JPH0185659U - - Google Patents
Info
- Publication number
- JPH0185659U JPH0185659U JP18115887U JP18115887U JPH0185659U JP H0185659 U JPH0185659 U JP H0185659U JP 18115887 U JP18115887 U JP 18115887U JP 18115887 U JP18115887 U JP 18115887U JP H0185659 U JPH0185659 U JP H0185659U
- Authority
- JP
- Japan
- Prior art keywords
- optical axis
- axis adjustment
- adjustment jig
- jig
- hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 claims description 6
- 238000002441 X-ray diffraction Methods 0.000 claims 2
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
Description
第１図は本考案の一実施例の斜視図、第２図は
この実施例の別の状態を示す斜視図、第３図はこ
の実施例の使用方法を示す平面図である。
１０…光軸調整治具、１２，１４…基準平面、
１８…貫通穴、２０…入射Ｘ線、２４…発散スリ
ツト。
FIG. 1 is a perspective view of one embodiment of the present invention, FIG. 2 is a perspective view showing another state of this embodiment, and FIG. 3 is a plan view showing how to use this embodiment. 10... Optical axis adjustment jig, 12, 14... Reference plane,
18...through hole, 20...incident X-ray, 24...divergent slit.
Claims (1)
整治具を取り付けたときに前記光軸調整治具の基
準平面が、前記試料台の回転軸線を含む平面内に
位置決めされるように構成された光軸調整治具に
おいて、 前記光軸調整治具は貫通穴を有し、前記貫通穴
の断面寸法は、前記Ｘ線回折装置の発散スリツト
を通過して前記試料台のところにやつて来るすべ
ての入射Ｘ線を通過させ得るほど十分な大きさと
されていることを特徴とする光軸調整治具。[Claims for Utility Model Registration] When an optical axis adjustment jig is attached to a sample stage of a goniometer of an X-ray diffraction apparatus, the reference plane of the optical axis adjustment jig is within a plane that includes the rotational axis of the sample stage. In the optical axis adjustment jig configured to be positioned, the optical axis adjustment jig has a through hole, and the cross-sectional dimension of the through hole is such that the sample passes through the divergent slit of the X-ray diffraction device. An optical axis adjustment jig characterized in that the jig is large enough to allow all incident X-rays that reach the table to pass through.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18115887U JPH0185659U (en) | 1987-11-30 | 1987-11-30 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18115887U JPH0185659U (en) | 1987-11-30 | 1987-11-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0185659U true JPH0185659U (en) | 1989-06-07 |
Family
ID=31472656
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18115887U Pending JPH0185659U (en) | 1987-11-30 | 1987-11-30 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0185659U (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59183353A (en) * | 1983-04-04 | 1984-10-18 | Rigaku Denki Kk | Optical adjustment of x-ray diffraction apparatus of polycrystalline specimen |
-
1987
- 1987-11-30 JP JP18115887U patent/JPH0185659U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59183353A (en) * | 1983-04-04 | 1984-10-18 | Rigaku Denki Kk | Optical adjustment of x-ray diffraction apparatus of polycrystalline specimen |
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