JPH0194453U - - Google Patents
Info
- Publication number
- JPH0194453U JPH0194453U JP18778787U JP18778787U JPH0194453U JP H0194453 U JPH0194453 U JP H0194453U JP 18778787 U JP18778787 U JP 18778787U JP 18778787 U JP18778787 U JP 18778787U JP H0194453 U JPH0194453 U JP H0194453U
- Authority
- JP
- Japan
- Prior art keywords
- shutter
- target
- electrode
- supply means
- covering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 4
- 238000004544 sputter deposition Methods 0.000 claims 2
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
第１図は本考案の一実施例を示す断面図、第２
図は第１図のＡ―Ａ断面図、第３図は他の実施例
を示す断面図である。
１…真空容器、４…真空ポンプ、５…スパツタ
電極、１３，１４…シヤツタ、１５…基板電極、
６…基板、１６，１７…円筒状の石英、１８，１
９…モータ、２１…高周波電源、２４…ガスボン
ベ。
Fig. 1 is a sectional view showing one embodiment of the present invention;
The figure is a sectional view taken along the line AA in FIG. 1, and FIG. 3 is a sectional view showing another embodiment. DESCRIPTION OF SYMBOLS 1... Vacuum container, 4... Vacuum pump, 5... Sputter electrode, 13, 14... Shutter, 15... Substrate electrode,
6... Substrate, 16, 17... Cylindrical quartz, 18, 1
9...Motor, 21...High frequency power supply, 24...Gas cylinder.
Claims (1)
トと前記ターゲツトを覆うシヤツタと基板電極と
、ガス供給手段と電力供給手段から成るスパツタ
装置において、前記ターゲツトを覆う前記シヤツ
タに前記シヤツタが閉じた時にシヤツタと基板電
極との間の空間を包囲する手段を設けたことを特
徴とするスパツタ電極用シヤツタ構造。 In a sputtering apparatus comprising a sputtering electrode, a target, a shutter covering the target, a substrate electrode, a gas supply means, and a power supply means in a vacuum vessel, the shutter covering the target is connected to the shutter and the substrate electrode when the shutter is closed. 1. A shutter structure for a spatter electrode, characterized in that it is provided with a means for enclosing a space between.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18778787U JPH0194453U (en) | 1987-12-11 | 1987-12-11 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18778787U JPH0194453U (en) | 1987-12-11 | 1987-12-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0194453U true JPH0194453U (en) | 1989-06-21 |
Family
ID=31699797
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18778787U Pending JPH0194453U (en) | 1987-12-11 | 1987-12-11 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0194453U (en) |
-
1987
- 1987-12-11 JP JP18778787U patent/JPH0194453U/ja active Pending
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