JPH0174262U - - Google Patents
Info
- Publication number
- JPH0174262U JPH0174262U JP1987167295U JP16729587U JPH0174262U JP H0174262 U JPH0174262 U JP H0174262U JP 1987167295 U JP1987167295 U JP 1987167295U JP 16729587 U JP16729587 U JP 16729587U JP H0174262 U JPH0174262 U JP H0174262U
- Authority
- JP
- Japan
- Prior art keywords
- target material
- vacuum chamber
- film
- forming body
- sputtering apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000013077 target material Substances 0.000 claims description 7
- 238000004544 sputter deposition Methods 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
第１図はこの考案の一実施例を示すスパツタ装
置の断面図、第２図ターゲツト材の一例を示すタ
ーゲツト材の一部分の拡大断面図、第３図は従来
のスパツタ装置の断面図である。
１……真空槽、２……バツキングプレート、４
……ヒータ、５……ホルダ、Ａ：…被膜形成体、
１０……ターゲツト材、１０ａ……Ｎｉフイルム
、１０ｂ…Ｃｕフイルム、１０ｃ……Ａｕフイル
ム、２０……ベースフイルム、２１……接着剤、
１１……供給リール、１３……巻取リール、１５
……モータ。
FIG. 1 is a cross-sectional view of a sputtering apparatus showing an embodiment of this invention, FIG. 2 is an enlarged cross-sectional view of a part of a target material showing an example of the target material, and FIG. 3 is a cross-sectional view of a conventional sputtering apparatus. 1... Vacuum chamber, 2... Batching plate, 4
... Heater, 5 ... Holder, A: ... Film forming body,
10...Target material, 10a...Ni film, 10b...Cu film, 10c...Au film, 20...Base film, 21...Adhesive,
11... Supply reel, 13... Take-up reel, 15
……motor.
Claims (1)
スパツタ装置において、真空槽内に長尺のシート
状ターゲツト材をその一部をバツキングプレート
上に摺動可能に支持させて収容するとともに、前
記真空槽内に、上記ターゲツト材をその長さ方向
に移動させる機構を設けたことを特徴とするスパ
ツタ装置。 In a sputtering apparatus for depositing target material on a film-forming body, a long sheet-like target material is housed in a vacuum chamber with a portion of the target material slidably supported on a backing plate, and the vacuum chamber A sputtering device comprising a mechanism for moving the target material in its length direction.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987167295U JPH0174262U (en) | 1987-10-31 | 1987-10-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987167295U JPH0174262U (en) | 1987-10-31 | 1987-10-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0174262U true JPH0174262U (en) | 1989-05-19 |
Family
ID=31455456
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987167295U Pending JPH0174262U (en) | 1987-10-31 | 1987-10-31 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0174262U (en) |
-
1987
- 1987-10-31 JP JP1987167295U patent/JPH0174262U/ja active Pending