JPH0124619Y2 - - Google Patents
Info
- Publication number
- JPH0124619Y2 JPH0124619Y2 JP9385979U JP9385979U JPH0124619Y2 JP H0124619 Y2 JPH0124619 Y2 JP H0124619Y2 JP 9385979 U JP9385979 U JP 9385979U JP 9385979 U JP9385979 U JP 9385979U JP H0124619 Y2 JPH0124619 Y2 JP H0124619Y2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- electron beam
- scanning
- width
- center
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 claims description 31
- 238000001514 detection method Methods 0.000 claims description 8
- 238000004611 spectroscopical analysis Methods 0.000 claims 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 8
- 238000004458 analytical method Methods 0.000 description 8
- 229910052717 sulfur Inorganic materials 0.000 description 8
- 239000011593 sulfur Substances 0.000 description 8
- 238000007689 inspection Methods 0.000 description 4
- 239000013078 crystal Substances 0.000 description 2
- 230000007274 generation of a signal involved in cell-cell signaling Effects 0.000 description 2
- 238000005211 surface analysis Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
Description
【考案の詳細な説明】
この考案は、試料面を電子ビームで走査し、試
料から放射される特性Ｘ線を分光，検出する電子
ビームマクロアナライザに関し、特に、大きな試
料を電子ビーム走査と直交方向に移動させながら
面分析を行なうものにおいて、試料の設定位置や
試料の幅が一定でなくても、試料の幅を所定比に
内分する特定線を基準にして電子ビームの走査位
置が自動的に決定されるようにしたものである。[Detailed description of the invention] This invention relates to an electron beam macro analyzer that scans the sample surface with an electron beam and spectrally and detects the characteristic X-rays emitted from the sample. When performing area analysis while moving the sample, even if the set position of the sample or the width of the sample is not constant, the scanning position of the electron beam can be automatically adjusted based on a specific line that divides the width of the sample within a predetermined ratio. It was decided that
例えば、銅板の粗材であるスラブの品質検査の
１つに、スラブ断面上におけるリンＰ、イオウ
Ｓ、アルミＡ2O3等の微量な介在物の含有量お
よび分布を調べる検査がある。この検査を現状で
はサルフアプリント法（イオウ印画法）行なつて
いるが、最近では、Ｘ線分析による分析装置によ
つて、スラブ製造ラインに組込まれるような形で
迅速に上記検査を行ないたいという要望が強い。 For example, one of the quality inspections of a slab, which is a rough material of a copper plate, is an inspection to check the content and distribution of minute inclusions such as phosphorus P, sulfur S, and aluminum A 2 O 3 on a cross section of the slab. Currently, this inspection is carried out using the sulfur print method, but recently it has been desired to quickly carry out the above inspection using an X-ray analyzer that can be incorporated into the slab manufacturing line. There is a strong demand for this.
通常のスラブ断面は幅30cm、長さ２ｍ程度であ
つて、その中心部数cmの範囲に帯状にイオウが析
出するとともに、極く表面に近いところにアルミ
ナが析出する。したがつて、イオウについてのＸ
線分析は、スラブ断面の全体を面分析する必要は
なく、スラブ断面の中心部を適当な幅で帯状に行
なえば良く、その方が分析時間が短かくなり、好
都合である。 A normal cross section of a slab is about 30 cm wide and 2 m long, and sulfur is precipitated in a band shape within a few cm of the center, and alumina is precipitated very close to the surface. Therefore, X for sulfur
Line analysis does not need to be a surface analysis of the entire slab cross-section, but can be performed in a band-like manner with an appropriate width at the center of the slab cross-section, which is more convenient because the analysis time is shorter.
このようなＸ線分析によるスラブ断面における
イオウの分析を具体化するには、適当な厚みで切
出された断面片を装置にセツトし、その幅を２分
する中心線上に電子ビームを適当な幅で走査しな
がら照射するとともに、電子ビームの走査と直交
方向に試料を移動させ、この電子ビーム照射によ
り試料から放出されるイオウの特性Ｘ線の強度を
検出する。ところが、この装置における問題とし
て、大きくて重いスラブ断面片を真空チヤンバー
内の分析ステージ上に高精度に位置決めして載置
するのは非常に面倒であるため、電子銃のビーム
軸にスラブ断面片の中心線を常に一致させること
は難かしく、したがつて、電子ビーム走査と試料
の移動による帯状の分析領域が、試料の中心から
外れてしまつて、予定した位置の分析が行なえな
くなることが上げられる。 In order to analyze sulfur in a cross section of a slab using X-ray analysis, a cross section cut out with an appropriate thickness is set in the equipment, and an electron beam is directed onto the center line that bisects the width. The sample is irradiated while scanning in width, the sample is moved in a direction perpendicular to the scanning of the electron beam, and the intensity of characteristic X-rays of sulfur emitted from the sample by this electron beam irradiation is detected. However, a problem with this device is that it is extremely troublesome to accurately position and place a large and heavy slab cross-section on the analysis stage inside the vacuum chamber, so the slab cross-section is placed on the beam axis of the electron gun. It is difficult to always align the center lines of the sample, and as a result, the belt-shaped analysis area created by scanning the electron beam and moving the sample may deviate from the center of the sample, making it impossible to analyze the planned position. It will be done.
この考案は上記の問題に鑑みなされたものであ
る。すなわち、電子ビームの走査と試料の移動に
より、試料の幅を所定比に内分する線上に沿つて
比較的幅の挾い帯状の分析をする装置において、
試料の幅が一定でなくても、また試料が高精度に
位置出しされていなくても、常に所期の分析位置
を維持できるようにした装置を提供するものであ
る。 This idea was made in view of the above problem. That is, in an apparatus that performs analysis of a comparatively wide wedge-shaped strip along a line that internally divides the width of a sample into a predetermined ratio by scanning an electron beam and moving the sample.
To provide an apparatus that can always maintain a desired analysis position even if the width of the sample is not constant or even if the sample is not positioned with high precision.
以下、この考案の一実施例を図面に基づいて詳
細に説明する。 Hereinafter, one embodiment of this invention will be described in detail based on the drawings.
図において、１は上記スラブ断面片である試料
で、この試料１は矢印ａ方向にスライド駆動され
るステージ２上に載置されている。３は電子銃
で、これから発射される電子ビーム４は適宜に絞
られて試料１上に照射されるとともに、走査コイ
ル５の作用により、電子ビーム４は試料１上にお
いてその移動方向ａと直交方向ｂに一定幅だけ
走査される。そして、電子ビーム４の照射により
試料１から放出される特性Ｘ線は、Ｘ線分光器の
コリメータ６を通つて平行Ｘ線束となり、分光結
晶７に対して所定角度で入射する。この分光結晶
７において分析目的元素であるイオウの特性Ｘ線
のみが分光されて反射し、それが比例計数管等か
らなるＸ線検出器８に導入され、その強度が測定
される。 In the figure, reference numeral 1 denotes a sample that is a cross-sectional piece of the slab, and this sample 1 is placed on a stage 2 that is slid and driven in the direction of arrow a. Reference numeral 3 denotes an electron gun, and the electron beam 4 emitted from the gun is appropriately focused and irradiated onto the sample 1, and due to the action of the scanning coil 5, the electron beam 4 is directed over the sample 1 in a direction perpendicular to the moving direction a. b is scanned by a certain width. The characteristic X-rays emitted from the sample 1 by irradiation with the electron beam 4 pass through the collimator 6 of the X-ray spectrometer and become a parallel X-ray flux, which is incident on the spectroscopic crystal 7 at a predetermined angle. In this spectroscopic crystal 7, only the characteristic X-rays of sulfur, which is the element to be analyzed, are spectrally separated and reflected, and introduced into an X-ray detector 8 consisting of a proportional counter or the like, and its intensity is measured.
また、９および１０はそれぞれ差動トランス等
を用いた位置検出器であつて、電子ビーム４の走
査延長線上でステージ２の両側部に位置して固定
設置され、両位置検出器９および１０の測定子１
１および１２がステージ２の中心線イ側に向けて
突出し、ステージ２上に載置された試料１の両側
面にそれぞれ当接する。すなわち、両位置検出器
９，１０によつて試料１の両側面の位置がそれぞ
れ検出される。そして、両位置検出器９，１０の
出力は差動増幅器１３に入力され、この差動増幅
器１３からは、ステージ２の中心線イに対する試
料１の中心線口（幅を２等分する線）のずれ量に
対応した電圧が出力される。 Further, 9 and 10 are position detectors each using a differential transformer, etc., and are fixedly installed on both sides of the stage 2 on the scanning extension line of the electron beam 4. Measuring head 1
1 and 12 protrude toward the center line A side of the stage 2 and abut on both sides of the sample 1 placed on the stage 2, respectively. That is, the positions of both side surfaces of the sample 1 are detected by both position detectors 9 and 10, respectively. The outputs of both position detectors 9 and 10 are input to the differential amplifier 13, and from this differential amplifier 13, the center line of the sample 1 relative to the center line A of the stage 2 (the line that bisects the width) is input to the differential amplifier 13. A voltage corresponding to the amount of deviation is output.
さらに、１４は電子ビーム４の走査信号となる一
定振幅、一定周期の鋸歯状波を出力する走査信号
発生回路であつて、これから出力される鋸歯状波
はレベルシフト回路１５において上記差動増幅器
１３の出力電圧に応じてレベルシフトされる。レ
ベルシフト回路１５からは、差動増幅器１３の出
力電圧を中心として上下に等振幅の鋸歯状波が出
力され、これが駆動回路１６を経て上記走査コイ
ル５に印加される。Furthermore, 14 is a scanning signal generation circuit that outputs a sawtooth wave with a constant amplitude and a constant period, which becomes a scanning signal for the electron beam 4. The sawtooth wave outputted from this circuit is passed through the level shift circuit 15 to the differential amplifier 13. The level is shifted according to the output voltage. The level shift circuit 15 outputs a sawtooth wave with equal amplitude above and below the output voltage of the differential amplifier 13, which is applied to the scanning coil 5 via the drive circuit 16.
以上の構成において、電子ビーム４の走査位置
における試料１の中心線口とステージ２の中心線
イが一致しておれば、両位置検出器９および１０
の検出出力は等しく、したがつて差動増幅器１３
の出力は零になる。この場合、レベルシフト回路
１５を経た鋸歯状波の中心電圧が零となり、この
走査信号に応じて電子ビーム４が走査されること
により、電子ビーム４の走査の中心は試料１の中
心口に合致して、走査幅で走査が行なわれる。 In the above configuration, if the centerline aperture of the sample 1 and the centerline A of the stage 2 at the scanning position of the electron beam 4 match, both position detectors 9 and 10
The detection outputs of the differential amplifier 13 are equal, so the differential amplifier 13
The output of will be zero. In this case, the center voltage of the sawtooth wave that has passed through the level shift circuit 15 becomes zero, and the electron beam 4 is scanned in accordance with this scanning signal, so that the scanning center of the electron beam 4 aligns with the center opening of the sample 1. Accordingly, scanning is performed with the scanning width.
また、走査位置における試料１の中心線口がス
テージ２の中心線イに対してずれていると、その
ずれの方向および量に応じて、差動増幅器１３の
正または負のある値の電圧が出力される。そのた
め、レベルシフト回路１５を経た鋸歯状波の中心
電圧が変化し、その走査信号によつて電子ビーム
４が走査される。これにより、電子ビーム４の走
査中心点が試料１の中心線のずれ分だけシフトさ
れ、電子ビーム４の走査はやはり試料１の中心線
口を中心とする幅の部分について行なわれるの
である。このように本考案の装置にあつては、試
料１がその中心線口がステージ２の中心線イに一
致するように載置されなくても、電子ビーム４の
走査は試料１の中心に合わせて行なわれる。した
がつて、簡単な位置決めで試料１をステージ２に
載置すれば良く、また、試料１の幅が一定でなく
ても良いのは上記説明から明らかである。 Furthermore, if the center line of the sample 1 at the scanning position is shifted from the center line A of the stage 2, the voltage of the differential amplifier 13 will have a positive or negative value depending on the direction and amount of the shift. Output. Therefore, the center voltage of the sawtooth wave passing through the level shift circuit 15 changes, and the electron beam 4 is scanned by the scanning signal. As a result, the scanning center point of the electron beam 4 is shifted by the amount of deviation of the center line of the sample 1, and the scanning of the electron beam 4 is still performed over a portion of the width centered on the center line opening of the sample 1. In this way, in the apparatus of the present invention, even if the sample 1 is not placed so that its center line opening coincides with the center line A of the stage 2, the scanning of the electron beam 4 is aligned with the center of the sample 1. It is done. Therefore, it is clear from the above description that the sample 1 only needs to be placed on the stage 2 by simple positioning, and the width of the sample 1 does not need to be constant.
なお、上記実施例においては、試料の両側面の
位置を検出する位置検出器として機械的なものを
説明したが、本考案はこれを限定されるものでは
なく、光電的な非接触式の位置検出器等、各種セ
ンサが適用することができる。 In the above embodiment, a mechanical position detector was used to detect the positions of both sides of the sample, but the present invention is not limited to this, and a photoelectric non-contact type position detector is used. Various sensors such as detectors can be applied.
以上の説明から明らかなように、この考案に係
る電子ビームマクロアナライザは、電子ビーム照
射位置における試料の両側面の位置を検出し、そ
の検出出力に基づき試料の幅を所定比に内分する
特定点の位置に対応した出力を発する検出手段を
設け、この検出手段の出力に対応して電子ビーム
の走査中心をシフトすることにより、電子ビーム
の走査を常に試料の上記特定点を中心に行なうよ
うにしたので、試料の位置出しを高精度に行なわ
なくても、また試料の幅が一定でなくても、常に
所期の位置についての帯状の面分析を正確に行な
うことができ、上述のスラブ断面状におけるイオ
ウの分析等に極めて好適となる。 As is clear from the above description, the electron beam macro analyzer according to this invention detects the positions of both side surfaces of the sample at the electron beam irradiation position, and divides the width of the sample within a predetermined ratio based on the detection output. By providing a detection means that emits an output corresponding to the position of the point and shifting the scanning center of the electron beam in accordance with the output of this detection means, the scanning of the electron beam is always performed centered on the specific point on the sample. As a result, even if the sample position is not performed with high precision or the width of the sample is not constant, band-shaped surface analysis can always be performed accurately at the desired position. It is extremely suitable for sulfur analysis in cross-section.
図面はこの考案に係る装置の一実施例を示す構
成説明図である。
１……試料、３……電子銃、５……走査コイ
ル、９，１０……位置検出器、１３……差動増幅
器、１４……走査信号発生回路、１５……レベル
シフト回路。
The drawing is a configuration explanatory diagram showing an embodiment of the device according to the invention. 1... Sample, 3... Electron gun, 5... Scanning coil, 9, 10... Position detector, 13... Differential amplifier, 14... Scanning signal generation circuit, 15... Level shift circuit.
Claims (1)
に略長方形状の試料をその走査と直交方向である
長手方向に移動させることにより、試料を面走査
し、この電子ビーム照射により試料から放出され
る特性Ｘ線を分光、検出する装置であつて、 電子ビーム照射装置における前記電子ビーム走
査方向と直交する前記試料の両側面の位置を検出
する位置検出手段と、その検出出力に基づき試料
の幅を所定比に内分する特定点の位置に対応した
出力を発する検出手段と、該検出手段の出力に対
応して電子ビームの走査中心をシフトする電子ビ
ーム走査制御手段を有し、電子ビームの走査中心
を常に試料の上記特定点に位置せしめるようにし
たことを特徴とする電子ビームマクロアナライ
ザ。[Claims for Utility Model Registration] The surface of the sample is scanned by scanning an electron beam with a constant width in the width direction and moving a substantially rectangular sample in the longitudinal direction perpendicular to the scan. A device for spectroscopy and detection of characteristic X-rays emitted from a sample by irradiation, comprising: a position detection means for detecting the positions of both side surfaces of the sample perpendicular to the electron beam scanning direction in an electron beam irradiation device; A detection means that emits an output corresponding to the position of a specific point that divides the width of the sample within a predetermined ratio based on the output, and an electron beam scanning control means that shifts the scanning center of the electron beam in response to the output of the detection means. 1. An electron beam macro analyzer, characterized in that the scanning center of the electron beam is always located at the specific point on the sample.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9385979U JPH0124619Y2 (en) | 1979-07-06 | 1979-07-06 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9385979U JPH0124619Y2 (en) | 1979-07-06 | 1979-07-06 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5627664U JPS5627664U (en) | 1981-03-14 |
| JPH0124619Y2 true JPH0124619Y2 (en) | 1989-07-25 |
Family
ID=29326758
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9385979U Expired JPH0124619Y2 (en) | 1979-07-06 | 1979-07-06 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0124619Y2 (en) |
-
1979
- 1979-07-06 JP JP9385979U patent/JPH0124619Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5627664U (en) | 1981-03-14 |
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