JPH01903A - Anti-glare filter - Google Patents
Anti-glare filterInfo
- Publication number
- JPH01903A JPH01903A JP62-157121A JP15712187A JPH01903A JP H01903 A JPH01903 A JP H01903A JP 15712187 A JP15712187 A JP 15712187A JP H01903 A JPH01903 A JP H01903A
- Authority
- JP
- Japan
- Prior art keywords
- coating
- layer
- glare
- cured
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は1表面硬度が高く、耐擦傷性が特に優れたプラ
スチック防眩フィルターに関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a plastic anti-glare filter that has a high surface hardness and particularly excellent scratch resistance.
(従来の技術)
従来、CRT、液晶デイスプレィ、発光ダイオード等の
表示装置においては、外光が表示画面上で反射すること
によシ生じる眩しさや1反射儂の映シ込みにより、映倫
が見にくくなるという問題がありた。この様な問題を解
決するため種々の防眩フィルターが提案されて訃シ、−
例として屈折率の異なる材料の薄膜を交互に基材上に設
け、多層構造にしたものが挙げられる。との種のフィル
ターは光の干渉作用を利用し、用いる膜材料の屈折率と
膜厚を指定することによル特定波長の光の反射を抑える
ものであるが1通常の環境においては種々の幅広い波長
分布を有する光が存在するため、反射偉をなくすことは
実質的に不可能である。(Prior Art) Conventionally, in display devices such as CRTs, liquid crystal displays, and light emitting diodes, it has been difficult to see images due to glare caused by external light reflecting on the display screen and smudges caused by one reflection. There was a problem. Various anti-glare filters have been proposed to solve these problems, and many have been proposed.
An example is a multilayer structure in which thin films of materials with different refractive indexes are alternately provided on a base material. This kind of filter uses the interference effect of light and suppresses the reflection of light at a specific wavelength by specifying the refractive index and film thickness of the film material used.1 In normal environments, various Since there is light with a wide wavelength distribution, it is virtually impossible to eliminate reflections.
又、多くの波長に対して反射率を下げようとすると薄膜
を何層にも積層する必要があシ、工程が煩雑となる。さ
らに、レンズの反射防止等に用いられているMgF2
、 LiF、 8102 、 ZrO2’、 0e02
、 Aj20Bなどの無機物質を用いる場合には、蒸
着やスパッタ等の方法を用いなければならず、生産性が
悪くなる。Furthermore, in order to lower the reflectance for many wavelengths, it is necessary to laminate many layers of thin films, which makes the process complicated. Furthermore, MgF2, which is used to prevent reflection in lenses, etc.
, LiF, 8102, ZrO2', 0e02
, Aj20B, etc., a method such as vapor deposition or sputtering must be used, resulting in poor productivity.
一方、基材表面に微細な凹凸を設けることによシ防眩作
用が得られることは従来よシ知られておシ、この効果を
利用した防眩フィルターは、儂の映シ込みを少なくでき
、又、比較的製造し易いため、種々の分野で応用されて
いる。しかしながら。On the other hand, it has long been known that an anti-glare effect can be obtained by providing minute irregularities on the surface of the substrate, and an anti-glare filter that utilizes this effect can reduce the amount of glare caused by the image. Moreover, since it is relatively easy to manufacture, it is applied in various fields. however.
ポリメチルメタクリレートやポリカーボネート等の通常
使用される基材自体からなる凹凸形状を表面に設けた場
合、材料自体の問題によシ傷がつきやすいという問題が
あった。When a surface is provided with an uneven shape made of a commonly used base material itself such as polymethyl methacrylate or polycarbonate, there is a problem in that it is easily scratched due to a problem with the material itself.
又、シリカ微粒子を分散させた樹脂被膜を基材表面に設
ける方法もあるが、この場合反射像の映り込みを実質上
なくすためには多量のシリカ粒子を被膜中に含有させね
ばならないため均一な分散が困難となシ、得られるフィ
ルターには表面に塗布むらが発生するなどの問題があっ
九。Another method is to provide a resin coating in which fine silica particles are dispersed on the surface of the substrate, but in this case, in order to virtually eliminate the reflection of the reflected image, a large amount of silica particles must be included in the coating, so a uniform coating cannot be obtained. Dispersion is difficult, and the resulting filter has problems such as uneven coating on the surface.
(発明が解決しようとする問題点)
本発明者らは1以上のごとき欠点のない防眩フィルター
を得ることを目的として種々の検討を行った結果、透明
プラスチック基材上に特定の硬化被膜を二層設けること
によシ、防眩効果を維持しつつ1表面硬度、耐擦傷性を
大幅に向上させ得ることを見出し1本発明に到達した。(Problems to be Solved by the Invention) The present inventors have conducted various studies with the aim of obtaining an anti-glare filter that does not have one or more of the following drawbacks, and as a result, we have developed a method for forming a specific hardened coating on a transparent plastic substrate. The present inventors have discovered that by providing two layers, the surface hardness and scratch resistance can be significantly improved while maintaining the anti-glare effect.
(問題点を解決する丸めの手段)
すなわち本発明によれば、透明プラスチック基材と、そ
の表面の少なくとも一部に設けた1表面に微細凹凸形状
を有する有機ポリシロキサン系組成物の硬化被膜層(第
−層)と、この硬化被膜上に設けた有機ポリシロキサン
系組成物の硬化物又はポリアクリレート系組成物の硬化
物よりなる被膜層(第二層)とからなることを特徴とす
る防眩フィルターが提供される。(Rounding Means for Solving Problems) That is, according to the present invention, a transparent plastic substrate and a cured coating layer of an organic polysiloxane composition having a fine unevenness on one surface provided on at least a part of the surface thereof. (layer) and a coating layer (second layer) formed of a cured product of an organic polysiloxane composition or a cured product of a polyacrylate composition provided on the cured coating. A glare filter is provided.
本発明で用いられる透明プラスチック基材の例としては
、ポリメタクリレート、ポリカーボネート、ボIJtJ
l化ビニル、エポキシ樹脂、ポリスチレン、ポリエステ
ル、ジエチレングリコールビスアリルカーボネート樹脂
などを挙げることができるが、デイスプレィ上の映像を
損なうことなく透過させうるものであれば特に限定され
ない。Examples of transparent plastic substrates used in the present invention include polymethacrylate, polycarbonate, and
Examples include vinyl chloride, epoxy resin, polystyrene, polyester, diethylene glycol bisallyl carbonate resin, etc., but there is no particular limitation as long as it can transmit images without damaging the image on the display.
又、これらのプラスチック基材は、板状、フィルム状で
用いられるほか、ブラウン管などの前面形状に合わせて
自在の形状に成形したものも使用できる。In addition to being used in the form of a plate or film, these plastic substrates can also be molded into any shape that matches the front shape of a cathode ray tube or the like.
基材表面への第−層の被膜材料としては種々の有機ポリ
シロキサン系組成物の硬化物を用いることができるが三
官能及び/又は四官能の有機ケイ素化合物の部分加水分
解物及びそれらの部分縮合物を適当な溶剤で希釈したも
のが好ましく用いられる。これらの硬化物を提供する材
料は種々のものが既に市販されてお夛容易に人手するこ
とができる。又、これらの材料中に適量の7リ力微粒子
。As the coating material for the first layer on the surface of the substrate, cured products of various organopolysiloxane compositions can be used, but partial hydrolysates of trifunctional and/or tetrafunctional organosilicon compounds and their parts are also suitable. A condensate diluted with a suitable solvent is preferably used. Various materials for providing these cured products are already commercially available and can be easily prepared by hand. In addition, these materials contain an appropriate amount of 7-Li force fine particles.
その他の添加剤を配合してもよく、これによシ耐擦傷性
、耐摩耗性、さらには加工性等の向上をはかることがで
きる。Other additives may be added, which can improve scratch resistance, abrasion resistance, processability, and the like.
第−層の被膜を基材上に形成するには、従来よυ一般的
に用いられている種々の塗布方法が適用でき1例として
、浸漬法、スピン法、ロールによる方法、フロー法など
が挙げられる。又、必要に応じ、密着性向上剤を基材と
第−層被膜の間に設けることもできる。In order to form the film of the first layer on the base material, various conventional and commonly used coating methods can be applied, such as dipping method, spin method, roll method, flow method, etc. Can be mentioned. Further, if necessary, an adhesion improver can be provided between the base material and the second layer coating.
第−層被膜表面上に微細凹凸形状を形成する方法として
は、化学エツチングあるいはサンドブラストなどの方法
により表面を荒らす方法、フォトリソグラフィーによシ
凹凸形状を形成する方法、あるいは凹凸形状に加工した
ガラスや金型を用いてパターンを転写する方法などが用
いられるが。Methods for forming fine irregularities on the surface of the first layer coating include a method of roughening the surface using methods such as chemical etching or sandblasting, a method of forming irregularities using photolithography, or a method of forming irregularities on glass processed into an irregular shape. Methods such as transferring a pattern using a mold are used.
パターンの均一性、制御性の点よシ、フォトリソグラフ
ィーによる方法が好ましい。In terms of pattern uniformity and controllability, photolithography is preferred.
第−層液膜表面に設けた凹凸の表面粗度は、必要とする
防眩性に応じ、第二層被膜の厚みとの組合せで種々の値
を設定することができるが、実質的に防眩効果を発現す
るためには、少なくとも中心線平均荒らさ(Ra )で
0.05μm以上であることが望ましい。又、クラック
の発生を防ぐためには、第−層被膜の厚みは、基材との
境界面から荒らさ中心までの距離で20μm以下である
ことが望ましい。The surface roughness of the irregularities provided on the surface of the first layer liquid film can be set to various values depending on the required anti-glare property and in combination with the thickness of the second layer film, but in practice In order to produce a dazzling effect, it is desirable that the centerline average roughness (Ra) be at least 0.05 μm or more. Further, in order to prevent the occurrence of cracks, it is desirable that the thickness of the first layer coating is 20 μm or less as measured from the interface with the base material to the center of roughness.
第二層目の被膜材料としては、第−層被膜と同一の、あ
るいは異なる構造の有機ポリシロキサン系組成物の硬化
物又はポリアクリレート系組成物の硬化物が使用される
。有機ポリシロキサン系組成物の硬化物は、第−層の硬
化物と同様、種々の材料を用いることができる。又、ポ
リアクリレート系組成物としては、(メタ)アクリル系
プレポリマーに光重合開始剤を添加したもの、あるいは
さらにポリオール(メタ)アクリレートモノマーを混合
したものなど種々の材料が用いられる。又。As the coating material for the second layer, a cured product of an organic polysiloxane composition or a cured product of a polyacrylate composition having the same or different structure as the first layer coating is used. As with the cured product of the second layer, various materials can be used for the cured product of the organic polysiloxane composition. Various materials can be used as the polyacrylate composition, such as a (meth)acrylic prepolymer to which a photopolymerization initiator is added, or a mixture of a polyol (meth)acrylate monomer. or.
第−層被膜と同様に、これらの材料中にシリカ微粒子等
を添加して種々の特性を付与することもできる。なお、
第二層被膜を形成するに当たっては前述の種々の塗布方
法が適用される。Similar to the second layer coating, fine silica particles or the like can be added to these materials to impart various properties. In addition,
In forming the second layer coating, the various coating methods described above can be applied.
得られた第二層被膜の厚みは第−層被膜と同様。The thickness of the second layer coating obtained is the same as that of the second layer coating.
クラックを防ぐためには20μm以下であることが望ま
しい。又、第二層形成後の表面粗度は、防眩性及び光線
透過率の点よシ、中心線平均荒らさ(Ra)で肌05〜
10.0μmであることが望ましく。In order to prevent cracks, the thickness is preferably 20 μm or less. In addition, the surface roughness after the formation of the second layer is 05 to 05 on the center line average roughness (Ra) in terms of anti-glare properties and light transmittance.
The thickness is preferably 10.0 μm.
この値は第−層被膜表面上の粗度と第二層被膜の厚みを
種々に設定することにより自由に調整することができる
。This value can be freely adjusted by varying the roughness on the surface of the first layer coating and the thickness of the second layer coating.
かくして、目的とする防眩フィルターが得られるが、さ
らに、必要に応じて基材裏面上に、本発明にお−て、第
−層又は第二層で用いられると同様の、又はその他の硬
化物の被膜を設け、耐擦傷性を付与することができる。In this way, the desired anti-glare filter is obtained, but if necessary, a hardening agent similar to that used in the second layer or the second layer in the present invention or another hardening agent may be applied on the back surface of the base material. A coating of material can be provided to impart scratch resistance.
又1画面上のチラッキをなくし、コントラストを向上さ
せる目的で。Also for the purpose of eliminating flicker on one screen and improving contrast.
顔料や染料を用いて基材あるいは被膜を着色してもよい
。さらには、被膜内部あるいは表面に、又。The base material or coating may be colored using pigments or dyes. Furthermore, inside or on the surface of the coating.
基材内部あるいは裏面に帯電防止剤を含有させるか、あ
るいは塗布することによシ、ゴミやホコリの付着を防ぐ
こともできる。By incorporating or coating an antistatic agent inside or on the back side of the base material, it is possible to prevent dirt and dust from adhering to the base material.
(発明の効果)
本発明によれば1表面硬度が高く、耐擦傷性が特に優れ
た透明なプラスチック製防眩フィルターが得られる。(Effects of the Invention) According to the present invention, a transparent plastic anti-glare filter having high surface hardness and particularly excellent scratch resistance can be obtained.
(実施例) 次に本発明を実施例によシ具体的に説明する。(Example) Next, the present invention will be specifically explained using examples.
比較例
アクリル樹脂板(2m厚、三菱レーヨン”アクリライト
°)上に、密着向上剤(東芝シリコーン”PH95°)
及びSi系ハードコート剤(東芝シリコーン1トスガー
ド520”)をとの順にスピン塗布し、90Cで2時間
加熱して硬化被膜を形成した。膜厚はそれぞれ0.02
μm及び5.0μmでありた。Comparative Example Adhesion improver (Toshiba Silicone PH95°) was placed on an acrylic resin plate (2m thick, Mitsubishi Rayon “Acrylite°”)
and Si-based hard coat agent (Toshiba Silicone 1 Toss Guard 520'') were spin-coated in this order and heated at 90C for 2 hours to form a cured film.The film thickness was 0.02 cm for each.
μm and 5.0 μm.
次に、ポジ型フォトレジスト(東京応化工業=OFPR
−800”)を先に形成した硬化被膜上に膜厚が1μm
になる様にスピン塗布し9.OCで20分間加熱処理し
た。その後、140メツシエ(線径60μm)の格子状
黒色パターンを有するマスクをレジストに圧着し、その
上方よシ超高圧水銀灯で11om:s7(至)2の紫外
線を照射し、アルカリ水溶液で現像してレジストパター
ンを形成し、さらに。Next, a positive photoresist (Tokyo Ohka Kogyo = OFPR)
The film thickness is 1 μm on the cured film that was previously formed (-800”).
9. Spin coating so that it looks like this. Heat treatment was performed with OC for 20 minutes. After that, a mask with a grid-like black pattern of 140 mesh (wire diameter 60 μm) was pressed onto the resist, and the upper part of the mask was irradiated with 11 om:s7 (to) 2 ultraviolet rays using an ultra-high pressure mercury lamp, and developed with an alkaline aqueous solution. Form a resist pattern and further.
90Cで20分間加熱処理を行った。Heat treatment was performed at 90C for 20 minutes.
得られたレジストパターンをマスクとして、3壬のフッ
化水累酸水溶液(フッ化アンモニウム含V)で、硬化被
膜を2DCで1時間エツチングした後、エタノールによ
りレジストを溶解除去し、硬化被膜層に凹凸パターンを
形成した。Using the obtained resist pattern as a mask, the cured film was etched at 2DC for 1 hour with 3 liters of fluoride/acid aqueous solution (containing ammonium fluoride), and then the resist was dissolved and removed with ethanol to form a cured film layer. A concavo-convex pattern was formed.
得られたパターンは均一なものであシ、段差は3.6μ
mであった。このものの45°鏡面反射率は5.5sで
あF)、 500−700nmの光線の透過率は78
%であった。又、表面硬度は鉛筆硬度で4Hであった。The obtained pattern is uniform, and the height difference is 3.6μ.
It was m. The 45° specular reflectance of this material is 5.5s (F), and the transmittance of light from 500 to 700 nm is 78
%Met. Moreover, the surface hardness was 4H in terms of pencil hardness.
しかし、$0000のスチールクールで表面を摩擦した
ところ(スチールウール試験)、表面に微かながら傷が
ついた。However, when the surface was rubbed with $0,000 Steel Cool (steel wool test), the surface was slightly scratched.
実施例1
比較例で得られた試料板を用い、さらにその上にSi系
ハードコート剤(“トスガード520”)を1μmの膜
厚になる様にスピン途布し、90Cで2時間加熱した。Example 1 Using the sample plate obtained in the comparative example, a Si-based hard coating agent ("Tosgard 520") was spun onto the sample plate to a thickness of 1 μm, and heated at 90C for 2 hours.
得られた試料の表面段差は3.4μmであシ、鏡面反射
率5.6%、透過率は78係でありた。又、鉛筆硬度は
8Hであシ、スチールウール試験でも傷は認められなか
った。The surface level difference of the obtained sample was 3.4 μm, the specular reflectance was 5.6%, and the transmittance was 78. The pencil hardness was 8H, and no scratches were observed in the steel wool test.
実施例2
比較例で得られた試料板を用い、その上K、以下の配合
により調製した感光性樹脂溶液を0.7μmの膜厚にな
る様にスピン塗布し、紫外線照射により完全に硬化を行
った。Example 2 Using the sample plate obtained in the comparative example, a photosensitive resin solution prepared according to the following formulation was spin-coated to a film thickness of 0.7 μm, and completely cured by ultraviolet irradiation. went.
感光性樹脂溶液の配合
トリメチロールプロパンドリアクリレート H]
3.5%イングプロルアルコール ya
o 1得られた試料の表面段差は4.2μmであシ、
鏡面反射率4.9%、透過率は74%であった。又、鉛
筆硬度は7Hでアシ、スチールウール試験でも傷はつか
なかった。Compounding of photosensitive resin solution Trimethylolpropane doryacrylate H]
3.5% Ingprol alcohol ya
o 1 The surface level difference of the obtained sample was 4.2 μm,
The specular reflectance was 4.9% and the transmittance was 74%. Furthermore, the pencil hardness was 7H, and there was no scratch in the reed or steel wool test.
実施例6
第二層被膜形成材料として1ムY−41−442”(東
しシリコーン、S1系ハードコート剤)を用いた以外は
実施例1と同様にして試料を作成した。Example 6 A sample was prepared in the same manner as in Example 1, except that 1mm Y-41-442'' (Toshi silicone, S1 hard coat agent) was used as the second layer film forming material.
第二層硬化被膜の厚みは1.2μmであった。The thickness of the second layer cured film was 1.2 μm.
得られた試料の表面段差は3.1μmであシ、鏡面反射
率6.0%、透過率は81%でありた。このものの鉛筆
硬度は8Hであシ、スチールウール試験でも傷はつかな
かった。The surface level difference of the obtained sample was 3.1 μm, the specular reflectance was 6.0%, and the transmittance was 81%. The pencil hardness of this product was 8H, and it did not show any scratches in the steel wool test.
特許出願人 日本ゼオン株式会社Patent applicant: Zeon Corporation
Claims (1)
設けた、表面に微細凹凸形状を有する有機ポリシロキサ
ン系組成物の硬化被膜層と、この硬化被膜上に設けた有
機ポリシロキサン系組成物の硬化物又はポリアクリレー
ト系組成物の硬化物よりなる被膜層とからなることを特
徴とする防眩フィルター。A transparent plastic base material, a cured coating layer of an organic polysiloxane composition having a finely uneven shape on the surface provided on at least a portion of the surface thereof, and curing of the organic polysiloxane composition provided on the cured coating. 1. An anti-glare filter comprising a coating layer made of a cured product of polyacrylate or a polyacrylate composition.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62-157121A JPH01903A (en) | 1987-06-24 | Anti-glare filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62-157121A JPH01903A (en) | 1987-06-24 | Anti-glare filter |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS64903A JPS64903A (en) | 1989-01-05 |
| JPH01903A true JPH01903A (en) | 1989-01-05 |
Family
ID=
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