JPH0124534B2 - - Google Patents

Info

Publication number
JPH0124534B2
JPH0124534B2 JP747482A JP747482A JPH0124534B2 JP H0124534 B2 JPH0124534 B2 JP H0124534B2 JP 747482 A JP747482 A JP 747482A JP 747482 A JP747482 A JP 747482A JP H0124534 B2 JPH0124534 B2 JP H0124534B2
Authority
JP
Japan
Prior art keywords
reaction
chamber
tube
gas
burner
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP747482A
Other languages
Japanese (ja)
Other versions
JPS58124532A (en
Inventor
Shinzo Takarada
Tetsuo Kimura
Kyokata Chimasa
Akira Arai
Akira Hosonuma
Goro Oguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Toatsu Chemicals Inc
Original Assignee
Mitsui Toatsu Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Toatsu Chemicals Inc filed Critical Mitsui Toatsu Chemicals Inc
Priority to JP747482A priority Critical patent/JPS58124532A/en
Publication of JPS58124532A publication Critical patent/JPS58124532A/en
Publication of JPH0124534B2 publication Critical patent/JPH0124534B2/ja
Granted legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/02Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
    • B01J8/0242Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid flow within the bed being predominantly vertical
    • B01J8/025Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid flow within the bed being predominantly vertical in a cylindrical shaped bed
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/02Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
    • B01J8/0285Heating or cooling the reactor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008Controlling the process
    • B01J2208/00017Controlling the temperature
    • B01J2208/00106Controlling the temperature by indirect heat exchange
    • B01J2208/00115Controlling the temperature by indirect heat exchange with heat exchange elements inside the bed of solid particles
    • B01J2208/00132Tubes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008Controlling the process
    • B01J2208/00017Controlling the temperature
    • B01J2208/00106Controlling the temperature by indirect heat exchange
    • B01J2208/00168Controlling the temperature by indirect heat exchange with heat exchange elements outside the bed of solid particles
    • B01J2208/00194Tubes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
  • Hydrogen, Water And Hydrids (AREA)

Description

【発明の詳細な説明】 本発明は、吸熱反応によつて供給原料ガスから
反応生成ガスを得るための吸熱反応装置の改良に
関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement in an endothermic reactor for obtaining a reaction product gas from a feed gas by an endothermic reaction.

吸熱反応を促進せしめる触媒を用いて、炭化水
素を含む原料ガスを水素ガスの如き工業上利用価
値の高いガスに転換する吸熱反応装置は、当技術
分野においてよく知られている。例えば供給原料
ガスから水素ガスを生成する最も一般的な技術
は、燃焼炉内に、触媒によつて満たされた円筒状
あるいは環状の反応室を配置し、この反応室内に
炭化水素を含む原料ガスを通過させることによ
り、スチームリフオーミングすることである。こ
のような吸熱反応装置においては、加熱用燃焼ガ
スによつて反応室に熱を与えるに際し、反応室の
外側から伝熱している。このため、各反応室の表
面を均一に且つ高い熱流束で加熱するには、各反
応室の周囲に比較的広い空間を形成する必要があ
る。また、各反応室と加熱炉炉壁との相対的位置
関係を均一に配置することが必要であるため、か
かる装置は全体として比較的大きな設備とならざ
るをえなかつた。さらに、かかる反応装置は、反
応室に対する伝熱が主として輻射によつているた
めに、加熱炉の燃焼ガスはその出口においても十
分に高温である必要があり、このため、燃焼ガス
によつて装置外に持ち出される熱エネルギーが、
水蒸気製造用エネルギー等として使用されるとし
ても、水素発生の吸熱反応のために直接使用され
る場合に比較すると、その有用性が低いため、全
体としてみると、生成される水素のコスト上昇を
招くことになる。
Endothermic reaction apparatuses that use catalysts that promote endothermic reactions to convert hydrocarbon-containing raw material gases into industrially useful gases such as hydrogen gas are well known in the art. For example, the most common technology for producing hydrogen gas from a feedstock gas is to place a cylindrical or annular reaction chamber filled with a catalyst in a combustion furnace, and a feedstock gas containing hydrocarbons is placed inside the reaction chamber. It is a process of steam reheating by passing through the water. In such an endothermic reaction apparatus, when heat is applied to the reaction chamber by the heating combustion gas, the heat is transferred from the outside of the reaction chamber. Therefore, in order to uniformly heat the surface of each reaction chamber with a high heat flux, it is necessary to form a relatively wide space around each reaction chamber. Furthermore, since it is necessary to uniformly arrange the relative positions of each reaction chamber and the furnace wall of the heating furnace, such an apparatus as a whole has to be a relatively large piece of equipment. Furthermore, in such a reactor, since heat transfer to the reaction chamber is mainly by radiation, the combustion gas of the heating furnace needs to be at a sufficiently high temperature even at its outlet. The heat energy taken outside is
Even if it is used as energy for steam production, its usefulness is lower compared to when it is used directly for the endothermic reaction of hydrogen generation, so overall the cost of generated hydrogen increases. It turns out.

例えば、燃料として炭化水素を含む原料ガスの
リフオーミングによつて発生する水素を用いる燃
料電池発電設備においては、その経済性を高める
ために、その熱効率を高めると共に、装置および
建設用地のコストを低減することが不可欠であ
る。このような必要性から、より高い熱利用率を
有し、よりコンパクトな装置として構成でき、且
つ反応室の不均一な加熱などに起因する装置の損
傷などの信頼性の低下をもたらすことのないスチ
ームリフオーミング設備が要請されている。
For example, in fuel cell power generation equipment that uses hydrogen generated by reforming raw material gas containing hydrocarbons as fuel, in order to increase its economic efficiency, it is necessary to increase its thermal efficiency and reduce the cost of equipment and construction land. It is essential that Because of this need, a device that has a higher heat utilization rate, can be configured as a more compact device, and does not cause a decrease in reliability such as damage to the device due to uneven heating of the reaction chamber, etc. Steam rewarming equipment is requested.

かかる要請の下に提案された技術として、特開
昭53−78983号、同53−78992号、同53−79766号、
同53−79768号の各公報等に記載のスチームリフ
オーミング装置が知られている。これらの装置
は、加熱炉内に配置された各反応管の内部に、環
状の反応室を設けると共に、この反応室の内部
に、その顕熱を前記反応室へ伝達させる環状の再
生室を設け、且つ各反応室の周囲に空隙として設
けられた燃焼室の下半部に燃焼ガスの排出通路を
設け、この排出通路が、反応室内の原料ガスの流
れとは逆の流れの燃焼ガスを、反応室の外壁に接
して導出するように構成された技術である。従つ
て、かかる装置は、前述した要請を或る程度満た
す技術であると言えよう。
Technologies proposed under this request include JP-A No. 53-78983, JP-A No. 53-78992, JP-A No. 53-79766,
Steam reforming devices described in various publications such as No. 53-79768 are known. In these devices, an annular reaction chamber is provided inside each reaction tube arranged in a heating furnace, and an annular regeneration chamber is provided inside this reaction chamber to transmit the sensible heat to the reaction chamber. , and a combustion gas exhaust passage is provided in the lower half of the combustion chamber provided as a gap around each reaction chamber, and this exhaust passage discharges combustion gas in a flow opposite to the flow of raw material gas in the reaction chamber. This is a technique configured to lead out in contact with the outer wall of the reaction chamber. Therefore, it can be said that such a device is a technology that satisfies the above-mentioned requirements to some extent.

しかしながら、かかる装置であつても、前記要
請を充分に満足させることはできず、解決すべき
問題点があることが判明した。
However, it has been found that even such a device cannot fully satisfy the above requirements and there are problems that need to be solved.

すなわち、前記の反応装置は、各反応管の上部
空間が燃焼室になつており、ここに多数のバーナ
ーが配置されている。従つて該装置においては、
バーナーを含む燃焼室の構造が複雑になるざるを
えず、このため装置の製作コストの上昇を招くと
共に、メンテナンスが容易ではないという欠点が
みられた。また、かかる装置において、各反応管
の均一加熱を達成しようとすれば、各バーナーの
配列等についての検討が必要であり、それは容易
なことで解決できる問題ではない。
That is, in the above-mentioned reaction apparatus, the upper space of each reaction tube serves as a combustion chamber, and a large number of burners are arranged here. Therefore, in this device,
The structure of the combustion chamber including the burner has to be complicated, which leads to an increase in the manufacturing cost of the device and has disadvantages in that maintenance is not easy. Furthermore, in order to achieve uniform heating of each reaction tube in such an apparatus, it is necessary to consider the arrangement of each burner, and this is not a problem that can be easily solved.

そこで、前記した製作コストおよびメンテナン
スの点を解決するために、例えば、単一のバーナ
ーを用いることが考えられるる。そして、このバ
ーナーを可能な限り均一加熱を得るためには、炉
の中央部分に配置することが考えられる。しか
し、このようなバーナー配置において、前記従来
の各反応管のような均等高さの配列を行えば、実
質的には、均一加熱を実現することが困難とな
る。そして、このため高い伝熱効率が実現できな
いという問題点が生じる。
Therefore, in order to solve the above-mentioned production cost and maintenance issues, it is conceivable to use, for example, a single burner. In order to obtain as uniform heating as possible, it is conceivable to place this burner in the central part of the furnace. However, in such a burner arrangement, if the conventional reaction tubes are arranged at equal heights, it becomes substantially difficult to achieve uniform heating. This causes a problem that high heat transfer efficiency cannot be achieved.

本発明は前記した問題点を解決すべくなされた
ものであつて、本発明の目的とするところは、反
応装置内の全ての反応管に対して均一なる加熱を
可能ならしめることにより、高い伝熱効率を実現
可能な吸熱反応装置を提供することにある。
The present invention has been made to solve the above-mentioned problems, and an object of the present invention is to enable uniform heating to all the reaction tubes in the reactor, thereby achieving high transmission efficiency. The object of the present invention is to provide an endothermic reaction device that can realize thermal efficiency.

具体的に述べると、通常のガスバーナーを、例
え1個だけ用いたとしても、反応管の位置の相違
にかかわらず、即ちバーナーからの距離の遠近に
かかわらず、各反応管ともバーナーからの火炎輻
射が均等に受けられ、かつ反応室及び再生室へ熱
伝達させる燃焼ガス輻射熱も均等になるようにす
ることが可能である吸熱反応装置を提供すること
にある。
Specifically, even if only one ordinary gas burner is used, regardless of the position of the reaction tubes, that is, regardless of the distance from the burner, the flame from the burner will emit from each reaction tube. It is an object of the present invention to provide an endothermic reaction device capable of uniformly receiving radiation and uniformly transferring combustion gas radiant heat to a reaction chamber and a regeneration chamber.

本発明の上記目的は、一端側に原料ガスG1
入口を有すると共に他端側に反応生成ガスG2
出口を有し、かつ吸熱反応に用いられる触媒40
によつて満たされた反応室20と該反応室20で
生成した反応生成ガスG2を導出させながら、そ
の顕熱を前記反応室20へ伝達させる再生室30
と燃焼室11とを有する吸熱反応装置1におい
て、該反応装置1は、反応容器2内に複数個の反
応管21を並設してなり、該反応管21のそれぞ
れが前記再生室30及び前記反応室20を有して
おり、前記燃焼室11が、前記反応管21の一端
空間に、かつその中央にバーナー10を備えて配
置されており、前記反応管21の上端が該バーナ
ー10を基準にして熱力学的に略々均一加熱にな
るような凹面鏡状に配置されており、かつ反応管
21の下端が、該反応管の上端22が形成してい
る前記配置と略同一の凹面鏡状に配置されている
ことを特徴とする吸熱反応装置1によつて達成さ
れる。
The above object of the present invention is to provide a catalyst 40 which has an inlet for raw material gas G1 on one end side and an outlet for reaction product gas G2 on the other end side, and is used for an endothermic reaction.
a reaction chamber 20 filled with gas, and a regeneration chamber 30 that transfers the sensible heat to the reaction chamber 20 while extracting the reaction product gas G 2 generated in the reaction chamber 20.
In an endothermic reaction apparatus 1 having a combustion chamber 11, a plurality of reaction tubes 21 are arranged in parallel in a reaction vessel 2, and each of the reaction tubes 21 is connected to the regeneration chamber 30 and the combustion chamber 11. The combustion chamber 11 is disposed in a space at one end of the reaction tube 21 with a burner 10 in the center thereof, and the upper end of the reaction tube 21 is located with respect to the burner 10. The lower end of the reaction tube 21 is arranged in a concave mirror shape that thermodynamically provides approximately uniform heating, and the lower end of the reaction tube 21 is arranged in a concave mirror shape that is approximately the same as the arrangement formed by the upper end 22 of the reaction tube. This is achieved by an endothermic reaction device 1 characterized in that it is arranged.

以下に添付の図面を参照しながら、本発明の好
しい具体例について説明する。
Preferred embodiments of the present invention will be described below with reference to the accompanying drawings.

第1図に例示されている反応装置1は、炭化水
素を原料としてスチームリフオーミングによつて
水素を生成するためのものである。断熱層8を内
設する反応装置容器2の内部には、複数個の反応
管21が並設されている。本具体例における反応
管21は同心に配置され、かつ径を異にする二つ
の管体からなり、いわゆる二重管構造をなしてい
る。管の構造自体は本発明の要旨とするところで
はないので、これに限定されるものではなく、二
重管構造の反応管21に基づいて本発明の内容を
説明しているにすぎない。前記二重管の内側管状
部分は再生室30であり、その外側の環状部分は
反応室20である。該反応管21の上端22空間
には燃焼室11が配設されており、該燃焼室11
を形成する空間上部中央に、バーナー10が配設
されている。本具体例におけるバーナー10は、
ガスバーナーを用いているが、該バーナーの燃料
はガスに限られず、重油等であつても良い。
The reactor 1 illustrated in FIG. 1 is for producing hydrogen by steam reforming using hydrocarbons as raw materials. A plurality of reaction tubes 21 are arranged in parallel inside the reactor container 2 having a heat insulating layer 8 installed therein. The reaction tube 21 in this example consists of two tube bodies arranged concentrically and having different diameters, and has a so-called double tube structure. Since the tube structure itself is not the gist of the present invention, it is not limited thereto, and the content of the present invention is merely explained based on the reaction tube 21 having a double tube structure. The inner tubular part of the double tube is the regeneration chamber 30 and the outer annular part is the reaction chamber 20. A combustion chamber 11 is disposed in the upper end 22 space of the reaction tube 21.
A burner 10 is disposed in the upper center of the space forming the space. The burner 10 in this specific example is
Although a gas burner is used, the fuel for the burner is not limited to gas, and may be heavy oil or the like.

前記反応管21の上端22は、燃焼室11を形
成する空間に向つて配設されており、その上端2
2は、前記バーナー10を基準にして、熱力学的
に略々均一加熱になるような凹面鏡状(以下、凹
面という。)に配置されている。本発明者らの研
究によれば、前記凹面の半径(R)は、0.5D〜
2.0D、好ましくは0.5D〜1.5Dとした場合に、本
装置における最良の均一加熱が実現されることが
判明している。ここにDは、容器2の壁厚と断熱
層8とを除いた内径を示す。なお、上記範囲は上
下限を示すものではなく、上記範囲をこえた場合
にも、略々均一加熱を実現することが可能であ
る。
The upper end 22 of the reaction tube 21 is disposed toward the space forming the combustion chamber 11.
2 is arranged in a concave mirror shape (hereinafter referred to as a concave surface) so as to thermodynamically provide substantially uniform heating with respect to the burner 10. According to the research of the present inventors, the radius (R) of the concave surface is 0.5D~
It has been found that the best uniform heating in the device is achieved with 2.0D, preferably between 0.5D and 1.5D. Here, D indicates the inner diameter of the container 2 excluding the wall thickness and the heat insulating layer 8. Note that the above ranges do not indicate upper or lower limits, and even when the above ranges are exceeded, substantially uniform heating can be achieved.

また、前記各反応管21はその下端が前記各反
応管の上端が形成している凹面と同じ凹面を形成
するように配置され、且つ管体の補修、触媒充填
の容易性などを考慮して設けられた管板構造によ
つて固定されている。管板23は複数個の孔が反
応管21の配列に対応する位置に設けられ、かつ
反応管21の上端22の形成する前記凹面と同じ
凹面を形成する板状体であり、反応管21は前記
孔に挿入された後、管板23に固着されている。
反応室20内にはスチームリフオーミング触媒4
0が充填されている。触媒充填層の上端、すなわ
ち反応室20の出口には、触媒流出防止板24が
設けられている。原料ガス入口ノズル3より、反
応装置1内に導入された炭化水素及びスチームを
含む原料ガスG1は、原料ガスマニホールド4に
よつて、各反応室20に入り、触媒40の作用に
よつて水素を含む生成ガスG2となつて反応室2
0上端より、反応管21内上部空間25に抜け出
る。反応管21の上端22は、前記空間25を形
成可能に密封されている。該密封部26には耐熱
性のキヤツプ27が被覆されている。本具体例に
おいては該キヤツプ27の材質を、燃焼室11か
ら送られる燃焼ガスgの高温加熱対策としてセラ
ミツク製としているが、耐熱製のものであればこ
れに特に限定されない。
Further, each of the reaction tubes 21 is arranged so that its lower end forms the same concave surface as the upper end of each of the reaction tubes, and in consideration of ease of repair of the tube body, ease of catalyst filling, etc. It is secured by a provided tubesheet structure. The tube plate 23 is a plate-shaped body in which a plurality of holes are provided at positions corresponding to the arrangement of the reaction tubes 21 and forms the same concave surface as the concave surface formed by the upper end 22 of the reaction tubes 21. After being inserted into the hole, it is fixed to the tube plate 23.
A steam reforming catalyst 4 is provided in the reaction chamber 20.
Filled with 0s. A catalyst outflow prevention plate 24 is provided at the upper end of the catalyst packed bed, that is, at the outlet of the reaction chamber 20. A raw material gas G 1 containing hydrocarbons and steam introduced into the reactor 1 from the raw material gas inlet nozzle 3 enters each reaction chamber 20 through the raw material gas manifold 4, and is converted into hydrogen by the action of the catalyst 40. The generated gas G 2 containing
0 exits into the upper space 25 inside the reaction tube 21 from the upper end. The upper end 22 of the reaction tube 21 is sealed so that the space 25 can be formed. The sealing portion 26 is covered with a heat-resistant cap 27. In this specific example, the material of the cap 27 is made of ceramic as a measure against high temperature heating of the combustion gas g sent from the combustion chamber 11, but the material is not particularly limited to this as long as it is made of a heat-resistant material.

反応管上部空間25に送られた反応生成ガス
G2は、該上部空間25に入口28をもつ再生室
30を通つて、生成ガスマニホールド5に達し、
生成ガス出口ノズル6より、装置1外へ取り出さ
れる。本触媒反応は、吸熱反応であることから、
反応室20へ熱を供給しなければならない訳であ
るが、その熱源となるものは、燃焼ガスgから供
給される熱と再生室30からの顕熱である。該燃
焼ガスgは、反応管21の上端22の上部空間に
設けられたバーナー10において発生し前記空間
に位置する燃焼室11に送られ、反応管21の上
端22方向から反応管21の下端方向に流れ、反
応管21相互によつて形成される通路12及び反
応管21と反応容器2の内壁とによつて形成され
る通路12′を通つて、燃焼ガス出口ノズル7か
ら装置1外へ取り出される。該燃焼ガスgの流れ
方向は、反応器20内の反応ガスの流れとは逆方
向の流れとしているが、特にこれに限定されるも
のではなく、並流方式において、本発明を実施す
ることは可能である。
Reaction product gas sent to reaction tube upper space 25
G 2 passes through a regeneration chamber 30 having an inlet 28 in the head space 25 and reaches the product gas manifold 5;
The produced gas is taken out of the apparatus 1 through the outlet nozzle 6. Since this catalytic reaction is an endothermic reaction,
Heat must be supplied to the reaction chamber 20, and the heat sources are the heat supplied from the combustion gas g and the sensible heat from the regeneration chamber 30. The combustion gas g is generated in a burner 10 provided in the upper space of the upper end 22 of the reaction tube 21 and sent to the combustion chamber 11 located in the space, from the direction of the upper end 22 of the reaction tube 21 to the direction of the lower end of the reaction tube 21. The combustion gas flows through the passage 12 formed by the reaction tubes 21 and the passage 12' formed by the reaction tube 21 and the inner wall of the reaction vessel 2, and is taken out from the combustion gas outlet nozzle 7 to the outside of the apparatus 1. It will be done. Although the flow direction of the combustion gas g is opposite to the flow direction of the reaction gas in the reactor 20, the present invention is not particularly limited to this, and it is possible to carry out the present invention in a parallel flow system. It is possible.

前記燃焼ガス通路12,12′は、上下に区画
され、下側区画部分13には熱伝達向上のための
パツキン材料14が充填されており、通路12,
12′の下端近くに設置された支持部材15上に
支持されている。本具体例におけるパツキン材料
14は、アルミナボールである。再生室30は前
述の如く、二重管構造をなす反応管21の内側管
状部分であるが、この管体内の空洞の状態でも再
生室30としての機能を十分果しうるが、さらに
伝熱性能を向上させるために、再生室30内に伝
熱パツキンを充填したり、あるいは、該管にフイ
ンを設けるなどの伝熱効果向上のための手段を設
けることも可能である。
The combustion gas passages 12, 12' are divided into upper and lower sections, and the lower section 13 is filled with a packing material 14 for improving heat transfer.
It is supported on a support member 15 located near the lower end of 12'. The packing material 14 in this specific example is an alumina ball. As mentioned above, the regeneration chamber 30 is the inner tubular part of the reaction tube 21 which has a double-tube structure, and although it can sufficiently function as the regeneration chamber 30 even in a hollow state inside this tube, the heat transfer performance In order to improve the heat transfer effect, it is also possible to provide means for improving the heat transfer effect, such as filling the regeneration chamber 30 with a heat transfer packing or providing fins on the tube.

上記具体例においては、反応管をその上端が凹
面になるように配したことから、通常のガスバー
ナー1個を用いたとしても、反応管の位置の相違
にもかかわらず、各反応管とも、バーナーからの
火炎輻射が均等に受けられ、かつ反応室及び再生
室へ熱伝達させる燃焼ガス輻射熱も均等に受ける
ことが可能となつた。また反応管の下端も管板構
造によつて、反応管上端の形成する凹面と同じ凹
面を形成すること、すなわち、反応管の長さが同
じ寸法であることから、反応管の製作費が安くな
ると共に、リフオーマーの規格化が可能になつ
た。この事は、上記バーナーを有する燃焼室の構
造の簡略化と相俟つて本装置の製作コストの低
減、およびメンテナンスの容易性を可能にした。
In the above specific example, since the reaction tubes are arranged so that their upper ends are concave, even if one ordinary gas burner is used, each reaction tube can be It has become possible to evenly receive flame radiation from the burner, and also to receive evenly the radiant heat of the combustion gas that transfers heat to the reaction chamber and the regeneration chamber. In addition, due to the tube plate structure, the lower end of the reaction tube forms the same concave surface as the upper end of the reaction tube, that is, the length of the reaction tube is the same, so the manufacturing cost of the reaction tube is low. At the same time, it became possible to standardize refomers. This, together with the simplification of the structure of the combustion chamber having the burner described above, has made it possible to reduce the manufacturing cost of this device and to facilitate maintenance.

さらに、反応管を固定するのに管板構造を採用
することが可能であり、装置の運転、保守が前記
各公報記載のリフオーマーより安易になると共
に、装置のコンパクト化を可能にする。
Furthermore, it is possible to employ a tube plate structure to fix the reaction tube, making operation and maintenance of the apparatus easier than with the reformers described in the above-mentioned publications, and making it possible to make the apparatus more compact.

上記具体例においては、反応管が二重管構造を
なすものについて説明したが、本発明はこれに限
定される訳ではない。反応室と再生室とを有する
管体の一端に燃焼室を有する構造のリフオーマー
にはすべて適用されるものである。例えば前記特
開昭53−78983号、同53−78992号、同53−79766
号、同53−79768号の各公報等に記載のリフオー
マー、あるいは本願と同日出願である特許願(A)及
び特許願(B)に記載されるリフオーマー等にも適用
可能である。
In the above specific example, the reaction tube has a double tube structure, but the present invention is not limited to this. This applies to all reformers having a structure in which a combustion chamber is provided at one end of a tube having a reaction chamber and a regeneration chamber. For example, the above-mentioned Japanese Patent Application Publication Nos. 53-78983, 53-78992, and 53-79766.
The present invention is also applicable to the reformers described in various publications such as No. 1, No. 53-79768, and the reformers described in patent applications (A) and (B) filed on the same day as the present application.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、本発明に係る吸熱反応装置の一具体
例を示す要部断面図である。第2図は、反応管上
部断面図である。 1……反応装置、2……反応装置容器、3……
原料ガス入口ノズル、4……原料ガスマニホール
ド、5……生成ガスマニホールド、6……生成ガ
ス出口ノズル、7……燃焼ガス出口ノズル、8…
…断熱層、10……バーナー、11……燃焼室、
12……燃焼ガス通路、12′……燃焼ガス通路、
13……下側区画部分、14……パツキン材料、
15……支持部材、20……反応室、21……反
応管、22……反応管の上端、23……管板、2
4……流出防止板、25……空間、26……密封
部、27……キヤツプ、28……再生室入口、3
0……再生室、40……触媒、G1……原料ガス、
G2……反応生成ガス、g……燃焼ガス。
FIG. 1 is a sectional view of a main part showing a specific example of an endothermic reaction device according to the present invention. FIG. 2 is a sectional view of the top of the reaction tube. 1... Reactor, 2... Reactor container, 3...
Raw material gas inlet nozzle, 4... Raw material gas manifold, 5... Produced gas manifold, 6... Produced gas outlet nozzle, 7... Combustion gas outlet nozzle, 8...
...Insulation layer, 10...Burner, 11...Combustion chamber,
12... Combustion gas passage, 12'... Combustion gas passage,
13... Lower compartment part, 14... Packing material,
15... Support member, 20... Reaction chamber, 21... Reaction tube, 22... Upper end of reaction tube, 23... Tube sheet, 2
4...Outflow prevention plate, 25...Space, 26...Sealing section, 27...Cap, 28...Regeneration chamber entrance, 3
0... Regeneration chamber, 40... Catalyst, G 1 ... Raw material gas,
G 2 ... reaction product gas, g ... combustion gas.

Claims (1)

【特許請求の範囲】[Claims] 1 一端側に原料ガスの入口を有すると共に他端
側に反応生成ガスの出口を有し、かつ吸熱反応に
用いられる触媒によつて満たされた反応室と、該
反応室で生成した反応生成ガスを導出させなが
ら、その顕熱を前記反応室へ伝達させる再生室
と、燃焼室とを有する吸熱反応装置において、該
反応装置は、反応容器内に複数個の反応管を並設
してなり、該反応管のそれぞれが前記再生室及び
前記反応室を有しており、前記燃焼室が、前記反
応管の一端空間に、かつその中央にバーナーを備
えて配置されており、前記各反応管の上端が該バ
ーナーを基準にして熱力学的に略々均一加熱にな
るような凹面鏡状に配置されており、かつ反応管
の下端が、該反応管の上端が形成している前記凹
面鏡状配置と略同一の凹面鏡状に配置されている
ことを特徴とする吸熱反応装置。
1. A reaction chamber having an inlet for raw material gas at one end and an outlet for reaction product gas at the other end, and filled with a catalyst used for an endothermic reaction, and the reaction product gas generated in the reaction chamber. An endothermic reaction device having a combustion chamber and a regeneration chamber that transfers the sensible heat to the reaction chamber while deriving the heat, the reaction device having a plurality of reaction tubes arranged in parallel in a reaction vessel, Each of the reaction tubes has the regeneration chamber and the reaction chamber, and the combustion chamber is disposed in one end space of the reaction tube and includes a burner in the center thereof. The upper end of the reaction tube is arranged in a concave mirror shape to thermodynamically provide substantially uniform heating with respect to the burner, and the lower end of the reaction tube is arranged in the concave mirror shape formed by the upper end of the reaction tube. An endothermic reaction device characterized by being arranged in substantially the same concave mirror shape.
JP747482A 1982-01-22 1982-01-22 Endothermic reaction apparatus Granted JPS58124532A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP747482A JPS58124532A (en) 1982-01-22 1982-01-22 Endothermic reaction apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP747482A JPS58124532A (en) 1982-01-22 1982-01-22 Endothermic reaction apparatus

Publications (2)

Publication Number Publication Date
JPS58124532A JPS58124532A (en) 1983-07-25
JPH0124534B2 true JPH0124534B2 (en) 1989-05-12

Family

ID=11666776

Family Applications (1)

Application Number Title Priority Date Filing Date
JP747482A Granted JPS58124532A (en) 1982-01-22 1982-01-22 Endothermic reaction apparatus

Country Status (1)

Country Link
JP (1) JPS58124532A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4820314A (en) * 1987-02-11 1989-04-11 International Fuel Cells Corporation Fuel cell power plant reformer
FR2898517B1 (en) * 2006-03-17 2008-12-12 Inst Francais Du Petrole INTERNAL COMBUSTION HEAT EXCHANGER REACTOR FOR ENDOTHERMIC REACTION IN FIXED BED
FR2898518B1 (en) * 2006-03-17 2009-01-16 Inst Francais Du Petrole INTERNAL COMBUSTION HEAT EXCHANGER REACTOR FOR ENDOTHERMIC REACTION IN FIXED BED

Also Published As

Publication number Publication date
JPS58124532A (en) 1983-07-25

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