでは、電子回路は薄膜化が進んで小型。For example, in the compact cassette tape recorder mentioned above, the electronic circuitry has become thinner and smaller.
軽量化に貢献しているが、磁気ヘッドはコイルが必要で
あることから薄膜化が進んでおらず、機器の容積に占め
るヘッドの割合が大きくなってきている。Although it contributes to weight reduction, because magnetic heads require coils, thinning of the film has not progressed, and the proportion of the head in the volume of the device is increasing.
しかし、コンパクトカセットテープレコーダ等は再生専
用機が主流であって、必ずしも磁気ヘッドにコイルは必
要ではない。However, compact cassette tape recorders and the like are mainly playback-only machines, and the magnetic head does not necessarily require a coil.
また、高保磁力のメタルテープ等に対応させるためには
、磁気ヘッドに1万ガウス以上の高い飽和磁束密度を有
する材料が必要である。Furthermore, in order to be compatible with metal tapes with high coercivity, the magnetic head needs to be made of a material with a high saturation magnetic flux density of 10,000 Gauss or more.
ところが、飽和磁束密度の高い材料は、結晶材料では、
透磁率の高さ、耐摩耗性等の実用性を考慮するとセンダ
スト系合金に限られるが、センダスト系合金では1万ガ
ウスの飽和磁束密度が限度であり、また鼻品質材料では
、コバルト(Co)系非晶質合金があるが、温度に対す
る安定性が低いという問題点がある。However, materials with high saturation magnetic flux density are crystalline materials.
Considering practicality such as high magnetic permeability and wear resistance, it is limited to Sendust alloys, but Sendust alloys have a maximum saturation magnetic flux density of 10,000 Gauss, and nose quality materials include cobalt (Co). There are amorphous alloys, but they have the problem of low stability against temperature.
本発明はこのような課題を解決するためになされたもの
であって、飽和磁束密度が高く、小型。The present invention was made to solve these problems, and has a high saturation magnetic flux density and a small size.
軽量の磁気ヘッドを提供することを目的とする。The purpose is to provide a lightweight magnetic head.
本発明に係る磁気ヘッドは、超電導体薄膜と、該超電導
体薄膜のマイスナ効果により生じる磁場への反発力を応
力として感知する圧電体*ny、=が積層され、この積
層体に該圧電体薄膜が感知した応力によって生じた電圧
を外部回路に出力する電極を備えたことを特徴とする。The magnetic head according to the present invention includes a superconductor thin film and a piezoelectric material *ny,= which senses the repulsion force to a magnetic field generated by the Meissner effect of the superconductor thin film as stress, and the piezoelectric thin film It is characterized by being equipped with an electrode that outputs the voltage generated by the stress sensed by the sensor to an external circuit.
本発明に係る磁気ヘッドは、超電導体薄膜のマイスナ効
果による磁場への反発力が圧電体薄膜に応力として印加
され、印加された応力に応じた電位差が圧電体Wi膜に
生じ、この電位差を電極を介して外部回路に出力する。In the magnetic head according to the present invention, the repulsion force against the magnetic field due to the Meissner effect of the superconductor thin film is applied to the piezoelectric thin film as stress, a potential difference corresponding to the applied stress is generated in the piezoelectric Wi film, and this potential difference is transferred to the electrodes. Output to external circuit via.
以下、本発明をその実施例を示す図面に基づき詳述する
。第1図は本発明に係る薄膜磁気へラドの構成を示す模
式的断面図であって、図中1は、磁界に反応する、例え
ばBa Y Cu O等の酸化物薄膜からなる超電導体
層である。超電導体層1は、W。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described in detail below based on drawings showing embodiments thereof. FIG. 1 is a schematic cross-sectional view showing the structure of a thin film magnetic helad according to the present invention, in which 1 is a superconductor layer made of a thin film of oxide such as Ba Y Cu O, etc., which responds to a magnetic field. be. The superconductor layer 1 is made of W.
Ti、Cr等の金属からなる電極層3.4をその両面に
積層した、チタン酸バリウム等の薄膜からなる圧電体層
2に、一方の電極層4を介して積層され、窒化ケイ素、
酸化ケイ素の絶縁体からなる下部保護層5によって保護
され、下部保護層5の上面は、窒化チタン、窒化クロム
等の耐摩耗性を有する薄膜からなる上部保護層6が積層
され、薄膜磁気ヘッドの摩耗を防止している。The piezoelectric layer 2 is made of a thin film such as barium titanate, on which electrode layers 3.4 made of metals such as Ti and Cr are laminated on both sides, and the piezoelectric layer 2 is laminated with one electrode layer 4 interposed therebetween.
It is protected by a lower protective layer 5 made of an insulator of silicon oxide, and the upper surface of the lower protective layer 5 is laminated with an upper protective layer 6 made of a wear-resistant thin film such as titanium nitride or chromium nitride. Prevents wear.
第4図は本発明に係る薄膜磁気ヘッドの動作原理を説明
する図であって、帯磁した磁気テープ7からの磁界Bを
超電導体層1が通過すると、超電導体層1は、マイスナ
効果によりその内部に磁束Bが入り込まないように反発
するため、超電導体層1表面に反発力Fが生じ、その反
発力Fが応力として圧電体層2に加わり、圧電体層・2
の表面に電荷Qが発生する0発生した電荷Qにより生じ
た圧電体層2の両側の電位差Vが電圧信号として電極層
3.4から外部回路へ出力される。FIG. 4 is a diagram illustrating the operating principle of the thin-film magnetic head according to the present invention. When the superconductor layer 1 passes through the magnetic field B from the magnetized magnetic tape 7, the superconductor layer 1 is In order to repel the magnetic flux B so that it does not enter inside, a repulsive force F is generated on the surface of the superconductor layer 1, and this repulsive force F is applied as stress to the piezoelectric layer 2, causing the piezoelectric layer 2 to
A potential difference V between both sides of the piezoelectric layer 2 caused by the generated charge Q is output from the electrode layer 3.4 to an external circuit as a voltage signal.
外部回路へ出力された電圧Vは、圧電体層2に対する応
力である反発力Fに比例し、反発力Fは、磁束Bの磁気
強度の二乗に比例するため、電圧■は磁束Bの磁気強度
の二乗に比例する。従って、磁束Bの磁気強度を検出す
るためには、電圧として出力された信号に微分処理を施
せばよい。The voltage V output to the external circuit is proportional to the repulsive force F, which is the stress on the piezoelectric layer 2, and the repulsive force F is proportional to the square of the magnetic intensity of the magnetic flux B. Therefore, the voltage V is the magnetic intensity of the magnetic flux B. is proportional to the square of Therefore, in order to detect the magnetic intensity of the magnetic flux B, it is sufficient to perform differential processing on the signal output as a voltage.
なお、磁気ヘッドの大きさは、磁気テープ7の幅方向を
幅、長さ方向を長さとすれば、幅は磁気テープの幅以上
、例えばカセットテープでは4m以上、長さは超電導体
層1の長さ以上であって、磁気テープ7と潤滑に接し得
る長さであればよく、また超電導体層1の幅は磁気テー
プ7のトラック幅に対応させて500μ−以下とする。The size of the magnetic head is, assuming that the width is the width and the length is the length of the magnetic tape 7, the width is equal to or greater than the width of the magnetic tape, for example, 4 m or more for a cassette tape, and the length is equal to or greater than the superconductor layer 1. The superconductor layer 1 may be of any length as long as it can be in lubricious contact with the magnetic tape 7, and the width of the superconductor layer 1 should be 500 μm or less in correspondence with the track width of the magnetic tape 7.
第3図は、超電導体層1を形成するために使用される高
周波(ラジオ周波数: radio frequenc
y:RF)スパッタリング装置の模式的断面図であって
、図中30は反応容器である0反応容器30の内部には
、マツチングユニット33を介して高周波電源34から
RF電力が供給されるRF電極を葦ね、試料を加熱する
ヒータ39と、ヒータ39を内蔵し、試料を支持する試
料支持台31と、該試料支持台31に対向し−てターゲ
ット基板40を支持し、これに電圧を印加する対向電極
35とを備え、反応容器30の一端側は外部に開口され
、ガス導入部37が図示しないマスフローコントローラ
に接続され、また他の一端側は外部に開口され、排気部
36が図示しない拡散ポンプに接続される。また、試料
支持台31は絶縁体32によって反応容器30に支持さ
れている。FIG. 3 shows the radio frequency (radio frequency) used to form the superconductor layer 1.
y: RF) is a schematic cross-sectional view of a sputtering apparatus, in which reference numeral 30 denotes a reaction vessel; A heater 39 with electrodes and a heater 39 for heating the sample, a sample support stand 31 containing the heater 39 and supporting the sample, a target substrate 40 supported opposite the sample support stand 31, and a voltage applied thereto. One end of the reaction vessel 30 is opened to the outside, a gas introduction part 37 is connected to a mass flow controller (not shown), and the other end is opened to the outside, and an exhaust part 36 is not shown. Not connected to a diffusion pump. Further, the sample support stand 31 is supported by the reaction container 30 by an insulator 32.
次に、本発明に係る薄膜磁気ヘッドの製造工程を第2図
に示す製造工程の説明図及び第3図に示すRFスパッタ
リング装置の模式的断面図に基づき説明する。本実施例
では、圧電体層2を基板とする。Next, the manufacturing process of the thin film magnetic head according to the present invention will be explained based on the explanatory diagram of the manufacturing process shown in FIG. 2 and the schematic cross-sectional view of the RF sputtering apparatus shown in FIG. In this embodiment, the piezoelectric layer 2 is used as a substrate.
十分に洗浄されたチタン酸バリウムからなる圧電体層2
の基板両面に、電子ビーム蒸着法により厚さ1μmにわ
たって、Tiからなる電極層3.4を形成する(第2図
(al)。Piezoelectric layer 2 made of thoroughly cleaned barium titanate
Electrode layers 3.4 made of Ti are formed on both sides of the substrate to a thickness of 1 μm by electron beam evaporation (FIG. 2 (al)).
次に、電極層3,4が形成された圧電体層2をRFスパ
ッタリング装置の反応容器30内の試料支持台31に載
置し、排気部36に接続した拡散ポンプにて反応容器3
0内の減圧を開始するとともに、ヒータ39に給電して
、圧電体層2の温度を650℃に安定させる。反応容器
30内の圧力が5 X 10−7Torr以下に低下し
た時点で、ガス導入部37に接続されたマスフローコン
トローラによってアルゴン(Ar)と酸素(02)との
混合ガス(Ar : 02 !10 : 7 )を導
入し、反応容器30内の圧力を2 X 10−2Tor
rに保つ。5分後、マツチングユニット33を調節しな
がら高周波電源34をオンにして試料支持台31へ供給
電圧1.4kVの給電を開始し、試料支持台と対向電極
35上に載置されたBa Y Cu Oからなるターゲ
ット基板40との間に30分間にわたってプラズマを発
生させ、圧電体層2上に厚さl11m+のBa Y C
u Oからなる超電導体層1を形成する(第2図(bl
)。Next, the piezoelectric layer 2 on which the electrode layers 3 and 4 have been formed is placed on the sample support stand 31 in the reaction container 30 of the RF sputtering device, and the reaction container 30 is
At the same time as starting to reduce the pressure to within 0°C, power is supplied to the heater 39 to stabilize the temperature of the piezoelectric layer 2 at 650°C. When the pressure inside the reaction vessel 30 drops to 5 X 10-7 Torr or less, a mixed gas of argon (Ar) and oxygen (02) (Ar: 02!10: 7), and the pressure inside the reaction vessel 30 was increased to 2 x 10-2 Torr.
Keep r. After 5 minutes, while adjusting the matching unit 33, the high frequency power supply 34 was turned on to start supplying power with a voltage of 1.4 kV to the sample support stand 31, and the Ba Y placed on the sample support stand and the counter electrode 35 was turned on. Plasma is generated for 30 minutes between the target substrate 40 made of CuO, and BaYC with a thickness of l11m+ is formed on the piezoelectric layer 2.
A superconductor layer 1 made of uO is formed (Fig. 2 (bl
).
さらに、超電導体層1を形成した後、高周波電源34を
オフにし、ガス導入部37のパルプを閉鎖してガス導入
を停止する。圧電体層2の温度が70℃に低下した時点
で、反応容器30を開放して電極層3.4及び超電導体
層1が積層された圧電体層2を反応容器30から取り出
す。Further, after forming the superconductor layer 1, the high frequency power source 34 is turned off, the pulp of the gas introduction section 37 is closed, and the gas introduction is stopped. When the temperature of the piezoelectric layer 2 drops to 70° C., the reaction vessel 30 is opened and the piezoelectric layer 2 on which the electrode layer 3.4 and the superconductor layer 1 are laminated is taken out from the reaction vessel 30.
次に、超電導体層1にレジスト10を塗布しく第2図(
C1)、磁場を検出する超電導体N1に相当する部分以
外のレジスト10を露光、現像により除去しく第2図(
d)) 、[いてドライエツチング法により、磁場を検
出する部分以外の超電導体層1を除去しく第2図(el
)、さらにレジス目0を除去する(第2図(f))。こ
のようにして、超電導体層1を長さ5μm9幅500μ
清の部分を残してバターニング加工する。Next, a resist 10 is applied to the superconductor layer 1 (see FIG. 2).
C1), the resist 10 other than the part corresponding to the superconductor N1 that detects the magnetic field is removed by exposure and development.
d)) [The superconductor layer 1 other than the part that detects the magnetic field is removed by dry etching.
), and further remove the registration mark 0 (FIG. 2(f)). In this way, the superconductor layer 1 is formed to have a length of 5 μm and a width of 500 μm.
Process buttering leaving the clear part.
パターニング加工した超電導体層1・上に、プラズマC
VD法によって、厚さ1μ−の窒化ケイ素膜からなる下
部保護層5を形成する(第2図(81)。Plasma C is placed on the patterned superconductor layer 1.
A lower protective layer 5 made of a silicon nitride film with a thickness of 1 μm is formed by the VD method (FIG. 2 (81)).
さらに、下部保護層5上に、プラズマCVD法。Further, on the lower protective layer 5, a plasma CVD method is applied.
イオンブレーティング法等によって、厚さ1μ−の窒化
チタン膜からなる耐摩耗性の上部保護層6を形成する(
第2図(h))。A wear-resistant upper protective layer 6 made of a titanium nitride film with a thickness of 1 μm is formed by an ion blating method or the like (
Figure 2 (h)).
最後に、圧電体層2を所要寸法に加工する。Finally, the piezoelectric layer 2 is processed to the required dimensions.
なお、本実施例では電極層3,4を圧電体層2に平行に
積層したが、これらを圧電体層2の側面に形成してもよ
い。In this embodiment, the electrode layers 3 and 4 are laminated in parallel to the piezoelectric layer 2, but they may be formed on the side surface of the piezoelectric layer 2.
以上のようにして形成された薄膜磁気ヘッドの特性を数
値を引用して以下に述べる。なお、超電導体層lの臨界
温度Tcは90K(ケルビン)、臨界磁場Hcは30T
(テスラ)であった。The characteristics of the thin film magnetic head formed as described above will be described below with reference to numerical values. The critical temperature Tc of the superconductor layer l is 90K (Kelvin), and the critical magnetic field Hc is 30T.
(Tesla).
基板とした圧電体層2の厚さが2鶴の場合、磁場100
0ガウスの時に圧電体層2から出力される電圧信号は6
0μV、 10000ガウスノ時に6 mV、 100
000ガウスの時に580+wVといった良好な信号再
生特性を示した。When the thickness of the piezoelectric layer 2 used as a substrate is 2 mm, the magnetic field is 100
The voltage signal output from the piezoelectric layer 2 at 0 Gauss is 6
0 μV, 6 mV at 10000 Gauss, 100
It showed good signal reproduction characteristics of 580+wV at 000 Gauss.
また、基板2の側面に電極層2を形成した磁器ヘッドの
場合、磁場10000ガウスの時に圧電体層2から出力
される電圧信号は70μVであった。この場合、磁気ヘ
ッドの厚さは2話、長さは10 m 。Further, in the case of a ceramic head in which the electrode layer 2 was formed on the side surface of the substrate 2, the voltage signal output from the piezoelectric layer 2 was 70 μV when the magnetic field was 10,000 Gauss. In this case, the thickness of the magnetic head is 2 mm, and the length is 10 m.
幅は6nであって、厚さが5〜Iotaある従来のコン
パクトカセットレコーダの磁気ヘッドと比較すると、磁
気ヘッドが大幅に小型、軽量化されている。The magnetic head is significantly smaller and lighter than the magnetic head of a conventional compact cassette recorder, which has a width of 6n and a thickness of 5 to 100 ota.
なお、本実施例では圧電体層2を基板として作製したが
、石英等を基板としてこの上に圧電体層。In this example, the piezoelectric layer 2 was produced as a substrate, but a piezoelectric layer was formed on a substrate made of quartz or the like.
超電導体層及び電極層を形成してもよい。A superconductor layer and an electrode layer may be formed.
、また、本実施例では圧電体層2及び超電導体層を1組
111rti形成したが、これらを複数組積層してもよ
い。Furthermore, in this embodiment, one set of the piezoelectric layer 2 and the superconductor layer was formed at 111rti, but a plurality of sets of these may be laminated.
さらに、Siを基板とすれば、圧電体層2から出力され
る電圧信号の処理回路も磁気ヘッドと同一基板上に作製
でき、この場合は信号処理回路も含めて小型軽量化を図
り得る。Furthermore, if Si is used as the substrate, the processing circuit for the voltage signal output from the piezoelectric layer 2 can also be fabricated on the same substrate as the magnetic head, and in this case, the size and weight of the signal processing circuit can be reduced.
本発明に係る薄膜磁気ヘッドは、超電導体層と圧電体層
とを薄膜形成し、超電導体層のマイスナ効果による磁場
への反発力を応力として圧電体層に加え、加えられた応
力に応じた電圧信号を電極を介して取り出すことにより
、薄膜磁気ヘッドの飽和磁束密度を高め、小型軽量化す
るという優れた効果を奏する。The thin-film magnetic head according to the present invention has a superconductor layer and a piezoelectric layer formed into thin films, applies repulsive force to a magnetic field due to the Meissner effect of the superconductor layer as stress to the piezoelectric layer, and generates a magnetic field according to the applied stress. By extracting the voltage signal through the electrodes, the saturation magnetic flux density of the thin-film magnetic head is increased and the excellent effect of reducing the size and weight of the thin-film magnetic head is achieved.
第1図は本発明に係る薄膜磁気ヘッドの模式的断面図、
第2図はその製造工程を示す模式図、第3図はその製造
に使用する高周波スパッタリング装置の模式的断面図、
第4図はその原理を説明する図である。
l・・・超電導体層 2・・・圧電体層 3.4・・・
電極層時 許 出願人 住友金属工業株式会社代理人
弁理士 河 野 登 夫h)
(b)
(C)
簗 29
(e)
(f)
(g)
(h)
弔 4 図
↓
I 3 図FIG. 1 is a schematic cross-sectional view of a thin film magnetic head according to the present invention;
FIG. 2 is a schematic diagram showing the manufacturing process, and FIG. 3 is a schematic cross-sectional view of the high frequency sputtering equipment used in the manufacturing.
FIG. 4 is a diagram explaining the principle. l...Superconductor layer 2...Piezoelectric layer 3.4...
Electrode Layer Xu Applicant Sumitomo Metal Industries Co., Ltd. Agent
Patent attorney Noboru Kono h) (b) (C) Yan 29 (e) (f) (g) (h) Funeral 4 Figure ↓ I 3 Figure
Claims (1)
より生じる磁場への反発力を応力として感知する圧電体
薄膜とが積層され、この積層体に該圧電体薄膜が感知し
た応力によって生じた電圧を外部回路に出力する電極を
備えたことを特徴とする薄膜磁気ヘッド。1. A superconductor thin film and a piezoelectric thin film that senses the repulsion to the magnetic field generated by the Meissner effect of the superconductor thin film as stress are laminated, and a voltage generated by the stress sensed by the piezoelectric thin film is generated in this laminate. A thin film magnetic head characterized by being equipped with an electrode that outputs a signal to an external circuit.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2622088A JPH01201815A (en) | 1988-02-05 | 1988-02-05 | Thin film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2622088A JPH01201815A (en) | 1988-02-05 | 1988-02-05 | Thin film magnetic head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01201815A true JPH01201815A (en) | 1989-08-14 |
Family
ID=12187309
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2622088A Pending JPH01201815A (en) | 1988-02-05 | 1988-02-05 | Thin film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01201815A (en) |
-
1988
- 1988-02-05 JP JP2622088A patent/JPH01201815A/en active Pending
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