JPH01248070A - Semiconductor device testing equipment - Google Patents
Semiconductor device testing equipmentInfo
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- JPH01248070A JPH01248070A JP63074297A JP7429788A JPH01248070A JP H01248070 A JPH01248070 A JP H01248070A JP 63074297 A JP63074297 A JP 63074297A JP 7429788 A JP7429788 A JP 7429788A JP H01248070 A JPH01248070 A JP H01248070A
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- semiconductor device
- alpha
- energy
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- Tests Of Electronic Circuits (AREA)
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は半導体装置の試験装置に係り、特K。[Detailed description of the invention] [Industrial application field] The present invention relates to a testing device for semiconductor devices, and relates to a test device for semiconductor devices.
半導体装置に放射線を照射したときのソフトエラー発生
を試験する装置に関する。The present invention relates to an apparatus for testing the occurrence of soft errors when a semiconductor device is irradiated with radiation.
半導体装置の誤動作の1つにソフトエラーと呼ばれる現
象がある。この原因となる放射線はα線で、その発生源
は、半導体装置を構成しているSiチップ、Al配線、
ガラス保護膜材料及びこれ等をバクケージするためのプ
ラスチック、セラミックその他の材料中に微量に含まれ
ているU(ウラン)。One of the malfunctions of semiconductor devices is a phenomenon called soft error. The radiation that causes this is alpha rays, whose sources are the Si chips, Al wiring, etc. that make up the semiconductor device.
U (uranium) is contained in trace amounts in glass protective film materials and plastics, ceramics, and other materials for back-caging these materials.
Th(トリウム)等の自然放射性物質である。そして、
U 、 Th等は自然崩壊によってα粒子(Heの原子
核)を放射し、これ等α粒子が半導体装置圧入対すると
、この飛程KGって電子−正孔対が生成される。MOS
ダイナミックメモリでは、これ等の生成された電子がメ
モリセルの空のポテンシャル井戸部に一定以上蓄積する
と、ソフトエラーが発生する。又、高速バイポーラスタ
チックメモリでは、生成された電子が雑音電流として流
れソフトエラーを発生させる。このようなソフトエラー
の問題は、半導体素子の高集積化、高速化に伴い増加す
る傾向にある。It is a natural radioactive substance such as Th (thorium). and,
U, Th, etc. emit α particles (He atomic nuclei) by natural decay, and when these α particles are pressed into a semiconductor device, electron-hole pairs are generated over a range KG. M.O.S.
In a dynamic memory, if these generated electrons accumulate in an empty potential well portion of a memory cell beyond a certain level, a soft error occurs. Furthermore, in high-speed bipolar static memory, the generated electrons flow as a noise current and cause soft errors. Such soft error problems tend to increase as semiconductor devices become more highly integrated and operate faster.
そこで、半導体装置のα線によるソフトエラー評価を行
う必要がある。この評価を行う場合、パッケージ材から
自然に放射されるα粒子だけでは。Therefore, it is necessary to evaluate soft errors of semiconductor devices using alpha rays. When making this assessment, alpha particles naturally emitted from packaging materials alone are not sufficient.
α粒子の放射密度が非常圧小さいため試験に長時間を要
する。従って、一般にはα粒子放射密度の犬ぎい自然放
射性物質又は人工放射性物質音用い加速評価試験を行う
。The test takes a long time because the radiation density of alpha particles is extremely low. Therefore, in general, accelerated evaluation tests using natural radioactive materials or artificial radioactive materials are conducted to determine the radiation density of alpha particles.
ソフトエラーの特性評価には、α線源から放射するα粒
子を被試験半導体装置に照射し、ソフトエラーが発生す
るまでの時間及び一定照射時間内におけるエラー発生回
数等を測定し、α線耐量を評価する。そして、試験方法
としては、υ量産品における性能チエツク(全数検査、
抜取り検査等)及び市場故障率の予測等を行う場合は、
パッケージ材料等から放射されるα線エネルギー分布と
相似な放射線を半導体装置に照射してα線耐量を測定す
る加速寿命評価試験や、2)半導体装置の改良・開発効
果、製品間のレベル比較、特異ビット(欠陥ビット)の
検出、製造プロセス上の問題点等を評価する場合は、α
線耐量が照射α粒子エネルギー。To evaluate the characteristics of soft errors, the semiconductor device under test is irradiated with α particles emitted from an α-ray source, and the time until a soft error occurs and the number of errors occurring within a certain irradiation time are measured, and the α-ray tolerance is measured. Evaluate. The testing methods include performance checks on mass-produced products (100% inspection,
(sampling inspections, etc.) and market failure rate predictions, etc.
Accelerated life evaluation tests that measure alpha-ray resistance by irradiating semiconductor devices with radiation similar to the alpha-ray energy distribution emitted from package materials, etc., and 2) improvement and development effects of semiconductor devices, level comparisons between products, When detecting singular bits (defective bits) or evaluating problems in the manufacturing process, α
The radiation tolerance is the irradiated α particle energy.
入射角に依存するため、これ等パラメータについて詳細
に特性評価を行う試験かある。Since it depends on the angle of incidence, there are tests to evaluate the characteristics of these parameters in detail.
本出願人は、先に1%願昭61.−121024号にお
いて、空気中のα線源と被試験半導体装置との間の距離
(α粒子が空気中を飛ぶ距離:空気層厚)を変化させる
ことだよってα線エネルギー減衰量を制御し、前記半導
体装置に照射するα線エネルギーを変化させて各照射α
粒子エネルギーごとに半導体装置のα線耐量を測定し、
更に、空気層厚を断続的又は連続的圧変えながら半導体
装置にα線を照射し半導体装置に連続的で幅の広いエネ
ルギー分布をもつα線を照射することで加速寿命評価試
験を行う試験方法を提案している。The present applicant previously applied for 1%. -121024, the α-ray energy attenuation amount is controlled by changing the distance between the α-ray source in the air and the semiconductor device under test (the distance that α particles fly in the air: air layer thickness), Each irradiation α is performed by changing the α-ray energy irradiated to the semiconductor device.
Measure the alpha ray resistance of semiconductor devices for each particle energy,
Furthermore, there is a test method that performs an accelerated life evaluation test by irradiating the semiconductor device with alpha rays while changing the air layer thickness intermittently or continuously, and irradiating the semiconductor device with alpha rays that have a continuous and wide energy distribution. is proposed.
上記提案に係る従来技術は、以前に比べて正確な加速寿
命試験とエネルギー依存特性評価を行うことができる反
面1次の理由により試験に時間がかかるという問題点を
残している。Although the conventional technology proposed above can perform accelerated life tests and energy-dependent characteristic evaluations more accurately than before, it still has the problem that the tests take a long time due to the first reason.
被試験半導体装置のα粒子エネルギー依存特性を評価す
る場合は、被試験半導体装置圧照射するα粒子エネルギ
ーを変えるために、α粒子が飛ぶ空気層厚を制御してい
る。しかし、α粒子エネルギー依存特性は、第2図に示
すように、下方に湾曲する放物線状の特性曲線を示し、
しかも同一品種の半導体装置であっても、特性曲線9
、10 、11で示すように個々の半導体装置でそのα
線耐量(MT B F : Mean Time Be
tween Failure )が大きく異なる。即ち
、MTBFが極小値を示すα粒子エネルギー値E、は半
導体装置毎に異なる。このエネルギー値Eoが被試験半
導体装置のα線耐量を小さ(しているエネルギー値であ
る。そこで、上記エネルギー値EOを求めるため釦は、
半導体装置に照射する測定エネルギー範囲を幅広(とる
必要があり、その結果、測定エネルギー点数(試験回数
)が多(なり、α線耐量の測定に長時間を要している。When evaluating the α-particle energy dependence characteristics of a semiconductor device under test, the thickness of the air layer through which the α-particles fly is controlled in order to change the α-particle energy applied to the semiconductor device under test. However, the α-particle energy-dependent characteristics exhibit a parabolic characteristic curve curving downward, as shown in Figure 2.
Moreover, even if the semiconductor device is of the same type, the characteristic curve 9
, 10, 11, the α of each semiconductor device is
Line tolerance (MTBF: Mean Time Be
tween Failure ) are significantly different. That is, the α particle energy value E at which the MTBF has a minimum value differs from semiconductor device to semiconductor device. This energy value Eo is the energy value that reduces the alpha ray tolerance of the semiconductor device under test. Therefore, in order to obtain the above energy value EO, press the button.
It is necessary to cover a wide measurement energy range for irradiating semiconductor devices, resulting in a large number of measurement energy points (number of tests), and it takes a long time to measure alpha ray tolerance.
本発明の目的は、上記した従来技術の問題点をな(シ、
半導体装置のα線耐量を短時間で評価するための半導体
装置の試験装置を提供することにある。An object of the present invention is to solve the problems of the prior art described above.
An object of the present invention is to provide a semiconductor device testing device for evaluating the alpha ray resistance of a semiconductor device in a short time.
上記目的は、空気中に放射線源と被試験半導体装1f’
&配置すると共に、これら両者間の空気層厚を任意に可
変設定し、放射線エネルギーを空気中で減衰させて被試
験半導体装置に入射させ該半導体装置の誤動作を試験す
る半導体装置の試験装置において、前記半導体装置の誤
動作が発生した時の放射線が通過した空気層厚を検出す
る手段と。The above purpose is to place a radiation source in the air and a semiconductor device under test 1f'.
& arrangement, and arbitrarily set the thickness of the air layer between the two to attenuate the radiation energy in the air and make it incident on the semiconductor device under test to test the malfunction of the semiconductor device. means for detecting the thickness of an air layer through which radiation passes when a malfunction occurs in the semiconductor device;
その時の入射放射線エネルギーを空気層厚にて換算する
手段とを設けることで、達成される。This can be achieved by providing a means for converting the incident radiation energy at that time by the air layer thickness.
α線エネルギー減衰手段として空気によるエネルギー減
衰特性を利用し、空気層厚を断続的または連続的に変化
させることで連続的且つ幅の広いエネルギー分布ビ有す
るα線を発生させることができる。ここで、α粒子のエ
ネルギーとその空気中の飛程距離との間には所定の関係
がある。従って、α粒子を飛ばす空気層厚を制御して連
続エネルギー分布のα線を発生させこれを被試験半導体
装置に照射し、誤動作が発生した時にα粒子が通過した
空気層厚を検出することによって、その空気層厚から被
試験半導体装置に入射した時のα粒子エネルギーを求め
ることができる。そして、得られた誤動作発生時のα粒
子エネルギー値と誤動作発生頻度の関係から、α線耐量
が極小値ヶ示すα粒子エネルギー値Eo(エネルギー依
存特性)を求めることができる。By utilizing the energy attenuation characteristic of air as an α-ray energy attenuation means and changing the air layer thickness intermittently or continuously, α-rays having a continuous and wide energy distribution can be generated. Here, there is a predetermined relationship between the energy of an α particle and its range in the air. Therefore, by controlling the thickness of the air layer through which α particles are emitted, generating α rays with a continuous energy distribution and irradiating the semiconductor device under test with this, the thickness of the air layer through which the α particles pass when a malfunction occurs is detected. From the thickness of the air layer, it is possible to determine the energy of α particles when they enter the semiconductor device under test. Then, from the obtained relationship between the α particle energy value at the time of malfunction occurrence and the frequency of malfunction occurrence, the α particle energy value Eo (energy dependent characteristic) that the α ray tolerance shows at the minimum value can be determined.
以上述べたように、加速寿命評価試験時に誤動作発生時
のα粒子エネルギーを求めることKよって、α粒子エネ
ルギー依存特性も同時に測定でき。As described above, by determining the α particle energy at the time of malfunction during the accelerated life evaluation test, the α particle energy dependent characteristics can also be measured at the same time.
測定時間の短縮ケ計ることができる。Measurement time can be shortened.
以下1本発明の一実施例を図面を参照して説明する。 An embodiment of the present invention will be described below with reference to the drawings.
第1図は本発明の一実施例に係る半導体装置の試験装置
の構成図である。第1図において、1は被試験半導体装
置、2は被試験半導体装置1から信号を取り出すための
ソケット、3はα粒子を放射するα線源、4はα線源3
の位置を検出する光電スイッチ、5はα線源3を上下に
移動させ所要時間保持するためのα線源移動制御装置、
6は被試験半導体装置1から読出した情報を正常データ
と比較し誤動作したかどうかをチエツクする誤動作チエ
ツク装置、7は誤動作発生時に誤動作チエツク装置6か
ら信号を受けとり、α線源移動制御装置5からα線源3
の現在位置(l:空気層厚)を検出する手段、8は誤動
作発生時の空気層厚からα粒子エネルギー値に換算する
入射放射線エネルギー換算手段を備え誤動作発生頻度と
α粒子エネルギー値及びα線を照射してから誤動作が発
生するまでの時間等を記録するテスタ手段、9は被試験
半導体装置1に対して外部から進入する光を遮へいする
ための暗箱である。FIG. 1 is a configuration diagram of a semiconductor device testing apparatus according to an embodiment of the present invention. In FIG. 1, 1 is a semiconductor device under test, 2 is a socket for extracting signals from the semiconductor device under test 1, 3 is an α-ray source that emits α-particles, and 4 is an α-ray source 3.
5 is an α-ray source movement control device for moving the α-ray source 3 up and down and holding it for the required time;
6 is a malfunction check device that compares information read from the semiconductor device under test 1 with normal data to check whether a malfunction has occurred; 7 receives a signal from the malfunction check device 6 when a malfunction occurs, and receives a signal from the α-ray source movement control device 5; α source 3
means for detecting the current position (l: air layer thickness), and 8 includes an incident radiation energy conversion means for converting the air layer thickness at the time of malfunction into an α particle energy value. 9 is a dark box for shielding the semiconductor device under test 1 from light entering from the outside.
第3図は、α粒子エネルギーと空気中における飛程(α
粒子がエネルギーを失うまでに空気中を飛んだ距離)の
関係を示す特性グラフである。このグラフから分かるよ
うに、α粒子が空気中を飛ぶ距離(空気層厚)を制御す
ることで、被試験半導体装置に照射するα線のエネルギ
ーを変化させることができる。Figure 3 shows α particle energy and range in air (α
This is a characteristic graph showing the relationship between the distance a particle flies in the air before losing energy. As can be seen from this graph, by controlling the distance that the α particles fly in the air (air layer thickness), the energy of the α rays irradiated to the semiconductor device under test can be changed.
次に、上述した構成の試験装置の動作を説明する。Next, the operation of the test apparatus configured as described above will be explained.
先ず、α線源移動制御装置5によりα線源3を光電スイ
ッチ4位置(基準位置)まで移動させる。First, the α-ray source movement control device 5 moves the α-ray source 3 to the photoelectric switch 4 position (reference position).
そして、予め定められたα線源3の移動量に従って移動
距離(l:空気層厚)及び保持時間をα線源移動制御装
置5が制御する。本実施例では、α線源3の上下駆動に
パルスモータを使用する。パルスモータを使用すると、
1パルス当りのα線源3移動距離が低値のため、移動距
離はパルス数に比例する。上記手法により、α線源3を
断続、連続的に移動させることによって連続エネルギー
分布を持つα線を発生させることができ、これを被試験
半導体装t1に照射する。照射中に誤動作チエツク装置
6が被試験半導体装置1の誤動作を検出すると、誤動作
発生信号が空気層厚検出手段7へ送られる。この信号を
受けた空気層厚検出手段7は、α線源移動制御装置5か
ら、基準位置に対シテパルス’Y何発パルスモータに加
えたか、そのパルス数信号を受けとり、この値から空気
層厚lを計算しテスタ手段8へ送る。テスタ手段8では
。Then, the α-ray source movement control device 5 controls the moving distance (l: air layer thickness) and holding time according to a predetermined movement amount of the α-ray source 3. In this embodiment, a pulse motor is used to drive the α-ray source 3 up and down. With a pulse motor,
Since the moving distance of the α-ray source 3 per pulse is a low value, the moving distance is proportional to the number of pulses. According to the above method, α-rays having a continuous energy distribution can be generated by moving the α-ray source 3 intermittently and continuously, and the semiconductor device under test t1 is irradiated with the α-rays. When the malfunction check device 6 detects a malfunction in the semiconductor device under test 1 during irradiation, a malfunction occurrence signal is sent to the air layer thickness detection means 7. Upon receiving this signal, the air layer thickness detecting means 7 receives a pulse number signal from the α-ray source movement control device 5 indicating how many pulses 'Y' are applied to the pulse motor relative to the reference position, and determines the air layer thickness from this value. l is calculated and sent to the tester means 8. In tester means 8.
パルス数から空気層厚lを求め、この空気層厚からα粒
子エネルギーの減衰量を計算し、被試験半導体装置1に
入射したα粒子エネルギー値に換算して、誤動作の試験
ン行う。The air layer thickness l is determined from the number of pulses, the attenuation amount of α particle energy is calculated from this air layer thickness, and the result is converted to the α particle energy value incident on the semiconductor device under test 1 to perform a malfunction test.
以上述べたように1本実施例によれば、加速寿命評価試
験の誤動作発生時に入射したα粒子エネルギー値を求め
ることによって、α粒子エネルギー依存特性も同時に測
定することができ、α線耐量の測定時間を短縮すること
ができる。As described above, according to this embodiment, by determining the energy value of the incident α particle when a malfunction occurs in the accelerated life evaluation test, the α particle energy dependence characteristics can also be measured at the same time, and the α ray tolerance can be measured. It can save time.
尚1本実施例では、α線源30基準位置検出に光電スイ
ッチ4を用いたが、これ以外にメカ的(例えばリミット
スイッチ)に検出することもでき、上記手法に限るもの
でないことは言うまでもない。In this embodiment, the photoelectric switch 4 was used to detect the reference position of the α-ray source 30, but it is also possible to detect it mechanically (for example, with a limit switch), and it goes without saying that the method is not limited to the above method. .
本発明によれば、従来に比べ簡単な方法で、誤動作の加
速寿命評価試験とα粒子エネルギー依存特性を同時に測
定することができ、被試験半導体装置の特性評価時間を
従来よりも大幅に短縮することができる。According to the present invention, it is possible to simultaneously measure the accelerated life evaluation test for malfunction and the α-particle energy dependence characteristics using a simpler method than before, and the time required to evaluate the characteristics of a semiconductor device under test can be significantly shortened compared to the conventional method. be able to.
第1図は不発明の一実施例に係る試験装置の構成因、第
2図は被試験半導体装置のα粒子エネルギー依存特性グ
ラフ、第3図は空気中におけるα粒子エネルギーと飛程
の関係を示す特性グラフである。
1・・・被試験半導体装置、3・・・α線源。
4・・・光電スイッチ、 5・・・α線源移動制御
装置。
7・・・空気層厚検出手段。
8・・・テスタ手段(入射放射線エネルギー換算手段を
含む。)
第1 図
葛2図
da+1ネ>LA”−(fiaV)
竿 3 図Fig. 1 shows the configuration of a test device according to an embodiment of the invention, Fig. 2 shows a graph of α particle energy dependence characteristics of a semiconductor device under test, and Fig. 3 shows the relationship between α particle energy and range in air. It is a characteristic graph showing. 1... Semiconductor device under test, 3... α-ray source. 4...Photoelectric switch, 5...α-ray source movement control device. 7...Air layer thickness detection means. 8... Tester means (includes incident radiation energy conversion means) Fig. 1 Fig. 2 Fig. da + 1 ne > LA” - (fiaV) Rod 3 Fig.
Claims (1)
共に、これ等両者間の空気層厚(距離)を任意に可変設
定し、放射線エネルギーを空気中で減衰させて被試験半
導体装置に入射させ該半導体装置の誤動作を試験する半
導体装置の試験装置において、前記半導体装置の誤動作
が発生した時の放射線が通過した空気層厚を検出する手
段と、その時の入射放射線エネルギーを空気層厚にて換
算する手段とを設けたことを特徴とする半導体装置の試
験装置。1. Place the radiation source and the semiconductor device under test in the air, and set the air layer thickness (distance) between them arbitrarily to attenuate the radiation energy before it enters the semiconductor device under test. In a semiconductor device testing apparatus for testing malfunction of the semiconductor device, there is provided means for detecting the thickness of an air layer through which radiation passes when a malfunction of the semiconductor device occurs, and means for detecting the incident radiation energy at that time by the air layer thickness. 1. A testing device for a semiconductor device, comprising: means for converting.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63074297A JPH073454B2 (en) | 1988-03-30 | 1988-03-30 | Semiconductor device testing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63074297A JPH073454B2 (en) | 1988-03-30 | 1988-03-30 | Semiconductor device testing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01248070A true JPH01248070A (en) | 1989-10-03 |
| JPH073454B2 JPH073454B2 (en) | 1995-01-18 |
Family
ID=13543064
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63074297A Expired - Lifetime JPH073454B2 (en) | 1988-03-30 | 1988-03-30 | Semiconductor device testing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH073454B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014077654A (en) * | 2012-10-09 | 2014-05-01 | Fujitsu Ltd | Inspection device and inspection method |
| KR20170033989A (en) * | 2015-09-18 | 2017-03-28 | 삼성전자주식회사 | Device and method for semiconductor test and data analyze device |
| WO2018225136A1 (en) * | 2017-06-05 | 2018-12-13 | 富士通株式会社 | Soft error inspection method, soft error inspection device, and soft error inspection system |
| WO2019026213A1 (en) * | 2017-08-02 | 2019-02-07 | 富士通株式会社 | Soft error inspection method, soft error inspection device, and soft error inspection system |
-
1988
- 1988-03-30 JP JP63074297A patent/JPH073454B2/en not_active Expired - Lifetime
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014077654A (en) * | 2012-10-09 | 2014-05-01 | Fujitsu Ltd | Inspection device and inspection method |
| KR20170033989A (en) * | 2015-09-18 | 2017-03-28 | 삼성전자주식회사 | Device and method for semiconductor test and data analyze device |
| WO2018225136A1 (en) * | 2017-06-05 | 2018-12-13 | 富士通株式会社 | Soft error inspection method, soft error inspection device, and soft error inspection system |
| CN110691979A (en) * | 2017-06-05 | 2020-01-14 | 富士通株式会社 | Soft error checking method, soft error checking device and soft error checking system |
| JPWO2018225136A1 (en) * | 2017-06-05 | 2020-04-09 | 富士通株式会社 | Soft error inspection method, soft error inspection device and soft error inspection system |
| US11054460B2 (en) | 2017-06-05 | 2021-07-06 | Fujitsu Limited | Soft error inspection method, soft error inspection apparatus, and soft error inspection system |
| WO2019026213A1 (en) * | 2017-08-02 | 2019-02-07 | 富士通株式会社 | Soft error inspection method, soft error inspection device, and soft error inspection system |
| JPWO2019026213A1 (en) * | 2017-08-02 | 2020-07-16 | 富士通株式会社 | Soft error inspection method, soft error inspection device and soft error inspection system |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH073454B2 (en) | 1995-01-18 |
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