JPH0135488B2 - - Google Patents
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- Publication number
- JPH0135488B2 JPH0135488B2 JP57006309A JP630982A JPH0135488B2 JP H0135488 B2 JPH0135488 B2 JP H0135488B2 JP 57006309 A JP57006309 A JP 57006309A JP 630982 A JP630982 A JP 630982A JP H0135488 B2 JPH0135488 B2 JP H0135488B2
- Authority
- JP
- Japan
- Prior art keywords
- sintered body
- grain
- atmosphere
- boundary layer
- grain boundaries
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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- Ceramic Capacitors (AREA)
- Inorganic Insulating Materials (AREA)
Description
本発明は酸化亜鉛(ZnO)の粒界にBa、Srの
うち少なくとも1種及びTiからなる酸化物誘電体
層を設けて得る粒界層型磁器誘電体及びその製造
方法に関するものである。
従来より、チタン酸バリウムやチタン酸ストロ
ンチウムを主体とする半導体磁器粒界を再酸化ま
たは原子価補償することにより得られる粒界層型
半導体磁器コンデンサは良く知られている。すな
わち、これらの粒界層型半導体磁器コンデンサ
は、まずチタン酸バリウムやチタン酸ストロンチ
ウムに原子価制御元素を微量添加し、中性雰囲気
または還元雰囲気中で高温焼成することにより半
導体磁器を作製し、この後、空気中で熱処理して
粒界を再酸化するか原子価補償することにより粒
界のみを絶縁化することができ、薄い誘電体層を
並列に接続したと同等の効果が得られるため、見
掛け上きわめて大きな誘電率が得られるものであ
る。
しかしながら、チタン酸バリウムやチタン酸ス
トロンチウムを主体とする上記の半導体コンデン
サは、半導体磁器を作製するために中空雰囲気や
還元雰囲気中で焼成しなければならないため、焼
成炉雰囲気コントロールが重要な特性制御要因と
なり、特に量産炉においては雰囲気の安定性を得
るために条件設定に相当高度な技術を要するもの
であつた。また、設備上も空気中焼成の炉に比較
してきわめてコスト高になるといつた欠点があつ
た。
本発明は上述のような欠点を考慮し、空気中で
焼成可能な粒界層型磁器誘電体及びその製造方法
を提供するものである。
以下、本発明を実施例に基づき説明する。
実施例 1
ZnOを99.8〜99.0モル%、BaCO30.2〜1.0モル
%からなる混合粉末を13.0mmφ×1.0mmtに成型
し、1200〜1400℃で大気中で焼成して得た焼結体
表面にBi2O320〜50モル%、TiO280〜50モル%か
らなる混合物を有機バインダーで付着し、1100〜
1200℃で大気中で熱処理する。この後、焼結体の
両面に銀電極を設ける。下記の第1表にこのよう
にして得られた素子の特性を示すものである。
The present invention relates to a grain boundary layer type ceramic dielectric material obtained by providing an oxide dielectric layer consisting of at least one of B a and S r and Ti at the grain boundaries of zinc oxide (ZnO), and a method for manufacturing the same. be. BACKGROUND ART Grain boundary layer type semiconductor ceramic capacitors obtained by reoxidizing or valence-compensating grain boundaries of semiconductor ceramics mainly composed of barium titanate or strontium titanate have been well known. In other words, these grain boundary layer type semiconductor ceramic capacitors are manufactured by first adding a trace amount of a valence control element to barium titanate or strontium titanate, and then firing the mixture at high temperature in a neutral or reducing atmosphere to produce semiconductor ceramic. After this, it is possible to insulate only the grain boundaries by heat treatment in air to re-oxidize the grain boundaries or compensate for valence, and the same effect as connecting thin dielectric layers in parallel can be obtained. , an apparently extremely large dielectric constant can be obtained. However, the above-mentioned semiconductor capacitors, which are mainly made of barium titanate or strontium titanate, must be fired in a hollow atmosphere or reducing atmosphere in order to produce semiconductor porcelain, so firing furnace atmosphere control is an important characteristic control factor. Therefore, particularly in mass-production furnaces, considerably advanced technology was required to set conditions in order to obtain stability of the atmosphere. In addition, it also had the disadvantage of being extremely expensive in terms of equipment compared to air firing furnaces. The present invention takes the above-mentioned drawbacks into consideration and provides a grain boundary layer type porcelain dielectric material that can be fired in air and a method for manufacturing the same. Hereinafter, the present invention will be explained based on examples. Example 1 A mixed powder consisting of 99.8 to 99.0 mol% of ZnO and 0.2 to 1.0 mol% of BaCO 3 was molded into a size of 13.0 mmφ x 1.0 mm, and the resulting sintered body was baked at 1200 to 1400°C in the air. A mixture consisting of 20-50 mol% Bi 2 O 3 and 80-50 mol % TiO 2 is attached with an organic binder,
Heat treated in air at 1200℃. After this, silver electrodes are provided on both sides of the sintered body. Table 1 below shows the characteristics of the device thus obtained.
【表】
なお、上記の焼結体で焼成温度が1200℃より低
い温度ではZnOが十分に焼結せず、結晶粒が成長
しないので良くない。また、焼成温度が1400℃を
超えると異常粒成長をして結晶粒が不均一になる
ので好ましくない。かかる1200〜1400℃の焼成温
度範囲で焼成すると平均結晶粒子径が50〜100μ
mの大きさの結晶粒子群からなる焼結体が得られ
る。この焼結体について、X線マイクロ解析を行
つた結果、結晶粒子にはZn元素が観測され、Ba
元素はほとんど見られず、一方、粒界にBa元素
のみが観測される。すなわち、Baのイオン半径
はZnのイオン半径に対して著しく大きいため、
ZnO結晶格子中に固溶されず、いわゆるBaOの
偏析層が粒界に形成される。次に、Bi2O3とTiO2
とを焼結体表面に付着して熱処理すると、粒界に
Bi2O3とTiO2が拡散するが、その熱処理温度が
1100℃よりも低温では内部まで十分に拡散しにく
い。また、1200℃よりも高い熱処理温度では粒界
層が破断し、粒子間は導通状態となるので好まし
くない。さらに、付着物でBi2O3を全く用いず
TiO2のみを付着して熱処理した場合は粒界に拡
散されにくく、ZnTiO3が焼結体表面に生じるだ
けで粒界にはTiが均一に存在しないことになる。
すなわち、Bi2O3の存在によつて粒界にBiとTiが
均一に拡散されるようになり、例えば1150℃、6
時間の熱処理では融点が820〜860℃と低いBi2O
が飛散し、TiとBaが均一に存在することになる。
以上の結果はX線マイクロ解析により確認され
た。
実施例 2
上記実施例1におけるBaCO3をSrCO3に置換
して全く同等の処理を行つた。下記の第2表にこ
の場合における代表例の特性を示す。[Table] In addition, if the firing temperature of the above sintered body is lower than 1200°C, ZnO will not be sufficiently sintered and crystal grains will not grow, which is not good. Furthermore, if the firing temperature exceeds 1400°C, abnormal grain growth will occur and the crystal grains will become non-uniform, which is not preferable. When fired in the firing temperature range of 1200 to 1400℃, the average crystal grain size becomes 50 to 100μ.
A sintered body consisting of a group of crystal grains having a size of m is obtained. As a result of X-ray microanalysis of this sintered body, Zn element was observed in the crystal grains, and Ba
Almost no elements are observed, and only Ba element is observed at the grain boundaries. In other words, since the ionic radius of Ba is significantly larger than that of Zn,
BaO is not dissolved in solid solution in the ZnO crystal lattice, and a so-called segregation layer of BaO is formed at grain boundaries. Then Bi2O3 and TiO2
When attached to the surface of the sintered body and heat-treated, it forms at the grain boundaries.
Bi 2 O 3 and TiO 2 diffuse, but the heat treatment temperature is
At temperatures lower than 1100°C, it is difficult to diffuse sufficiently into the interior. Further, a heat treatment temperature higher than 1200° C. is not preferable because the grain boundary layer is broken and the particles become electrically conductive. Furthermore, no Bi 2 O 3 is used in the deposits.
When only TiO 2 is attached and heat treated, it is difficult to diffuse into the grain boundaries, and ZnTiO 3 is only generated on the surface of the sintered body, but Ti is not uniformly present at the grain boundaries.
In other words, the presence of Bi 2 O 3 allows Bi and Ti to be uniformly diffused at the grain boundaries.
Bi2O has a low melting point of 820-860℃ after heat treatment for several hours.
is scattered, and T i and B a are uniformly present.
The above results were confirmed by X-ray microanalysis. Example 2 Exactly the same treatment as in Example 1 was performed except that BaCO 3 was replaced with SrCO 3 . Table 2 below shows the characteristics of typical examples in this case.
【表】
以上、実施例に基づき本発明を説明したが、大
気中で焼成して得られる高誘電率粒界層型磁器誘
電体を提供できる点で、本発明はきわめて有意義
なものである。[Table] Although the present invention has been described above based on Examples, the present invention is extremely significant in that it can provide a high permittivity grain boundary layer type porcelain dielectric material obtained by firing in the atmosphere.
Claims (1)
粒子で、かつこの結晶粒子群の粒界がBaとTiま
たはSrとTiとからなる酸化物の誘電体層で構成
される粒界層型磁器誘電体。 2 ZnO粉末にBaCO3、SrCO3のうち少なくとも
1種類の化合物を添加してなる混合物を成型し、
大気中で焼成して得た焼結体に、Bi2O3及びTiO2
からなる混合物を付着して後、大気中で熱処理し
て得ることを特徴とする粒界層型磁器誘電体の製
造方法。[Claims] 1. The crystal grains of the sintered body are semiconductor grains mainly composed of ZnO, and the grain boundaries of these crystal grain groups are composed of a dielectric layer of an oxide composed of Ba and Ti or Sr and Ti. grain boundary layer type porcelain dielectric. 2 Molding a mixture formed by adding at least one compound among BaCO 3 and SrCO 3 to ZnO powder,
Bi 2 O 3 and TiO 2 are added to the sintered body obtained by firing in the atmosphere.
1. A method for producing a grain boundary layer type porcelain dielectric, characterized in that the mixture is deposited and then heat-treated in the atmosphere.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57006309A JPS58123714A (en) | 1982-01-18 | 1982-01-18 | Grain boundary layer type porcelain dielectric material and method of producing same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57006309A JPS58123714A (en) | 1982-01-18 | 1982-01-18 | Grain boundary layer type porcelain dielectric material and method of producing same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58123714A JPS58123714A (en) | 1983-07-23 |
| JPH0135488B2 true JPH0135488B2 (en) | 1989-07-25 |
Family
ID=11634766
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57006309A Granted JPS58123714A (en) | 1982-01-18 | 1982-01-18 | Grain boundary layer type porcelain dielectric material and method of producing same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58123714A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2649342B2 (en) * | 1986-12-04 | 1997-09-03 | 太陽誘電株式会社 | Manufacturing method of porcelain for electronic parts |
| JP2649341B2 (en) * | 1986-12-04 | 1997-09-03 | 太陽誘電株式会社 | Grain boundary insulated semiconductor porcelain |
| JPH0451466Y2 (en) * | 1987-05-15 | 1992-12-03 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5522933B2 (en) * | 1973-07-16 | 1980-06-19 |
-
1982
- 1982-01-18 JP JP57006309A patent/JPS58123714A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58123714A (en) | 1983-07-23 |
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