JPH02116820A - Optical switch - Google Patents

Optical switch

Info

Publication number
JPH02116820A
JPH02116820A JP26935788A JP26935788A JPH02116820A JP H02116820 A JPH02116820 A JP H02116820A JP 26935788 A JP26935788 A JP 26935788A JP 26935788 A JP26935788 A JP 26935788A JP H02116820 A JPH02116820 A JP H02116820A
Authority
JP
Japan
Prior art keywords
active layer
implanted
optical switch
wavelength
absorption
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP26935788A
Other languages
Japanese (ja)
Inventor
Masahiro Ikeda
正宏 池田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP26935788A priority Critical patent/JPH02116820A/en
Publication of JPH02116820A publication Critical patent/JPH02116820A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To expand the operation wavelength region of the optical switch having a gain at the time of on and to allow the use of the switch for wavelength multiplex transmission by constituting an active layer of a semiconductor having plural kinds of composite structures and controlling the amplification and absorption of the light signal to be implanted to the active layer by the minority carriers to be implanted to the active layer. CONSTITUTION:The material and well layer width of the quantum well structure are controlled to control the concn. of the carriers to be implanted so that isolation is assured over a wide wavelength region. Namely, the active layer 4 sandwiched by the p type and n type semiconductors 3, 5 is constituted of the semiconductor of plural kinds of the composite quantum well structures. The amplification and absorption of the light signals implanted to the active layer 4 are controlled by the minority carriers to be implanted to the active layer. The sufficiently large gain is, therefore, obtd. over a wide wavelength region and the sufficiently large absorption loss is obtd. at the time of on. The application to a wavelength multiplex transmission system as the ultra-wide band optical switch is enabled in this way.

Description

【発明の詳細な説明】 〈産業上の利用分野〉 本発明は半導体材料で構成される小型で損失の小さい光
スィッチに関するものである。
DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a small optical switch made of semiconductor material and having low loss.

〈従来の技術及び発明が解決しようとする課題〉第1図
はP型及びN型半導体にはさまれた活性層に順方向電流
を注入し、入射光信号の増幅、吸収によって入射光信号
のオン、オフ(ゲート)を行う光スィッチの基本構成を
示したものである。同図中、1は入力用光導波路、2は
出力用先導波路、3はP型半導体材料で構成されるクラ
ッド、4は活性層、5はN型半導体材料で構成されるク
ラッド、6は反射防止膜である。
<Prior art and problems to be solved by the invention> Figure 1 shows that a forward current is injected into the active layer sandwiched between P-type and N-type semiconductors, and the incident optical signal is amplified and absorbed. This figure shows the basic configuration of an optical switch that turns on and off (gates). In the figure, 1 is an optical waveguide for input, 2 is a leading waveguide for output, 3 is a cladding made of a P-type semiconductor material, 4 is an active layer, 5 is a cladding made of an N-type semiconductor material, and 6 is a reflection It is a preventive film.

従来技術に係るこの種の光スィッチでは、活性層4はノ
ンドープの半導体材料で、厚さは約0.15μm程度が
一般的である。この光スィッチに順方向電流を注入する
とキャリアの反転分布が形成され、半導体レーザと同様
に活性層4は利得媒質に変化する。したがって利得幅内
に入力用光導波路1を介して光信号が注入されると誘導
増幅作用によって入射光信号は増幅され、出力月光導波
路2を介して出射する。一方、電流が注入されていない
場合には誘導吸収によって入射光信号は減衰し、出力用
光導波路2には出射されない。したがって順方向注入電
流のオン、オフによって入射光信号のオン、オフを行う
光スィッチとして機能する。
In this type of conventional optical switch, the active layer 4 is made of a non-doped semiconductor material and generally has a thickness of about 0.15 μm. When a forward current is injected into this optical switch, a population inversion of carriers is formed, and the active layer 4 changes into a gain medium similarly to a semiconductor laser. Therefore, when an optical signal is injected through the input optical waveguide 1 within the gain width, the input optical signal is amplified by the induced amplification effect and outputted through the output lunar optical waveguide 2. On the other hand, when no current is injected, the incident optical signal is attenuated by induced absorption and is not emitted to the output optical waveguide 2. Therefore, it functions as an optical switch that turns on and off the incident optical signal by turning on and off the forward injection current.

第3図は活性層4が、1.3μmのバンドギャツブエネ
ルギ波長を持つノンドープの半導体で構成される従来の
光スィッチの、オン時とオフ時の出力−波長特性を示し
たものである。
FIG. 3 shows the output-wavelength characteristics of a conventional optical switch in which the active layer 4 is made of a non-doped semiconductor having a bandgap energy wavelength of 1.3 .mu.m when the switch is on and off.

オン時の少数キャリア注入量は6 X 10 ”ell
−’程度であり、このキャリア濃度は、活性N4の厚さ
を0.2μm1活性層4の輻を3μm1素子長Iを20
0μm1キヤリアの寿命時間を約1nsと仮定すると約
120〜150 mAの電流注入量に対応する。今、光
信号波長λgが1.3μmと仮定すると、オン時には約
20 dBの利得が得られ、オフ時には約35 dBの
吸収損失となる。すなわち、アイソレージシンが約55
 dBの光ゲートスイッチが得られる。
The amount of minority carriers injected when turned on is 6 x 10”ell
The carrier concentration is approximately 0.2 μm for the thickness of the active N4, 3 μm for the convergence of the active layer 4, and 20 μm for the element length I.
Assuming that the life time of a 0 μm carrier is about 1 ns, this corresponds to a current injection amount of about 120 to 150 mA. Assuming now that the optical signal wavelength λg is 1.3 μm, a gain of about 20 dB is obtained when it is on, and an absorption loss of about 35 dB when it is off. That is, the isolation thin is approximately 55
A dB optical gate switch is obtained.

ところが信号光波長が1.55μmの場合にはオン時も
オフ時も約3 dBの損失となり、光スィッチとしての
機能を果さな(なる。
However, if the signal light wavelength is 1.55 μm, there will be a loss of about 3 dB both when on and off, and it will not function as an optical switch.

因に光ファイバを用いた光通信方式においては光信号波
長が1.3μmから1.55μm以上の波長に亘る波長
多重伝送方式が将来の伝送方式として重要な位置を占め
る。そこで、かかる波長多重伝送方式に使うことのでき
る低損失で高速、かつ小型の光スィッチ4の出現が待望
されている。
Incidentally, in optical communication systems using optical fibers, a wavelength multiplexing transmission system in which optical signal wavelengths range from 1.3 μm to 1.55 μm or more will occupy an important position as a future transmission system. Therefore, the emergence of a low-loss, high-speed, and compact optical switch 4 that can be used in such a wavelength division multiplexing transmission system has been awaited.

本発明は、上記従来技術に鑑み、オン時に利得のある光
スィッチの動作波長域を拡大して波長多重伝送用として
使用できる光スィッチを提供することを目的とする。
SUMMARY OF THE INVENTION In view of the above-mentioned prior art, an object of the present invention is to provide an optical switch that can be used for wavelength multiplexing transmission by expanding the operating wavelength range of an optical switch that has a gain when turned on.

く課題を解決するための手段〉 第4図は活性層にバンドギャップエネルギに対応する波
長が1.55μmで井戸層の輻W= 200 nmの量
子井戸構造を持った量子井戸半導体レーザの出力−波長
特性を示したものである。同図はキャリア濃度がI X
 10 ”am−’程度で、0.56μmの波長で発振
するものについて示したものである。
Figure 4 shows the output of a quantum well semiconductor laser having a quantum well structure in which the wavelength corresponding to the band gap energy in the active layer is 1.55 μm and the well layer radiation W = 200 nm. This shows the wavelength characteristics. In the figure, the carrier concentration is I
The figure shows something that oscillates at a wavelength of 0.56 .mu.m at a wavelength of about 10 "am-".

同図から明らかなように、1.56μmの発振光波長で
はオフ時の吸収量が5 dB以下となる。このときに、
量子井戸構造では、利得のピーク波長は発振波長の量子
エネルギレベルにほぼ固定されるものと見られていたた
め光スィッチとしてはアイソレージ讐ン特性が悪く使用
できないものと見られていた。
As is clear from the figure, at an oscillation light wavelength of 1.56 μm, the amount of absorption in the off state is 5 dB or less. At this time,
In the quantum well structure, the peak wavelength of gain was considered to be almost fixed at the quantum energy level of the oscillation wavelength, so it was considered that the isolation characteristics were poor and it could not be used as an optical switch.

本発明は量子井戸構造の材料と井戸層幅を制御し、注入
キャリア濃度を制御して広い波長域に亘ってアイソレー
ジシンを確保できろようにしたものである。
The present invention makes it possible to ensure isolation over a wide wavelength range by controlling the material and well layer width of the quantum well structure and controlling the injection carrier concentration.

上記目的を達成する本発明の構成は、P型及びN型半導
体にはさまれた活性層を、複数積類の複合化された量子
井戸構造の半導体で構成し、活性層に注入される光信号
の増幅。
The structure of the present invention that achieves the above object is such that the active layer sandwiched between P-type and N-type semiconductors is composed of a semiconductor with a multilayer composite quantum well structure, and the light injected into the active layer is Signal amplification.

吸収を、活性層に注入する少数キャリアで制御するよう
にしたことを特徴とする 〈作   用〉 上記構成の本発明によれば、広い波長域に亘って充分大
きな利得を得ることができ、オフ時には充分大きな吸収
損失がある。
Features: Absorption is controlled by minority carriers injected into the active layer <Function> According to the present invention having the above configuration, a sufficiently large gain can be obtained over a wide wavelength range, Sometimes there are sufficiently large absorption losses.

く実 施 例〉 以下本発明の実施例を図面に基づき詳細に説明する。Practical example Embodiments of the present invention will be described in detail below based on the drawings.

本実施例に係る光スィッチは外形的には第1図に示す光
スィッチと同じであるが、その活性層4は、バンドギャ
ップエネルギ波長λg = 1.55 μm、井戸層幅
40nm、P型バックグラウンドキャリア濃度= 4 
X 10 ”am−3の第1の量子井戸層と、パックギ
ャップエネルギ波長λg = 1.33 μm、井戸層
幅W=10nm。
The optical switch according to this embodiment is externally the same as the optical switch shown in FIG. Ground carrier concentration = 4
A first quantum well layer of X 10 "am-3, pack gap energy wavelength λg = 1.33 μm, and well layer width W = 10 nm.

P型バックグラウンドキャリア濃度=4 XIO”am
−3の第2の量子井戸層とを有し、これら第1及び第2
の井戸層の暦数比が1:2.5で注入少数キャリア濃度
n == 4. OX 10 ′8am−3としである
P-type background carrier concentration = 4 XIO”am
-3 second quantum well layers;
The almanac ratio of the well layer is 1:2.5 and the injected minority carrier concentration n == 4. OX 10'8 am-3.

第2図は本実施例に係る複合化量子井戸構造を持った光
スィッチに対して計算した出力−波長特性を示したもの
である。計算は密度行列解析で、重い正孔と軽い正孔の
両者を考慮したものである。
FIG. 2 shows the output-wavelength characteristics calculated for the optical switch having a composite quantum well structure according to this embodiment. The calculation is a density matrix analysis that takes into account both heavy holes and light holes.

また、同図中の破線の特性は、活性層4が量子井戸構造
でない通常のDH構造の場合について同様の特性を併せ
て示したものである。
Further, the characteristics indicated by the broken line in the same figure also show similar characteristics in the case where the active layer 4 has a normal DH structure that is not a quantum well structure.

同図から明らかなようにn = 4. OX 10 ”
cm−’以下の少ない注入キャリア濃度で、1.3μm
から1.55μmまでの波長域で25dB以上の利得が
得られている。またオフ時の吸収は1.55μmの波長
で30 dB以上の吸収損失となっているため、アイソ
レージ璽ン特性としては1.3μmから1.55μmま
で55 dB以上の良好な特性が得られる。
As is clear from the figure, n = 4. OX10”
1.3 μm with low injection carrier concentration below cm-'
A gain of 25 dB or more was obtained in the wavelength range from 1.55 μm to 1.55 μm. In addition, since the absorption loss in the off state is 30 dB or more at a wavelength of 1.55 μm, good isolation characteristics of 55 dB or more can be obtained from 1.3 μm to 1.55 μm.

一方通常のDH構造の光スィッチでは、吸収特性は同等
のものが得られるが、利得に関してはこの少数キャリア
濃度では同等のレベルは得られない。そうだからといっ
て注入少数キャリア濃度を増加させても熱による利得の
飽和、非発光再結合過程の増加等によって利得の増加は
困難なため通常の構造の活性層4では広帯域化は難かし
い。
On the other hand, with an optical switch having a normal DH structure, the same absorption characteristics can be obtained, but the same level of gain cannot be obtained with this minority carrier concentration. However, even if the concentration of injected minority carriers is increased, it is difficult to increase the gain due to gain saturation due to heat, increase in non-radiative recombination processes, etc., and therefore it is difficult to widen the band with the active layer 4 having a normal structure.

なお本実施例の光スィッチを多段に組み合わせて集積型
光マトリクススイッチを構成すると広帯域な光マトリク
ススイッチが構成できることは言うまでもない。
It goes without saying that a wideband optical matrix switch can be constructed by combining the optical switches of this embodiment in multiple stages to construct an integrated optical matrix switch.

〈発明の効果〉 以上実施例とともに具体的に説明したようjコ、本発明
によれば広い波長域に亘って充分大きな利得を得ること
ができるとともにオフ時には充分大きな吸収損失を得る
ことができるので、超広帯域光スィッチとして波長多重
伝送方式への適用も可能となる。また、小型で高速な集
積型光スイッチ網を構成することができるとともに、波
長多重伝送方式に光アンプ兼光スイッチとして使用する
ことも可能である。
<Effects of the Invention> As described above in detail with the embodiments, according to the present invention, it is possible to obtain a sufficiently large gain over a wide wavelength range, and also to obtain a sufficiently large absorption loss during off-time. , it can also be applied to wavelength division multiplexing transmission systems as an ultra-wideband optical switch. Furthermore, it is possible to construct a compact and high-speed integrated optical switch network, and it is also possible to use it as an optical amplifier and optical switch in a wavelength division multiplexing transmission system.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はPN接合を有する光スィッチの一般的な構造を
概念的に示す説明図、第2図は本発明の実施例に係る光
スィッチの出力−波長特性を示すグラフ、第3図は従来
技術に係る光スィッチの出力−波長特性を示すグラフ、
第4図は量子井戸構造を有する活性層をもった半導体レ
ーザの出力−波長特性を示すグラフである。 図面中、 1は入力用光導波路、 2は出力用光導波路、 3はP型クラッド、 4は活性層、 5はN型クラッド、 6は反射防止膜である。
Fig. 1 is an explanatory diagram conceptually showing the general structure of an optical switch having a PN junction, Fig. 2 is a graph showing the output-wavelength characteristics of an optical switch according to an embodiment of the present invention, and Fig. 3 is a conventional diagram. A graph showing the output-wavelength characteristics of an optical switch related to the technology,
FIG. 4 is a graph showing the output-wavelength characteristics of a semiconductor laser having an active layer having a quantum well structure. In the drawings, 1 is an input optical waveguide, 2 is an output optical waveguide, 3 is a P-type cladding, 4 is an active layer, 5 is an N-type cladding, and 6 is an antireflection film.

Claims (1)

【特許請求の範囲】[Claims] P型及びN型半導体にはさまれた活性層を、複数種類の
複合化された量子井戸構造の半導体で構成し、活性層に
注入される光信号の増幅、吸収を、活性層に注入する少
数キャリアで制御するようにしたことを特徴とする光ス
イッチ。
The active layer sandwiched between P-type and N-type semiconductors is composed of multiple types of composite quantum well structure semiconductors, and the amplification and absorption of optical signals injected into the active layer are injected into the active layer. An optical switch characterized by being controlled by minority carriers.
JP26935788A 1988-10-27 1988-10-27 Optical switch Pending JPH02116820A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26935788A JPH02116820A (en) 1988-10-27 1988-10-27 Optical switch

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26935788A JPH02116820A (en) 1988-10-27 1988-10-27 Optical switch

Publications (1)

Publication Number Publication Date
JPH02116820A true JPH02116820A (en) 1990-05-01

Family

ID=17471254

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26935788A Pending JPH02116820A (en) 1988-10-27 1988-10-27 Optical switch

Country Status (1)

Country Link
JP (1) JPH02116820A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59104191A (en) * 1982-12-07 1984-06-15 Fujitsu Ltd Semiconductor light emitting device
JPS6045087A (en) * 1983-08-22 1985-03-11 Mitsubishi Electric Corp Semiconductor laser device
JPS6371826A (en) * 1986-09-16 1988-04-01 Hitachi Ltd Optical semiconductor device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59104191A (en) * 1982-12-07 1984-06-15 Fujitsu Ltd Semiconductor light emitting device
JPS6045087A (en) * 1983-08-22 1985-03-11 Mitsubishi Electric Corp Semiconductor laser device
JPS6371826A (en) * 1986-09-16 1988-04-01 Hitachi Ltd Optical semiconductor device

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