JPH01285363A - Thermal head resistance adjustment device for high image quality - Google Patents
Thermal head resistance adjustment device for high image qualityInfo
- Publication number
- JPH01285363A JPH01285363A JP11467288A JP11467288A JPH01285363A JP H01285363 A JPH01285363 A JP H01285363A JP 11467288 A JP11467288 A JP 11467288A JP 11467288 A JP11467288 A JP 11467288A JP H01285363 A JPH01285363 A JP H01285363A
- Authority
- JP
- Japan
- Prior art keywords
- resistance value
- head
- resistance
- image quality
- correction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は画像プリンタのメインデバイスである感熱記録
ヘッドの最終製造法に係シ、特に、厚膜形感熱記録ヘッ
ドの最終抵抗値調整法に関する。[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a final manufacturing method for a thermal recording head, which is a main device of an image printer, and particularly relates to a method for adjusting the final resistance value of a thick film type thermal recording head. .
感熱記録ヘッドは、一般には、セラミック基板上に、−
列に並んだ発熱抵抗体と、この発熱抵抗体に選択的に記
録信号を与え、電圧を印加する駆動回路を有し、発熱抵
抗体のジュール熱に応じた発熱を記録媒体に与えて記録
を行うものである。A thermal recording head is generally mounted on a ceramic substrate.
It has heating resistors arranged in a row and a drive circuit that selectively applies recording signals and voltages to the heating resistors, and records by giving heat to the recording medium according to the Joule heat of the heating resistors. It is something to do.
従来、ヘッドには、製造プロセスによって薄膜形と厚膜
形とがあるが、高精細、高画質対応としては前者がふさ
れしい。しかし、コスト面での問題より、何とか厚膜ヘ
ッドで高画質に対応したいという要求がある。そのため
、元来、ばらつきの大きな抵抗値分布をレーザによって
複数個の微小穿孔を行い、とれてよって一定の値になる
よう。Conventionally, there are two types of heads, thin-film type and thick-film type, depending on the manufacturing process, but the former is suitable for high definition and high image quality. However, due to cost issues, there is a desire to somehow support high image quality with a thick film head. Therefore, a laser is used to make multiple micro-perforations to eliminate the resistance value distribution, which originally has a large variation, so that it becomes a constant value.
孔数によって抵抗値を調整していた(特開昭62−12
2102号公報)。この場合、抵抗値一定ということで
、抵抗値ばらつきを±1パーセント程度まで調整可能で
あった。The resistance value was adjusted by the number of holes.
Publication No. 2102). In this case, since the resistance value was constant, it was possible to adjust the resistance value variation to about ±1%.
また電圧パルスによる抵抗調整は特公昭47−2593
9号公報や特開昭62−278061号公報にみられる
ように、正シフト、負シフトさまざま考えられているが
、いずれも目標は一定の抵抗値ということで、シーケン
スが組まれている。In addition, resistance adjustment using voltage pulses is possible using the
As seen in Japanese Patent No. 9 and Japanese Patent Application Laid-open No. 62-278061, various positive and negative shifts have been considered, but in all cases the target is a constant resistance value, and a sequence is established.
上記従来技術は、抵抗値一定という制御思想のもとに進
められた技術であり、出力画像と抵抗値とを直接因果づ
けたことにはなって“いない。周知のように1発熱抵抗
体の発熱量は印加電圧をv1抵抗値をRとすれば、V2
/Rに比例するため、発色濃度むらの第一の原因はこ
の抵抗値ばらつきと考えられる。しかし、第2図(a)
、 (b)に示すように、感熱記録ヘッド(とくに厚膜
感熱記録ヘッド)の表面は電極の凹凸や、印刷精度など
に起因する表面凹凸の生成などによって、抵抗値ばらつ
きから独立した発色濃度むらを生ずることになる。1は
セラミック基板、2はガラス・グレーズ、3は電極、4
は抵抗体、5は保護ガラスである。The above-mentioned conventional technology is a technology developed based on the control concept of keeping the resistance value constant, and does not directly link the output image and the resistance value. The amount of heat generated is V2, where the applied voltage is v1 and the resistance value is R.
Since it is proportional to /R, this variation in resistance value is considered to be the primary cause of uneven color density. However, Fig. 2(a)
, As shown in (b), the surface of a thermal recording head (particularly a thick-film thermal recording head) has unevenness of the electrodes and unevenness of the surface due to printing accuracy, etc., resulting in uneven color density independent of resistance value variations. This will result in 1 is a ceramic substrate, 2 is a glass glaze, 3 is an electrode, 4
is a resistor, and 5 is a protective glass.
第3図に、従来のレーザ穿孔法を用いた場合の昇華熱転
写における濃度ムラの原因分析結果を示す。この図から
も明らかなように、従来の高画質化というのは、抵抗値
ばらつきのみに着目する間接的な手法である。FIG. 3 shows the analysis results of the cause of density unevenness in sublimation thermal transfer when the conventional laser perforation method is used. As is clear from this figure, the conventional method of improving image quality is an indirect method that focuses only on resistance value variations.
本発明の目的は、画像との直接的な結びっけから、各影
響因子を含んだ抵抗調整を行い、最終的に高画質を得る
ことにある。An object of the present invention is to perform resistance adjustment including various influencing factors from a direct connection with the image, and to finally obtain high image quality.
上記目的は1画像と抵抗値を直接的に結びつけ。 The above purpose is to directly link one image and the resistance value.
各発熱素子に応じた抵抗値設定を必要とし、仮に組み上
げた厚膜ヘッドを用いて、規定の評価バター/を出力し
、各素子に応じた平均発色濃度分布を得ることにより、
達成される。It is necessary to set the resistance value according to each heating element, and by using the temporarily assembled thick film head to output the specified evaluation butter / and obtain the average color density distribution according to each element,
achieved.
もつと平易に言うならば、予め、一つのヘッド系におい
て1発色濃度と修正抵抗値量の関係を明らかにした後、
修正量まで抵抗値を補正するものである。この方法をと
ることによって従来、一定の抵抗値に調整していた場合
に比べて、さらに高画質を実現できる。To put it simply, after clarifying the relationship between one color density and the amount of corrected resistance value in one head system,
The resistance value is corrected up to the correction amount. By adopting this method, higher image quality can be achieved than in the conventional case where the resistance value is adjusted to a constant value.
尚、微小濃度測定システムとしては発熱素子に対応する
平均発色濃度分布を求めるために主走査方向にステップ
送りが可能な光学センサをもつことが望ましい。また調
整システムとしては発熱素子の抵抗値を調整するために
、位置合せ装置と。It is preferable that the minute density measurement system has an optical sensor capable of step feeding in the main scanning direction in order to obtain the average color density distribution corresponding to the heating element. The adjustment system also includes a positioning device to adjust the resistance value of the heating element.
高電圧短時間パルスを印加できる装置を具備することが
好ましい。Preferably, a device capable of applying high voltage short-time pulses is provided.
仮組みのヘッドによる濃度分布の測定は、CCDなどの
受光素子を備えたセンサによって行うことができる。一
方、極短パルス幅の電圧印加によって、厚膜抵抗素子の
抵抗値がシフトすることはよく知られており、このシフ
ト量を人為的にコントロールすることが本方法になる。The concentration distribution can be measured using a temporarily assembled head using a sensor equipped with a light receiving element such as a CCD. On the other hand, it is well known that the resistance value of a thick film resistance element shifts due to the application of a voltage with an extremely short pulse width, and the present method involves artificially controlling the amount of this shift.
たとえば、静電気による抵抗値シフトはこの極端な例と
いうことができる。For example, a resistance value shift due to static electricity can be said to be an extreme example of this.
以下1本発明の実施例を図により説明する。 An embodiment of the present invention will be described below with reference to the drawings.
第1図は本発明の全体の流れ図を示している。FIG. 1 shows the overall flowchart of the invention.
マス、通常のプロセスによって厚膜ヘッドを仮組立てす
る。したがって、保護膜の形成も、従来のレーザによる
穿孔法の場合と異なり、5ooC前後の安定した焼成条
件を確保できるため、信頼性の面で優位に立てるもので
ある。この仮組みのヘッドの抵抗値;R3分布は予め測
定しておく。次に、定められた発色評価装置によって全
抵抗素子の記録を行い、各抵抗素子に応じた平均濃度;
D1分布を求める。通常、濃度特性はCOD (電荷結
合素子)などの光電変換器によって求めることができる
。このシステムを第4図に示す。まず、パルス・モータ
駆動のXYテーブル7上に画像サンプル8をおき、所定
のピッチで測定位置を選び濃度検出器9によって平均濃
度を求めるわけである。The thick film head is pre-assembled using standard processes. Therefore, unlike the conventional laser perforation method, the formation of the protective film is advantageous in terms of reliability because stable firing conditions of around 5ooC can be ensured. The resistance value; R3 distribution of this temporarily assembled head is measured in advance. Next, all the resistive elements are recorded using a specified color development evaluation device, and the average density according to each resistive element is determined.
Find the D1 distribution. Usually, concentration characteristics can be determined by a photoelectric converter such as a COD (charge-coupled device). This system is shown in FIG. First, an image sample 8 is placed on an XY table 7 driven by a pulse motor, measurement positions are selected at a predetermined pitch, and the average density is determined by a density detector 9.
データ処理および位置制御は、MPU6による。Data processing and position control are performed by the MPU 6.
感熱転写の発色濃度;Dlはさまざまの影響因子をもつ
ことは第3図で示したが、ここで抵抗値とその他の因子
に分けることができる。通常の製造法によるヘッドでは
コンタクトの影響と抵抗値の影響を考えればよい。The color density of thermal transfer; Dl has various influencing factors as shown in FIG. 3, but it can be divided into resistance value and other factors. For heads manufactured using normal manufacturing methods, it is sufficient to consider the influence of contacts and the influence of resistance value.
次の段階で、抵抗値一定となるような修正を行う。これ
には第5図に示したようなシステムを用いる。まず、位
置制御テーブル上に、ヘッドを置く。このヘッドには抵
抗素子14a・・・・・・が構成されており、これらの
各々に、極短のパルス電圧を印加することによって抵抗
調整するものである。In the next step, corrections are made to keep the resistance constant. For this purpose, a system as shown in FIG. 5 is used. First, place the head on the position control table. This head is constructed with resistance elements 14a, and the resistance is adjusted by applying an extremely short pulse voltage to each of these elements.
このとき、電圧印加とともに、抵抗値をモニタしておき
、所定の抵抗値で、停止するものである。At this time, the voltage is applied and the resistance value is monitored, and the process is stopped when a predetermined resistance value is reached.
通常、極短パルスでは、第6図(a)に示すように。Usually, in the case of an extremely short pulse, as shown in FIG. 6(a).
厚膜抵抗体材料では抵抗値が負側にシフトする場合が多
く、通常の使用レベルのパルス入力域では、−時的な負
側シフトから正側シフトに移行するようであり、両者の
使い分けによって、任意の抵抗値調整が可能である。こ
のようにして、はぼ一定に修正した抵抗群をもつヘッド
によって、また試し印画を行い、このときの濃度分布D
+’を求める。With thick film resistor materials, the resistance value often shifts to the negative side, and in the pulse input range of the normal usage level, it seems to shift from a -temporal negative side shift to a positive side shift. , arbitrary resistance value adjustment is possible. In this way, another trial print was made using the head with the resistance group modified to be approximately constant, and the density distribution D
Find +'.
ここで濃度の変動量ΔD+’に対して、さらに抵抗値修
正量ΔR1を定め、所定の抵抗値: R+ 1’に追い
こんでいく方法である。Here, a resistance value correction amount ΔR1 is further determined for the concentration fluctuation amount ΔD+', and the resistance value is brought to a predetermined resistance value: R+1'.
抵抗値修正は通常1抵抗素子当り数秒内に完了するため
、繰返しを行っても、工程時間はそれほど多くを要しな
い。Since the resistance value modification is normally completed within several seconds per resistive element, the process does not require much time even if it is repeated.
実際に電極材料にきわめて薄い厚膜材料(たとえば有機
金など)を使えば、抵抗体の印刷焼成による、抵抗値ば
らつきを±10%以下までおさえることができ、その後
の工程も短縮できる。その結果、32階調、64階調と
いうような高画質化を達成できるし、濃度むらΔD+も
きわめて小さくできる。In fact, if an extremely thin thick film material (for example, organic gold, etc.) is used as the electrode material, variations in resistance value due to printing and firing of resistors can be suppressed to less than ±10%, and subsequent steps can also be shortened. As a result, high image quality such as 32 gradations and 64 gradations can be achieved, and density unevenness ΔD+ can be extremely reduced.
本発明によれば、ヘッドの表面形状にはメスを入れず、
濃度の薄い部分は所定の抵抗値より低目に、濃い部分は
高目に設定することで、各抵抗素子からメディアへの伝
熱量を一定圧できるため、従来にない高画質、とぐに濃
度ムラのない厚膜ヘッドを供給できる。According to the present invention, no scalpel is inserted into the surface shape of the head;
By setting the resistance value lower for areas with lower density and higher value for darker areas, the amount of heat transferred from each resistance element to the media can be maintained at a constant pressure, resulting in unprecedentedly high image quality and uneven density. We can supply thick film heads without
これに関連して、従来高画質を実現するために実施して
いた。マイクロボリジングの工程を省略できるため、量
産には非常に向いたプロセスとなる。いいかえれば、低
価格化を実現できる。In this regard, conventional techniques have been used to achieve high image quality. Since the microboring process can be omitted, this process is very suitable for mass production. In other words, lower prices can be achieved.
次に本ヘッドの抵抗値修正は従来のレーザ穿孔法によら
ないため、まず高温焼成の保護膜を採用できるため、走
行、静電気などの信頼性を大幅に向上できる。Secondly, since the resistance value correction of this head does not involve the conventional laser drilling method, it is possible to first use a high-temperature fired protective film, which greatly improves reliability in terms of running and static electricity.
また、修正方法をきわめてシステマチックに構成できる
ため、自動化が容易であり、量卒1(向く。In addition, since the correction method can be configured in an extremely systematic manner, it is easy to automate, and it is suitable for mass production.
以上のような効果を有する。It has the above effects.
第1図は本発明の濃度分布に基づく抵抗値修正による高
画質化システムのフロー図、第2図は櫛歯電極構造によ
る厚膜ヘッドの平面図、および断面図、第3図は現状の
画像プリンタにおける濃度ムラの原因と対策を示すフロ
ー図、第4図は各抵抗素子に対応する発色濃度分布を測
定するシステム・ブロック図、第5図はパルス状電圧印
加による抵抗値調整のだめのシステム・ブロック図、第
6図はパルス印加による抵抗値変動の様子を示す特性図
である。
1・・・セラミック基板、2・・・ガラス・グレーズ、
3・・・電極、4・・・抵抗体、5・・・保護ガラス、
6・・・制御用パソコン、7・・・パルスモータ駆動X
Yテーブル。
8・・・画像サンプル、9・・・発色濃度検出器、10
・・・パルス発生電源、11・・・デジタル・マルチメ
ータ。
第 1 凹
早 2 図
(2L)
第 3I!1
<源、 図 > <封 東〉
峯 4 図
第 5I21
乙
/
14抵嶺漂干Figure 1 is a flow diagram of the high image quality system by modifying resistance values based on concentration distribution according to the present invention, Figure 2 is a plan view and cross-sectional view of a thick film head with a comb-teeth electrode structure, and Figure 3 is an image of the current state. A flow diagram showing the causes and countermeasures for density unevenness in printers. Figure 4 is a system block diagram for measuring color density distribution corresponding to each resistance element. Figure 5 is a system block diagram for adjusting resistance values by applying pulsed voltage. The block diagram and FIG. 6 are characteristic diagrams showing how the resistance value changes due to pulse application. 1... Ceramic substrate, 2... Glass glaze,
3... Electrode, 4... Resistor, 5... Protective glass,
6... Control computer, 7... Pulse motor drive X
Y table. 8... Image sample, 9... Color density detector, 10
...Pulse generation power supply, 11...Digital multimeter. 1st Concave 2 Figure (2L) 3rd I! 1 <Source, Figure><FengEast> Mine 4 Figure 5I21 Otsu / 14 Drifting Ridge
Claims (1)
プロセスによつて形成されたヘッドにより出力された評
価画像をもとに、各発熱素子の抵抗値を決め、電圧パル
ス印加によつて抵抗補正を行うことを特徴とする高画質
対応感熱ヘッド抵抗調整装置。1. In a thermal recording head for an image printer, the resistance value of each heating element is determined based on the evaluation image output by the head formed by a normal process, and the resistance is corrected by applying a voltage pulse. A thermal head resistance adjustment device that supports high image quality.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11467288A JPH01285363A (en) | 1988-05-13 | 1988-05-13 | Thermal head resistance adjustment device for high image quality |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11467288A JPH01285363A (en) | 1988-05-13 | 1988-05-13 | Thermal head resistance adjustment device for high image quality |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01285363A true JPH01285363A (en) | 1989-11-16 |
Family
ID=14643717
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11467288A Pending JPH01285363A (en) | 1988-05-13 | 1988-05-13 | Thermal head resistance adjustment device for high image quality |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01285363A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001239689A (en) * | 2000-02-28 | 2001-09-04 | Ricoh Elemex Corp | Thermal head, method and apparatus for adjusting thermal head, and method of manufacturing thermal head |
| JP2002029079A (en) * | 2000-07-14 | 2002-01-29 | Kyocera Corp | Thermal head resistance adjustment method |
-
1988
- 1988-05-13 JP JP11467288A patent/JPH01285363A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001239689A (en) * | 2000-02-28 | 2001-09-04 | Ricoh Elemex Corp | Thermal head, method and apparatus for adjusting thermal head, and method of manufacturing thermal head |
| JP2002029079A (en) * | 2000-07-14 | 2002-01-29 | Kyocera Corp | Thermal head resistance adjustment method |
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