JPH0192127U - - Google Patents
Info
- Publication number
- JPH0192127U JPH0192127U JP18871187U JP18871187U JPH0192127U JP H0192127 U JPH0192127 U JP H0192127U JP 18871187 U JP18871187 U JP 18871187U JP 18871187 U JP18871187 U JP 18871187U JP H0192127 U JPH0192127 U JP H0192127U
- Authority
- JP
- Japan
- Prior art keywords
- cvd apparatus
- low
- pressure cvd
- wafer transfer
- gas supply
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004518 low pressure chemical vapour deposition Methods 0.000 claims description 3
- 239000012495 reaction gas Substances 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 4
- 238000011017 operating method Methods 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Description
第１図は本考案の第１の実施例の構成図、第２
図〜第６図は第１の実施例の操作方法を説明する
ための図、第７図は本考案の第２の実施例の構成
図、第８図は従来の減圧ＣＶＤ装置の構成図であ
る。
１……反応管、２ａ，２ｂ……ウエハ移送治具
、３……加熱源、４……反応ガス供給系、５……
ロータリーポンプ、６……メカニカルブースター
ポンプ、７……圧力調整器、８……バツクハツチ
、９……フロントハツチ、１０ａ，１０ｂ……ウ
エハ、１１……ボート、１２ａ，１２ｂ……ウエ
ハ移送治具、１３……開口部、１４……真空排気
系。
Figure 1 is a configuration diagram of the first embodiment of the present invention;
6 to 6 are diagrams for explaining the operating method of the first embodiment, FIG. 7 is a configuration diagram of the second embodiment of the present invention, and FIG. 8 is a configuration diagram of a conventional low pressure CVD apparatus. be. 1... Reaction tube, 2a, 2b... Wafer transfer jig, 3... Heat source, 4... Reaction gas supply system, 5...
Rotary pump, 6... Mechanical booster pump, 7... Pressure regulator, 8... Back hatch, 9... Front hatch, 10a, 10b... Wafer, 11... Boat, 12a, 12b... Wafer transfer jig, 13...opening, 14...vacuum exhaust system.
Claims (1)
と真空排気系及び加熱源とから成る減圧ＣＶＤ装
置において、前記反応管の両端開口部双方より半
導体ウエハを搬出搬入するための少くなくとも２
つのウエハ移送治具を備えていることを特徴とす
る減圧ＣＶＤ装置。 In a low-pressure CVD apparatus consisting of a reaction tube having openings at both ends, a reaction gas supply system, a vacuum exhaust system, and a heating source, at least two
A low-pressure CVD apparatus characterized by being equipped with two wafer transfer jigs.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18871187U JPH0192127U (en) | 1987-12-10 | 1987-12-10 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18871187U JPH0192127U (en) | 1987-12-10 | 1987-12-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0192127U true JPH0192127U (en) | 1989-06-16 |
Family
ID=31479785
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18871187U Pending JPH0192127U (en) | 1987-12-10 | 1987-12-10 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0192127U (en) |
-
1987
- 1987-12-10 JP JP18871187U patent/JPH0192127U/ja active Pending