JPH01321402A - heatless reflector - Google Patents
heatless reflectorInfo
- Publication number
- JPH01321402A JPH01321402A JP63154866A JP15486688A JPH01321402A JP H01321402 A JPH01321402 A JP H01321402A JP 63154866 A JP63154866 A JP 63154866A JP 15486688 A JP15486688 A JP 15486688A JP H01321402 A JPH01321402 A JP H01321402A
- Authority
- JP
- Japan
- Prior art keywords
- heat
- mirror
- thin film
- base material
- refractive index
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010408 film Substances 0.000 claims abstract description 41
- 239000000463 material Substances 0.000 claims abstract description 24
- 239000010409 thin film Substances 0.000 claims abstract description 21
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 15
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 15
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 9
- 239000010936 titanium Substances 0.000 claims abstract description 9
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 8
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 7
- 239000010703 silicon Substances 0.000 claims abstract description 7
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 6
- 239000011651 chromium Substances 0.000 claims abstract description 6
- 229910000838 Al alloy Inorganic materials 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 5
- 238000005253 cladding Methods 0.000 claims description 4
- 239000010410 layer Substances 0.000 abstract description 23
- 239000002344 surface layer Substances 0.000 abstract 2
- 238000005498 polishing Methods 0.000 description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 2
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- XTKDAFGWCDAMPY-UHFFFAOYSA-N azaperone Chemical compound C1=CC(F)=CC=C1C(=O)CCCN1CCN(C=2N=CC=CC=2)CC1 XTKDAFGWCDAMPY-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Optical Elements Other Than Lenses (AREA)
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、照明器具の反射鏡に関するものである。[Detailed description of the invention] [Industrial application field] TECHNICAL FIELD The present invention relates to a reflecting mirror for a lighting device.
白熱電球、カーボンアークなどを光源に用いた高照度照
明器具、例えばスタジオ投光器や映写機光源部では、金
属膜又は金属板を用いた反射鏡が使われることが多いが
、この反射鏡は、赤外線もよく反射するので、被照射面
の著しい温度上昇を招いたり、照射される人に堪え難い
暑さを感じさせたりするという欠点がある。ガラスを基
材としその表面に多層反射膜を設けたいわゆるコールド
ミラー（冷光鏡）は、可視光線を反射するが赤外線は透
過する性質を持つので、金属性反射鏡のように被照射面
の温度を上昇させることはないが、金属製のもののよう
に薄くできないから、重くて扱いにくく、また破損し易
いから、安全性の点でも問題がある。High-intensity lighting equipment that uses incandescent bulbs, carbon arcs, etc. as a light source, such as studio floodlights and projector light sources, often uses reflectors made of metal films or metal plates. Since it reflects well, it has the drawback of causing a significant temperature rise on the irradiated surface and making the person being irradiated feel unbearably hot. A so-called cold mirror, which is made of glass and has a multilayer reflective film on its surface, reflects visible light but transmits infrared rays, so unlike a metallic mirror, the temperature of the illuminated surface changes. However, since they cannot be made as thin as metal ones, they are heavy and difficult to handle, and they are easily damaged, which poses a safety problem.
このような問題を解決するため、昭和６１年特許願第０
９７０００号には、金属またはセラミックスよりなる基
材の表面にケイ素、チタン及びクロムから成る群から選
ばれた元素の黒色酸化物の薄膜を蒸着し、該黒色酸化物
の薄膜の上に透明な高屈折率膜と低屈折率膜との交互積
層膜から成る赤外線透過性多層反射膜を形成して成る無
熱反射鏡が開示されている、このような無熱反射鏡であ
ると、赤外線透過性多層反射膜が実質的に可視光線のみ
を反射゛し、赤外線を透過させ、この透過した赤外線′
は、黒色酸化物の薄膜で吸収されて熱エネルギに変換さ
れ、この熱エネルギは基材に伝達された後、伝導又は輻
射により基材背面から放散される。上記基材としては高
純度アルミニウムが最も好ましい。基材をアルミニウム
とすると、電解研磨により容易に鏡面が得られ、コール
ドミラーよりも軽量で扱い易く、また丈夫で破…のおそ
れがないという利点を有する無熱反射鏡が得られる。In order to solve these problems, patent application No. 0 was filed in 1986.
No. 97000, a thin film of a black oxide of an element selected from the group consisting of silicon, titanium, and chromium is deposited on the surface of a base material made of metal or ceramics, and a transparent high-temperature film is deposited on the thin film of the black oxide. A heat-free reflecting mirror is disclosed in which an infrared-transmitting multilayer reflective film is formed by alternately laminating films of refractive index films and low-refractive index films. The multilayer reflective film substantially reflects only visible light and transmits infrared rays.
is absorbed by the black oxide thin film and converted into thermal energy, which is transferred to the substrate and then dissipated from the back side of the substrate by conduction or radiation. High purity aluminum is most preferred as the base material. When aluminum is used as the base material, a mirror surface can be easily obtained by electrolytic polishing, and a heat-free reflective mirror is obtained which has the advantages of being lighter and easier to handle than a cold mirror, and being durable and free from breakage.
然しなから、上記無熱反射鏡を長時間使用すると基材が
高温となり、これが高純度アルミ“である場合には軟化
して変形し、又耐熱性の÷ルミ合金を使用すると電解研
磨等によっても鏡面仕上げが困難であるという問題点が
あった。However, if the above-mentioned heat-free reflector is used for a long time, the base material becomes high temperature, and if it is made of high-purity aluminum, it will soften and deform, and if a heat-resistant ÷ lumi alloy is used, it will be damaged by electrolytic polishing etc. However, there was a problem in that mirror finishing was difficult.
本発明は、叙上の問題点を解決するためなされたもので
あり、その目的とするところは、軽量で扱い易く、高温
においても基材が軟化することなく、良好な鏡面を有す
る無熱反射鏡を提供することにある。The present invention was made to solve the above problems, and its purpose is to provide a heat-free reflective material that is lightweight and easy to handle, does not soften the base material even at high temperatures, and has a good mirror surface. It's about providing a mirror.
上記の目的は、基材の表面にケイ素、チタン及びクロム
から成る群から選ばれた元素の黒色酸化物の’ＩＪ膜を
蒸着し、該黒色酸化物の薄膜の上に透明な高屈折率膜と
低屈折率膜との交互積層膜から成る赤外線透過性多層反
射膜を形成して成る無熱反射鏡において、上記基材が、
９９．８％以上の高純度アルミニウムから成る鏡面層と
耐熱アルミニウム合金から成る基層とにより構成される
クラッド材から成ることを特徴とする上記の無熱反射鏡
によって達成し得る。The above purpose is to deposit an 'IJ film of a black oxide of an element selected from the group consisting of silicon, titanium and chromium on the surface of a substrate, and to deposit a transparent high refractive index film on the thin film of the black oxide. In a heat-free reflecting mirror formed by forming an infrared-transmissive multilayer reflective film consisting of an alternately laminated film of and a low refractive index film, the base material is
This can be achieved by the heat-free reflecting mirror described above, which is made of a cladding material composed of a mirror layer made of 99.8% or more high-purity aluminum and a base layer made of a heat-resistant aluminum alloy.
上記の如き構成の無熱反射鏡であると、基材が、９９．
８％以上の高純度アルミニウムから成る鏡面層と耐熱ア
ルミニウム合金から成る基層とにより構成されているか
ら、高純度アルミニウムから成る鏡面層は電解研磨等の
手段により高度の鏡面仕上げが可能であり、また基層は
耐熱アルミニウム合金から成るため長時間の使用によっ
ても軟化することのない優れた無熱反射鏡を提供し得る
ものである。In the heat-free reflecting mirror configured as above, the base material is 99.
Since it is composed of a mirror layer made of 8% or more high-purity aluminum and a base layer made of a heat-resistant aluminum alloy, the mirror layer made of high-purity aluminum can be finished to a high mirror finish by means such as electrolytic polishing. Since the base layer is made of a heat-resistant aluminum alloy, it is possible to provide an excellent heat-free reflecting mirror that does not soften even after long-term use.
以下、図面を参照、しつ−本発明の構成を具体的に説明
する。DESCRIPTION OF THE PREFERRED EMBODIMENTS The structure of the present invention will be specifically described below with reference to the drawings.
第１図は本発明にか＼る無熱反射鏡の一実施例を示す断
面図、第２図は第１図に示した無熱反射鏡の分光反射曲
線である。FIG. 1 is a cross-sectional view showing an embodiment of a heat-free reflecting mirror according to the present invention, and FIG. 2 is a spectral reflection curve of the heat-free reflecting mirror shown in FIG. 1.
而して、本願発明にか−る無熱反射鏡の構造は、第１図
に示す如く、高純度アルミニウムから成る鏡面層１ａと
耐熱アルミニウム合金から成る基層１ｂとを有するクラ
ッド材から成る基材ｌの表面に、ケイ素、チタン及びク
ロムから成る群から選ばれた元素の黒色酸化物の薄膜２
を蒸着により形成し、該黒色酸化物の薄膜２の上に透明
な高屈折率膜４−１ないし４−ｎと低屈折率膜５−１な
いし５−ｎとの交互積層膜から成る赤外線透過性多層反
射膜３を形成して成るものである。As shown in FIG. 1, the structure of the heat-free reflecting mirror according to the present invention includes a base material made of a cladding material, which has a mirror layer 1a made of high-purity aluminum and a base layer 1b made of a heat-resistant aluminum alloy. A thin film 2 of a black oxide of an element selected from the group consisting of silicon, titanium and chromium on the surface of the
is formed by vapor deposition, and on the black oxide thin film 2, transparent high refractive index films 4-1 to 4-n and low refractive index films 5-1 to 5-n are alternately laminated. It is formed by forming a multilayer reflective film 3.
基材ｌは、その強度及び重量の観点から厚さ数ｍ１１１
程度のものが好適であり、その鏡面層１ａは例えばＪＩ
Ｓ １１４０００ に規定された合金番号１０８０の
純度９９．８％以上の高純度アルミニウム材が使用され
、これを耐熱アルミニウム合金から成る基層ｌｂ上にク
ラッド法によって一体的に結合して成るものである。基
材１の形状は放物面状など反射鏡として必要な形状に成
形されたま−のものでもよいが、必要に応してその背面
に、放熱のためのフィン又は水冷機構を設けて過度の温
度上昇を防ぐようにするのが望ましい。The base material l has a thickness of several meters from the viewpoint of its strength and weight.
For example, the mirror layer 1a is made of JI
A high-purity aluminum material having a purity of 99.8% or more and having alloy number 1080 specified by S 114000 is used, and is integrally bonded to a base layer lb made of a heat-resistant aluminum alloy by a cladding method. The shape of the base material 1 may be a ball shaped into the shape required for a reflecting mirror, such as a paraboloid, but if necessary, fins or a water cooling mechanism for heat radiation may be provided on the back surface to avoid excessive heat dissipation. It is desirable to prevent temperature rise.
鏡面層１ａの表面は電解研磨、化学研磨等の手段によっ
て鏡面仕上げが施され、その上にケイ素、チタン及びク
ロムから成る群から選ばれた元素の黒色酸化物の薄膜２
が蒸着により形成される。The surface of the mirror layer 1a is mirror-finished by means such as electrolytic polishing or chemical polishing, and a thin film 2 of a black oxide of an element selected from the group consisting of silicon, titanium, and chromium is applied thereon.
is formed by vapor deposition.
黒色酸化物の薄膜２は、真空蒸着の常法によりケイ素、
チタン若しくはクロムの酸化物の薄膜を基材上に形成さ
せるに当り、通常の透明酸化物（ＳｉＯ，、ＴｉＯ２又
はＣｒｚＯ：＋）の薄膜を形成させる場合よりも酸素供
給量を制限することにより形成されるものである。この
黒色酸化物の薄膜の微細構造は完全に解明されてはいな
いが、漆畳で、光学顕微鏡で観察する程度では緻密なＭ
ｉ織に見えるものである。その薄膜は、基材表面が完全
に隠蔽される程度の厚さ（通常１５０〜４００ｎｍ程変
）に形成されている。The black oxide thin film 2 is made of silicon,
When forming a thin film of titanium or chromium oxide on a substrate, the amount of oxygen supplied is more limited than when forming a thin film of normal transparent oxide (SiO, TiO2 or CrzO:+). It is something that will be done. Although the fine structure of this thin film of black oxide has not been completely elucidated, it is a lacquer mat, and when observed with an optical microscope, it shows a dense M
It looks like an i-weave. The thin film is formed to a thickness (usually varying from 150 to 400 nm) that completely covers the surface of the base material.
薄膜２としてチタンの黒色酸化物を用いる場合、制限さ
れた量の酸素を供給しながら鏡面Ｎ１ａＪ＝にチタンを
厚さ約２００ｎｍ程度となるように真空蒸着するもので
ある。When black oxide of titanium is used as the thin film 2, titanium is vacuum-deposited on the mirror surface N1aJ= to a thickness of about 200 nm while supplying a limited amount of oxygen.
その上の赤外線透過性多層反射膜３は、黒色酸化物の薄
膜２の表面に直接形成されている。この反射膜は、通常
のコールドミラーの表面に形成されている多層反射膜と
同じものである。即ち、Ｓｉ０２ 、Ｔ ｉ Ｏｚ 、
Ｍ ｇ Ｆ ｚ 、Ｇ ｅ等から成る透明な薄膜であっ
て、屈折率の異なるもの２種類、即ち高屈折率の膜４−
１ないし４−〇と低屈折率の膜５−１ないし５−ｎとを
交互に、通常１１〜２３層程度積層して成るものである
。そして各層の厚さは、最大反射率が波長５００〜６０
０ｎｍ、最適には約５５０ｎｍの光において得られ且つ
多層反射膜全体についてみたときの赤外線領域における
反射率が約２０％以下となるように選定されている。な
お、最大反射率を示す波長λ。と単層層厚ｄとの間には
、周知のｄ−λ。／４という関係がある。The infrared transmitting multilayer reflective film 3 thereon is formed directly on the surface of the black oxide thin film 2. This reflective film is the same as the multilayer reflective film formed on the surface of a normal cold mirror. That is, Si02, T i Oz,
Two kinds of transparent thin films made of M g F z , Ge, etc. and having different refractive indexes, that is, high refractive index films 4-
1 to 4-0 and low refractive index films 5-1 to 5-n are alternately laminated, usually about 11 to 23 layers. The thickness of each layer has a maximum reflectance of 500 to 600 wavelengths.
It is selected so that it can be obtained with light of 0 nm, optimally about 550 nm, and the reflectance in the infrared region of the entire multilayer reflective film is about 20% or less. Note that the wavelength λ indicates the maximum reflectance. and the monolayer thickness d is the well-known d−λ. There is a relationship of /4.
図示した実施例の場合、赤外線透過性多層反射膜３は、
屈折率２．３０の酸化チタン膜４−１ないし４−ｎと、
屈折率ｌ、３８のフッ化マグネシウム膜５−１ないし５
−ｎとが交互に、合計２３層、真空蒸着による多層反射
膜形成の常法に従って積層されて成るものである。そし
て酸化チタン膜４−１ないし４−ｎ及びフン化マグネシ
ウム膜５−１ないし５−ｎは、それらによる光の反射が
波長的４００〜７００ｎｍで最大になるよう、各単層膜
厚が約５５０／４ ｎｍに選ばれている。それにより、
この反射鏡の光線反射率は、第２図に示したように、可
視光線の略全領域では約８０％以上であるが、波長７０
０ｎｍ以上の赤外線領域では約５％以下となるような、
無熱反射鏡として優れた特性を有するものである。In the illustrated embodiment, the infrared-transmissive multilayer reflective film 3 is
Titanium oxide films 4-1 to 4-n with a refractive index of 2.30,
Magnesium fluoride film 5-1 to 5 with refractive index l, 38
-n are alternately laminated for a total of 23 layers according to a conventional method for forming a multilayer reflective film by vacuum deposition. The titanium oxide films 4-1 to 4-n and the magnesium fluoride films 5-1 to 5-n each have a single layer thickness of about 550 nm so that the light reflection by them is maximum in the wavelength range of 400 to 700 nm. /4 nm. Thereby,
As shown in Figure 2, the light reflectance of this reflecting mirror is approximately 80% or more in almost the entire range of visible light, but
In the infrared region of 0 nm or more, it is about 5% or less,
It has excellent properties as a heat-free reflecting mirror.
［発明の効果］
本発明は狭止の如く構成されるから、本発明によるとき
は、その基材が、９９．８％以上の高純度アルミニウム
から成る鏡面層と耐熱アルミニウム合金から成る基層と
により構成されており、高純度アルミニウムから成る鏡
面層は電解研磨等の手段により高度の鏡面仕上げが可能
であり、また基層は耐熱アルミニウム合金から成るため
長時間の使用によっても軟化することがなく、軽量で汲
い易い優れた無熱反射鏡を提供し得るものである。[Effects of the Invention] Since the present invention is structured in a narrow manner, when the present invention is applied, the base material is formed by a mirror layer made of high purity aluminum of 99.8% or more and a base layer made of a heat-resistant aluminum alloy. The mirror layer made of high-purity aluminum can be polished to a high mirror finish by means such as electrolytic polishing, and the base layer is made of heat-resistant aluminum alloy, so it does not soften even after long-term use and is lightweight. This makes it possible to provide an excellent heat-free reflecting mirror that is easy to pump.
なお、本発明は狭止の実施例に限定されるものでなく、
例えば基材の形状や寸法は必要に応して種々変更し得る
ものであり、黒色酸化物の薄膜から成る反射膜の厚さ、
赤外線透過性多層反射膜の厚さや層数等は使用目的に応
じて適宜変更し得るものであり、従って、本発明はその
目的の範囲内において上記の説明から当業者が容易に推
考し得るすべての変更実施例を包摂するものである。Note that the present invention is not limited to the narrowing example,
For example, the shape and dimensions of the base material can be changed in various ways as necessary, and the thickness of the reflective film made of a thin film of black oxide,
The thickness, number of layers, etc. of the infrared-transmissive multilayer reflective film can be changed as appropriate depending on the purpose of use, and therefore, the present invention incorporates all modifications that can be easily deduced by a person skilled in the art from the above description within the scope of its purpose. This includes the modified embodiments of .
第１図は本発明にか−る無熱反射鏡の一実施例を示す断
面図、第２図は第１図に示した無熱反射鏡の分光反射曲
線である。
１−−−−−−−−−−−−−−一基材１ ａ −−−
−−−−−−−一鏡面層Ｉｂ−−−−−−−−−・−基
層
２ −−−−−−−−−−−一黒色酸化物の薄膜３−−
−−−−一・−−−−−−一赤外線透過性多層反射膜４
−１ないし４− ｎ −一一一−高屈折率膜５−１な
いし５−ｎ−ｍ−低屈折率膜FIG. 1 is a cross-sectional view showing an embodiment of a heat-free reflecting mirror according to the present invention, and FIG. 2 is a spectral reflection curve of the heat-free reflecting mirror shown in FIG. 1------------ One base material 1 a ---
-----------One specular layer Ib------------ Base layer 2------One black oxide thin film 3---
------1・-----1 Infrared transmitting multilayer reflective film 4
-1 to 4-n -111-high refractive index film 5-1 to 5-n-m-low refractive index film
Claims (1)
選ばれた元素の黒色酸化物の薄膜を蒸着し、該黒色酸化
物の薄膜の上に透明な高屈折率膜と低屈折率膜との交互
積層膜から成る赤外線透過性多層反射膜を形成して成る
無熱反射鏡において、上記基材が、９９．８％以上の高
純度アルミニウムから成る鏡面層と耐熱アルミニウム合
金から成る基層とにより構成されるクラッド材から成る
ことを特徴とする上記の無熱反射鏡。A thin film of a black oxide of an element selected from the group consisting of silicon, titanium, and chromium is deposited on the surface of the substrate, and a transparent high refractive index film and a low refractive index film are formed on the black oxide thin film. In a heat-free reflecting mirror formed of an infrared-transmissive multilayer reflective film composed of alternately laminated films, the base material is composed of a mirror layer made of high-purity aluminum of 99.8% or more and a base layer made of a heat-resistant aluminum alloy. The above-mentioned heat-free reflecting mirror is made of a cladding material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63154866A JP2714397B2 (en) | 1988-06-24 | 1988-06-24 | Non-heat reflecting mirror |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63154866A JP2714397B2 (en) | 1988-06-24 | 1988-06-24 | Non-heat reflecting mirror |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01321402A true JPH01321402A (en) | 1989-12-27 |
| JP2714397B2 JP2714397B2 (en) | 1998-02-16 |
Family
ID=15593631
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63154866A Expired - Lifetime JP2714397B2 (en) | 1988-06-24 | 1988-06-24 | Non-heat reflecting mirror |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2714397B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112962064A (en) * | 2021-02-01 | 2021-06-15 | 国家纳米科学中心 | High-temperature-resistant optical reflecting film and preparation method and application thereof |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS529454A (en) * | 1975-07-14 | 1977-01-25 | Yokohama Kiko Kk | Reflection mirror manufacturing process |
| JPS62254104A (en) * | 1986-04-28 | 1987-11-05 | Koichiro Tsutsui | Manufacturing method of heat-free reflective mirror |
-
1988
- 1988-06-24 JP JP63154866A patent/JP2714397B2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS529454A (en) * | 1975-07-14 | 1977-01-25 | Yokohama Kiko Kk | Reflection mirror manufacturing process |
| JPS62254104A (en) * | 1986-04-28 | 1987-11-05 | Koichiro Tsutsui | Manufacturing method of heat-free reflective mirror |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112962064A (en) * | 2021-02-01 | 2021-06-15 | 国家纳米科学中心 | High-temperature-resistant optical reflecting film and preparation method and application thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2714397B2 (en) | 1998-02-16 |
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