JPH0148533B2 - - Google Patents
Info
- Publication number
- JPH0148533B2 JPH0148533B2 JP9737482A JP9737482A JPH0148533B2 JP H0148533 B2 JPH0148533 B2 JP H0148533B2 JP 9737482 A JP9737482 A JP 9737482A JP 9737482 A JP9737482 A JP 9737482A JP H0148533 B2 JPH0148533 B2 JP H0148533B2
- Authority
- JP
- Japan
- Prior art keywords
- image
- film
- polymerization inhibitor
- photosensitive
- formed product
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000006116 polymerization reaction Methods 0.000 claims description 29
- 239000000463 material Substances 0.000 claims description 24
- 239000003112 inhibitor Substances 0.000 claims description 22
- 230000001603 reducing effect Effects 0.000 claims description 9
- 230000002829 reductive effect Effects 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 238000007654 immersion Methods 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 29
- -1 silver halide Chemical class 0.000 description 21
- 238000000034 method Methods 0.000 description 17
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 239000007864 aqueous solution Substances 0.000 description 12
- 150000001875 compounds Chemical class 0.000 description 10
- 239000000178 monomer Substances 0.000 description 10
- 239000011230 binding agent Substances 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 9
- 239000000047 product Substances 0.000 description 9
- 239000000975 dye Substances 0.000 description 8
- 230000007423 decrease Effects 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- 239000011241 protective layer Substances 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 5
- 239000006096 absorbing agent Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000011161 development Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 229920000728 polyester Polymers 0.000 description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 4
- 229920000609 methyl cellulose Polymers 0.000 description 4
- 235000010981 methylcellulose Nutrition 0.000 description 4
- 239000002985 plastic film Substances 0.000 description 4
- 229920006255 plastic film Polymers 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 239000004952 Polyamide Substances 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 239000006229 carbon black Substances 0.000 description 3
- 229920002678 cellulose Polymers 0.000 description 3
- 229920002301 cellulose acetate Polymers 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- 239000000539 dimer Substances 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- WUALQPNAHOKFBR-UHFFFAOYSA-N lithium silver Chemical compound [Li].[Ag] WUALQPNAHOKFBR-UHFFFAOYSA-N 0.000 description 3
- 150000002736 metal compounds Chemical class 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
- 229920002647 polyamide Polymers 0.000 description 3
- 229920006267 polyester film Polymers 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 description 3
- 235000019422 polyvinyl alcohol Nutrition 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 2
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 description 2
- 229920002873 Polyethylenimine Polymers 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- 238000002835 absorbance Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 2
- 125000005250 alkyl acrylate group Chemical group 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- REIWEKCPWVIMER-UHFFFAOYSA-N butanedioic acid;methoxymethane Chemical compound COC.OC(=O)CCC(O)=O REIWEKCPWVIMER-UHFFFAOYSA-N 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 239000001768 carboxy methyl cellulose Substances 0.000 description 2
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 2
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- VEZUQRBDRNJBJY-UHFFFAOYSA-N cyclohexanone oxime Chemical compound ON=C1CCCCC1 VEZUQRBDRNJBJY-UHFFFAOYSA-N 0.000 description 2
- BADXJIPKFRBFOT-UHFFFAOYSA-N dimedone Chemical compound CC1(C)CC(=O)CC(=O)C1 BADXJIPKFRBFOT-UHFFFAOYSA-N 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- JKQFJJHZVJEHKH-UHFFFAOYSA-N methoxymethane;phthalic acid Chemical compound COC.OC(=O)C1=CC=CC=C1C(O)=O JKQFJJHZVJEHKH-UHFFFAOYSA-N 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- 230000036211 photosensitivity Effects 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229920002401 polyacrylamide Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 2
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 2
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- YKYONYBAUNKHLG-UHFFFAOYSA-N propyl acetate Chemical compound CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 230000002441 reversible effect Effects 0.000 description 2
- 230000001235 sensitizing effect Effects 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- KJSLIEVOUOCULE-UHFFFAOYSA-N (2,4-dihydroxyphenyl)-phenylmethanone 4-phenyl-2H-benzotriazol-5-ol Chemical compound Oc1ccc(C(=O)c2ccccc2)c(O)c1.Oc1ccc2n[nH]nc2c1-c1ccccc1 KJSLIEVOUOCULE-UHFFFAOYSA-N 0.000 description 1
- NAWAHSSRMQMAFB-UHFFFAOYSA-N (4-acetyloxy-3,6-dioxocyclohexa-1,4-dien-1-yl) acetate Chemical compound CC(=O)OC1=CC(=O)C(OC(C)=O)=CC1=O NAWAHSSRMQMAFB-UHFFFAOYSA-N 0.000 description 1
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 1
- 150000005208 1,4-dihydroxybenzenes Chemical class 0.000 description 1
- TUSDEZXZIZRFGC-UHFFFAOYSA-N 1-O-galloyl-3,6-(R)-HHDP-beta-D-glucose Natural products OC1C(O2)COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC1C(O)C2OC(=O)C1=CC(O)=C(O)C(O)=C1 TUSDEZXZIZRFGC-UHFFFAOYSA-N 0.000 description 1
- ZOZNCAMOIPYYIK-UHFFFAOYSA-N 1-aminoethylideneazanium;acetate Chemical compound CC(N)=N.CC(O)=O ZOZNCAMOIPYYIK-UHFFFAOYSA-N 0.000 description 1
- BOCJQSFSGAZAPQ-UHFFFAOYSA-N 1-chloroanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2Cl BOCJQSFSGAZAPQ-UHFFFAOYSA-N 0.000 description 1
- VETPHHXZEJAYOB-UHFFFAOYSA-N 1-n,4-n-dinaphthalen-2-ylbenzene-1,4-diamine Chemical compound C1=CC=CC2=CC(NC=3C=CC(NC=4C=C5C=CC=CC5=CC=4)=CC=3)=CC=C21 VETPHHXZEJAYOB-UHFFFAOYSA-N 0.000 description 1
- YXAOOTNFFAQIPZ-UHFFFAOYSA-N 1-nitrosonaphthalen-2-ol Chemical compound C1=CC=CC2=C(N=O)C(O)=CC=C21 YXAOOTNFFAQIPZ-UHFFFAOYSA-N 0.000 description 1
- MEZZCSHVIGVWFI-UHFFFAOYSA-N 2,2'-Dihydroxy-4-methoxybenzophenone Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1O MEZZCSHVIGVWFI-UHFFFAOYSA-N 0.000 description 1
- RNIPJYFZGXJSDD-UHFFFAOYSA-N 2,4,5-triphenyl-1h-imidazole Chemical class C1=CC=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 RNIPJYFZGXJSDD-UHFFFAOYSA-N 0.000 description 1
- SPSSULHKWOKEEL-UHFFFAOYSA-N 2,4,6-trinitrotoluene Chemical compound CC1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O SPSSULHKWOKEEL-UHFFFAOYSA-N 0.000 description 1
- CZNRFEXEPBITDS-UHFFFAOYSA-N 2,5-bis(2-methylbutan-2-yl)benzene-1,4-diol Chemical compound CCC(C)(C)C1=CC(O)=C(C(C)(C)CC)C=C1O CZNRFEXEPBITDS-UHFFFAOYSA-N 0.000 description 1
- QYXHDJJYVDLECA-UHFFFAOYSA-N 2,5-diphenylcyclohexa-2,5-diene-1,4-dione Chemical compound O=C1C=C(C=2C=CC=CC=2)C(=O)C=C1C1=CC=CC=C1 QYXHDJJYVDLECA-UHFFFAOYSA-N 0.000 description 1
- WBXJSJGOLYYWOT-UHFFFAOYSA-N 2-(2-chloronaphthalen-1-yl)-4,5-diphenyl-1h-imidazole Chemical class ClC1=CC=C2C=CC=CC2=C1C(N1)=NC(C=2C=CC=CC=2)=C1C1=CC=CC=C1 WBXJSJGOLYYWOT-UHFFFAOYSA-N 0.000 description 1
- OOSBRVMGUZXBDA-UHFFFAOYSA-N 2-(2-methoxynaphthalen-1-yl)-4,5-diphenyl-1h-imidazole Chemical class COC1=CC=C2C=CC=CC2=C1C(N1)=NC(C=2C=CC=CC=2)=C1C1=CC=CC=C1 OOSBRVMGUZXBDA-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- GZYZPHPDKCTFFH-UHFFFAOYSA-N 2-(4-methylsulfanylphenyl)-4,5-diphenyl-1h-imidazole Chemical class C1=CC(SC)=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 GZYZPHPDKCTFFH-UHFFFAOYSA-N 0.000 description 1
- PITPRNOGWXAZAW-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-4-methoxyphenol Chemical compound COC1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1 PITPRNOGWXAZAW-UHFFFAOYSA-N 0.000 description 1
- MFYSUUPKMDJYPF-UHFFFAOYSA-N 2-[(4-methyl-2-nitrophenyl)diazenyl]-3-oxo-n-phenylbutanamide Chemical compound C=1C=CC=CC=1NC(=O)C(C(=O)C)N=NC1=CC=C(C)C=C1[N+]([O-])=O MFYSUUPKMDJYPF-UHFFFAOYSA-N 0.000 description 1
- UBTQCXUORSAVEL-UHFFFAOYSA-N 2-anthracen-9-yl-4,5-diphenyl-1h-imidazole Chemical class C1=CC=CC=C1C1=C(C=2C=CC=CC=2)NC(C=2C3=CC=CC=C3C=C3C=CC=CC3=2)=N1 UBTQCXUORSAVEL-UHFFFAOYSA-N 0.000 description 1
- FPKCTSIVDAWGFA-UHFFFAOYSA-N 2-chloroanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3C(=O)C2=C1 FPKCTSIVDAWGFA-UHFFFAOYSA-N 0.000 description 1
- SFPNZPQIIAJXGL-UHFFFAOYSA-N 2-ethoxyethyl 2-methylprop-2-enoate Chemical compound CCOCCOC(=O)C(C)=C SFPNZPQIIAJXGL-UHFFFAOYSA-N 0.000 description 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
- DIVXVZXROTWKIH-UHFFFAOYSA-N 2-hydroxy-1,2-diphenylpropan-1-one Chemical compound C=1C=CC=CC=1C(O)(C)C(=O)C1=CC=CC=C1 DIVXVZXROTWKIH-UHFFFAOYSA-N 0.000 description 1
- HFCUBKYHMMPGBY-UHFFFAOYSA-N 2-methoxyethyl prop-2-enoate Chemical compound COCCOC(=O)C=C HFCUBKYHMMPGBY-UHFFFAOYSA-N 0.000 description 1
- VTWDKFNVVLAELH-UHFFFAOYSA-N 2-methylcyclohexa-2,5-diene-1,4-dione Chemical compound CC1=CC(=O)C=CC1=O VTWDKFNVVLAELH-UHFFFAOYSA-N 0.000 description 1
- NPLUXVNHIYMIKN-UHFFFAOYSA-N 2-naphthalen-1-yl-4,5-diphenyl-1h-imidazole Chemical class C1=CC=CC=C1C1=C(C=2C=CC=CC=2)NC(C=2C3=CC=CC=C3C=CC=2)=N1 NPLUXVNHIYMIKN-UHFFFAOYSA-N 0.000 description 1
- AGIJRRREJXSQJR-UHFFFAOYSA-N 2h-thiazine Chemical compound N1SC=CC=C1 AGIJRRREJXSQJR-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- SRYYOKKLTBRLHT-UHFFFAOYSA-N 4-(benzylamino)phenol Chemical compound C1=CC(O)=CC=C1NCC1=CC=CC=C1 SRYYOKKLTBRLHT-UHFFFAOYSA-N 0.000 description 1
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 1
- YYVYAPXYZVYDHN-UHFFFAOYSA-N 9,10-phenanthroquinone Chemical compound C1=CC=C2C(=O)C(=O)C3=CC=CC=C3C2=C1 YYVYAPXYZVYDHN-UHFFFAOYSA-N 0.000 description 1
- GJCOSYZMQJWQCA-UHFFFAOYSA-N 9H-xanthene Chemical compound C1=CC=C2CC3=CC=CC=C3OC2=C1 GJCOSYZMQJWQCA-UHFFFAOYSA-N 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- 229920000298 Cellophane Polymers 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- 239000001263 FEMA 3042 Substances 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- OAZWDJGLIYNYMU-UHFFFAOYSA-N Leucocrystal Violet Chemical compound C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 OAZWDJGLIYNYMU-UHFFFAOYSA-N 0.000 description 1
- WZKXBGJNNCGHIC-UHFFFAOYSA-N Leucomalachite green Chemical compound C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)N(C)C)C1=CC=CC=C1 WZKXBGJNNCGHIC-UHFFFAOYSA-N 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical class SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- KEQFTVQCIQJIQW-UHFFFAOYSA-N N-Phenyl-2-naphthylamine Chemical compound C=1C=C2C=CC=CC2=CC=1NC1=CC=CC=C1 KEQFTVQCIQJIQW-UHFFFAOYSA-N 0.000 description 1
- NPKSPKHJBVJUKB-UHFFFAOYSA-N N-phenylglycine Chemical compound OC(=O)CNC1=CC=CC=C1 NPKSPKHJBVJUKB-UHFFFAOYSA-N 0.000 description 1
- 229930192627 Naphthoquinone Natural products 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- LRBQNJMCXXYXIU-PPKXGCFTSA-N Penta-digallate-beta-D-glucose Natural products OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-PPKXGCFTSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- BGNXCDMCOKJUMV-UHFFFAOYSA-N Tert-Butylhydroquinone Chemical compound CC(C)(C)C1=CC(O)=CC=C1O BGNXCDMCOKJUMV-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- ARNIZPSLPHFDED-UHFFFAOYSA-N [4-(dimethylamino)phenyl]-(4-methoxyphenyl)methanone Chemical compound C1=CC(OC)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 ARNIZPSLPHFDED-UHFFFAOYSA-N 0.000 description 1
- AUNAPVYQLLNFOI-UHFFFAOYSA-L [Pb++].[Pb++].[Pb++].[O-]S([O-])(=O)=O.[O-][Cr]([O-])(=O)=O.[O-][Mo]([O-])(=O)=O Chemical compound [Pb++].[Pb++].[Pb++].[O-]S([O-])(=O)=O.[O-][Cr]([O-])(=O)=O.[O-][Mo]([O-])(=O)=O AUNAPVYQLLNFOI-UHFFFAOYSA-L 0.000 description 1
- IYKJEILNJZQJPU-UHFFFAOYSA-N acetic acid;butanedioic acid Chemical compound CC(O)=O.OC(=O)CCC(O)=O IYKJEILNJZQJPU-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229920006397 acrylic thermoplastic Polymers 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001409 amidines Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- BIVUUOPIAYRCAP-UHFFFAOYSA-N aminoazanium;chloride Chemical compound Cl.NN BIVUUOPIAYRCAP-UHFFFAOYSA-N 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 150000008365 aromatic ketones Chemical class 0.000 description 1
- 239000012752 auxiliary agent Substances 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 1
- KXHPPCXNWTUNSB-UHFFFAOYSA-M benzyl(trimethyl)azanium;chloride Chemical compound [Cl-].C[N+](C)(C)CC1=CC=CC=C1 KXHPPCXNWTUNSB-UHFFFAOYSA-M 0.000 description 1
- ZLSMCQSGRWNEGX-UHFFFAOYSA-N bis(4-aminophenyl)methanone Chemical class C1=CC(N)=CC=C1C(=O)C1=CC=C(N)C=C1 ZLSMCQSGRWNEGX-UHFFFAOYSA-N 0.000 description 1
- VYHBFRJRBHMIQZ-UHFFFAOYSA-N bis[4-(diethylamino)phenyl]methanone Chemical compound C1=CC(N(CC)CC)=CC=C1C(=O)C1=CC=C(N(CC)CC)C=C1 VYHBFRJRBHMIQZ-UHFFFAOYSA-N 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- SKOLWUPSYHWYAM-UHFFFAOYSA-N carbonodithioic O,S-acid Chemical class SC(S)=O SKOLWUPSYHWYAM-UHFFFAOYSA-N 0.000 description 1
- 229920003086 cellulose ether Polymers 0.000 description 1
- WOWHHFRSBJGXCM-UHFFFAOYSA-M cetyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+](C)(C)C WOWHHFRSBJGXCM-UHFFFAOYSA-M 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 229940120693 copper naphthenate Drugs 0.000 description 1
- SEVNKWFHTNVOLD-UHFFFAOYSA-L copper;3-(4-ethylcyclohexyl)propanoate;3-(3-ethylcyclopentyl)propanoate Chemical compound [Cu+2].CCC1CCC(CCC([O-])=O)C1.CCC1CCC(CCC([O-])=O)CC1 SEVNKWFHTNVOLD-UHFFFAOYSA-L 0.000 description 1
- AFYCEAFSNDLKSX-UHFFFAOYSA-N coumarin 460 Chemical compound CC1=CC(=O)OC2=CC(N(CC)CC)=CC=C21 AFYCEAFSNDLKSX-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- XHFGWHUWQXTGAT-UHFFFAOYSA-N dimethylamine hydrochloride Natural products CNC(C)C XHFGWHUWQXTGAT-UHFFFAOYSA-N 0.000 description 1
- IQDGSYLLQPDQDV-UHFFFAOYSA-N dimethylazanium;chloride Chemical compound Cl.CNC IQDGSYLLQPDQDV-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- GMSCBRSQMRDRCD-UHFFFAOYSA-N dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C(C)=C GMSCBRSQMRDRCD-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- NXOCXWBPHYAIGC-UHFFFAOYSA-N ethanimidamide;sulfuric acid Chemical compound CC(N)=N.OS(O)(=O)=O NXOCXWBPHYAIGC-UHFFFAOYSA-N 0.000 description 1
- IAJNXBNRYMEYAZ-UHFFFAOYSA-N ethyl 2-cyano-3,3-diphenylprop-2-enoate Chemical compound C=1C=CC=CC=1C(=C(C#N)C(=O)OCC)C1=CC=CC=C1 IAJNXBNRYMEYAZ-UHFFFAOYSA-N 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- LNCPIMCVTKXXOY-UHFFFAOYSA-N hexyl 2-methylprop-2-enoate Chemical compound CCCCCCOC(=O)C(C)=C LNCPIMCVTKXXOY-UHFFFAOYSA-N 0.000 description 1
- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 description 1
- 150000002429 hydrazines Chemical class 0.000 description 1
- 235000011167 hydrochloric acid Nutrition 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
- MOUPNEIJQCETIW-UHFFFAOYSA-N lead chromate Chemical compound [Pb+2].[O-][Cr]([O-])(=O)=O MOUPNEIJQCETIW-UHFFFAOYSA-N 0.000 description 1
- QDLAGTHXVHQKRE-UHFFFAOYSA-N lichenxanthone Natural products COC1=CC(O)=C2C(=O)C3=C(C)C=C(OC)C=C3OC2=C1 QDLAGTHXVHQKRE-UHFFFAOYSA-N 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- DZCCLNYLUGNUKQ-UHFFFAOYSA-N n-(4-nitrosophenyl)hydroxylamine Chemical compound ONC1=CC=C(N=O)C=C1 DZCCLNYLUGNUKQ-UHFFFAOYSA-N 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 150000002828 nitro derivatives Chemical class 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 150000002832 nitroso derivatives Chemical class 0.000 description 1
- NLRKCXQQSUWLCH-UHFFFAOYSA-N nitrosobenzene Chemical compound O=NC1=CC=CC=C1 NLRKCXQQSUWLCH-UHFFFAOYSA-N 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- JOVOSQBPPZZESK-UHFFFAOYSA-N phenylhydrazine hydrochloride Chemical compound Cl.NNC1=CC=CC=C1 JOVOSQBPPZZESK-UHFFFAOYSA-N 0.000 description 1
- 229940038531 phenylhydrazine hydrochloride Drugs 0.000 description 1
- OXNIZHLAWKMVMX-UHFFFAOYSA-N picric acid Chemical compound OC1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O OXNIZHLAWKMVMX-UHFFFAOYSA-N 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920001290 polyvinyl ester Polymers 0.000 description 1
- 229920001291 polyvinyl halide Polymers 0.000 description 1
- 229920000131 polyvinylidene Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000001915 proofreading effect Effects 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 229960001755 resorcinol Drugs 0.000 description 1
- GDESWOTWNNGOMW-UHFFFAOYSA-N resorcinol monobenzoate Chemical compound OC1=CC=CC(OC(=O)C=2C=CC=CC=2)=C1 GDESWOTWNNGOMW-UHFFFAOYSA-N 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 238000007127 saponification reaction Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 150000003378 silver Chemical class 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000010129 solution processing Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 125000001174 sulfone group Chemical group 0.000 description 1
- LRBQNJMCXXYXIU-NRMVVENXSA-N tannic acid Chemical compound OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-NRMVVENXSA-N 0.000 description 1
- 229940033123 tannic acid Drugs 0.000 description 1
- 235000015523 tannic acid Nutrition 0.000 description 1
- 229920002258 tannic acid Polymers 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- FVRDYQYEVDDKCR-DBRKOABJSA-N tiazofurine Chemical compound NC(=O)C1=CSC([C@H]2[C@@H]([C@H](O)[C@@H](CO)O2)O)=N1 FVRDYQYEVDDKCR-DBRKOABJSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- ILWRPSCZWQJDMK-UHFFFAOYSA-N triethylazanium;chloride Chemical compound Cl.CCN(CC)CC ILWRPSCZWQJDMK-UHFFFAOYSA-N 0.000 description 1
- 239000000015 trinitrotoluene Substances 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Description
本発明は減力可能な画像形成物およびその製造
方法に関するものである。
従来から感光材料に画像露光する場合、活性光
線に対して、実質的に不透明な画像を有するマス
クが使用されている。特に印刷用版材を製造する
場合、感光材料を使用することが多く上記マスク
を通して、活性光線を露光後、現像処理すること
により、レリーフ像またはレジスト像を形成させ
る方法がとられている。この目的に対して、マス
ク中の画像は活性光線に対して、高いコントラス
トを有することが要求される。例えば、活性光線
に対して透明性に優れた部分と、活性光線に対し
て実質的に不透明な部分を有することが必要であ
る。
印刷においては、写真などを印刷する場合、網
点画像を有するマスクを作る必要がある。この際
原画を写真的方法により、網点分解する。次にこ
れを第2の画像複製材料によつて反転した網点画
像に変え、良好な網点画像にするため、密着反転
の操作を繰り返した後で、得られた網点画像をマ
スクフイルムとする。次に、このマスクフイルム
を通し、感光性版材に露光し、現像処理などする
ことによつて網点画像を有する印刷版を製造して
いる。この第2の画像複製材料を通常「返えし返
えし用リスフイルム」と呼んでいる。
従来からこのような用途に使用するリスフイル
ムの研究は多く行なわれている。しかし、ハロゲ
ン化銀感光材料の場合は、高感度であるが、高コ
ントラストやフリンジの消滅に本質的な限界があ
り、露光、現像のラチチユードが狭く、減力する
と光学濃度が低下するという問題がある。また、
ハロゲン化銀フイルムは可視光感度を有するた
め、画像複製作業を暗室で行なわなければなら
ず、作業性および労働環境においても満足できる
ものではなく、明室において画像複製作業を可能
にするものが希望されている。この目的に対し、
明室ハロゲン化銀フイルムが開発されたが、明室
作業性は改良されたが、それ以外の点ではまだ解
決されていない。
次に「返えし返えし用フイルム」として重要な
減力作業について述べる。第2の画像複製材料と
して、銀塩リスフイルムを用いた場合、トーン値
や色濃度の修正のため減力作業が行なわれる。特
に原色版においては、フイルムが完成すると校正
刷りを行ない、色校正が行なわれる。色校正の結
果色別のフイルムを修正加工する。銀塩リスフイ
ルムの修正は、酸化剤で処理することによつて行
なわれる。透明部分のカブリをとつたり、ボケ足
の形を整えたり、ハーフトーンの網点を小さくし
たり、ハーフトーンの網点のトーン値を変えるこ
とによつて部分的または全体を修正する。この一
連の操作を減力作業という。また逆に網点を太ら
すことも、この減力性を利用して行なわれる。即
ちポジフイルムを反転してネガフイルムを作り、
次に減力して細らす、そしてこのネガフイルムを
反転しポジフイルムとすると、もとのポジフイル
ムの網点より太つた網点が得られる。
最近、コストの低減や資源問題と前記銀塩フイ
ルムの欠点を解消する1つの手段として、活性光
線範囲内において光学濃度が少なくとも3以上の
光重合性層・保護層・支持体からなるエレメント
が提案されている。(特公昭52−62427公報)この
非銀塩リスフイルムは明室性を有しており、マス
ク材料を通して画像露光後、水洗・アルカリ浸
漬・スプレー・水洗・乾燥といつた簡単な現像処
理によつて、高コントラストで、フリンジのない
マスクフイルムが得られる。また、製造したマス
クフイルムはアルカリ水溶液処理・水洗によつ
て、容易に減力ができるという特長をもつてい
る。
しかし、この非銀塩フイルムを減力する際、減
力作業を行なう前の処理条件や保存条件によつ
て、その減力性に差がでてくることがわかつた。
即ち乾燥温度が高かつたり、保存条件が悪かつた
り、室内光にさらされていると暗反応や熱かぶり
や光重合・架橋反応などの進行によつて、減力性
が低下するか減力不能になる。
実際にマスクフイルムとして使用する場合、出
来たマスクフイルムを用いて校正作業が行なわれ
る。校正作業としては、一般に校正用感光材料や
感光性版材へ焼付け、校正刷りを行ない、校正を
する。次に、このマスクフイルムの修正作業を行
なう。しかし、この校正用感光材料や感光性版材
への焼付け時の露光によつて、光重合・架橋反応
が進行してしまつて、次に修正のために減力をし
ようとしても減力性がなくなつてしまうという欠
点を有することがわかつた。このことは実用面で
「返えし返えし用フイルム」として必要な減力性
を失つたことになる。
本発明者らは現像処理時および処理後の暗反応
や熱かぶりやマスクフイルムの取扱い時の露光の
有無にかかわらず、同様に優れた減力性を保持さ
せるべく鋭意検討の結果、遂に本発明を完成する
に到つた。すなわち本発明は支持体および感光層
を含む感光材料を画像露光し、易溶部を除去する
ことによつて得られ、画像形成域が硬化した上層
部と未硬化の下層部とからなる画像形成物であつ
て、前記画像形成域に有効量の重合禁止剤を含有
していることを特徴とする減力可能な画像形成物
およびその製造方法である。
本発明において、画像形成域が硬化した上層部
と未硬化の下層部とからなつているとは、感光層
の画像形成域の重合度または硬化度がその表面に
おいて最も高く、下層になる程、重合度または硬
化度がより低くなつていることを示している。こ
れは感光層がある程度以上の高さの活性光線の吸
光度を有することによつて得られ、画像形成後、
減力する際の必要条件である。
また、本発明において重合禁止剤の有効量と
は、画像形成後、種々の条件、たとえば露光、長
時間の放置などを経た後も、減力性を保持するた
めに必要とする量のことであり、後述する重合禁
止剤の種類によつて、その有効量は異なる。
なお従来より感光層中に予め少量の重合禁止剤
が配合されているが、この場合、原版の製造工程
中および保存中に、暗反応や光重合・架橋反応が
起こるのを防ぐための必要最少量であり、画像形
成における露光後では、その重合禁止能力は失わ
れているため、減力性を保持できなかつた。一
方、減力性を保持できるように、感光層中の重合
禁止剤の添加量を増したものは、感度が大幅に低
下し実用に供し得ないものとなる。
本発明は前記欠点を解決したものであり、露光
後、現像処理時や現像処理後の暗反応や熱かぶり
だけでなく、室内光にさらされたり、感光剤への
焼付けを行なつても、なおかつ減力性を保持して
いる画像形成物を提供するものである。
本発明画像形成物における支持体としては、ガ
ラス板、プラスチツクフイルム、金属または金属
化合物の薄層を表面に有するガラス板やプラスチ
ツクフイルム、金属板、紙類などがある。プラス
チツクフイルムとしては、ポリエチレン、ポリプ
ロピレン等のポリオレフイン類、ポリ塩化ビニ
ル、ポリ塩化ビニリデン等のポリハロゲン化ビニ
ル類、セルロースアセテート、ニトロセルロー
ス、セロハン等のセルロース誘導体類、ポリアミ
ド類、ポリエステル類、ポリスチレン、ポリカー
ボネート、ポリイミドなどの単独又は積層フイル
ムが用いられる。これらの中で特に好ましいもの
は、寸法安定性および透明性に優れる二軸延伸ポ
リエチレンテレフタレートフイルムである。
前記金属または金属化合物の薄層をガラスやプ
ラスチツクフイルム表面に設ける方法としては、
蒸着法、スパツタリング法、イオン化静電メツキ
法、メツキ法などがある。使用する金属としては
取扱い易さ、コスト、毒性、などの点でアルミニ
ウムが最も望ましい。これら支持体上に感光層と
の接着性の向上または他の目的で下引き層を有し
ていてもよい。
本発明の画像形成物における感光層は、以下に
例示するような光開始剤、単量体、結合剤、活性
光線吸収剤を含有し、必要により安定剤、可塑
剤、界面活性剤、着色剤などを添加したものであ
る。
a 光開始剤
光開始剤とは活性光線によつて重合反応や架橋
反応を開始させる能力のあるもので、単独または
他の化合物と組合わせて用いられる。その代表的
化合物の例として、ベンジル、ベンゾフエノン、
ミヒラーズケトン、4,4′―ビス(ジエチルアミ
ノ)ベンゾフエノン、4―メトキシ―4′―ジメチ
ルアミノベンゾフエノンなどのベンゾフエノン誘
導体、アンスラキノン、2―クロルアンスラキノ
ン、2エチルアンスラキノン、1―クロルアンス
ラキノン、フエナントラキノンなどの芳香族ケト
ン類、ベンゾイン、ベンゾインアルキルエーテル
類、α―メチルベンゾイン等のベンゾイン誘導
体、ベンジル・ジメチルケタール・多核キノン
類、2,4,5―トリアリールイミダゾール2量
体と遊離基発生剤の組合せ系などがある。又増感
剤や増感染料を添加するとと更に感度が向上す
る。他に、2,4,5―トリアリールイミダゾー
ル2量体としては、2―(0―メトキシフエニ
ル)―4,5―ジフエニルイミダゾール2量体、
2―(0―クロルフエニル)―4,5―ジフエニ
ルイミダゾール2量体、2―(p―メチルメルカ
プトフエニル)―4,5―ジフエニルイミダゾー
ル2量体などのトリフエニルイミダゾール2量
体、2―(1―ナフチル)―4,5―ジフエニル
イミダゾール2量体、2―(9―アントリル)―
4,5―ジフエニルイミダゾール2量体、2―
(2―メトキシ―1―ナフチル)―4,5―ジフ
エニルイミダゾール2量体、2―(2―クロロ―
1―ナフチル)―4,5―ジフエニルイミダゾー
ル2量体などの多環アリール―4,5―ジフエニ
ルイミダゾール2量体を挙げることができる。
2,4,5―トリアリールイミダゾール2量体
と組合わせて使用される遊離基発生剤としては、
p,p′―ビス(ジメチルアミノ)ベンゾフエノン
などのp―アミノフエニルケトン化合物、ロイコ
マラカイトグリーン、ロイコクリスタルバイオレ
ツトなどのロイコトリフエニルメタン染料、2,
4―ジエチル―1,3―シクロブタンジオンなど
の環状ジチトン化合物、4′4′―ビス(ジメチルア
ミノ)チオベンゾフエノンなどのチオケトン化合
物、2―メルカプトベンゾチアゾールなどのメル
カプタン化合物、N―フエニルグリシン、ジメド
ン、7―ジエチルアミノ―4―メチルクマリンな
どを挙げることができる。
増感剤または増感染料としては、キサンテン
系、アクリジン系、チアジン系、シアニン系など
の色素が有効である。
b 活性光線吸収剤
光開始剤のほかに、活性光線の吸収に有効な化
合物を添加することによつて、活性光線に対して
不透明な画像が形成される。活性光線の吸収を大
きくすることによつて、マスクの透明部分を通し
て露光された画像部分は上層部のみ硬化反応が進
み下層は未硬化の状態を保つようになる。このよ
うに、未硬化の下層部を保持出来れば減力性が保
持される。これに対して活性光線吸収量が小さい
と、露光時に下層部分まで硬化してしまい後で減
力できなくなつてしまう。また、活性光線吸収量
が多すぎると、上層部の非常に薄い層のみしか硬
化できずレジスト効果が劣るのみならず、感光性
も低下する。最も好ましい感光性層の活性光線の
吸光度は2〜4である。
使用される活性光線吸収剤としては、紫外線吸
収剤、紫外線吸収染料やその他の染料や顔料など
である。これらの例として、カーボンブラツク、
酸化チタン、酸化鉄、各種金属や金属の酸化物、
硫化物等の化合物の粉末、ピグメントブラツク
(C.I.50440)、クロムイエローライト(C.
I.77603)、2,2′―ジヒドロキシ―4―メトキシ
ベンゾフエノン、2,4―ジヒドロキシベンゾフ
エノンヒドロキシフエニルベンゾトリアゾール、
2―(2′―ヒドロキシ―5′―メトキシフエニル)
ベンゾトリアゾール、レゾルシノールモノベンゾ
エート、エチル―2―シアノ―3,3―ジフエニ
ルアクリレート、トルイジン・イエローGW(C.
I.71680)、モリブデンオレンジ(C.I.77605)、ス
ーダンイエロー(C.I.30)、オイルオレンジ(C.
I.12055)などがある。特に、従来の銀塩と同じ
黒色にするにはカーボンブラツクが望ましい。ま
た、着色のない紫外線吸収剤などを用いる場合は
画像部が見にくいため染料や顔料を添加する方が
良い。無機・有機顔料や金属、金属の化合物など
の場合、物理的方法か化学的方法によつて微粒子
化する必要がある。
c 単量体
使用する単量体は1個またはそれ以上の重合可
能二重結合を有するものであればよい。このよう
な化合物の例として、ヘキシルアクリレート、ヘ
キシルメタアクリレート、シクロヘキシルアクリ
レート、シクロヘキシルメタアクリレート、ラウ
リルアクリレート、ラウリルメタアクリレート、
ベンジルアクリレート、ベンジルメタアクリレー
トなどのアルキルアクリレートまたはアルキルメ
タアクリレート類、ヒドロキシアルキルアクリレ
ート、ヒドロキシアルキルメタアクリレート、
NN―ジアルキルアミノアルキルアクリレートま
たはメタアクリレート類、メトキシエチルアクリ
レート、エトキシエチルメタアクリレート等のア
ルキルエーテルアクリレートまたはメタアクリレ
ート類、ハロゲン化アルキルアクリレート又はメ
タアクリレート、アルキルアクリルまたはメタア
クリルアミド類、ヒドロキシアルキルアクリレー
トまたはメタアクリレート類、ジエチレングリコ
ールジアクリレートまたはメタアクリレート、ト
リエチレングリコールジアクリレートまたはメタ
アクリレートのようなポリアルキルエーテルのア
クリレートまたはメタアクリレート、エチレング
リコールジアクリレートまたはジメタアクリレー
ト、グリセリン、トリメチロールプロパン、ペン
タエリスリトールなどの多価アルコールのアクリ
レートまたはメタアクリレート類、アクリル酸、
メタアクリル酸、グリシジルアクリレートまたは
メタアクリレートと活性水素含有物との反応物、
グリシジール化合物とアクリル酸またはメタアク
リル酸との反応物、Nメチロール化合物と尿素化
合物の縮合物、ポリイソシアネート化合物とヒド
ロキシアルキルアクリレートまたはメタアクリレ
ートとの反応物などがある。使用する単量体は1
種類に限定するものではなく、結合剤の種類、単
量体の比率、光開始剤の種類や量、活性光線吸収
化合物の種類や量などによつて、使用する単量体
を選択する必要があり、相容性、皮膜形成性、安
定性、感光性などから決定される。使用する単量
体として沸点が低いと皮膜形成中又は形成後に揮
発して減少するので、沸点としては高い方が望ま
しい。
d 結合剤
結合剤としては、溶媒可溶の50℃以下では固体
状の有機重合体であり、重合可能な単量体と相容
することが必要である。結合剤は熱可塑性であつ
ても、なくても良いが皮膜形成能を有する必要が
あり、特に単量体、光開始剤、活性光線吸収剤を
添加してもなおかつ皮膜形成性を有する必要があ
る。
このような結合剤の例としてセルロースのエス
テル類やエーテル類それらの共存する誘導体(セ
ルロースエチルエーテル、セルロースアセテー
ト、カルボキシメチルセルロース、セルロースア
セテートサクシネート、セルロースメチルエーテ
ルフタレート、セルロースメチルエーテルサクシ
ネートなど)、ポリアルキルエーテル類、ポリエ
ステル類、ポリアミド類、ポリビニルエステルお
よびそれらの共重合体、フエノール樹脂、ポリビ
ニリデン化合物、ポリビニルアルコール類、ゼラ
チンやその誘導体、ポリビニルブチラール、ポリ
アクリルアミド、ポリビニルピロリドン、ポリス
チレン、塩素化ゴム、ポリエチレンイミン等があ
る。
特に水系現像液で、現像できるようにするに
は、結合剤自身が水系現像液に溶解又は分散する
ことが必要である。このような例として、ポリビ
ニルアルコール、ポリアクリルアミド、スルホン
基、三級窒素含有ポリマーの酸による4級化され
た単位カルボキシル基などを含有するポリマー、
ポリビニルピロリドン、ポリエチレンイミンなど
がある。
酸性またはアルカリ性水溶液可溶の結合剤とし
ては、カルボキシメチルセルロース、セルロース
メチルエーテルフタレート、セルロースメチルエ
ーテル・サクシネートなどのカルボキシル基含有
セルロース誘導体、メタアクリル酸、アクリル
酸、マレイン酸、イタコン酸、クロトン酸などと
ビニルモノマーの共重合体、三級窒素基含有ポリ
エステル、ポリアミド、ビニルポリマーなどがあ
る。
なお上記結合剤の主鎖又は側鎖に重合性の不飽
和二重結合基を含んでいてもよい。
以上列記した支持体および感光層より、通常の
方法によつて、本発明で用いられる感光材料が得
られる。
次に本発明画像形成物を得る方法としては、
1 支持体および感光層を含む感光材料を画像露
光した後易溶部を除去する前に重合禁止剤およ
び/または重合禁止剤を含有する溶液に浸漬処
理する方法。
2 支持体および感光層を含む感光材料を画像露
光し、易溶部を現像液を用いて除去する際に、
現像液中に重合禁止剤を添加して現像と同時に
処理する方法。
3 支持体および感光層を含む感光材料を画像露
光し、易溶部を除去することによつて得られた
画像形成物を重合禁止剤および/または重合禁
止剤を含有する溶液に浸漬処理する方法などが
ある。
前記本発明方法において使用される重合禁止剤
の例としては、p―ベンゾキノン、ナフトキノ
ン、パラキシロキノン、パラトルキノン、2,6
―ジクロロキノン、2,5―ジフエニル―p―ベ
ンゾキノン、2,5―ジアセトキシ―p―ベンゾ
キノン、2,5―ジカプロキシ―p―ベンゾキノ
ン、2,5―ジアシロキシ―p―ベンゾキノンな
どのキノン類、ハイドロキノン、p―t―ブチル
カテコール、モノ―t―ブチルハイドロキノン、
2,5―ジ―t―アミルハイドロキノンなどのハ
イドロキノン類、ハイドロキノンモノメチルエー
テル等のフエノール類、アセトアミジンアセテー
ト、アセトアミジンサルフエート等のアミジン
類、フエニルヒドラジン塩酸塩、ヒドラジン塩酸
塩等のヒドラジン塩類、トリメチルベンジルアン
モニユウムクロライド、セチルトリメチルアンモ
ニユウムクロライド等の第4級アンモニユウム塩
類、フエニル―β―ナフチルアミン、p―ベンジ
ルアミノフエノール、ジ―β―ナフチルパラフエ
ニレンジアミン等のアミン類、ニトロベンゼン、
トリニトロトルエン、ピクリン酸等のニトロ化合
物類、キノンジオキシム、シクロヘキサノンオキ
シム等のオキシム類、ピロガロール、タンニン
酸、レゾルシン等の多価フエノール類、トリエチ
ルアミン塩酸塩、ジメチルアミン塩酸塩、ジブチ
ルアミン塩酸塩等のアミン塩酸塩類、ナフテン酸
銅等の有機ならびに無機の銅塩類、ニトロソベン
ゼン、ニトロソβナフトール、クペロンなどのニ
トロソ化合物類、重合禁止能を有する染料などが
挙げられ、これらの1種または2種以上組合わせ
て用いられる。
前記重合禁止剤は、画像形成域へ単なる物理的
吸着や固定であつても、化学的反応を伴つたもの
であつてもよいが、後に行なう減力操作を行なう
までの期間に重合禁止剤が揮発してなくならない
程度に高沸点であることが望ましい。また重合禁
止剤が変質して、重合禁止能力が低下するものは
好ましくない。
処理の容易さからは短時間処理が容易で、上記
の要求を満足し、毒性がなく、安価なものが好ま
しい。特に溶液処理する場合、有機溶剤は取扱い
コストなどの点で望ましくない。水溶液や水分散
液で使用出来るものが特に好ましい。この化合物
としてハイドロキノンがある。また処理性能を向
上させる目的で、界面活性剤などの助剤を用いて
もよい。
前記方法において、画像露光後、易溶部を除去
する現像液としては、リチウム、ナトリウム、カ
リウムなどのアルカリ金属の水酸化物および炭酸
塩の水溶液が使用され、特に好ましいのは、水酸
化ナトリウム、炭酸ナトリウム、水酸化カリウ
ム、炭酸カリウムなどの水溶液である。また、酸
性水溶液の現像液としては、塩酸、蟻酸、シユウ
酸などの無機酸または有機酸の水溶液を使用で
き、さらに中性水も使用できる。
以上いずれの方法によつても得られる本発明画
像形成物における画像形成域に含まれる重合禁止
剤は有効量、すなわち減力性を保持するための量
を有することが必要であり、その有効量は重合禁
止剤の種類によつて異なり、また前記方法におけ
る条件、たとえば浸漬時間なども、重合禁止剤が
有効量含有されるように適宜決定されるものであ
る。
以上かかる構成よりなる本発明画像形成物は簡
単な方法で、従来の非銀塩リスフイルムの欠点と
されていた減力性の喪失を解決したものであり、
画像形成後、種々の条件下でもその減力性を保持
しており、非銀塩リスフイルムとして、本発明に
よつて始めて市場に供し得るものとなつたのであ
る。
以下、本発明を実施例を用いて具体的に説明す
るが、本発明はこれらに限定されるものではな
い。
実施例 1
厚さ100μのポリエステルフイルムに下記の組
成物をリバースコーターでコーテイングし、乾燥
することにより0.5μの下引層を有するポリエステ
ルフイルムを作製した。
バイロン20S飽和ポリエステル接着剤 50部
(東洋紡績製)
コロネートL(日本ポリウレタン工業製) 4部
U―Cat SA―No.102(サンアボツト社製) 0.1部
トルエン 80部
メチルエチルケトン 20部
次に、下記の組成物を混合分散させた感光性組
成物を調整し、リバースコーターにより上記下引
き層を設けたポリエステルフイルム上にコーテイ
ングし、厚さ4μの感光層を被覆した。
メタアクリル酸メチル(70モル%)、メタアク
リル酸(30モル%)の共重合体 41部
カーボンブラツク 12部
トリメチロールプロパントリアクリレート 34部
2―(2―クロロ―1―ナフチル)4,5―ジ
フエニルイミダゾール2量体 8部
ハイドロキノンモノメチルエーテル 0.03部
ジメドン 3部
ミヒラーケトン 2.0部
メタノール 140部
クロロホルム 120部
酢酸エチル 80部
酢酸n―プロピル 40部
イソプロピルアルコール 40部
さらに、このフイルム上に下記の組成からなる
保護層用組成物を同様にコーテイングし、厚さ
1μの保護層を有する感光性フイルムを作製した。
ポリビニルアルコール 5部
(ケン化度98.5%、重合度500)
ノイゲンEA―140(第一工業製薬製) 0.2部
メタノール 5部
水 90部
得られた感光性フイルムに、21段ステツプガイ
ド(大日本スクリーン社製)と150l/in、5〜95
%の網点を組合わせたテスト用ネガフイルムを重
ね、明室プリンター(ORC社製)を用い、20秒
間画像露光を行なつた。次に水洗で保護層を除い
た後に、30℃に調節した1%Na2CO3水溶液中に
10秒間浸漬後、水洗下、スポンジで擦りながら現
像乾燥することにより反転画像を得た。ステツプ
ガイドの5段まで硬化しており、網点はネガをよ
く再現している事が判つた。
次に同様にして作つた複製網点画像を、30℃に
保つたハイドロキノンの5%水溶液に10秒、20
秒、30秒、60秒間それぞれ浸漬後、水洗、乾燥処
理した。このようにして処理した試料と未処理の
試料を、室内(昼間800ルツクス)に放置し、経
時的な減力性の変化を測定した。減力は20℃で、
5%NaCO3と0.1%のノイゲンEA−140を含有す
る水溶液に60秒間浸漬後、水洗しながらスポンジ
で擦ることによつて行なつた。結果を以下に示
す。
The present invention relates to an image-formed product that can be reduced in force and a method for producing the same. 2. Description of the Related Art Conventionally, when image-wise exposing a photosensitive material, a mask having an image that is substantially opaque to actinic light has been used. In particular, when manufacturing printing plates, photosensitive materials are often used, and a method is used in which a relief image or a resist image is formed by exposing the material to actinic rays through the above-mentioned mask and then developing it. For this purpose, the image in the mask is required to have high contrast with respect to actinic radiation. For example, it is necessary to have a portion that is highly transparent to actinic light and a portion that is substantially opaque to actinic light. In printing, when printing photographs or the like, it is necessary to create a mask having a halftone image. At this time, the original image is separated into halftone dots using a photographic method. Next, this is converted into an inverted halftone dot image using a second image duplicating material, and in order to obtain a good halftone image, after repeating the contact inversion operation, the obtained halftone dot image is transferred to a mask film. do. Next, a photosensitive plate material is exposed to light through this mask film and subjected to development processing to produce a printing plate having a halftone image. This second image duplicating material is commonly referred to as a "reversing lithographic film." Many studies have been conducted on lithium-ion film for use in such applications. However, although silver halide photosensitive materials have high sensitivity, they have inherent limitations in high contrast and fringe elimination, have a narrow exposure and development latitude, and have problems such as a decrease in optical density when the power is reduced. be. Also,
Since silver halide film is sensitive to visible light, image duplication work must be done in a dark room, and it is not satisfactory in terms of workability and work environment.We would like to have something that allows image duplication work to be done in a bright room. has been done. For this purpose,
Bright room silver halide films have been developed, and although light room workability has been improved, other aspects remain unsolved. Next, we will discuss the important reduction work for "reversing film." When a silver halide lithium film is used as the second image duplication material, a reduction operation is performed to correct tone values and color density. Particularly in the case of primary color plates, once the film is completed, proof printing is performed and color proofing is performed. Correct the film for each color as a result of color proofing. Modification of silver salt lithographic films is carried out by treatment with oxidizing agents. Partial or total correction is performed by removing fog from transparent parts, adjusting the shape of blurred feet, reducing the size of halftone dots, or changing the tone value of halftone dots. This series of operations is called force reduction work. Conversely, making the halftone dots thicker is also done by utilizing this force reduction property. In other words, by reversing a positive film to create a negative film,
Next, when the force is reduced to make it thinner, and this negative film is reversed to make a positive film, halftone dots that are thicker than those of the original positive film are obtained. Recently, an element consisting of a photopolymerizable layer, a protective layer, and a support having an optical density of at least 3 in the active light range has been proposed as a means to reduce costs, solve resource problems, and solve the disadvantages of silver salt films. has been done. (Japanese Patent Publication No. 52-62427) This non-silver salt lithium film has bright room properties, and after image exposure through a mask material, it can be easily developed by washing with water, dipping in alkali, spraying, washing with water, and drying. As a result, a mask film with high contrast and no fringes can be obtained. In addition, the produced mask film has the advantage that it can be easily reduced in strength by treatment with an alkaline aqueous solution and washing with water. However, it has been found that when reducing the force of this non-silver salt film, there are differences in the ability to reduce the force depending on the processing conditions and storage conditions before performing the force reduction operation.
In other words, if the drying temperature is high, the storage conditions are poor, or if it is exposed to indoor light, the strength reducing ability will decrease or the strength will decrease due to the progress of dark reactions, thermal fogging, photopolymerization, crosslinking reactions, etc. becomes incapable. When actually used as a mask film, the finished mask film is used for calibration work. Proofreading work generally involves printing on a photosensitive proofing material or photosensitive plate material, printing a proof, and making a proof. Next, this mask film is corrected. However, due to the exposure of the photosensitive proofing material and photosensitive plate material during printing, photopolymerization and crosslinking reactions progress, and even if you try to reduce the force for correction next time, it will not be possible to reduce the force. It turned out that it has the disadvantage that it disappears. From a practical point of view, this means that the film has lost its force-reducing properties, which is necessary as a "returning film." The inventors of the present invention have conducted intensive studies to maintain excellent force reduction properties regardless of dark reactions, heat fogging, or exposure during handling of the mask film during and after processing, and as a result, they have finally developed the present invention. I have come to complete it. That is, the present invention is formed by image-forming a photosensitive material including a support and a photosensitive layer and removing the easily soluble areas, and the image forming area is composed of a hardened upper layer part and an uncured lower layer part. 1. A reducible image-formed product and a method for producing the same, characterized in that the image-forming area contains an effective amount of a polymerization inhibitor. In the present invention, the expression that the image forming area consists of a hardened upper layer part and an uncured lower layer part means that the degree of polymerization or curing of the image forming area of the photosensitive layer is highest on the surface, and as the layer becomes lower, This indicates that the degree of polymerization or curing is becoming lower. This is achieved by the photosensitive layer having a certain level of absorbance for actinic rays, and after image formation,
This is a necessary condition when reducing power. In addition, in the present invention, the effective amount of the polymerization inhibitor refers to the amount required to maintain the force-reducing property even after image formation and after various conditions such as exposure and long-term standing. However, the effective amount thereof varies depending on the type of polymerization inhibitor described below. Conventionally, a small amount of polymerization inhibitor has been added to the photosensitive layer in advance. Since the amount was small and the ability to inhibit polymerization was lost after exposure in image formation, force reducing properties could not be maintained. On the other hand, if the amount of polymerization inhibitor added in the photosensitive layer is increased in order to maintain the force reducing property, the sensitivity will be significantly lowered and it will be impossible to put it to practical use. The present invention solves the above-mentioned drawbacks, and does not only cause dark reactions and heat fog after exposure, during and after development, but also when exposed to room light or when printed on a photosensitive material. Furthermore, the present invention provides an image-formed product that maintains force-reducing properties. Examples of the support for the image-formed product of the present invention include glass plates, plastic films, glass plates and plastic films having thin layers of metal or metal compounds on their surfaces, metal plates, papers, and the like. Plastic films include polyolefins such as polyethylene and polypropylene, polyvinyl halides such as polyvinyl chloride and polyvinylidene chloride, cellulose derivatives such as cellulose acetate, nitrocellulose, and cellophane, polyamides, polyesters, polystyrene, and polycarbonate. A single film or a laminated film of polyimide or the like is used. Particularly preferred among these is biaxially oriented polyethylene terephthalate film, which has excellent dimensional stability and transparency. The method for providing a thin layer of the metal or metal compound on the surface of glass or plastic film includes:
There are vapor deposition methods, sputtering methods, ionized electrostatic plating methods, plating methods, etc. Aluminum is the most desirable metal to use in terms of ease of handling, cost, toxicity, etc. A subbing layer may be provided on these supports for the purpose of improving adhesion to the photosensitive layer or for other purposes. The photosensitive layer in the image-formed product of the present invention contains a photoinitiator, a monomer, a binder, and an actinic ray absorber as exemplified below, and if necessary, a stabilizer, a plasticizer, a surfactant, and a colorant. etc. are added. a Photoinitiator A photoinitiator has the ability to initiate a polymerization reaction or a crosslinking reaction with actinic rays, and is used alone or in combination with other compounds. Examples of typical compounds include benzyl, benzophenone,
Michler's ketone, benzophenone derivatives such as 4,4'-bis(diethylamino)benzophenone, 4-methoxy-4'-dimethylaminobenzophenone, anthraquinone, 2-chloroanthraquinone, 2ethylanthraquinone, 1-chloroanthraquinone, Aromatic ketones such as phenanthraquinone, benzoin, benzoin alkyl ethers, benzoin derivatives such as α-methylbenzoin, benzyl dimethyl ketal, polynuclear quinones, 2,4,5-triarylimidazole dimer and free There are combination systems of group generators. Furthermore, the sensitivity can be further improved by adding a sensitizer or a sensitizing dye. In addition, examples of the 2,4,5-triarylimidazole dimer include 2-(0-methoxyphenyl)-4,5-diphenylimidazole dimer,
Triphenylimidazole dimers such as 2-(0-chlorophenyl)-4,5-diphenylimidazole dimer, 2-(p-methylmercaptophenyl)-4,5-diphenylimidazole dimer, 2 -(1-naphthyl)-4,5-diphenylimidazole dimer, 2-(9-anthryl)-
4,5-diphenylimidazole dimer, 2-
(2-methoxy-1-naphthyl)-4,5-diphenylimidazole dimer, 2-(2-chloro-
Examples include polycyclic aryl-4,5-diphenylimidazole dimers such as 1-naphthyl)-4,5-diphenylimidazole dimers. The free radical generator used in combination with the 2,4,5-triarylimidazole dimer includes:
p-aminophenyl ketone compounds such as p,p'-bis(dimethylamino)benzophenone; leucotriphenylmethane dyes such as leucomalachite green and leuco crystal violet; 2.
Cyclic dithitone compounds such as 4-diethyl-1,3-cyclobutanedione, thioketone compounds such as 4′4′-bis(dimethylamino)thiobenzophenone, mercaptan compounds such as 2-mercaptobenzothiazole, N-phenylglycine , dimedone, 7-diethylamino-4-methylcoumarin, and the like. As the sensitizer or sensitizing dye, xanthene-based, acridine-based, thiazine-based, cyanine-based dyes and the like are effective. b Actinic ray absorber By adding, in addition to the photoinitiator, a compound effective in absorbing actinic rays, an image that is opaque to actinic rays can be formed. By increasing the absorption of actinic rays, only the upper layer of the image exposed through the transparent portion of the mask undergoes a curing reaction, while the lower layer remains uncured. In this way, if the uncured lower layer can be maintained, the force-reducing properties can be maintained. On the other hand, if the absorption amount of actinic rays is small, even the lower layer will be hardened during exposure, making it impossible to reduce the force later. Furthermore, if the amount of actinic rays absorbed is too large, only the very thin upper layer can be cured, resulting in not only poor resist effect but also poor photosensitivity. The most preferable photosensitive layer has an actinic ray absorbance of 2 to 4. Actinic light absorbers used include ultraviolet absorbers, ultraviolet absorbing dyes, and other dyes and pigments. Examples of these are carbon black,
Titanium oxide, iron oxide, various metals and metal oxides,
Powder of compounds such as sulfides, pigment black (CI50440), chrome yellow light (C.
I.77603), 2,2'-dihydroxy-4-methoxybenzophenone, 2,4-dihydroxybenzophenone hydroxyphenylbenzotriazole,
2-(2′-hydroxy-5′-methoxyphenyl)
Benzotriazole, resorcinol monobenzoate, ethyl-2-cyano-3,3-diphenyl acrylate, toluidine yellow GW (C.
I.71680), Molybdenum Orange (CI77605), Sudan Yellow (CI30), Oil Orange (C.
I.12055). In particular, carbon black is desirable in order to achieve the same black color as conventional silver salts. Furthermore, if a non-colored ultraviolet absorber is used, it is better to add dyes or pigments since the image area will be difficult to see. In the case of inorganic/organic pigments, metals, metal compounds, etc., it is necessary to make them into fine particles by physical or chemical methods. c Monomer The monomer used may have one or more polymerizable double bonds. Examples of such compounds include hexyl acrylate, hexyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, lauryl acrylate, lauryl methacrylate,
Alkyl acrylate or alkyl methacrylates such as benzyl acrylate and benzyl methacrylate, hydroxyalkyl acrylate, hydroxyalkyl methacrylate,
NN-Dialkylaminoalkyl acrylates or methacrylates, alkyl ether acrylates or methacrylates such as methoxyethyl acrylate, ethoxyethyl methacrylate, halogenated alkyl acrylates or methacrylates, alkyl acrylics or methacrylamides, hydroxyalkyl acrylates or methacrylates acrylates or methacrylates of polyalkyl ethers such as diethylene glycol diacrylate or methacrylate, triethylene glycol diacrylate or methacrylate, ethylene glycol diacrylate or dimethacrylate, polyvalents such as glycerin, trimethylolpropane, pentaerythritol Alcohol acrylates or methacrylates, acrylic acid,
A reaction product of methacrylic acid, glycidyl acrylate or methacrylate with an active hydrogen-containing substance,
Examples include reaction products of glycidyl compounds and acrylic acid or methacrylic acid, condensates of N-methylol compounds and urea compounds, and reaction products of polyisocyanate compounds and hydroxyalkyl acrylates or methacrylates. The monomer used is 1
The monomers to be used need to be selected depending on the type of binder, the ratio of monomers, the type and amount of photoinitiator, the type and amount of actinic light absorbing compound, etc. Yes, determined based on compatibility, film-forming properties, stability, photosensitivity, etc. If the monomer used has a low boiling point, it will volatilize and decrease during or after film formation, so a higher boiling point is desirable. d Binder The binder must be an organic polymer that is soluble in a solvent, solid at temperatures below 50°C, and compatible with the polymerizable monomer. The binder may or may not be thermoplastic, but it must have film-forming ability, and in particular it must have film-forming ability even when monomers, photoinitiators, and actinic light absorbers are added. be. Examples of such binders include cellulose esters and ethers, their coexisting derivatives (cellulose ethyl ether, cellulose acetate, carboxymethyl cellulose, cellulose acetate succinate, cellulose methyl ether phthalate, cellulose methyl ether succinate, etc.), and polyesters. Alkyl ethers, polyesters, polyamides, polyvinyl esters and their copolymers, phenolic resins, polyvinylidene compounds, polyvinyl alcohols, gelatin and its derivatives, polyvinyl butyral, polyacrylamide, polyvinylpyrrolidone, polystyrene, chlorinated rubber, Examples include polyethyleneimine. Particularly, in order to enable development with an aqueous developer, the binder itself must be dissolved or dispersed in the aqueous developer. Examples of such polymers include polyvinyl alcohol, polyacrylamide, sulfone groups, and polymers containing carboxyl groups quaternized with acid in tertiary nitrogen-containing polymers;
Examples include polyvinylpyrrolidone and polyethyleneimine. Examples of binders soluble in acidic or alkaline aqueous solutions include carboxyl group-containing cellulose derivatives such as carboxymethyl cellulose, cellulose methyl ether phthalate, and cellulose methyl ether succinate, methacrylic acid, acrylic acid, maleic acid, itaconic acid, and crotonic acid. Examples include copolymers of vinyl monomers, polyesters containing tertiary nitrogen groups, polyamides, and vinyl polymers. Note that the main chain or side chain of the binder may contain a polymerizable unsaturated double bond group. From the support and photosensitive layer listed above, the photosensitive material used in the present invention can be obtained by a conventional method. Next, as a method for obtaining an image-formed product of the present invention, 1. After imagewise exposing a photosensitive material including a support and a photosensitive layer, and before removing the easily soluble portion, the photosensitive material is exposed to a polymerization inhibitor and/or a solution containing a polymerization inhibitor. Method of immersion treatment. 2. When imagewise exposing a photosensitive material including a support and a photosensitive layer and removing easily soluble areas using a developer,
A method in which a polymerization inhibitor is added to the developer and processing is performed simultaneously with development. 3. A method of imagewise exposing a photosensitive material including a support and a photosensitive layer, and immersing an image formed product obtained by removing an easily soluble area in a polymerization inhibitor and/or a solution containing the polymerization inhibitor. and so on. Examples of the polymerization inhibitor used in the method of the present invention include p-benzoquinone, naphthoquinone, paraxyquinone, paratoluquinone, 2,6
- Quinones such as dichloroquinone, 2,5-diphenyl-p-benzoquinone, 2,5-diacetoxy-p-benzoquinone, 2,5-dicaproxy-p-benzoquinone, 2,5-diacyloxy-p-benzoquinone, hydroquinone, pt-butylcatechol, mono-t-butylhydroquinone,
Hydroquinones such as 2,5-di-t-amylhydroquinone, phenols such as hydroquinone monomethyl ether, amidines such as acetamidine acetate and acetamidine sulfate, hydrazine salts such as phenylhydrazine hydrochloride and hydrazine hydrochloride, Quaternary ammonium salts such as trimethylbenzylammonium chloride and cetyltrimethylammonium chloride, amines such as phenyl-β-naphthylamine, p-benzylaminophenol, di-β-naphthylparaphenylenediamine, nitrobenzene,
Nitro compounds such as trinitrotoluene and picric acid, oximes such as quinone dioxime and cyclohexanone oxime, polyhydric phenols such as pyrogallol, tannic acid, and resorcinol, triethylamine hydrochloride, dimethylamine hydrochloride, dibutylamine hydrochloride, etc. Examples include amine hydrochlorides, organic and inorganic copper salts such as copper naphthenate, nitroso compounds such as nitrosobenzene, nitroso-β-naphthol, and cuperone, and dyes having polymerization inhibiting ability. Used together. The polymerization inhibitor may be simply physically adsorbed or fixed to the image forming area, or may be caused by a chemical reaction. It is desirable that the boiling point is high enough to not volatilize and disappear. Further, it is not preferable that the polymerization inhibitor deteriorates in quality and its ability to inhibit polymerization decreases. From the viewpoint of ease of processing, it is preferable to use one that can be easily processed for a short time, satisfies the above requirements, is non-toxic, and is inexpensive. Particularly in the case of solution processing, organic solvents are undesirable in terms of handling costs and the like. Particularly preferred are those that can be used in the form of an aqueous solution or aqueous dispersion. This compound is hydroquinone. Further, for the purpose of improving processing performance, auxiliary agents such as surfactants may be used. In the above method, an aqueous solution of hydroxides and carbonates of alkali metals such as lithium, sodium, and potassium is used as a developer for removing easily soluble areas after image exposure, and particularly preferred are sodium hydroxide, It is an aqueous solution of sodium carbonate, potassium hydroxide, potassium carbonate, etc. Further, as the acidic aqueous developer, an aqueous solution of an inorganic or organic acid such as hydrochloric acid, formic acid, or oxalic acid can be used, and neutral water can also be used. The polymerization inhibitor contained in the image forming area of the image-formed product of the present invention obtained by any of the above methods must have an effective amount, that is, an amount to maintain force-reducing properties. varies depending on the type of polymerization inhibitor, and the conditions in the method, such as immersion time, are appropriately determined so that an effective amount of the polymerization inhibitor is contained. The image-formed product of the present invention having the above-mentioned structure solves the problem of loss of force reducing property, which was considered to be a drawback of conventional non-silver salt lithium films, by a simple method,
After image formation, the film retains its strength-reducing properties under various conditions, making it the first non-silver salt lithium film available on the market. EXAMPLES Hereinafter, the present invention will be specifically explained using Examples, but the present invention is not limited thereto. Example 1 A polyester film having a thickness of 100μ was coated with the following composition using a reverse coater and dried to produce a polyester film having a subbing layer of 0.5μ. Byron 20S saturated polyester adhesive 50 parts (manufactured by Toyobo Co., Ltd.) Coronate L (manufactured by Nippon Polyurethane Industries) 4 parts U-Cat SA-No. 102 (manufactured by Sunabott Co., Ltd.) 0.1 part Toluene 80 parts Methyl ethyl ketone 20 parts Next, the following composition A photosensitive composition was prepared by mixing and dispersing the components, and it was coated on the polyester film provided with the above-mentioned undercoat layer using a reverse coater to form a photosensitive layer having a thickness of 4 μm. Copolymer of methyl methacrylate (70 mol%) and methacrylic acid (30 mol%) 41 parts carbon black 12 parts trimethylolpropane triacrylate 34 parts 2-(2-chloro-1-naphthyl) 4,5- Diphenylimidazole dimer 8 parts Hydroquinone monomethyl ether 0.03 parts Dimedone 3 parts Michler's ketone 2.0 parts Methanol 140 parts Chloroform 120 parts Ethyl acetate 80 parts n-propyl acetate 40 parts Isopropyl alcohol 40 parts Furthermore, the following composition was printed on this film. The composition for the protective layer is coated in the same manner, and the thickness
A photosensitive film with a protective layer of 1μ was prepared. Polyvinyl alcohol 5 parts (saponification degree 98.5%, polymerization degree 500) Neugen EA-140 (Daiichi Kogyo Seiyaku) 0.2 parts methanol 5 parts water 90 parts company) and 150l/in, 5 to 95
% halftone dots were stacked on top of each other, and image exposure was performed for 20 seconds using a bright room printer (manufactured by ORC). Next, after removing the protective layer by washing with water, it was placed in a 1% Na 2 CO 3 aqueous solution adjusted to 30℃.
After immersing for 10 seconds, washing with water, developing and drying while rubbing with a sponge, a reversed image was obtained. It was found that up to the 5th step of the step guide was hardened, and the halftone dots reproduced the negative well. Next, the duplicate halftone image made in the same manner was immersed in a 5% aqueous solution of hydroquinone kept at 30℃ for 10 seconds and 20 minutes.
After being immersed for 2 seconds, 30 seconds, and 60 seconds, the samples were washed with water and dried. The thus treated and untreated samples were left indoors (at 800 lux during the day), and changes in force reduction over time were measured. The reduction force is 20℃,
This was done by immersing the sample in an aqueous solution containing 5% NaCO 3 and 0.1% Neugen EA-140 for 60 seconds, and then rubbing with a sponge while rinsing with water. The results are shown below.
【表】
以上の結果から明らかなように、本発明の方法
を用いることによつて、室内放置時の反応の進行
による減力性の低下をおさえることができた。そ
れに比べ比較例(未処理)の場合、数日の放置で
減力性が大巾に低下し、減力不能となることがわ
かる。
実施例 2
実施例1と同様にして作つた網点画像を、ハイ
ドロキノン4%とノイゲンEA―140 0.2%を含有
する水溶液に60秒間浸漬後、水洗、乾燥した。こ
の網点画像をネガフイルムとして、ネガ型PS版
SGN―(富士写真フイルム社製)に2K.W.水
銀灯(ORC社製)を用いて焼付けを行なつた。
次に、このネガフイルムの減力を実施例1と同様
に行なつたところ28%減力性を有している事が判
つた。しかし、処理を行なわなかつたネガフイル
ムを用いて、同様の試験を行なつたところ、2%
しか減力することが出来なくなつていた。
実施例 3
実施例1で得られた感光性フイルムをテスト用
ネガを用いて画像露光後水洗により保護層を除い
た後に、ハイドロキノン4%、Na2SO31%、
Na2CO30.3%含有する水溶液に45秒浸漬後、水洗
下スポンジで擦り現像した。得られた処理フイル
ムはベース面から、明室プリンターで30秒露光後
も、24%の減力性を保持していた。それに対しハ
イドロキノンを添加せずに同様の処理を行なつた
ものは、ほとんど減力されなかつた。
実施例 4
実施例1で得られた感光性フイルムをテストネ
ガを用いて画像露光後、水洗で保護層を除いた。
そしてハイドロキノン4%とノイゲンEA―140
0.4%を含有する水溶液に3分間浸漬した。次に
1%NA2CO3に8秒浸漬後、水洗下スポンジで現
像・乾燥した。得られたフイルムは実施例3と同
様ベース面から明室プリンターで露光された後も
20%の減力性を保持していることがわかつた。そ
れに対して、ハイドロキノンの溶液処理を行なわ
なかつたものは、2%減力されただけであつた。[Table] As is clear from the above results, by using the method of the present invention, it was possible to suppress the decrease in force reduction properties due to the progress of the reaction when left indoors. In comparison, it can be seen that in the case of the comparative example (untreated), the force reducing ability significantly decreases after being left for several days, making it impossible to reduce force. Example 2 A halftone image produced in the same manner as in Example 1 was immersed in an aqueous solution containing 4% hydroquinone and 0.2% Neugen EA-140 for 60 seconds, washed with water, and dried. This halftone image is used as a negative film to create a negative PS version.
Printing was carried out on SGN- (manufactured by Fuji Photo Film) using a 2K.W. mercury lamp (manufactured by ORC).
Next, when this negative film was reduced in force in the same manner as in Example 1, it was found that it had a force reduction property of 28%. However, when a similar test was conducted using untreated negative film, 2%
I was becoming unable to reduce my strength. Example 3 The photosensitive film obtained in Example 1 was image-exposed using a test negative, the protective layer was removed by washing with water, and then 4% of hydroquinone, 1% of Na 2 SO 3 ,
After immersing it in an aqueous solution containing 0.3% Na 2 CO 3 for 45 seconds, it was washed with water and developed by rubbing with a sponge. The resulting treated film maintained 24% strength reduction from the base side even after exposure for 30 seconds in a bright room printer. On the other hand, when the same treatment was carried out without adding hydroquinone, there was almost no reduction in strength. Example 4 The photosensitive film obtained in Example 1 was subjected to image exposure using a test negative, and then the protective layer was removed by washing with water.
And hydroquinone 4% and Neugen EA-140
It was immersed in an aqueous solution containing 0.4% for 3 minutes. Next, the film was immersed in 1% NA 2 CO 3 for 8 seconds, washed with water, developed with a sponge, and dried. The obtained film was exposed from the base side using a bright room printer in the same way as in Example 3.
It was found that it maintains a force reduction of 20%. In contrast, those that were not treated with a hydroquinone solution had only a 2% reduction in strength.
Claims (1)
光し、易溶部を除去することによつて得られ、画
像形成域が硬化した上層部と未硬化の下層部とか
らなる画像形成物であつて、前記画像形成域に有
効量の重合禁止剤を含有していることを特徴とす
る減力可能な画像形成物。 2 支持体および感光層を含む感光材料を画像露
光した後、易溶部を除去する前に、重合禁止剤お
よび/または重合禁止剤を含有する溶液に浸漬処
理することを特徴とする減力可能な画像形成物の
製造方法。 3 支持体および感光層を含む感光材料を画像露
光した後、重合禁止剤を含有した現像液を用いて
易溶部を除去することを特徴とする減力可能な画
像形成物の製造方法。 4 支持体および感光層を含む感光材料を画像露
光し、易溶部を除去することによつて得られた画
像形成物を重合禁止剤および/または重合禁止剤
を含有する溶液に浸漬処理することを特徴とする
減力可能な画像形成物の製造方法。[Scope of Claims] 1. Obtained by imagewise exposing a photosensitive material including a support and a photosensitive layer and removing easily soluble areas, the image forming area is formed from a hardened upper layer part and an uncured lower layer part. 1. An image-formed product which can be reduced in force, characterized in that the image-forming area contains an effective amount of a polymerization inhibitor. 2. After imagewise exposing the photosensitive material including the support and the photosensitive layer, before removing the easily soluble parts, it is subjected to immersion treatment in a polymerization inhibitor and/or a solution containing the polymerization inhibitor. A method for producing an image-formed product. 3. A method for producing an image-formed product that can be reduced in strength, which comprises imagewise exposing a photosensitive material including a support and a photosensitive layer, and then removing easily soluble areas using a developer containing a polymerization inhibitor. 4. Imagewise exposing the photosensitive material including the support and the photosensitive layer, and immersing the image formed product obtained by removing the easily soluble area in a polymerization inhibitor and/or a solution containing the polymerization inhibitor. A method for producing an image-formed product capable of reducing force, characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57097374A JPS58214145A (en) | 1982-06-07 | 1982-06-07 | Reducible image formed and its manufacture |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57097374A JPS58214145A (en) | 1982-06-07 | 1982-06-07 | Reducible image formed and its manufacture |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58214145A JPS58214145A (en) | 1983-12-13 |
| JPH0148533B2 true JPH0148533B2 (en) | 1989-10-19 |
Family
ID=14190729
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57097374A Granted JPS58214145A (en) | 1982-06-07 | 1982-06-07 | Reducible image formed and its manufacture |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58214145A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0716347B1 (en) * | 1994-12-06 | 2002-07-24 | Fuji Photo Film Co., Ltd. | Developer for photosensitive lithographic printing plate |
-
1982
- 1982-06-07 JP JP57097374A patent/JPS58214145A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58214145A (en) | 1983-12-13 |
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