JPH0133921B2 - - Google Patents

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Publication number
JPH0133921B2
JPH0133921B2 JP8444383A JP8444383A JPH0133921B2 JP H0133921 B2 JPH0133921 B2 JP H0133921B2 JP 8444383 A JP8444383 A JP 8444383A JP 8444383 A JP8444383 A JP 8444383A JP H0133921 B2 JPH0133921 B2 JP H0133921B2
Authority
JP
Japan
Prior art keywords
manganese
thermistor
nickel
atom
samples
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP8444383A
Other languages
Japanese (ja)
Other versions
JPS59208804A (en
Inventor
Takuoki Hata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP58084443A priority Critical patent/JPS59208804A/en
Publication of JPS59208804A publication Critical patent/JPS59208804A/en
Publication of JPH0133921B2 publication Critical patent/JPH0133921B2/ja
Granted legal-status Critical Current

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  • Thermistors And Varistors (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

産業上の利用分野 本発明は、−60℃〜450℃で温度センサとして利
用できる、負の抵抗温度係数を有するサーミスタ
用酸化物半導体に関するものである。 従来例の構成とその問題点 従来から良く知られているマンガン−コバルト
−ニツケル系およびマンガン−コバルト−ニツケ
ル−銅系酸化物サーミスタ材料は、汎用デイスク
サーミスタとして主に用いられてきたが、高温使
用下での抵抗値変動が大きいため、300℃を越え
るような高い温度では使用することができず、
300℃以下の温度で使用されてきた。この問題点
に対処し、既に種々の組成を提案し、実施してき
た。その一つとして酸化マンガンを主成分とし、
クロムとケイ素を含有させることを特徴としたマ
ンガン−ニツケル−クロム−ケイ素系酸化物半導
体を提案した(特開昭57−15403号公報)。しか
し、450℃まで使用できる高抵抗の材料を得るこ
とができなかつた。 発明の目的 本発明は、上記問題点に鑑みてなされたもの
で、その目的とするところは、300℃〜450℃で適
当な抵抗値を示し、安定に使用できるサーミスタ
の提供にある。 発明の構成 本発明は、上記マンガン−ニツケル−クロム−
ケイ素系酸化物についてさらに検討を進めた結
果、300℃〜450℃で安定に使用できる材料を得た
ことによる。 本発明のサーミスタ用酸化物半導体は、金属元
素に換算してマンガンを88.0〜99.3原子%、ニツ
ケルを0.1〜5.0原子%未満、クロムを0.3〜5.0原
子%およびケイ素を0.3〜2.0原子%の割合を含有
し、この合計が100原子%となる組成である。 実施例の説明 以下本発明の実施例について説明する。 市販の原料MnCO3、NiO、Cr2O3、SiO2を下
表に示すようにそれぞれ組成(原子百分率)にな
るように配合した。サーミスタ製造課程を例示す
ると、これらの配合組成物をボールミルで湿式混
合し、これらのスラリーを乾燥させた後800℃の
温度で仮焼し、これら仮焼物をボールミルで湿式
粉砕混合を行なつた。得られたスラリーを乾燥
し、ポリビニルアルコールをバインダーとして添
加混合し、所要量採つて円板状に加圧成形し成形
品を多数作り、これらを空気中にて1300℃の温度
で2時間焼結させ、これらの円板状焼結体(直径
約6.5mm、厚み約1mm)の両面にAgを主成分とす
る電極を焼き付けてオーミツク接触を得た。これ
らの試料について25℃および50℃での抵抗値(そ
れぞれR25℃およびR50℃)を測定し、25℃での
抵抗率ρ25℃を下記(1)式より、またB定数を(2)式
より算出した。 ρ25℃=R25℃×S/d ……(1) (S=電極面積、d=電極間距離) B=8.868×103×logR25℃/R50℃ ……(2) さらにこれらの組成のうち一部組成について、
上記円板を300μmの厚みに研磨した後、両面に
Rtを主成分とする電極を焼き付ける。これを一
辺500μmの角型にカツテイングした後、ガラス
管に窒素ガス中で封入する。端子はデユメツト線
を介して取り出す。このガラス封入サーミスタを
450℃の空気中に放置し、1000時間後の抵抗値変
化を測定した。これらの結果を下表にまとめて示
す。
INDUSTRIAL APPLICATION FIELD The present invention relates to an oxide semiconductor for a thermistor that has a negative temperature coefficient of resistance and can be used as a temperature sensor at -60°C to 450°C. Structures of conventional examples and their problems Conventionally well-known manganese-cobalt-nickel and manganese-cobalt-nickel-copper oxide thermistor materials have been mainly used as general-purpose disk thermistors, but they cannot be used in high-temperature applications. Because the resistance value fluctuates greatly at low temperatures, it cannot be used at high temperatures exceeding 300℃.
It has been used at temperatures below 300°C. To address this problem, various compositions have already been proposed and implemented. One of the main ingredients is manganese oxide,
We proposed a manganese-nickel-chromium-silicon based oxide semiconductor characterized by containing chromium and silicon (Japanese Unexamined Patent Publication No. 15403/1983). However, it was not possible to obtain a high-resistance material that could be used up to 450°C. OBJECTS OF THE INVENTION The present invention has been made in view of the above-mentioned problems, and its purpose is to provide a thermistor that exhibits an appropriate resistance value at 300°C to 450°C and can be used stably. Structure of the Invention The present invention provides the above-mentioned manganese-nickel-chromium
As a result of further studies on silicon-based oxides, we were able to obtain a material that can be used stably at temperatures between 300°C and 450°C. The oxide semiconductor for thermistor of the present invention has a proportion of manganese of 88.0 to 99.3 atom%, nickel of 0.1 to less than 5.0 atom%, chromium of 0.3 to 5.0 atom%, and silicon of 0.3 to 2.0 atom% in terms of metal elements. The total amount is 100 atomic %. Description of Examples Examples of the present invention will be described below. Commercially available raw materials MnCO 3 , NiO, Cr 2 O 3 and SiO 2 were blended to have the respective compositions (atomic percentages) shown in the table below. To illustrate the thermistor manufacturing process, these blended compositions were wet-mixed in a ball mill, the slurry was dried and then calcined at a temperature of 800°C, and the calcined product was wet-pulverized and mixed in a ball mill. The resulting slurry is dried, polyvinyl alcohol is added and mixed as a binder, the required amount is taken and pressure molded into disk shapes to make many molded products, and these are sintered in air at a temperature of 1300℃ for 2 hours. Then, electrodes containing Ag as a main component were baked on both sides of these disk-shaped sintered bodies (diameter: about 6.5 mm, thickness: about 1 mm) to obtain ohmic contact. The resistance values at 25°C and 50°C (R 25 °C and R 50 °C, respectively) were measured for these samples, and the resistivity ρ 25 °C at 25°C was calculated from the following equation (1), and the B constant was calculated by (2 ) Calculated using the formula. ρ 25 ℃ = R 25 ℃ × S/d ... (1) (S = electrode area, d = distance between electrodes) B = 8.868 × 10 3 × logR 25 ℃ / R 50 ℃ ... (2) Furthermore, these Regarding some of the compositions,
After polishing the above disk to a thickness of 300 μm, both sides were
Burn an electrode containing Rt as the main component. After cutting this into a square shape of 500 μm on each side, it was sealed in a glass tube under nitrogen gas. The terminal is taken out via a dumet wire. This glass-encapsulated thermistor
It was left in air at 450°C and the change in resistance was measured after 1000 hours. These results are summarized in the table below.

【表】【table】

【表】 ただし、*印試料は比較用試料であ
り、本発明の範囲外のもので
ある。
比較用試料のうち1、2、3および16は、比抵
抗が大きく実用的でない。試料5、8、10、14、
15、16、18、20、21、22および24は450℃での抵
抗経時変化率が±5%以上と高く実用上安定性に
欠けるため、本発明の範囲外とした。また、比較
用試料のうち、9、11、12および13は、抵抗経時
変化率が±5%以内を満足するが、Ni量5.0原子
%で既に出願済の特許(特開昭57−15403号公報)
と重複するため、本発明の範囲外とした。しかし
ながら、Ni量は0.1〜5.0原子%の連続量であり、
5.0原子%は除くものの0.1〜5.0原子%未満の組成
での効果が認められるものであ。 以上の試料では乾式成形後焼成した試料を用い
た場合であるが、湿式成形により得たガラス封入
サーミスタであつても良い。また、ビード型サー
ミスタとし、これにガラスコーテイングしたもの
であつても良い。さらに必要に応じて他の成分を
添加し、その特性を改善することもよい方法であ
る。 なお、本発明の実施例においては原料混合およ
び仮焼物粉砕混合にジルコニア玉石を用いた。上
記実施例の試料(焼結体)について元素分析を行
なつた結果、ジルコニウムの混入量はサーミスタ
構成元素の100原子%に対してすべての試料にお
いて0.5原子%以下であつた。 本発明は、その構成でも述べたようにマンガン
−ニツケル−クロム−ケイ素系酸化物でマンガン
を主成分とした高比抵抗の特性を有する組成で、
しかも300℃〜450℃の温度領域で安定性の高い材
料を得ることができる。そして、SiO2の添加は
焼結促進効果を示し、緻密なセラミツクスを得る
ことができる。また比抵抗の制御方法としても用
いることができる。 発明の効果 以上の説明からわかるように、本発明のサーミ
スタ用酸化物半導体は、300℃〜450℃での特性経
時変化に優れており、高温で高い信頼性が要求さ
れている温度測定に最も適している。すなわち、
たとえば電子レンジ、石油燃焼の温度制御等の分
野で広く使用できるサーミスタを提供することが
できるものである。
[Table] However, samples marked with * are samples for comparison and are outside the scope of the present invention.
be.
Among the comparative samples, samples 1, 2, 3, and 16 have large specific resistances and are not practical. Samples 5, 8, 10, 14,
Samples Nos. 15, 16, 18, 20, 21, 22, and 24 were excluded from the scope of the present invention because their resistance change rate over time at 450° C. was as high as ±5% or more and lacked practical stability. In addition, among comparative samples 9, 11, 12 and 13, the resistance change rate over time satisfies ±5% or less; Public bulletin)
Since this overlaps with the above, it is excluded from the scope of the present invention. However, the amount of Ni is a continuous amount of 0.1 to 5.0 at%,
Although 5.0 atomic % is excluded, the effect is observed at compositions of 0.1 to less than 5.0 atomic %. Although the above sample uses a sample that was dry molded and then fired, a glass-encapsulated thermistor obtained by wet molding may also be used. Alternatively, it may be a bead-type thermistor coated with glass. Furthermore, it is a good method to add other components as necessary to improve the properties. In the examples of the present invention, zirconia boulders were used for mixing raw materials and pulverizing and mixing calcined products. As a result of elemental analysis of the samples (sintered bodies) of the above examples, the amount of zirconium mixed was 0.5 atomic % or less in all samples based on 100 atomic % of the thermistor constituent elements. As mentioned in the configuration, the present invention is a manganese-nickel-chromium-silicon oxide with a composition having high resistivity and mainly containing manganese.
Moreover, it is possible to obtain a highly stable material in the temperature range of 300°C to 450°C. Addition of SiO 2 exhibits a sintering accelerating effect, making it possible to obtain dense ceramics. It can also be used as a method for controlling specific resistance. Effects of the Invention As can be seen from the above explanation, the oxide semiconductor for thermistors of the present invention has excellent characteristics over time at 300°C to 450°C, and is most suitable for temperature measurement where high reliability is required at high temperatures. Are suitable. That is,
For example, it is possible to provide a thermistor that can be widely used in fields such as microwave ovens and temperature control of oil combustion.

Claims (1)

【特許請求の範囲】[Claims] 1 マンガン、ニツケル、クロムおよびケイ素の
酸化物を含む焼結体であつて、金属元素に換算し
てその組成比率がマンガン88.0〜99.3原子%、ニ
ツケル0.1〜5.0原子%未満、クロム0.3〜5.0原子
%およびケイ素0.3〜2.0原子%(合計100原子%)
であることを特徴とするサーミスタ用酸化物半導
体。
1 A sintered body containing oxides of manganese, nickel, chromium, and silicon, whose composition ratio in terms of metal elements is 88.0 to 99.3 atom% of manganese, 0.1 to less than 5.0 atom% of nickel, and 0.3 to 5.0 atom of chromium. % and silicon 0.3-2.0 at% (total 100 at%)
An oxide semiconductor for a thermistor, characterized in that:
JP58084443A 1983-05-13 1983-05-13 Oxide semiconductor for thermistor Granted JPS59208804A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58084443A JPS59208804A (en) 1983-05-13 1983-05-13 Oxide semiconductor for thermistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58084443A JPS59208804A (en) 1983-05-13 1983-05-13 Oxide semiconductor for thermistor

Publications (2)

Publication Number Publication Date
JPS59208804A JPS59208804A (en) 1984-11-27
JPH0133921B2 true JPH0133921B2 (en) 1989-07-17

Family

ID=13830735

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58084443A Granted JPS59208804A (en) 1983-05-13 1983-05-13 Oxide semiconductor for thermistor

Country Status (1)

Country Link
JP (1) JPS59208804A (en)

Also Published As

Publication number Publication date
JPS59208804A (en) 1984-11-27

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