JPH0211896B2 - - Google Patents

Info

Publication number
JPH0211896B2
JPH0211896B2 JP55058089A JP5808980A JPH0211896B2 JP H0211896 B2 JPH0211896 B2 JP H0211896B2 JP 55058089 A JP55058089 A JP 55058089A JP 5808980 A JP5808980 A JP 5808980A JP H0211896 B2 JPH0211896 B2 JP H0211896B2
Authority
JP
Japan
Prior art keywords
photosensitive resin
layer
resin layer
light
image forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP55058089A
Other languages
Japanese (ja)
Other versions
JPS56154733A (en
Inventor
Takeo Kodaira
Takao Taguchi
Takeo Sugiura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP5808980A priority Critical patent/JPS56154733A/en
Publication of JPS56154733A publication Critical patent/JPS56154733A/en
Publication of JPH0211896B2 publication Critical patent/JPH0211896B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)

Description

【発明の詳細な説明】 本発明は、画像形成材料、特に超硬調の金属画
像の形成が可能な画像形成材料及びそれを用いた
画像形成方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an image forming material, particularly an image forming material capable of forming ultra-high contrast metal images, and an image forming method using the same.

現在、支持体上に遮光金属層及び感光性樹脂層
が順次設けられて成る画像形成材料が、超硬調の
画像が得られかつ画像周辺部にフリンジが発生せ
ず、しかも省銀という社会的背景から、従来の銀
塩リス型感光材料に変わつて注目されている。こ
の画像形成材料は、ガラス板又はプラスチツクフ
イルム等の支持体上に遮光金属層を蒸着等の方法
で形成させ、その上にネガ型の感光性樹脂より成
る層を形成させたものである。このような構成の
画像形成体は、例えばポジ像露光を施すと、感光
性樹脂より成る層の露光部分のみが硬化し、現像
処理により未露光部の感光性樹脂が溶解され、遮
光金属層が露出することになる。そして現像液を
更に作用させると露出した遮光金属層の部分は現
像液中に溶出し、当該部分は透明になり、焼付け
られたポジ像とは逆のネガ像(金属画像)が形成
するようになる。
Currently, image forming materials consisting of a light-shielding metal layer and a photosensitive resin layer sequentially provided on a support are capable of producing ultra-high contrast images, do not cause fringes at the image periphery, and are silver-saving. Since then, it has been attracting attention as an alternative to conventional silver salt lithium-based photosensitive materials. This image-forming material has a light-shielding metal layer formed on a support such as a glass plate or a plastic film by a method such as vapor deposition, and a layer made of a negative photosensitive resin formed thereon. For example, when an image forming body having such a structure is subjected to positive image exposure, only the exposed portion of the layer made of photosensitive resin is cured, and the photosensitive resin in the unexposed portion is dissolved by development processing, and the light-shielding metal layer is cured. It will be exposed. When the developing solution is further applied, the exposed portion of the light-shielding metal layer dissolves into the developing solution and becomes transparent, forming a negative image (metallic image) that is the opposite of the printed positive image. Become.

本発明は上記の如く画像形成材料と同じ構成を
とりながら、ポジ像露光に対してポジ金属画像の
形成が、更にはネガ像露光に対してはネガ金属画
像の形成が可能な、著しく改良された金属画像形
成材料及びそれを用いた金属画像形成方法を提供
することを目的とするものである。即ち本発明
は、支持体上に遮光金属層及び感光性樹脂層が順
次設けられて成る画像形成材料において、該感光
性樹脂層が現像液に対して可溶性のプレポリマー
と現像液に対して難溶性の架橋剤及びその他の各
種助剤とを含有する層であることを特徴とする画
像形成材料及びこの画像形成材料の感光性樹脂層
側から像露光を施して該感光性樹脂層の露光部を
硬化させた後、現像液により該感光性樹脂層の未
露光部は遮光金属層上に付着・形成されている架
橋剤より成るレジスト層を除いて溶解除去し、該
感光性樹脂層の露光硬化部は遮光金属層面から剥
離させ、更にレジスト層で覆われていない遮光金
属層の部分を溶解除去させることを特徴とする画
像形成方法である。
The present invention has the same configuration as the image forming material as described above, but is significantly improved in that it can form a positive metal image in response to positive image exposure, and furthermore, it can form a negative metal image in response to negative image exposure. The object of the present invention is to provide a metal image forming material and a metal image forming method using the same. That is, the present invention provides an image forming material in which a light-shielding metal layer and a photosensitive resin layer are sequentially provided on a support, in which the photosensitive resin layer is composed of a prepolymer that is soluble in a developer, and a prepolymer that is soluble in a developer. An image forming material characterized in that it is a layer containing a soluble crosslinking agent and various other auxiliary agents, and an exposed area of the photosensitive resin layer by imagewise exposure from the photosensitive resin layer side of this image forming material. After curing, the unexposed areas of the photosensitive resin layer are dissolved and removed using a developer, except for the resist layer made of a crosslinking agent that is adhered and formed on the light-shielding metal layer, and the photosensitive resin layer is exposed to light. This image forming method is characterized in that the cured portion is peeled off from the surface of the light-shielding metal layer, and further, the portion of the light-shielding metal layer that is not covered with the resist layer is dissolved and removed.

以下本発明を図面を参照に詳細に説明する。 The present invention will be described in detail below with reference to the drawings.

第1図及び第3図乃至第5図は本発明の説明図
であり、図中10は支持体1上に遮光金属層2及
び感光性樹脂層3が順次設けられて成る本発明に
係る画像形成体である。
1 and 3 to 5 are explanatory diagrams of the present invention, and in the figures, reference numeral 10 denotes an image according to the present invention in which a light-shielding metal layer 2 and a photosensitive resin layer 3 are sequentially provided on a support 1. It is a formation.

支持体1は透明もしくは不透明な素材、例えば
ガラス、プラスチツク、金属及びこれらの複合材
料などから選択でき、それらの形状はフイルム状
または板状のものとすることができる。更にこの
支持体1は、画像形成材料10に画像を形成させ
るために使用する現像液に対して不活性のもので
なければいけない。
The support 1 can be selected from transparent or opaque materials such as glass, plastic, metal, and composite materials thereof, and can be in the form of a film or a plate. Furthermore, the support 1 must be inert to the developer used to form an image on the imaging material 10.

支持体1の上には遮光金属層2を形成する。こ
の遮光金属層2は現像液によつて溶解され得る金
属によつて形成される層であり、アルミニウム、
スズ、銅、ニツケル、亜沿等の金属を100〜500Å
程度の厚さで、真空蒸着法、電気泳動法、スパツ
タリング法等によりピンホール無く設ければよ
い。この厚さは使用する金属によつても異なるが
透過濃度で3.0以上になるような厚さが望ましい。
A light-shielding metal layer 2 is formed on the support 1 . This light-shielding metal layer 2 is a layer formed of a metal that can be dissolved by a developer, and includes aluminum,
Metals such as tin, copper, nickel, and aluminum with a thickness of 100 to 500Å
It is sufficient to provide the film with a certain thickness without pinholes by a vacuum evaporation method, an electrophoresis method, a sputtering method, or the like. This thickness varies depending on the metal used, but it is desirable to have a thickness that provides a transmission density of 3.0 or more.

この遮光金属層2上にはネガ型感光性樹脂によ
り感光性樹脂層3を形成する。
A photosensitive resin layer 3 is formed on the light-shielding metal layer 2 using a negative type photosensitive resin.

ネガ型感光性樹脂としては、プレポリマーに架
橋剤やその他の各種助剤を組合わせたものが挙げ
られる。従来のこの種のネガ型感光性樹脂より成
る感光性樹脂層3′を有する画像形成材料10′
は、第2図aに示すように、フイルム原稿8を通
して像露光を施すと感光性樹脂層3′の露光該当
部4は架橋剤によりプレポリマーどうしが架橋
し、三次元構造を作り、現像液に対して不溶とな
り、未露光部分は架橋を起さず、プレポリマーや
架橋剤等は現像液に溶解するようになる。従つ
て、更に現像液を作用させると第2図bの如く遮
光金属層2の部分も溶解し、像5が形成される。
この像5は、露光時にネガ像露光を施せばポジ像
となり、ポジ像露光であればネガ像となる。
Examples of negative photosensitive resins include those obtained by combining a prepolymer with a crosslinking agent and various other auxiliary agents. Image forming material 10' having a photosensitive resin layer 3' made of a conventional negative photosensitive resin of this type
As shown in FIG. 2a, when image exposure is applied through the film original 8, the prepolymers in the exposed area 4 of the photosensitive resin layer 3' are crosslinked with each other by the crosslinking agent, creating a three-dimensional structure, and the developing solution The unexposed areas do not undergo crosslinking, and the prepolymer, crosslinking agent, etc. become soluble in the developer. Therefore, when the developer is further applied, the light-shielding metal layer 2 is also dissolved, and an image 5 is formed as shown in FIG. 2b.
This image 5 becomes a positive image if negative image exposure is performed during exposure, and becomes a negative image if positive image exposure is performed.

本発明においては、感光性樹脂層3を形成する
感光性樹脂中のプレポリマーとして現像液に対し
て可溶性のものを、更に架橋剤としては現像液に
対して難溶性のものを選択する。
In the present invention, the prepolymer in the photosensitive resin forming the photosensitive resin layer 3 is selected to be soluble in the developer, and the crosslinking agent is selected to be slightly soluble in the developer.

具体的には、プレポリマーとしてはスチレンビ
ニル安息香酸共重合物、ビニルトルエンイタコン
酸共重合物、ビニルトルエンイタコン酸プレポリ
マー、ビニルトルエン無水マレイン酸共重合物、
スチレンマレイン酸モノブチルエステル共重合物
等、架橋剤としては、トリメチロールプロパント
リアクリレート、ジペンタエリスリトールヘキサ
アクリレート、ペンタエリスリトールジアクリレ
ート等が挙げられる。
Specifically, the prepolymers include styrene vinyl benzoic acid copolymer, vinyl toluene itaconic acid copolymer, vinyl toluene itaconic acid prepolymer, vinyl toluene maleic anhydride copolymer,
Examples of crosslinking agents such as styrene maleic acid monobutyl ester copolymer include trimethylolpropane triacrylate, dipentaerythritol hexaacrylate, and pentaerythritol diacrylate.

このように現像液に対して溶解性の悪い架橋剤
を用いると、第3図に示すように未露光部の遮光
金属層2上に付着・形成されている架橋剤より成
るレジスト層6だけが残され、他の架橋剤やプレ
ポリマー、更には開始剤、増感剤、現像促進剤、
接着性改良剤等の各種助剤等は現像液中に溶解
し、更に現像を進めると、第4図に示すように硬
化した感光性樹脂層の部分は架橋されているため
現像液には溶解せず、皮膜状態のまま現像液中に
浮遊する。露光部分の皮膜が剥離すると、当該部
分の遮光金属層は露出された状態になり、金属部
分が現像液中に溶出される。非露光部分には架橋
剤より成るレジスト層6が残つているため、現像
液に対してレジスト作用を示し、その下の遮光金
属層2は現像液中に溶出せず、第5図に示すよう
に金属画像7が形成されるようになる。感光性樹
脂層3を構成する感光性樹脂の酸素依存性が高い
場合には必要に応じてオーバーコート層を、
PVA水溶液、ポリビニルピロリドン等により形
成しておいてもよい。
When a cross-linking agent with poor solubility in the developer is used in this way, only the resist layer 6 made of the cross-linking agent adhered and formed on the light-shielding metal layer 2 in the unexposed area is exposed, as shown in FIG. Other crosslinking agents and prepolymers, as well as initiators, sensitizers, development accelerators,
Various auxiliary agents such as adhesion improvers are dissolved in the developer, and when development is further progressed, as shown in Figure 4, the cured photosensitive resin layer is crosslinked and is therefore dissolved in the developer. Instead, it floats in the developer solution as a film. When the film in the exposed area is peeled off, the light-shielding metal layer in that area is exposed, and the metal part is eluted into the developer. Since the resist layer 6 made of a crosslinking agent remains in the non-exposed area, it acts as a resist to the developer, and the light-shielding metal layer 2 underneath does not dissolve into the developer, as shown in FIG. A metal image 7 is now formed. If the photosensitive resin constituting the photosensitive resin layer 3 has high oxygen dependence, an overcoat layer may be added as necessary.
It may also be formed from a PVA aqueous solution, polyvinylpyrrolidone, or the like.

本発明による画像形成材料及び画像形成方法に
よれば、ネガ型感光性樹脂の使用にかかわらずポ
ジ−ポジ型の画像形成材料及び画像形成方法が提
供できるものであり、しかも得られる画像は遮光
金属層による画像であるため必要な透過濃度を十
分に確保することができ、更には画質を超硬調な
ものとすることができるものである。
According to the image forming material and image forming method according to the present invention, a positive-positive type image forming material and image forming method can be provided regardless of the use of a negative photosensitive resin, and furthermore, the obtained image can be obtained using a light-shielding metal. Since it is a layered image, it is possible to sufficiently secure the necessary transmission density, and furthermore, it is possible to make the image quality extremely high contrast.

以下本発明の実施例を説明する。 Examples of the present invention will be described below.

<実施例> 東レ(株)製、銀ルミラー(支持体の厚さ75μ、ア
ルミニウム蒸着層の厚さ500Å)上に、ビニルト
ルエン無水マレイン酸プレポリマー5gとトリメ
チロールプロパントリアクリレート(架橋剤)5
gとベンジルメチルケタール(重合開始剤)0.25
gとをメチルセロソルブ90gに溶解して得られる
感光性樹脂を回転塗布機(100rpm)で塗布して
感光性樹脂層を形成した。更にその上にPVA水
溶液を塗布してオーバーコート層を形成後、60℃
で30分間乾燥させ、本発明の画像形成材料を得
た。感光性樹脂層とオーバーコート層の厚さはそ
れぞれ0.7μと0.5μであつた。次にポジフイルム原
稿を画像形成材料のオーバーコート層面に密着さ
せ、2Kwの水銀灯で30秒間露光し、その後30℃
1%NaOHの現像液中に浸漬し、振盪した。感
光性樹脂層の非露光部は、現像開示後1分で遮光
金属層(アルミニウム蒸着層)面に付着している
架橋剤(トリメチロールプロパントリアクリレー
ト)より成るレジスト層は残し、他の部分は現像
液中に溶解した。更に現像を進めると感光性樹脂
層の硬化部(露光該当部)が遮光金属層の部分か
ら剥離し、2分後には剥膜して露出したアルミニ
ウム蒸着層(遮光金属層)が溶解し始め、3分す
ると透明な支持体上に金属ポジ画像を得ることが
できた。
<Example> 5 g of vinyltoluene maleic anhydride prepolymer and 5 g of trimethylolpropane triacrylate (crosslinking agent) were placed on a silver Lumirror manufactured by Toray Industries, Inc. (support thickness 75 μm, aluminum vapor deposition layer thickness 500 Å).
g and benzyl methyl ketal (polymerization initiator) 0.25
A photosensitive resin layer was formed by dissolving 90 g of methyl cellosolve in 90 g of methyl cellosolve and coating the resulting photosensitive resin with a spin coater (100 rpm). Furthermore, after forming an overcoat layer by applying a PVA aqueous solution on top of it, it was heated to 60℃.
The image forming material of the present invention was obtained by drying for 30 minutes. The thicknesses of the photosensitive resin layer and overcoat layer were 0.7μ and 0.5μ, respectively. Next, the positive film original was brought into close contact with the overcoat layer surface of the image forming material, exposed for 30 seconds to a 2Kw mercury lamp, and then heated to 30°C.
It was immersed in a developer solution of 1% NaOH and shaken. In the non-exposed areas of the photosensitive resin layer, the resist layer made of the crosslinking agent (trimethylolpropane triacrylate) attached to the surface of the light-shielding metal layer (aluminum evaporated layer) is left in place one minute after development starts, and the other areas are removed. Dissolved in developer. As the development progresses further, the cured part of the photosensitive resin layer (the exposed part) peels off from the light-shielding metal layer, and after 2 minutes, the aluminum vapor deposited layer (light-shielding metal layer) that was peeled off and exposed begins to dissolve. After 3 minutes, a metal positive image could be obtained on the transparent support.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の画像形成材料の概略構成図、
第2図は従来の画像形成材料を使用した画像形成
方法の説明図、第3図乃至第5図は本発明の画像
形成方法の説明図をそれぞれ示す。 1…支持体、2…遮光金属層、3…感光性樹脂
層、6…レジスト層、7…金属画像層、10…画
像形成材料。
FIG. 1 is a schematic diagram of the image forming material of the present invention;
FIG. 2 is an explanatory diagram of an image forming method using a conventional image forming material, and FIGS. 3 to 5 are explanatory diagrams of an image forming method of the present invention. DESCRIPTION OF SYMBOLS 1... Support, 2... Light-shielding metal layer, 3... Photosensitive resin layer, 6... Resist layer, 7... Metal image layer, 10... Image forming material.

Claims (1)

【特許請求の範囲】[Claims] 1 支持体上に遮光金属層及び感光性樹脂層が順
次設けられている画像形成材料であつて、該感光
性樹脂層がアルカリ性現像液に対して可溶性のプ
レポリマーと現像液に対して難溶性のトリメチロ
ールプロパントリアクリレート、ジペンタエリス
リトールヘキサアクリレート、ペンタエリスリト
ールジアクリレートから選択された一種の架橋剤
及び各種助剤とを含有する層である画像形成材料
の感光性樹脂層側から像露光を施して該感光性樹
脂層の露光部を硬化させた後、アルカリ性現像液
により該感光性樹脂層の未露光部は遮光金属層上
に付着・形成されている前記架橋剤より成るレジ
スト層を除いて溶解し、該感光性樹脂層の露光硬
化部は遮光金属層面から剥離させ、更にレジスト
層に覆われていない遮光金属層の部分を溶解除去
させることを特徴とする画像形成方法。
1 An image forming material in which a light-shielding metal layer and a photosensitive resin layer are sequentially provided on a support, and the photosensitive resin layer is composed of a prepolymer that is soluble in an alkaline developer and a prepolymer that is sparingly soluble in the developer. Images are exposed from the photosensitive resin layer side of the image forming material, which is a layer containing a crosslinking agent selected from trimethylolpropane triacrylate, dipentaerythritol hexaacrylate, and pentaerythritol diacrylate and various auxiliary agents. After curing the exposed areas of the photosensitive resin layer, an alkaline developer is used to cure the unexposed areas of the photosensitive resin layer, except for the resist layer made of the crosslinking agent that is adhered and formed on the light-shielding metal layer. An image forming method comprising dissolving the photosensitive resin layer, peeling the exposed and hardened portion of the photosensitive resin layer from the surface of the light-shielding metal layer, and further dissolving and removing the portion of the light-shielding metal layer that is not covered with the resist layer.
JP5808980A 1980-04-30 1980-04-30 Image forming material and formation of image using it Granted JPS56154733A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5808980A JPS56154733A (en) 1980-04-30 1980-04-30 Image forming material and formation of image using it

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5808980A JPS56154733A (en) 1980-04-30 1980-04-30 Image forming material and formation of image using it

Publications (2)

Publication Number Publication Date
JPS56154733A JPS56154733A (en) 1981-11-30
JPH0211896B2 true JPH0211896B2 (en) 1990-03-16

Family

ID=13074206

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5808980A Granted JPS56154733A (en) 1980-04-30 1980-04-30 Image forming material and formation of image using it

Country Status (1)

Country Link
JP (1) JPS56154733A (en)

Also Published As

Publication number Publication date
JPS56154733A (en) 1981-11-30

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