JPH02102721U - - Google Patents
Info
- Publication number
- JPH02102721U JPH02102721U JP1203689U JP1203689U JPH02102721U JP H02102721 U JPH02102721 U JP H02102721U JP 1203689 U JP1203689 U JP 1203689U JP 1203689 U JP1203689 U JP 1203689U JP H02102721 U JPH02102721 U JP H02102721U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- resist
- stage
- rails
- predetermined length
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000007723 transport mechanism Effects 0.000 claims description 4
- 230000007246 mechanism Effects 0.000 claims 1
Description
第１図は本考案の一実施例を示すウエーハ搬送
機構の斜視図、第２図ａ〜ｄは第１図に示すウエ
ーハ搬送機構の動作順に示した断面図、第３図ａ
及びｂは従来のウエーハ搬送機構の一部を示す斜
視図及び側面図である。
１，１ａ……レール、２……ステージ、３……
ウエーハ、４……レジスト膜、５……レジスト汚
れ、６……突出平坦面、７……スリツト、８……
搭載面、９ａ〜９ｄ……矢印。
FIG. 1 is a perspective view of a wafer transport mechanism showing an embodiment of the present invention, FIGS. 2 a to d are cross-sectional views showing the wafer transport mechanism shown in FIG. 1 in the order of operation, and FIG. 3 a
2A and 2B are a perspective view and a side view showing a part of a conventional wafer transport mechanism. 1, 1a...Rail, 2...Stage, 3...
Wafer, 4...Resist film, 5...Resist stain, 6...Protruding flat surface, 7...Slit, 8...
Mounting surface, 9a-9d...arrow.
Claims (1)
ト塗布機とこの塗布されたレジストを乾燥するオ
ーブンとの間に配置されるとともに前記ウエーハ
の外径より所定の寸法だけ小さい長さで長手方向
に所定の間隔で形成された複数個の突出平坦面を
有する二本のレールと、この二本のレールが挿入
される二つのスリツトを有するとともに前記ウエ
ーハを搭載する搭載面をもつステージと、前記二
本のレールの前記突出平坦面に搭載された前記ウ
エーハを前記ステージの前記搭載面に移載させる
前記レールを上下及び送り駆動する機構とを備え
ることを特徴とするレジスト膜形成装置のウエー
ハ搬送機構。 A resist coater is disposed between a resist coater that coats a resist on one main surface of the wafer and an oven that dries the coated resist, and has a length smaller than the outer diameter of the wafer by a predetermined length and a predetermined length in the longitudinal direction. a stage having two rails having a plurality of protruding flat surfaces formed at intervals, two slits into which the two rails are inserted, and a mounting surface on which the wafer is mounted; A wafer transport mechanism for a resist film forming apparatus, comprising: a mechanism for vertically and forwardly driving the rail for transferring the wafer mounted on the protruding flat surface of the rail onto the mounting surface of the stage.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1203689U JPH0644091Y2 (en) | 1989-02-02 | 1989-02-02 | Wafer transfer mechanism of resist film forming equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1203689U JPH0644091Y2 (en) | 1989-02-02 | 1989-02-02 | Wafer transfer mechanism of resist film forming equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02102721U true JPH02102721U (en) | 1990-08-15 |
| JPH0644091Y2 JPH0644091Y2 (en) | 1994-11-14 |
Family
ID=31221118
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1203689U Expired - Lifetime JPH0644091Y2 (en) | 1989-02-02 | 1989-02-02 | Wafer transfer mechanism of resist film forming equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0644091Y2 (en) |
-
1989
- 1989-02-02 JP JP1203689U patent/JPH0644091Y2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0644091Y2 (en) | 1994-11-14 |
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