JPH0170329U - - Google Patents

Info

Publication number
JPH0170329U
JPH0170329U JP1987165540U JP16554087U JPH0170329U JP H0170329 U JPH0170329 U JP H0170329U JP 1987165540 U JP1987165540 U JP 1987165540U JP 16554087 U JP16554087 U JP 16554087U JP H0170329 U JPH0170329 U JP H0170329U
Authority
JP
Japan
Prior art keywords
semiconductor substrate
hot air
fin
splashing
thrown
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1987165540U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1987165540U priority Critical patent/JPH0170329U/ja
Publication of JPH0170329U publication Critical patent/JPH0170329U/ja
Pending legal-status Critical Current

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  • Drying Of Solid Materials (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案の一実施例を示す断面図、第2
図はそのフイン6の斜視図、第3図は本考案の他
の実施例を示す断面図、第4図はそのフイン6′
の斜視図、第5図は従来の温風乾燥装置の断面図
である。 1……送風機、2……発熱体、3……フイルタ
ー、4……半導体基板、5……半導体支持治具、
6,6′……フイン、7……チヤンバー。
Fig. 1 is a sectional view showing one embodiment of the present invention;
The figure is a perspective view of the fin 6, FIG. 3 is a sectional view showing another embodiment of the present invention, and FIG. 4 is a fin 6'.
FIG. 5 is a sectional view of a conventional hot air drying device. 1...Blower, 2...Heating element, 3...Filter, 4...Semiconductor substrate, 5...Semiconductor support jig,
6, 6'...Fin, 7...Chamber.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] ウエツト処理後の半導体基板を温風にて乾燥す
る装置において、半導体基板支持治具直下に水は
ね防止およびゴミのまき上げ防止のフインを設け
たことを特徴とする温風乾燥機。
What is claimed is: 1. A hot air dryer for drying a semiconductor substrate after wet processing using hot air, characterized in that a fin is provided directly under a semiconductor substrate support jig to prevent water from splashing and dust from being thrown up.
JP1987165540U 1987-10-28 1987-10-28 Pending JPH0170329U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987165540U JPH0170329U (en) 1987-10-28 1987-10-28

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987165540U JPH0170329U (en) 1987-10-28 1987-10-28

Publications (1)

Publication Number Publication Date
JPH0170329U true JPH0170329U (en) 1989-05-10

Family

ID=31452118

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987165540U Pending JPH0170329U (en) 1987-10-28 1987-10-28

Country Status (1)

Country Link
JP (1) JPH0170329U (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4918614U (en) * 1972-05-20 1974-02-16
JPS52135453A (en) * 1976-05-08 1977-11-12 Nec Corp Wafer dryer

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4918614U (en) * 1972-05-20 1974-02-16
JPS52135453A (en) * 1976-05-08 1977-11-12 Nec Corp Wafer dryer

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