JPH01209332A - Interference measuring apparatus - Google Patents
Interference measuring apparatusInfo
- Publication number
- JPH01209332A JPH01209332A JP3460988A JP3460988A JPH01209332A JP H01209332 A JPH01209332 A JP H01209332A JP 3460988 A JP3460988 A JP 3460988A JP 3460988 A JP3460988 A JP 3460988A JP H01209332 A JPH01209332 A JP H01209332A
- Authority
- JP
- Japan
- Prior art keywords
- lens
- light
- optical path
- diameter
- lens system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 claims description 36
- 230000004907 flux Effects 0.000 claims description 8
- 238000005259 measurement Methods 0.000 claims description 8
- 210000001747 pupil Anatomy 0.000 abstract description 3
- 238000000034 method Methods 0.000 abstract description 2
- 238000012360 testing method Methods 0.000 description 11
- 238000003384 imaging method Methods 0.000 description 6
- 238000005773 Enders reaction Methods 0.000 description 3
- 230000004075 alteration Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Landscapes
- Length Measuring Devices By Optical Means (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野コ −
本発明は、レンズ等の光学部品の光学性能をその透過波
面の歪みから測定するための干渉測定装置、いわゆる干
渉計に関するものであり、特に径が数ミリメートル以下
といった微小なレンズの光学性能測定に有用な干渉測定
装置に関する。[Detailed Description of the Invention] [Industrial Field of Application] The present invention relates to an interferometer, a so-called interferometer, for measuring the optical performance of an optical component such as a lens from the distortion of its transmitted wavefront. In particular, the present invention relates to an interference measurement device useful for measuring the optical performance of microlenses with a diameter of several millimeters or less.
[従来の技術]
レンズ、ミラー等の光学部品の光学性能の評価のため、
古くから干渉計測技術が開発され、種々の干渉i91定
装置、干渉計が市販され広く利用されている。[Prior art] For evaluating the optical performance of optical components such as lenses and mirrors,
Interference measurement technology has been developed for a long time, and various interference i91 determination devices and interferometers are commercially available and widely used.
第2図は、このような従来の干渉測定装置の一例である
。図中、1はHe−Neレーザ、2はビームエキスパン
ダであり、ビームエキスパンダ2で平行光束になったレ
ーザビームがビームスプリッタ3,4とミラー5,6と
で構成されるマツハツエンダ−干渉計に入射する。一方
の光路には対物レンズ7と被験レンズ8が置かれ、両レ
ンズは被験レンズ8を透過した光束が再び略平行光束に
なるように配置される。ビームスプリッタ4の後に、結
像レンズ9が置かれ、結像面10に被験レンズ8の瞳面
の像を結像させる。このとき、参照光路11を通った光
束の方向と、前記被験レンズ8を透過した後の物体光路
12の光束の方向を合せる事によって、結像面10に、
被験レンズ8の透過波面の干渉パターンが得られる。FIG. 2 shows an example of such a conventional interference measurement device. In the figure, 1 is a He-Ne laser, 2 is a beam expander, and the laser beam, which is made into a parallel beam by the beam expander 2, is sent to a Matsuhatsu Ender interferometer, which is composed of beam splitters 3, 4 and mirrors 5, 6. incident on . An objective lens 7 and a test lens 8 are placed on one optical path, and both lenses are arranged so that the light beam transmitted through the test lens 8 becomes a substantially parallel light beam again. An imaging lens 9 is placed after the beam splitter 4, and forms an image of the pupil plane of the test lens 8 on an imaging plane 10. At this time, by aligning the direction of the light flux passing through the reference optical path 11 and the direction of the light flux in the object optical path 12 after passing through the test lens 8,
An interference pattern of the transmitted wavefront of the test lens 8 is obtained.
第3図は、得られる干渉パターンの一例を示している。FIG. 3 shows an example of the resulting interference pattern.
良好な光学特性を持つ被験レンズであれば、第3図(a
)のような等間隔て直線状の干渉パターンが得られ、レ
ンズに収差が存在すれば、第3図(b)のように、その
収差量に応じて歪んだ干渉パターンが得られる。従って
、このようにして得た干渉パターンを例えばCCDカメ
ラで入力し、画像をA/D変換して計算機処理をする事
により、被験レンズの収差レベルを定全化する事が出来
る。If the test lens has good optical properties, the
) is obtained, and if there is an aberration in the lens, an interference pattern that is distorted according to the amount of aberration is obtained, as shown in FIG. 3(b). Therefore, by inputting the interference pattern thus obtained using, for example, a CCD camera, A/D converting the image, and performing computer processing, it is possible to stabilize the aberration level of the lens under test.
[発明が解決しようとする問題点コ
しかしながら、従来の干渉計測装置は、参照光路11を
通る光束の光束径が固定されているため、被験レンズ8
のレンズ径の大小、NA(開口数)の大小によって、被
験レンズ8透過後の光束の単位断面積当りの光強度が変
化すると、2つの光路11.12を通る光束の光量比が
変化してしまい、双方のバランスが悪いと干渉縞のコン
トラストか著しく低下するという欠点があった。[Problems to be Solved by the Invention] However, in the conventional interferometric measurement device, the diameter of the light flux passing through the reference optical path 11 is fixed.
When the light intensity per unit cross-sectional area of the light flux after passing through the test lens 8 changes depending on the size of the lens diameter and NA (numerical aperture), the light intensity ratio of the light flux passing through the two optical paths 11 and 12 changes. However, if the balance between the two is poor, the contrast of the interference fringes will drop significantly.
このような場合、参照光路11或いは物体光路12中に
光減衰器を挿入して、光強度の強い方の光束の光量を低
下させ、バランスを合せることも名えられるが、光減衰
器を入れるこのような方法では、物体光と参照先のトー
タル光量が低下するため、微小なレンズを測定する場合
、全体の光量不足が問題になる。In such a case, it is also possible to insert an optical attenuator into the reference optical path 11 or the object optical path 12 to reduce the amount of light beam with the stronger light intensity and adjust the balance. In such a method, the total amount of light of the object light and the reference destination decreases, so when measuring a minute lens, an insufficient amount of light as a whole becomes a problem.
[問題点を解決するための手段]
上記問題点を解決する本発明装置は、光源から出た光を
略平行な光束にした後、参照光路と物体光路とに2分割
し、物体光路途中に透光性の被験体を配置するとともに
、この被験体を透過した後の光束に、前記参照光路を通
る光束を同一方向に合流させることにより、干渉を発生
させるようにした干渉測定装置において、前記参照光路
中にアフを一カルなレンズ系を配置し、参照光路を通る
光束の径を該レンズ系で調整できるようにした。[Means for Solving the Problems] The device of the present invention that solves the above problems converts the light emitted from the light source into a substantially parallel beam, and then divides the light into a reference optical path and an object optical path. In the interference measurement device, a light-transmitting object is disposed, and the light beam passing through the object is merged with the light beam passing through the reference optical path in the same direction, thereby causing interference. A lens system with a single aperture is placed in the reference optical path, so that the diameter of the light beam passing through the reference optical path can be adjusted by the lens system.
[作 用コ
上記装置によれば、被験レンズのレンズ径、NA等を変
える事によって生じる物体光と参照光の光景のアンバラ
ンスを参照光路中のアフォーカルなレンズ系による参照
光ビーム径の調整で簡単に補正することができる。[Function] According to the above device, the unbalance between the sight of the object light and the reference light caused by changing the lens diameter, NA, etc. of the test lens can be corrected by adjusting the reference light beam diameter using an afocal lens system in the reference light path. can be easily corrected.
[実 施 例コ 以下、本発明の一実施例を第1図について説明する。[Implementation example] An embodiment of the present invention will be described below with reference to FIG.
第1図の装置はマツハツエンダ−タイプの干渉計をベー
スにしており、He N eレーザー等から成る光源
21から出た光はビームエキスパンダー22で平行光束
にされ、ビームスプリッタ23Aによって参照光路41
と物体光路42とに分割される。The apparatus shown in FIG. 1 is based on a Matsuhatsu Ender type interferometer, in which light emitted from a light source 21 such as a HeNe laser is made into a parallel beam by a beam expander 22, and sent to a reference optical path 41 by a beam splitter 23A.
and an object optical path 42.
物体光路42を通る光束はミラー25Aで反射された後
対物レンズ27を介して被験体レンズ28に入射する。The light flux passing through the object optical path 42 is reflected by the mirror 25A and then enters the subject lens 28 via the objective lens 27.
両レンズ27.28を通ることにより被験体レンズ28
を透過後の光は平行光束となり、ビームスプリッタ24
Bを透過する。The subject lens 28 by passing through both lenses 27 and 28.
The light after passing through becomes a parallel beam of light, and the beam splitter 24
Transmit B.
ビームスプリッタ24Bの後方には結像レンズ29が置
かれ、結像面31に被験体レンズ28の瞳面の像を結像
させる。An imaging lens 29 is placed behind the beam splitter 24B, and forms an image of the pupil plane of the subject lens 28 on an imaging plane 31.
一方、参照光路41途中には、アフォーカルなレンズ系
43を挿入してあり、このレンズ系43を通った光束は
従来装置と同様にミラー25Bで反射された後、ビーム
スプリッタ24Bを介して物体光路42に合流する。On the other hand, an afocal lens system 43 is inserted in the middle of the reference optical path 41, and the light beam passing through this lens system 43 is reflected by a mirror 25B, as in the conventional device, and then passes through a beam splitter 24B to an object. It joins the optical path 42.
上記のアフォーカルなレンズ系43は、平行入射光束を
平行光束として出射する光学系であり、その倍率、即ち
射出光束径と入射光束径の比が、可変になっているか又
は、少なくとも1つ以上のアフォーカルなレンズ系が参
照光路中に挿入可能になっていて、参照先の光束径を段
階的に変化させる事が出来るようになっている。The afocal lens system 43 is an optical system that emits a parallel incident light beam as a parallel light beam, and its magnification, that is, the ratio of the diameter of the emitted light beam to the diameter of the incident light beam, is variable or at least one or more. The afocal lens system can be inserted into the reference optical path, and the diameter of the reference beam can be changed in stages.
例えばNAが等しくレンズ径の異なる2種類の被験体レ
ンズを測定するような場合、被験体レンズ28を透過後
の光束の単位断面積当りの光強度は、被験体レンズ28
のレンズ径の2乗におよそ反比例する。For example, when measuring two types of subject lenses with the same NA and different lens diameters, the light intensity per unit cross-sectional area of the light beam after passing through the subject lens 28 is
is roughly inversely proportional to the square of the lens diameter.
一方、参照先の単位断面積当りの光強度は、アフォーカ
ルなレンズ系43の倍率の2乗におよそ反比例するので
、被験体レンズ28のレンズ径、即ち物体光の光強度に
応じて、適当な倍率のアフォーカルなレンズ系43を挿
入する事によって、物体光と参照先の光強度をバランス
させる事が出来る。On the other hand, since the light intensity per unit cross-sectional area of the reference target is approximately inversely proportional to the square of the magnification of the afocal lens system 43, it is necessary to set the By inserting an afocal lens system 43 with a certain magnification, it is possible to balance the light intensity of the object light and the reference destination.
以上、レンズの測定について説明したが、被験体28と
してレンズ以外に、例えば先導波路のスライスサンプル
の透過波面を計測する事によって、導波路断面の屈折率
分布を測定する等、本発明装置は、一般に微小光学素子
の評価に広く適用できる。このような場合、第1図中の
対物レンズ27は省略してもよい。また光源としては、
半導体レーザ等地の光源であってもかまわない。The measurement of the lens has been described above, but in addition to the lens as the test object 28, the apparatus of the present invention can also measure the refractive index distribution of the waveguide cross section by measuring the transmitted wavefront of a slice sample of the leading waveguide. Generally, it can be widely applied to the evaluation of micro optical elements. In such a case, the objective lens 27 in FIG. 1 may be omitted. Also, as a light source,
A solid light source such as a semiconductor laser may also be used.
またマツハツエンダ−タイプの干渉計をベースにして説
明したが、他のタイプの干渉計に転用することもできる
。Further, although the description has been made based on a Matsuhatsu Ender type interferometer, it is also possible to apply it to other types of interferometers.
[発明の効果コ
本発明によれば、参照光路中にアフォーカルなレンズ系
を挿入した事により、被験レンズのレンズ径、NA等を
変える事によって生じる物体光と参照光の光量のアンバ
ランスを簡単な構成で補正する事が出来、常にコントラ
ストの高い良好な干渉縞が観測できる。[Effects of the Invention] According to the present invention, by inserting an afocal lens system into the reference optical path, it is possible to eliminate the imbalance between the light intensity of the object light and the reference light, which is caused by changing the lens diameter, NA, etc. of the test lens. It can be corrected with a simple configuration, and good interference fringes with high contrast can always be observed.
特に微小なレンズ径のレンズの透過波面の干渉測定をす
る様な場合、レンズ径が小さくなっていくと、従来の干
渉計では参照光束のほんの僅かな部分しか使われないた
め、参照光が物体光に対し著しく暗くなり、干渉縞の観
測は極めて難しかったが、本発明によれば、レンズ径に
合せて参照光束を絞り込むことが出来るため、充分な光
量を得て、物体光と参照先の光量をバランスさせる事が
でき、良好な干渉縞が観測できる。Particularly when measuring the interference of the transmitted wavefront of a lens with a small lens diameter, as the lens diameter becomes smaller, conventional interferometers use only a small portion of the reference beam, so the reference beam is However, according to the present invention, the reference beam can be narrowed down according to the lens diameter, so a sufficient amount of light can be obtained and the difference between the object beam and the reference beam can be The amount of light can be balanced and good interference fringes can be observed.
第1図は本発明の一実施例を示す平面図、第2図は従来
の干渉測定装置を示す平面図、第3図(a)、(b)は
、干渉パターンの例を示す図である。
21・・・・・・光源 22・・・・・・ビームエキス
パンダ23A、24B・・・・・・ビームスプリッタ2
5A、2B・・・・・・ミラー
28・・・・・・被験体レンズ 29・・・・・・結像
レンズ31・・・・・・結像面 41・・・・・・参照
光路42・・・・・・物体光路 43・・・・・・アフ
ォーカルレンズ系Fig. 1 is a plan view showing an embodiment of the present invention, Fig. 2 is a plan view showing a conventional interference measurement device, and Figs. 3 (a) and (b) are diagrams showing examples of interference patterns. . 21...Light source 22...Beam expander 23A, 24B...Beam splitter 2
5A, 2B... Mirror 28... Subject lens 29... Imaging lens 31... Imaging surface 41... Reference optical path 42 ...Object optical path 43...Afocal lens system
Claims (1)
体光路とに2分割し、物体光路途中に透光性の被験体を
配置するとともに、該被験体透過後の光束に、前記参照
光路を通る光束を同一方向に合流させることにより、干
渉を発生させるようにした干渉測定装置において、前記
参照光路中にアフォーカルなレンズ系を配置して、参照
光路を通る光束の径を該レンズ系で調整し得るようにし
た事を特徴とする干渉測定装置。After the light emitted from the light source is made into a substantially parallel beam, it is divided into two into a reference optical path and an object optical path, a translucent object is placed in the middle of the object optical path, and the beam after passing through the object is In an interference measurement device that generates interference by merging light fluxes passing through a reference optical path in the same direction, an afocal lens system is placed in the reference optical path to measure the diameter of the light flux passing through the reference optical path. An interference measuring device characterized by being adjustable with a lens system.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3460988A JPH01209332A (en) | 1988-02-17 | 1988-02-17 | Interference measuring apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3460988A JPH01209332A (en) | 1988-02-17 | 1988-02-17 | Interference measuring apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01209332A true JPH01209332A (en) | 1989-08-23 |
Family
ID=12419107
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3460988A Pending JPH01209332A (en) | 1988-02-17 | 1988-02-17 | Interference measuring apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01209332A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11048279B2 (en) * | 2016-05-31 | 2021-06-29 | Pointwatch Systems Llc | Liquid handling system monitoring systems and methods |
-
1988
- 1988-02-17 JP JP3460988A patent/JPH01209332A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11048279B2 (en) * | 2016-05-31 | 2021-06-29 | Pointwatch Systems Llc | Liquid handling system monitoring systems and methods |
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