JPH01208499A - Electrode for electroplating - Google Patents
Electrode for electroplatingInfo
- Publication number
- JPH01208499A JPH01208499A JP3456288A JP3456288A JPH01208499A JP H01208499 A JPH01208499 A JP H01208499A JP 3456288 A JP3456288 A JP 3456288A JP 3456288 A JP3456288 A JP 3456288A JP H01208499 A JPH01208499 A JP H01208499A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- steel sheet
- metal
- plating
- anodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000009713 electroplating Methods 0.000 title claims abstract description 26
- 229910052751 metal Inorganic materials 0.000 claims abstract description 29
- 239000002184 metal Substances 0.000 claims abstract description 29
- 229910000831 Steel Inorganic materials 0.000 claims abstract description 28
- 238000007747 plating Methods 0.000 claims abstract description 28
- 239000010959 steel Substances 0.000 claims abstract description 28
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 9
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 8
- 238000005868 electrolysis reaction Methods 0.000 claims abstract description 7
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 7
- 239000000463 material Substances 0.000 claims abstract description 6
- 229910052741 iridium Inorganic materials 0.000 claims abstract description 3
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 8
- 239000010936 titanium Substances 0.000 claims description 8
- -1 platinum group metal oxide Chemical class 0.000 claims description 6
- 239000007772 electrode material Substances 0.000 claims description 5
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 4
- 239000011247 coating layer Substances 0.000 claims description 4
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical group O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 claims description 4
- 229910000457 iridium oxide Inorganic materials 0.000 claims description 4
- 150000004706 metal oxides Chemical class 0.000 claims description 4
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 2
- 229910052787 antimony Inorganic materials 0.000 claims description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 2
- 238000000034 method Methods 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 239000011733 molybdenum Substances 0.000 claims description 2
- 229910052758 niobium Inorganic materials 0.000 claims description 2
- 239000010955 niobium Substances 0.000 claims description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 2
- 229910052762 osmium Inorganic materials 0.000 claims description 2
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 claims description 2
- 229910052763 palladium Inorganic materials 0.000 claims description 2
- 229910052703 rhodium Inorganic materials 0.000 claims description 2
- 239000010948 rhodium Substances 0.000 claims description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 2
- 229910052707 ruthenium Inorganic materials 0.000 claims description 2
- 229910052709 silver Inorganic materials 0.000 claims description 2
- 239000004332 silver Substances 0.000 claims description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 239000010937 tungsten Substances 0.000 claims description 2
- 239000007789 gas Substances 0.000 abstract description 14
- 239000000126 substance Substances 0.000 abstract 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 1
- 239000001301 oxygen Substances 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910000978 Pb alloy Inorganic materials 0.000 description 1
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000011162 core material Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000005246 galvanizing Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
Landscapes
- Electroplating Methods And Accessories (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、連続電気メッキ構内に配設され、鋼板表面に
メッキ処理を施すための電気メッキ用電極に関するもの
である。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to an electroplating electrode that is installed in a continuous electroplating facility and is used to plate the surface of a steel plate.
(従来の技術)
現在、鋼板の電気メッキは亜鉛、錫、銅、ニッケル、ク
ロームの単独、又はこれらの合金、更にはこれらの金属
による多層メッキが行われ、多品種の防食及び装飾鋼板
が大量に連続的に生産されている。この連続電気メッキ
構内で使用され陽極となる電極は、1対で構成され被処
理材である鋼板は1対の電極間を高速で搬送される。(Prior art) Currently, electroplating of steel sheets is carried out using zinc, tin, copper, nickel, chromium alone, alloys of these metals, or multilayer plating of these metals, and a large number of various types of anticorrosive and decorative steel sheets are produced. It is produced continuously. The electrodes that are used in this continuous electroplating facility and serve as anodes are comprised of a pair, and the steel plate that is the material to be treated is transported between the pair of electrodes at high speed.
この電極としては、かつて消耗N極が使用されていたが
、その後鉛を主成分とする不溶性電極。A consumable N-electrode was once used as this electrode, but later an insoluble electrode whose main component was lead.
すなわち鉄芯材の周囲を金属チタンで被覆し、更にその
表面に鉛あるいは鉛−錫合金等をホモゲン溶着させた板
状体が通常使用されてきた。このような鉛を主成分とす
る平板電極は、不溶性とはいえ可成りの消耗が認められ
ること、また溶解物が製品に混じり製品品質に問題が生
ずること等の理由で、白金被覆電極の使用が一部実施さ
れた。この電極は不溶性電極としての効果を挙げている
が経済的に問題がある。近年では白金族を主体とした金
属酸化物被覆電極が更に効率的であるとの理由で実用化
の段階に入っている。That is, a plate-like body in which the periphery of an iron core material is coated with metallic titanium and further homogeneously welded lead or a lead-tin alloy on the surface thereof has been used. The use of platinum-coated electrodes has been discouraged due to the fact that such flat plate electrodes, whose main component is lead, are subject to considerable wear and tear even though they are insoluble, and that melted materials may mix with the product, causing problems with product quality. were partially implemented. Although this electrode is effective as an insoluble electrode, it is economically problematic. In recent years, metal oxide-coated electrodes mainly made of platinum group metals have entered the stage of practical application because they are more efficient.
(発明が解決しようとする課題)
しかしながら従来の陽極となる電極は、何れも相当な重
量のある平板体である。例えば鉛平板電極は約幅100
0mm、長さ1800mm、厚さ30mmの大きざで溶
着される鉛合金の厚みは約15〜20mmとなり、白金
被覆電極、白金族等の金属酸化物被覆電極の場合も鉄板
に不溶性のチタン板を貼りその表面に白金又はそれらの
酸化物を付着させており、これら電極の1枚当りの重量
は約300〜60()kgにも及ぶ。このような重量物
は取扱い操作が甚だ困難である。(Problems to be Solved by the Invention) However, conventional electrodes serving as anodes are all flat plate bodies with considerable weight. For example, a lead plate electrode has a width of approximately 100 mm.
The thickness of the lead alloy welded in a size of 0 mm, length 1800 mm, and thickness 30 mm is approximately 15 to 20 mm, and in the case of platinum-coated electrodes and metal oxide-coated electrodes such as platinum group metals, an insoluble titanium plate is attached to the iron plate. Platinum or an oxide thereof is attached to the surface of the electrode, and each electrode weighs about 300 to 60 kg. Such heavy objects are extremely difficult to handle.
また電力消費を削減するために、極力極間を短縮してい
るので、特に高電流密度においては極間で発生するガス
の俵けが悪く、電圧の上昇と更に発生ガスの変動により
液圧が変化し、搬送中の鋼板が揺れて極間の著しい変動
を来たし遂には短絡専属す危険性がある。同時にメッキ
液のメッキ面への補給も十分でない場合は、メッキの着
きむらの原因の1つにもなり、鋼板の速度を上げて生産
能力の向上を図り難い等の問題点がある。In addition, in order to reduce power consumption, the gap between the poles is shortened as much as possible, so especially at high current densities, the gas generated between the poles is not well distributed, and the liquid pressure changes due to the increase in voltage and fluctuations in the gas generated. However, there is a risk that the steel plate shakes during transportation, causing significant fluctuations in the distance between the poles, and eventually causing a short circuit. At the same time, if the plating solution is not sufficiently replenished to the plating surface, this may be one of the causes of uneven plating deposition, and there are problems such as difficulty in increasing the speed of steel sheet processing and improving production capacity.
(課題を解決するための手段)
本発明者らは種々検討の結果、陽極となる電極として多
孔性電極を使用することにより、上記問題点を解決し得
ることを見出し、本発明を完成した。(Means for Solving the Problems) As a result of various studies, the present inventors have found that the above-mentioned problems can be solved by using a porous electrode as an electrode serving as an anode, and have completed the present invention.
本発明はすなわち、電極活性物質の被覆層を有する多孔
性金属陽極よりなる連続電気メッキ用電極、及びこの電
極を使用する鋼板の連続電気メッキ方法である。The present invention is thus an electrode for continuous electroplating consisting of a porous metal anode having a coating layer of electrode active material, and a method for continuous electroplating of steel sheets using this electrode.
金属陽極の被覆層でおる電極活性物質としては、白金族
金属すなわちイリジウム、ロジウム、パラジウム、ルテ
ニウム、オスミウムから選ばれた金属の酸化物の1種又
は2種以上を含有する物質が適当でおり、特に酸化イリ
ジウム又はこれにチタンあるいはタンタル等を含有させ
たものが好ましい。金属陽極の基材としてはチタン、ジ
ルコニウム、タンタル、ニオブ、タングステン、モリブ
デン、アンチモン等の不働性被膜を形成する金属あるい
は銀等の金属が挙げられ、実用的にはチタンが好ましい
。As the electrode active material in the coating layer of the metal anode, a material containing one or more metal oxides selected from platinum group metals, i.e., iridium, rhodium, palladium, ruthenium, and osmium, is suitable; In particular, iridium oxide or iridium oxide containing titanium, tantalum, etc. is preferable. Examples of the base material of the metal anode include metals that form passive films such as titanium, zirconium, tantalum, niobium, tungsten, molybdenum, and antimony, and metals such as silver, with titanium being preferred from a practical standpoint.
多孔性金属陽極の形状は任意であり、第1図に概略を示
すようにエキスパンドメタル(a)、パンチングメタル
(b)、粗孔網状体(C)、cThるいは日子状体(d
)等が例示されるが、−船釣にはエキスパンドメタルが
使用される。この電極の目の大きさは最大口開き1〜2
0mm程度である。The shape of the porous metal anode is arbitrary, and as schematically shown in Fig. 1, it can be expanded metal (a), punched metal (b), coarse pore network (C), cTh, or cylindrical body (d).
) etc., but - Expanded metal is used for boat fishing. The eye size of this electrode is the maximum opening of 1 to 2
It is about 0 mm.
第2図及び第3図は本発明電極が使用される垂直型電気
メッキ装置と水平型電気メッキ装置の概略図でおる。垂
直型電気メッキ装置は第2図に示すように、垂直型電気
メッキ槽(1)の鋼板入側及び出側の上方に設けられた
コンダクタ−ロール(2>(2>と、電気メッキ槽(1
)内の下部に8堪ブられたジンクロール(3)と、コン
ダクタ−ロール(2)(2>の各々とジンクロール(3
)との間において電気メッキ槽(1)内を移動中の鋼板
(4)を間にして、陰極となる鋼板(4)と平行に配置
された1対の垂直な陽極(5)(5)と(6)(6)と
からなっている。鋼板(4)はメッキ浴が収容されかつ
流れている電気メッキ槽(1)内を下方に次いで上方に
向って移動し、1対の陽極(5)’(5>及び(6)(
6)を通過する間に連続的に電気メッキされる。第2図
装置においては陽極(5)(6)に本発明電極を使用す
ることにより、電解時発生する酸素ガスは、電極が多孔
性でおるため、81111板(4)と陽極(5)又は(
6)との間のみならず、その背面にも逸出し、極間にお
ける滞留ガス量を大幅に減少することができ、これと共
にメッキ液の補給も十分に行うことができる。FIGS. 2 and 3 are schematic diagrams of a vertical electroplating apparatus and a horizontal electroplating apparatus in which the electrode of the present invention is used. As shown in Fig. 2, the vertical electroplating apparatus consists of conductor rolls (2>(2>) and electroplating tank ( 1
) and the conductor roll (2) and each of the conductor rolls (2) and the zinc roll (3
) a pair of vertical anodes (5) (5) arranged parallel to the steel plate (4) serving as the cathode, with the steel plate (4) moving in the electroplating tank (1) between them. It consists of (6) and (6). The steel plate (4) moves downward and then upward in the electroplating tank (1) in which a plating bath is contained and flowing, and a pair of anodes (5)'(5> and (6) (
6) is continuously electroplated during the passage. In the device shown in Figure 2, by using the electrodes of the present invention for the anodes (5) and (6), the oxygen gas generated during electrolysis is absorbed by the 81111 plate (4) and the anode (5) or (
6), it escapes not only between the electrodes but also on the back side thereof, and the amount of gas remaining between the electrodes can be significantly reduced, and at the same time, the plating solution can be sufficiently replenished.
水平型電気メッキ装置は第3図に示すように、水平型電
気メッキ槽(7)の鋼板入側及び出側に設けられた上下
1対のダムロール(8a>(8a>と(8b)(8b)
との間において、電気メッキ槽(7)内を移動中の鋼板
(4)を間にして、陰極となる鋼板(4)と平行に配置
された1対の水平な陽極(5a>(5b)と(6a)(
6bL!:からなっている。鋼板(4)はメッキ浴が収
容されかつ流れている電気メッキ槽(7)内を移動し、
1対の陽極(5a)(5b)及び(6a>(6b)を通
過する間に連続的に電気メッキされる。As shown in Fig. 3, the horizontal electroplating apparatus has a pair of upper and lower dam rolls (8a>(8a> and (8b) (8b )
A pair of horizontal anodes (5a>(5b) are placed parallel to the steel plate (4) that will serve as the cathode, with the steel plate (4) moving in the electroplating tank (7) in between. and (6a) (
6bL! : It consists of. The steel plate (4) moves in an electroplating tank (7) in which a plating bath is contained and flowing;
Electroplating is performed continuously while passing through a pair of anodes (5a) (5b) and (6a>(6b)).
第3図装置においては、上方の陽極(5a)(6a)と
して本発明陽極を使用することにより、電解時発生する
酸素ガスは電極が多孔性であるため背面に逸出し、極間
における滞留ガス量を大幅に減少することができ、これ
と共にメッキ液の補給も十分に行うことかできる。なお
下方の陽極(5b)(6b)もメッキ液の補給面より多
孔性陽極を使用することが好ましい。In the device shown in Fig. 3, by using the anodes of the present invention as the upper anodes (5a) and (6a), the oxygen gas generated during electrolysis escapes to the back side because the electrodes are porous, and the remaining gas between the electrodes The amount of plating solution can be significantly reduced, and at the same time, the plating solution can be sufficiently replenished. Note that it is preferable to use porous anodes for the lower anodes (5b) and (6b) from the perspective of replenishing the plating solution.
(作 用)
上記のように、本発明電極は多孔性であるため、極間に
滞留しやすい発生ガスが容易に逸出され電圧の降下に奇
与し得る。また多孔性金属陽極2例えばエキスパンドメ
タルの放電面は全てエツジ形状となっているため、従来
の金属陽極に比べてその周囲に集中するエツジ電流が減
少し電流分布が良好になる。また多孔性陽極を使用する
ことによりカット面すべてが電極面として作用し、かつ
ガス扱けが良好なため、従来の陽極と比較して液−ガス
の流れによるエロージョンの影響が少くなり、電極の寿
命の長期化が図られる。(Function) As described above, since the electrode of the present invention is porous, the generated gas that tends to stay between the electrodes can easily escape and cause a voltage drop. Furthermore, since the discharge surface of the porous metal anode 2, for example, an expanded metal, is entirely edge-shaped, the edge current concentrated around it is reduced compared to a conventional metal anode, resulting in a better current distribution. In addition, by using a porous anode, the entire cut surface acts as an electrode surface, and gas handling is good, so compared to conventional anodes, the influence of erosion due to liquid-gas flow is reduced, and the electrode has a long lifespan. The long term will be extended.
実施例1 第4図に示すアクリル製実験槽(200mm 4方。Example 1 Acrylic experimental tank (200 mm, 4 sides) shown in Figure 4.
高さ200mm> (9)を使用し鋼板の亜鉛電気メ
ッキを行った。長さ150mm、幅15mm、厚さ2m
mのチタン板の試料片、及び同じ大ぎざのチタン板を加
工した目開き2mmのエキスパンドメタルの試料片を作
製した。これら2種の試料片の長さ方向一端より75m
mまでの面に、酸化イリジウム被覆槽(10)を施して
陽極(11)とし、同じ寸法の鋼板を陰極(12)とし
、下記組成のメッキ液(13)を入れて下記条件で電解
を行った。Height: 200 mm> Zinc electroplating of a steel plate was performed using (9). Length 150mm, width 15mm, thickness 2m
A sample piece of a titanium plate with a diameter of 2 mm, and a sample piece of expanded metal with an opening of 2 mm made by processing a titanium plate with the same large serrations were prepared. 75m from one end in the length direction of these two types of specimens
An iridium oxide coating tank (10) was applied to the surface up to m to serve as an anode (11), a steel plate of the same size was used as a cathode (12), a plating solution (13) of the following composition was added, and electrolysis was performed under the following conditions. Ta.
メッキ液組成 Na2 SOa 100g/、
1!znso4−7H20300(II/、1!pHi
、o〜1.2
極間距離 5mm
電解温度 55〜60’C
電流密度 80八/dm2
なおメッキ液はポンプにて循環させ、液濃度は時々高濃
度メッキ液を添加して濃度調整を行った。Plating solution composition Na2 SOa 100g/,
1! znso4-7H20300 (II/, 1!pHi
, o ~ 1.2 Distance between electrodes: 5 mm Electrolysis temperature: 55 to 60'C Current density: 808/dm2 The plating solution was circulated by a pump, and the concentration of the solution was adjusted by occasionally adding a high concentration plating solution. .
また陰極は析出物により著しく極間距離が小にならぬよ
う定期的にかぎ取った。その結果を第1表に示す。また
、電流密度と摺電圧との関係を第5図に示す。In addition, the cathode was periodically scraped to prevent the distance between the electrodes from becoming too small due to deposits. The results are shown in Table 1. Moreover, the relationship between current density and sliding voltage is shown in FIG.
第 1 表
陽極ガス発生 対面側のみ 陽極の両面型 聞
18.2!;l 11.Oq実施例2
実施例1と同様の装置を使用し、下記のメッキ液組成に
変えた以外は同様の条件で鋼板の錫メッキを行った。No. 1 Front anode gas generation Only on the opposite side Double-sided anode
18.2! ;l 11. Oq Example 2 Using the same apparatus as in Example 1, tin plating of a steel plate was carried out under the same conditions except that the plating solution composition was changed to the following.
メッキ液組成 Na2SO4100g/NSnSO
440!l]/j
pHO,8〜1.0
極間距離 7mm
電流密度 40A/dm2
その結果を第2表に示す。Plating solution composition Na2SO4100g/NSnSO
440! l]/j pHO, 8 to 1.0 Distance between electrodes 7 mm Current density 40 A/dm2 The results are shown in Table 2.
第 2 表
以上のように、本発明電極によれば従来の電極を使用し
た場合に比較して低電圧で鋼板の亜鉛メッキもしくは錫
メッキを行うことができる。As shown in Table 2, the electrode of the present invention allows galvanizing or tin plating of a steel plate at a lower voltage than when using a conventional electrode.
(発明の効果)
本発明の多孔性陽極を使用して鋼板表面の連続メッキ処
理を行うことにより、従来の平板陽極を使用する場合に
比べ次のような効果を生ずる。(Effects of the Invention) By performing continuous plating treatment on the surface of a steel plate using the porous anode of the present invention, the following effects are produced compared to the case where a conventional flat plate anode is used.
i)電極自体が軽便化され取扱いが容易になる。i) The electrode itself is lighter and easier to handle.
11)発生ガスの逸散が容易であって電圧の降下に有効
であり電極の寿命も長期化される。11) The generated gas can be easily dissipated, which is effective in reducing the voltage, and the life of the electrode can be extended.
1!i)発生ガス逸散の容易化により、メッキ液の陰極
面への供給が十分に行われ、メッキの看ぎむらの原因の
防止2品質の向上に有効であり、また電流密度を高めら
れるので鋼板の搬送速度が高められ生産性が向上する。1! i) By facilitating the dissipation of generated gas, the plating solution is sufficiently supplied to the cathode surface, which is effective in preventing the causes of uneven plating 2 and improving the quality, and increasing the current density. The conveyance speed of steel plates is increased and productivity is improved.
iv)従来は発生ガスの滞留を防ぐため、メッキ液の流
速を増大する必要があったが、本発明によればガスの逸
散が容易であるのでその必要はなくなり動力費の削減が
可能である。iv) Conventionally, it was necessary to increase the flow rate of the plating solution in order to prevent the generated gas from stagnation, but according to the present invention, the gas can easily dissipate, so this is no longer necessary and power costs can be reduced. be.
■)発生ガス逸散の容易化により、液圧の変動が殆んど
なくなり、電解時における鋼板の“ゆらぎパが減少し、
陽陰極短絡防止に奇与し得る。■) By facilitating the dissipation of generated gas, fluctuations in liquid pressure are almost eliminated, and the fluctuation of the steel plate during electrolysis is reduced.
It can help prevent anode and cathode short circuits.
第1図は本発明多孔性金属陽極の多孔部分の形状を示す
概略図であり、第2図、第3図は本発明電極が使用され
る垂直型電気メッキ装置、及び水平型電気メッキ装置の
概略図である。また第4図は実施例に使用の実験装置概
略図、第5図は実施例1の電圧と電流密度との関係を示
すグラフである。
(1)・・・垂直型電気メッキ槽
(2)・・・コンダクタ−ロール
(3)・・・ジンクロール (4)・・・鋼板(5
>(6)・・・多孔性陽極
(7)・・・水平型電気メッキ槽
(8)・・・ダムロールFIG. 1 is a schematic diagram showing the shape of the porous part of the porous metal anode of the present invention, and FIGS. 2 and 3 are diagrams of a vertical electroplating device and a horizontal electroplating device in which the electrode of the present invention is used. It is a schematic diagram. Further, FIG. 4 is a schematic diagram of the experimental apparatus used in the example, and FIG. 5 is a graph showing the relationship between voltage and current density in Example 1. (1) Vertical electroplating tank (2) Conductor roll (3) Zinc roll (4) Steel plate (5
>(6)...Porous anode (7)...Horizontal electroplating tank (8)...Dam roll
Claims (7)
りなる連続電気メッキ用電極。(1) An electrode for continuous electroplating consisting of a porous metal anode with a coating layer of electrode active material.
グメタル、網状、又は簀子状である請求項1に記載の電
極。(2) The electrode according to claim 1, wherein the porous metal anode has an expanded metal, punched metal, net shape, or screen shape.
1又は2に記載の電極。(3) The electrode according to claim 1 or 2, wherein the electrode active material contains an oxide of a platinum group metal.
ラジウム、ルテニウム、オスミウムより選ばれた金属の
酸化物の1種又は2種以上である請求項3に記載の電極
。(4) The electrode according to claim 3, wherein the platinum group metal oxide is one or more metal oxides selected from iridium, rhodium, palladium, ruthenium, and osmium.
項3に記載の電極。(5) The electrode according to claim 3, wherein the platinum group metal oxide is iridium oxide.
ル、ニオブ、タングステン、モリブデン、アンチモン、
銀より選ばれた金属である請求項1より5のいずれかに
記載の電極。(6) The base material of the metal anode is titanium, zirconium, tantalum, niobium, tungsten, molybdenum, antimony,
The electrode according to any one of claims 1 to 5, which is a metal selected from silver.
使用し、メッキ浴中に搬送する鋼板を陰極としてメッキ
浴の電解を行うことを特徴とする鋼板の連続電気メッキ
方法。(7) A method for continuous electroplating of steel sheets, characterized in that a porous metal anode having a coating layer of an electrode active material is used, and electrolysis of the plating bath is carried out using the steel sheet conveyed into the plating bath as a cathode.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3456288A JPH01208499A (en) | 1988-02-17 | 1988-02-17 | Electrode for electroplating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3456288A JPH01208499A (en) | 1988-02-17 | 1988-02-17 | Electrode for electroplating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01208499A true JPH01208499A (en) | 1989-08-22 |
Family
ID=12417755
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3456288A Pending JPH01208499A (en) | 1988-02-17 | 1988-02-17 | Electrode for electroplating |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01208499A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0353563U (en) * | 1989-09-26 | 1991-05-23 | ||
| CN109790635A (en) * | 2016-12-28 | 2019-05-21 | Toto株式会社 | Electrolytic water generating device |
| WO2024111515A1 (en) | 2022-11-25 | 2024-05-30 | ディップソール株式会社 | Anode for electroplating, and method and system for electroplating article with metal |
| JP2024153365A (en) * | 2023-04-17 | 2024-10-29 | トヨタ自動車株式会社 | Metal film deposition equipment |
-
1988
- 1988-02-17 JP JP3456288A patent/JPH01208499A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0353563U (en) * | 1989-09-26 | 1991-05-23 | ||
| CN109790635A (en) * | 2016-12-28 | 2019-05-21 | Toto株式会社 | Electrolytic water generating device |
| WO2024111515A1 (en) | 2022-11-25 | 2024-05-30 | ディップソール株式会社 | Anode for electroplating, and method and system for electroplating article with metal |
| JP2024076825A (en) * | 2022-11-25 | 2024-06-06 | ディップソール株式会社 | Electroplating anode and method and system for electroplating an article with a metal - Patents.com |
| KR20240089488A (en) | 2022-11-25 | 2024-06-20 | 딥솔 가부시키가이샤 | Method and system for electroplating articles with anodes and metals for electroplating |
| US12546027B2 (en) | 2022-11-25 | 2026-02-10 | Dipsol Chemicals Co., Ltd. | Anode for electroplating, and method and system for electroplating articles with metal |
| JP2024153365A (en) * | 2023-04-17 | 2024-10-29 | トヨタ自動車株式会社 | Metal film deposition equipment |
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