JPH0126523B2 - - Google Patents

Info

Publication number
JPH0126523B2
JPH0126523B2 JP57179344A JP17934482A JPH0126523B2 JP H0126523 B2 JPH0126523 B2 JP H0126523B2 JP 57179344 A JP57179344 A JP 57179344A JP 17934482 A JP17934482 A JP 17934482A JP H0126523 B2 JPH0126523 B2 JP H0126523B2
Authority
JP
Japan
Prior art keywords
film
capacitor
electron beam
irradiated
dielectric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57179344A
Other languages
Japanese (ja)
Other versions
JPS5968919A (en
Inventor
Hidetoshi Kita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissin Electric Co Ltd
Original Assignee
Nissin Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissin Electric Co Ltd filed Critical Nissin Electric Co Ltd
Priority to JP57179344A priority Critical patent/JPS5968919A/en
Publication of JPS5968919A publication Critical patent/JPS5968919A/en
Publication of JPH0126523B2 publication Critical patent/JPH0126523B2/ja
Granted legal-status Critical Current

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  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

この発明は、誘電体層として、不活性ガス雰囲
気下で電子線を照射したポリプロピレンフイルム
(以下PPフイルムと呼称)を用いるコンデンサに
関し、耐電圧性にすぐれ、静電容量が大で小型化
しうるコンデンサに関する。 今日の電気機器は高電圧化、大容量化および小
型化の要望が強い。コンデンサに対しても静電容
量の増大と小型化の要求が高まつている。コンデ
ンサの容量は、誘電体の誘電率(ε)に比例し、
厚さに逆比例するが、誘電体の厚みを薄くすると
耐電圧性(絶縁破壊強度)の低下を招くので限度
がある。 従来、コンデンサの誘電体として用いられてい
る代表的なフイルムはPPフイルムであるが、コ
ンデンサの大容量化と小型化とをはかるために一
層耐電圧性の高い誘電体が要望されている。PP
フイルムの耐電圧性を向上させる方法としては、
PPフイルムをメタクリル酸メチルに浸漬し電子
線を照射しメタクリル酸メチルをPPフイルムの
表面にグラフト重合させる方法が知られている
(実公昭53−21410)。しかしこのPPフイルムは、
極性基を有するメタクリル酸メチルを表面にグラ
フト重合させたため、グラフト重合処理をしてい
ないPPフイルムに比べて誘電体損失(tanδ)が
大きくなるという欠点を有する。また、浸漬処理
と電子線照射という2段階の操作を行わねばなら
ず、さらに電子線照射が空気中で行われているた
めポリプロピレンの分解劣化が生じもろくなると
いう欠点がある。 この発明の発明者はこのような状況において鋭
意研究した結果この発明をなすにいたつたもので
あつて、高分子物フイルムの誘電体層を電極箔間
に積層して巻回したコンデンサ素子からなるコン
デンサであつて、高分子物フイルムが、不活性ガ
ス雰囲気下で電子線を照射したポリプロピレンフ
イルムであることを特徴とするポリプロピレンフ
イルムコンデンサを提供するものである。 この発明のコンデンサは誘電体として、不活性
ガス雰囲気下で電子線を照射したPPフイルムを
用いることを特徴とするものである。 この発明のコンデンサに用いられるPPフイル
ムは、前記先行技術のグラフト重合PPフイルム
と比べて誘電率と耐電圧性は同等であるが誘電体
損失が著しく小さく、さらにPPフイルムの分解
劣化が著しく少ないという利点を有する。また未
照射PPフイルムと比べて誘電率および誘電体損
失が同等でしかも耐電圧性が高いという利点を有
するものである。従つてこの発明によれば、より
小型で耐電圧性が大きくしかも大容量のコンデン
サが得られる。 この発明に用いられるPPフイルムとしては、
従来コンデンサ用に用いられている2軸延伸PP
フイルムなどのPPフイルムが用いられ、その厚
みなどはコンデンサの種類によつて適宜選択され
る。 またPPフイルムへの電子線照射は、窒素、ヘ
リウム、ネオン、アルゴンなどのごとき不活性ガ
スの雰囲気下、室温で行われ、電子線照射装置と
しては通常用いられているものでよく例えば変圧
器型、バンデグラーフ型、コツククロフトウオル
トン型等の電子線加速器が挙げられる。PPフイ
ルムは、電子線照射量が増大するにつれて、耐電
圧特性は増大し、誘電率はほとんど変化しない
が、一方誘電体損失が増大し比抵抗(ρ)が減少
するとともに特に照射量が極端に大きくなるとも
ろくなる。従つて電子線照射量には適切な範囲が
あり、コンデンサの種類、PPフイルムの種類、
厚みなどによつて適切な照射量が選択される。例
えば22μm厚の2軸延伸PPフイルムを用いた場
合、室温で0.5〜5.0Mradまでの電子線照射量が
適切である。 つぎにこの発明を実験例と実施例によつて説明
するがこの発明を限定するものではない。 実験例 (PPフイルムへの電子線照射試験) 22μm厚の2軸延伸PPフイルムに、空気中およ
び窒素雰囲気下約25℃でそれぞれ電子線照射した
後の特性を25℃で測定し第1表と第2表に示し
た。
This invention relates to a capacitor that uses a polypropylene film (hereinafter referred to as PP film) that has been irradiated with electron beams in an inert gas atmosphere as a dielectric layer, and has excellent voltage resistance, large capacitance, and can be miniaturized. Regarding. Today's electrical equipment has strong demands for higher voltage, larger capacity, and smaller size. There is also an increasing demand for capacitors to have increased capacitance and be made smaller. The capacitance of a capacitor is proportional to the permittivity (ε) of the dielectric material,
Although it is inversely proportional to the thickness, there is a limit because reducing the thickness of the dielectric causes a decrease in withstand voltage (dielectric breakdown strength). Conventionally, the typical film used as a dielectric material for capacitors is PP film, but in order to increase the capacity and downsize capacitors, there is a demand for dielectric materials with even higher voltage resistance. PP
As a method to improve the voltage resistance of the film,
A known method is to immerse a PP film in methyl methacrylate and irradiate it with an electron beam to graft-polymerize methyl methacrylate onto the surface of the PP film (Japanese Utility Model Publication No. 53-21410). However, this PP film
Because methyl methacrylate, which has a polar group, is graft-polymerized on the surface, it has the disadvantage that the dielectric loss (tan δ) is larger than that of a PP film that has not been graft-polymerized. In addition, a two-step operation of dipping treatment and electron beam irradiation must be performed, and since the electron beam irradiation is performed in air, there is a disadvantage that the polypropylene decomposes and deteriorates, making it brittle. The inventor of this invention has made this invention as a result of intensive research under such circumstances, and it consists of a capacitor element in which a dielectric layer of polymeric film is laminated between electrode foils and wound. The present invention provides a polypropylene film capacitor characterized in that the polymer film is a polypropylene film irradiated with electron beams in an inert gas atmosphere. The capacitor of the present invention is characterized in that a PP film irradiated with an electron beam in an inert gas atmosphere is used as the dielectric. The PP film used in the capacitor of this invention has the same dielectric constant and voltage resistance as the graft-polymerized PP film of the prior art, but the dielectric loss is significantly lower, and furthermore, the decomposition and deterioration of the PP film is significantly less. has advantages. It also has the advantage of having the same dielectric constant and dielectric loss as unirradiated PP film, and high voltage resistance. Therefore, according to the present invention, it is possible to obtain a capacitor that is smaller in size, has high voltage resistance, and has a large capacity. The PP film used in this invention is:
Biaxially stretched PP conventionally used for capacitors
A PP film such as a film is used, and its thickness is selected as appropriate depending on the type of capacitor. The PP film is irradiated with electron beams at room temperature in an atmosphere of an inert gas such as nitrogen, helium, neon, or argon. , Vandegraaf type, Kotsukucroft-Walton type, and other electron beam accelerators. As the electron beam irradiation dose increases, the PP film's dielectric strength increases and its dielectric constant hardly changes, but on the other hand, the dielectric loss increases and the resistivity (ρ) decreases, especially when the irradiation dose becomes extreme. As it grows, it becomes brittle. Therefore, there is an appropriate range for the amount of electron beam irradiation, and it depends on the type of capacitor, type of PP film,
An appropriate irradiation amount is selected depending on the thickness and other factors. For example, when using a biaxially stretched PP film with a thickness of 22 μm, an electron beam irradiation amount of 0.5 to 5.0 Mrad at room temperature is appropriate. Next, the present invention will be explained with reference to experimental examples and examples, but the present invention is not limited thereto. Experimental example (Electron beam irradiation test on PP film) A biaxially stretched PP film with a thickness of 22 μm was irradiated with an electron beam at approximately 25°C in air and in a nitrogen atmosphere, and its properties were measured at 25°C and shown in Table 1. It is shown in Table 2.

【表】 第1表の結果から明らかなように、空気中で電
子線照射すると誘電体損失が急激に増大するとと
もに、PP樹脂自体が分解劣化するためコンデン
サに用いることはできない。
[Table] As is clear from the results in Table 1, when irradiated with electron beams in air, the dielectric loss increases rapidly and the PP resin itself decomposes and deteriorates, so it cannot be used in capacitors.

【表】 第2表の結果から明らかなように、窒素ガス雰
囲気下約25℃で電子線を照射しその線量を増大し
ていくと、耐直流電圧電流傾度は増大し誘電率は
わずかに増大するが、一方誘電体損失も増大し、
比抵抗が低下する。このフイルムの場合照射線量
が5.0と10.0Mradの場合かなりもろくなつてい
た。従つてこのPPフイルムの場合、照射線量と
しては、約5.0Mrad以下の範囲が適切であること
を示している。また照射線量が高い程不経済なの
で、この点も考慮して照射線量は適宜選択され
る。 次に窒素ガス雰囲気下で電子線を照射したPP
フイルムを用いて作製したコンデンサの実施例に
ついて述べる。 実施例 1 (電力用コンデンサ) 第1図(コンデンサ素子要部の断面図)に示す
ように、窒素雰囲気下約25℃で電子線を照射した
22μm厚のPP2軸延伸フイルム1を3枚重ねた誘
電体層2にアルミニウム電極箔3が接するように
したコンデンサ素子に、鉱物油(JIS1種1号電気
絶縁油)を含浸させた構成の電力用コンデンサ
を、電子線照射量の異なる2種のPPフイルムを
使用して作製した。電子線未照射のPPフイルム
使用の対照品を含めて各コンデンサの特性を25℃
で測定して結果を第3表に示した。
[Table] As is clear from the results in Table 2, when the electron beam is irradiated at approximately 25°C in a nitrogen gas atmosphere and the dose is increased, the withstand DC voltage and current slope increases and the dielectric constant increases slightly. However, on the other hand, the dielectric loss also increases,
Specific resistance decreases. This film became quite brittle at irradiation doses of 5.0 and 10.0 Mrad. Therefore, in the case of this PP film, the appropriate irradiation dose is approximately 5.0 Mrad or less. Furthermore, since the higher the irradiation dose is, the more uneconomical it is, the irradiation dose is appropriately selected taking this point into consideration. Next, PP was irradiated with an electron beam under a nitrogen gas atmosphere.
An example of a capacitor fabricated using a film will be described. Example 1 (Power capacitor) As shown in Figure 1 (cross-sectional view of the main part of the capacitor element), an electron beam was irradiated at approximately 25°C in a nitrogen atmosphere.
For power use, a capacitor element is impregnated with mineral oil (JIS Class 1 No. 1 electrical insulating oil) in which a dielectric layer 2 made of three 22 μm thick PP biaxially stretched films 1 is placed in contact with an aluminum electrode foil 3. Capacitors were fabricated using two types of PP films with different electron beam irradiation doses. Characteristics of each capacitor including a control product using PP film that has not been irradiated with electron beams at 25°C
The results are shown in Table 3.

【表】 電子線照射のPPフイルムを用いたコンデンサ
は、対照品と比べて誘電率は変らないがACLが
高いので、体積比からみて著しく小型化できるこ
とが分かる。 実施例 2 (乾式コンデンサ) 第2図に示すように、窒素雰囲気下約25℃で電
子線を照射した22μm厚のPP2軸延伸フイルム1
11枚にアルミニウム電極箔12が接するように
したコンデンサ素子を、エポキシ樹脂で被覆成形
した構成の乾式コンデンサを作製した。電子線未
照射のPPフイルム使用の対照品を含めて各コン
デンサの特性を測定して結果を第4表に示した。
[Table] It can be seen that capacitors using electron beam irradiated PP film have the same dielectric constant as the control product, but have a higher ACL, so they can be significantly smaller in terms of volume ratio. Example 2 (Dry capacitor) As shown in Figure 2, a 22 μm thick PP biaxially stretched film 1 was irradiated with an electron beam at about 25°C in a nitrogen atmosphere.
A dry capacitor was fabricated by covering and molding 11 capacitor elements with aluminum electrode foils 12 in contact with an epoxy resin. The characteristics of each capacitor were measured, including a control product using a PP film that had not been irradiated with electron beams, and the results are shown in Table 4.

【表】 電子線照射のPPフイルムを用いたコンデンサ
は、対照品と比べて誘電率は変らないがACLが
高いので、体積比からみて著しく小型化できるこ
とが分かる。
[Table] It can be seen that capacitors using electron beam irradiated PP film have the same dielectric constant as the control product, but have a higher ACL, so they can be significantly smaller in terms of volume ratio.

【図面の簡単な説明】[Brief explanation of drawings]

第1図と第2図はそれぞれ、この発明の電力用
コンデンサおよび乾式コンデンサの一実施例のコ
ンデンサ素子要部の断面図である。 1,11…窒素雰囲気下で電子線照射したPP
フイルム、2…PPフイルムの誘電体層、3,1
2…アルミニウム電極箔。
FIGS. 1 and 2 are sectional views of essential parts of capacitor elements of an embodiment of a power capacitor and a dry capacitor of the present invention, respectively. 1,11...PP irradiated with electron beam under nitrogen atmosphere
Film, 2...Dielectric layer of PP film, 3,1
2...Aluminum electrode foil.

Claims (1)

【特許請求の範囲】 1 高分子物フイルムの誘電体層を電極箔間に積
層して巻回したコンデンサ素子からなるコンデン
サであつて、 高分子物フイルムが、不活性ガス雰囲気下で電
子線を照射したポリプロピレンフイルムであるこ
とを特徴とするポリプロピレンフイルムコンデン
サ。
[Scope of Claims] 1. A capacitor consisting of a capacitor element in which a dielectric layer of polymeric film is laminated between electrode foils and wound, wherein the polymeric film irradiates an electron beam under an inert gas atmosphere. A polypropylene film capacitor characterized in that it is an irradiated polypropylene film.
JP57179344A 1982-10-12 1982-10-12 Polypropylene film condenser Granted JPS5968919A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57179344A JPS5968919A (en) 1982-10-12 1982-10-12 Polypropylene film condenser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57179344A JPS5968919A (en) 1982-10-12 1982-10-12 Polypropylene film condenser

Publications (2)

Publication Number Publication Date
JPS5968919A JPS5968919A (en) 1984-04-19
JPH0126523B2 true JPH0126523B2 (en) 1989-05-24

Family

ID=16064194

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57179344A Granted JPS5968919A (en) 1982-10-12 1982-10-12 Polypropylene film condenser

Country Status (1)

Country Link
JP (1) JPS5968919A (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010219329A (en) * 2009-03-17 2010-09-30 Prime Polymer Co Ltd Method of manufacturing polypropylene film for film capacitor
JP5320115B2 (en) * 2009-03-17 2013-10-23 株式会社プライムポリマー Polypropylene film for film capacitor and film capacitor
SG174386A1 (en) * 2009-03-17 2011-10-28 Prime Polymer Co Ltd Polypropylene for film capacitor, polypropylene sheet for film capacitor, method for producing the same, and uses of the same
JP2014195110A (en) * 2014-05-26 2014-10-09 Prime Polymer Co Ltd Method for manufacturing polypropylene film for film capacitor
EP3732698B1 (en) * 2017-12-25 2025-07-09 Hitachi Energy Ltd Biaxially oriented polypropylene film, power capacitor, and associated manufacturing method and system
WO2021186674A1 (en) * 2020-03-19 2021-09-23 日新電機株式会社 Film for film capacitors, metallized film for film capacitors, and film capacitor

Also Published As

Publication number Publication date
JPS5968919A (en) 1984-04-19

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