JPH02123776A - Solid laser device - Google Patents

Solid laser device

Info

Publication number
JPH02123776A
JPH02123776A JP27832888A JP27832888A JPH02123776A JP H02123776 A JPH02123776 A JP H02123776A JP 27832888 A JP27832888 A JP 27832888A JP 27832888 A JP27832888 A JP 27832888A JP H02123776 A JPH02123776 A JP H02123776A
Authority
JP
Japan
Prior art keywords
wavelength
laser
light
conversion means
active substance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP27832888A
Other languages
Japanese (ja)
Other versions
JPH0821743B2 (en
Inventor
Ryohei Tanuma
良平 田沼
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP27832888A priority Critical patent/JPH0821743B2/en
Publication of JPH02123776A publication Critical patent/JPH02123776A/en
Publication of JPH0821743B2 publication Critical patent/JPH0821743B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/091Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H01S3/0915Processes or apparatus for excitation, e.g. pumping using optical pumping by incoherent light
    • H01S3/092Processes or apparatus for excitation, e.g. pumping using optical pumping by incoherent light of flash lamp
    • H01S3/093Processes or apparatus for excitation, e.g. pumping using optical pumping by incoherent light of flash lamp focusing or directing the excitation energy into the active medium
    • H01S3/0931Imaging pump cavity, e.g. elliptical
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06Construction or shape of active medium
    • H01S3/0602Crystal lasers or glass lasers
    • H01S3/0606Crystal lasers or glass lasers with polygonal cross-section, e.g. slab, prism
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08Construction or shape of optical resonators or components thereof
    • H01S3/08095Zig-zag travelling beam through the active medium

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)

Abstract

PURPOSE:To improve the efficiency of optical pumping, and to increase an output by applying irradiation light to an optical conversion means composed of a semiconductor, generating fluorescence and optically pumping a laser active substance in a laser medium by the fluorescence. CONSTITUTION:An optical conversion means 10 consisting of a semiconductor absorbing irradiation light 1R and generating fluorescence having a wavelength proper to the optical pumping of a laser active substance is provided, and irradiation light 1R is applied to the optical conversion means 10 and the laser active substance in a laser medium 1 is optically pumped while using fluorescence generated from the optical conversion means 10 as excitation light EL. Not only a wavelength component within a wavelength range having the excellent efficiency of the optical pumping of the laser active substance in irradiation light but also a wavelength component within a wavelength range shorter than the wavelength component are absorbed by previously conforming the wavelength of fluorescence emitted from the optical conversion means 10 within the wavelength range having the excellent efficiency of the optical pumping of the laser active substance, and the wavelength, component which has not been used is utilized effectively for optically pumping the laser active substance. Accordingly, the efficiency of optical pumping is improved, and a large output can be acquired.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は遷移金属イオンや希土類元素イオンをドープし
たYAGやガラス等を固体レーザ媒質として用い、光励
起によりレーザ発光させる固体レーザ装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a solid-state laser device that uses YAG, glass, or the like doped with transition metal ions or rare earth element ions as a solid-state laser medium, and emits laser light through optical excitation.

〔従来の技術〕[Conventional technology]

よく知られているように、固体レーザ装置ではY A 
G  (YJfsO+x)、G G G (GdsGa
sOtt)+ G S G G(GdsGasOtt)
等の光学結晶やガラスの母材にCS’等の遷移金属イオ
ンやNd ”等の希土類元素イオンをレーザ活性物質と
して含ませたものがレーザ媒質として用いられ、それ用
の励起光としては従来からタングステンハロゲンランプ
やクリプトン放電灯等の励起光源からの光、場合によっ
ては太陽光が用いられる。レーザ媒質の形状はふつうロ
ッド状であるが、最近では大出力用にいわゆるスラブ形
のものも用いられるようになって来た。第5図は、よく
知られていることであるが、ロッド状のYAGをレーザ
媒質を用いた従来の固体レーザ装置の原理構成を示すも
のである。
As is well known, in solid-state laser devices, YA
G (YJfsO+x), G G G (GdsGa
sOtt) + G S G G (GdsGasOtt)
An optical crystal or glass base material containing transition metal ions such as CS' or rare earth element ions such as Nd'' as a laser active substance is used as a laser medium, and excitation light for this has conventionally been used as a laser medium. Light from an excitation light source such as a tungsten halogen lamp or krypton discharge lamp, or in some cases sunlight, is used.The shape of the laser medium is usually rod-shaped, but recently, so-called slab-shaped ones are also used for high output. As is well known, FIG. 5 shows the basic structure of a conventional solid-state laser device using rod-shaped YAG as a laser medium.

第5図(a)に示すように、ロッド状のレーザ媒質1の
各端面に対問して部分反射鏡2および全反射鏡3が配置
され、レーザ媒質lとともにレーザ共振系が構成され、
部分反射鏡2側からレーザ光LLの出力が取り出される
。励起光EL用の光源4は例えばクリプトン放電灯であ
って、閉鎖容器5内にレーザ媒質lと対向して配置され
、出入口5aを介して閉鎖容器5内に通流される冷却媒
体CMによってレーザ媒質1および励起光源4が強力に
冷却される。同図(b)に示すように、閉鎖容器5は両
端が閉鎖された楕円筒状でその内面は鏡面仕上げされて
おり、楕円の一方の焦点に配置された励起光源4からの
励起光ELが他方の焦点に配置されたレーザ媒t1に集
められる。
As shown in FIG. 5(a), a partial reflection mirror 2 and a total reflection mirror 3 are arranged opposite to each end face of a rod-shaped laser medium 1, and together with the laser medium 1, a laser resonant system is constructed.
The output of the laser beam LL is extracted from the partial reflecting mirror 2 side. The light source 4 for the excitation light EL is, for example, a krypton discharge lamp, and is disposed in a closed container 5 facing the laser medium 1, and the laser medium is heated by a cooling medium CM flowing into the closed container 5 through an inlet/outlet 5a. 1 and excitation light source 4 are strongly cooled. As shown in Figure (b), the closed container 5 has an elliptical cylinder shape with both ends closed, and its inner surface is mirror-finished, and the excitation light EL from the excitation light source 4 placed at one focal point of the ellipse is It is focused on the laser medium t1 located at the other focal point.

〔発明が解決しようとする&1IB) ところが一般に光励起の固体レーザでは、レーザ媒質に
与えられた励起光EL中のほんの一部がレーザ活性物質
ないしはイオンの励起に寄与するだけで、その大部分が
熱になって失われてしまうのでエネルギ効率が非常に低
い問題がある。これを第4図を参照して説明する。
[To be solved by the invention &1IB] However, in general, in optically pumped solid-state lasers, only a small part of the excitation light EL given to the laser medium contributes to the excitation of the laser active substance or ions, and most of it contributes to the excitation of the laser active substance or ions. There is a problem that energy efficiency is very low because the energy is lost in the process. This will be explained with reference to FIG.

第4図(alは、Nd ”をレーザ活性イオンとするY
AGレーザ媒質において、励起光がNd”の励起に寄与
する効率ηの相対値と励起光の波長λの相関を示すもの
で、これかられかるように図でAで示された720〜8
20n−の波長範囲で高い励起効率を有する。同図(b
)は励起光源としてのクリプトン放電灯の発光強度Iの
波長特性を示すもので、図かられかるように上述の波長
範囲Aで高い発光強度を有する点は非常に都合がよい、
しかし、励起光源がこれ以外の範囲とくに短波長範囲B
でもかなりの発光強度をもっているのに対し、レーザ媒
質の方はこの波長範囲Bで非常に励起効率が低いので、
全波長範囲で見ると励起光のもつエネルギの僅かに5%
程度しかレーザ活性イオンの励起に貢献しない。
Figure 4 (al is Y with Nd'' as the laser active ion)
In the AG laser medium, this shows the correlation between the relative value of the efficiency η at which the pumping light contributes to the excitation of Nd'' and the wavelength λ of the pumping light.
It has high excitation efficiency in the wavelength range of 20n-. The same figure (b
) shows the wavelength characteristics of the emission intensity I of a krypton discharge lamp as an excitation light source, and as can be seen from the figure, it is very convenient that it has a high emission intensity in the wavelength range A mentioned above.
However, if the excitation light source is in a range other than this, especially in the short wavelength range B
However, while it has a considerable emission intensity, the excitation efficiency of the laser medium is extremely low in this wavelength range B, so
When viewed over the entire wavelength range, it is only 5% of the energy of the excitation light.
The laser contributes only to a limited extent to the excitation of active ions.

このように光励起の効率が5%程度で、残りの9596
はレーザ媒質内ですべて熱に変換されてしまうので、固
体レーザはそのレーザ媒質の密度従っ”CレーlJ′活
性・イオンの密度が高くて、元来はずっと大レーザ出力
を取り出せるはずのものが、実際には熱的に制約されて
充分に高出力運転ができない問題がある。
In this way, the efficiency of optical excitation is about 5%, and the remaining 9596
is all converted into heat within the laser medium, so solid-state lasers have a high density of active ions, which is due to the density of the laser medium. In reality, however, there is a problem in that it is not possible to operate at a sufficiently high output due to thermal constraints.

光励起効率の向上の観点から、最近に至り励起光源とし
て半導体レーザを用いる固体レーザ装置が注目されてい
るaAflGaAs系の半導体し・−1J′ではよく知
られているようにAIとGaの組成比を変えることによ
りその発振波長を調整できるので、これを例えばNd”
°の励起効率のピークがある810n−付近に合わせる
ことにより、光励起効率を大幅に向上し、かつレーザ媒
質の発熱の問題もほぼ完全になくすことができる。しか
し、周知のように半導体レーザ1個あたりの出力は最大
でもIW程度と低いので、これを多数個差べて励起光源
を構成しても数Wから数十W程度の固体レーザ出力しか
得られず、半導体レーザ励起の固体レーザ装置は小出力
用には適しても、現在ランプ励起で得られている数百W
ないし数に―の高出力レベルまでは届きそうもない。
From the viewpoint of improving optical pumping efficiency, solid-state laser devices that use a semiconductor laser as a pumping light source have recently attracted attention. The oscillation wavelength can be adjusted by changing the wavelength, for example, Nd"
By adjusting the excitation efficiency to around 810n-, where the excitation efficiency peaks at .degree., the optical excitation efficiency can be greatly improved, and the problem of heat generation in the laser medium can be almost completely eliminated. However, as is well known, the maximum output per semiconductor laser is as low as IW, so even if you configure a pumping light source by using a large number of semiconductor lasers, you will only be able to obtain a solid-state laser output of several watts to several tens of watts. Although solid-state laser devices pumped by semiconductor lasers are suitable for low-output applications, the power of several hundred watts currently obtained with lamp pumping is
It is unlikely that it will reach high output levels.

本発明はかかる問題点を解決して、光励起効率が高くか
つ高出力用に適する固体レーザ装置を提供することを目
的とする。
An object of the present invention is to solve these problems and provide a solid-state laser device with high optical pumping efficiency and suitable for high output.

〔課題を解決するための手段〕[Means to solve the problem]

この目的は本発明によれば、固体のレーザ媒質中のレー
ザ活性物質を光励起してレーザ発光させる固体レーザ装
置において、照射光を吸収してレーザ活性@h質の光励
起に適する波長の蛍光を発する半導体からなる光変換手
段を設け、光変換手段に照射光を与えてそれから発せら
れる蛍光を励起光としてレーザ媒質中のレーザ活性物質
を光励起するように構成することによって達成される。
According to the present invention, this purpose is achieved by absorbing irradiated light and emitting fluorescence at a wavelength suitable for optical excitation of laser active materials in a solid-state laser device that optically excites a laser active substance in a solid laser medium to emit laser light. This is achieved by providing a light conversion means made of a semiconductor, applying irradiation light to the light conversion means, and using the fluorescence emitted from the light conversion means as excitation light to optically excite the laser active substance in the laser medium.

上記構成にいう光変換手段はそれが受ける照射光を蛍光
に変換するもので、これに用いる半導体は蛍光の波長な
いし波長ζ囲をレーザ活性物質の光励起効率が高い波長
範囲に容易に合わせ得るものが望ましく、この意味でこ
れに41. Ga、□Asを用い、そのAlの含を率X
によって蛍光の波長を調整できるようにするのが好適で
ある。また、蛍光の波長範囲をレーザ活性物質の光励起
効率のピークに正確に合わせ得るようにできるだけ狭く
する上では、半導体には直接遷移形のエネルギバンド構
造をもつものとするのが望ましく 、AlGaAsはこ
の点でも本発明における光変換手段用の半導体として適
する。このAlGaAsを用いた場合、光変換手段はも
ちろんその単層構成とすることでよいが、場合によりい
わゆるダブルへテロ接合構造をもつ複合層構成するるこ
とができる。
The light conversion means referred to in the above configuration converts the irradiated light that it receives into fluorescence, and the semiconductor used therein is one that can easily adjust the wavelength of the fluorescence or the wavelength range ζ to the wavelength range where the light excitation efficiency of the laser active substance is high. is desirable, and in this sense it is 41. Using Ga and □As, the content of Al is
It is preferable that the wavelength of fluorescence can be adjusted by adjusting the wavelength of the fluorescence. In addition, in order to narrow the wavelength range of fluorescence as much as possible so that it can accurately match the peak of the optical excitation efficiency of the laser active material, it is desirable that the semiconductor has a direct transition type energy band structure, and AlGaAs has this type of energy band structure. In this respect, it is suitable as a semiconductor for the light conversion means in the present invention. When AlGaAs is used, the light conversion means may of course have a single layer structure, but in some cases, it may have a composite layer structure with a so-called double heterojunction structure.

光変換手段の実際の形態としては半導体を薄い層ないし
は膜状に形成するのがよく、これを透明な1対の保持板
例えばガラス板間に挟持させた板状体の形で光変換手段
を構成して、固体レーザ装置内に組み込むのが適切であ
る。
As for the actual form of the light conversion means, it is preferable to form a semiconductor in the form of a thin layer or film, and to form the light conversion means in the form of a plate-like body sandwiched between a pair of transparent holding plates, for example, glass plates. It is suitable to configure and incorporate it into a solid-state laser device.

〔作用] よく知られているように半導体はエネルギ準位の低い価
電帯とその上の伝導帯とからなるエネルギバンド構造を
もっており、照射光を受けたとき価電帯内の電子が伝導
帯に励起され、この励起電子が再び価電帯に遷移ないし
は落ち込むときに伝導帯と価電帯との間のエネルギギャ
ップEgで決まる波長λの蛍光を発する。この蛍光の波
長はλ−Eg/ h c       (1)で表され
る。ただしhはブランク定数、Cは光速度とする。また
、この半導体はそれが受ける照射光中の上式の波長λよ
り長い波長成分はほとんど吸収しないが、それ以下の波
長成分は非常によく吸収する。
[Function] As is well known, semiconductors have an energy band structure consisting of a valence band with a low energy level and a conduction band above it, and when exposed to irradiation light, electrons in the valence band move to the conduction band. When the excited electrons transition or fall back into the valence band, they emit fluorescence with a wavelength λ determined by the energy gap Eg between the conduction band and the valence band. The wavelength of this fluorescence is expressed as λ-Eg/h c (1). However, h is a blank constant and C is the speed of light. Furthermore, this semiconductor hardly absorbs wavelength components longer than the wavelength λ in the above equation in the irradiation light it receives, but it absorbs wavelength components shorter than that very well.

本発明はこの原理を利用したもので、例えば前記した第
4図(b)の光源の発光強度分布について説明すると、
上述の半導体を用いた光変換手段が発する蛍光の波長λ
をレーザ活性物質の光励起効率のよい波長範囲A内に合
わせて置くことにより、この光源から光変換手段が受け
る照射光中のこの範囲A内の波長成分はもちろんそれよ
り波長の短い範囲B内の波長成分も吸収させ、波長範囲
A内の蛍光に変換してレーザ媒質に励起光として与える
ことにより、いままで利用されていなかった波長範囲B
内の波長成分をレーザ活性物質の光励起に有効利用する
ものである。
The present invention utilizes this principle, and for example, to explain the emission intensity distribution of the light source shown in FIG. 4(b),
The wavelength λ of the fluorescence emitted by the light conversion means using the semiconductor described above
By aligning the wavelength component within the wavelength range A where the optical excitation efficiency of the laser active substance is high, the wavelength components within this range A of the irradiation light received by the light conversion means from this light source as well as the wavelength components within the shorter wavelength range B are included. By absorbing the wavelength component, converting it to fluorescence within wavelength range A, and applying it to the laser medium as excitation light, wavelength range B, which has not been used until now, can be generated.
The wavelength components within the wavelength range are effectively used for optical excitation of a laser active substance.

なお、上述の半導体のエネルギバンド構造をより詳細に
電子の連動量ないしは波数ベクトルについて見ると、価
電帯は上方に凸な、伝導帯は下方に凸なバンド形状をそ
れぞれもつが、いわゆる直接遷移形の半導体では価電帯
の頂上と伝導帯の底とがほぼ一致するバンド構造をもっ
ている。この場合、照射光によって価電帯から伝導播に
励起された電子は、ごく短い緩和時間内でその運動量を
緩和して伝導帯の底に落ち込み、そこから価電帯の頂上
に遷移して蛍光を発生させる。直接遷移形の半導体では
、この遷移時に電子の連動量変化がほとんどないから、
間接i!!移形に比べて蛍光発生の量子効率が高くほぼ
100%であり、かつ蛍光の波長範囲も狭いので、本発
明にとって非常に有利な利点を有することになる。
If we look at the energy band structure of the semiconductor described above in more detail in terms of the amount of interlocking electrons or the wave number vector, we can see that the valence band has an upwardly convex band shape, and the conduction band has a downwardly convex band shape, but they are not directly transitioned. A type of semiconductor has a band structure in which the top of the valence band and the bottom of the conduction band almost coincide. In this case, the electrons excited by the irradiation light from the valence band to conduction dispersion relax their momentum within a very short relaxation time and fall to the bottom of the conduction band, and from there they transition to the top of the valence band and fluoresce. to occur. In direct transition type semiconductors, there is almost no change in the amount of interlocking electrons during this transition, so
Indirect i! ! The quantum efficiency of fluorescence generation is high, almost 100%, compared to the shape transfer, and the wavelength range of the fluorescence is also narrow, so this has very advantageous advantages for the present invention.

前述のAIGαAsはそのAtとGoとの成分比を選択
することにより、レーザ活性物質の光励起効率が高い波
長範囲の蛍光を発生させることができ、かつこの成分範
囲内で直接遷移形のエネルギバンド構造をもっている。
By selecting the component ratio of At and Go, the aforementioned AIGαAs can generate fluorescence in a wavelength range where the optical excitation efficiency of the laser active substance is high, and has a direct transition type energy band structure within this component range. have.

〔実施例〕〔Example〕

以下、図を参照しながら本発明の詳細な説明する。第1
図は前の第5図に対応して本発明による固体レーザ装置
の概要構成を例示するもので、対応部分には同じ符号が
付けられている。以下において、前と重複する部分の説
明は一切省略するものとする。
Hereinafter, the present invention will be described in detail with reference to the drawings. 1st
This figure corresponds to the previous FIG. 5 and illustrates the general configuration of a solid-state laser device according to the present invention, and corresponding parts are given the same reference numerals. In the following, explanations of parts that overlap with the previous ones will be omitted.

第1図に示された実施例では、レーザ媒質1は大出力の
固体レーザ装置に適するいわゆるスラブ形であって、同
図(b)の断面かられかるようにやや偏平な方形断面を
もつ板状体に形成され、その材質としては例えばNd 
”ドープのYAGが用いられる。前述のように、このレ
ーザ媒質は第4図(a)に示す波長特性の光励起効率η
を有する。
In the embodiment shown in FIG. 1, the laser medium 1 is a so-called slab-shaped plate suitable for a high-output solid-state laser device, and has a slightly flat rectangular cross section as seen from the cross section in FIG. 1(b). The material is, for example, Nd.
"Doped YAG is used. As mentioned above, this laser medium has a wavelength characteristic of optical excitation efficiency η shown in FIG. 4(a).
has.

かかるスラブ形のレーザ媒質1を用いる固体レーザ装置
では、同図(a)に示されたようにレーザ媒t1の1対
の斜端面Laから出入するレーザ光LLはその内部で図
の上下の1対の板面により全反射されながらジグザグ状
に進行し、これによって、レーザ媒ft1のもついわゆ
る熱レンズ効果が減少される。さらに、同図(ロ)に示
すように、レーザ媒質1の図の左右の側面には熱絶縁1
bが施され、その断面の左右方向の温度勾配をなくして
熱レンズ効果を−N減少させるようになっている。
In a solid-state laser device using such a slab-shaped laser medium 1, as shown in FIG. The laser beam travels in a zigzag pattern while being totally reflected by the pair of plate surfaces, thereby reducing the so-called thermal lens effect of the laser medium ft1. Furthermore, as shown in FIG.
b is applied to eliminate the temperature gradient in the left-right direction of the cross section and reduce the thermal lens effect by -N.

このスラブ形のレーザ媒質1にその1対の板面側から励
起光ELを与えるため、この実施例ではその上下に本発
明による光変換手段lOがそれぞれ図示のように設けら
れ、この例では光変換手段10はAtGaASの薄い層
ないしは膜を1対のガラス板間に挟持した板状体に形成
され、適宜な手段で閉鎖容器5の第1図(a)の左右の
側壁に固定される。この1対の光変換手段10に照射光
IRをそれぞれ与えるため、それらに対応してこの例で
は照射光源6が閉鎖容器5の上下部分にそれぞれ配置さ
れ、閉鎖容器5内に通流される冷却媒体CMによって冷
却される。この照射光源6としては、種々の高出力の放
電灯や白熱灯のほか前述のように太陽光を利用すること
もできるが、この実施例では第4図0))の波長特性の
発光強度Iの分布をもつクリプトン放電灯が用いられる
ものとする。
In order to apply excitation light EL to this slab-shaped laser medium 1 from the pair of plate surfaces, in this embodiment, light conversion means 1O according to the present invention are provided above and below, respectively, as shown in the figure. The converting means 10 is formed into a plate-like body in which a thin layer or film of AtGaAS is sandwiched between a pair of glass plates, and is fixed to the left and right side walls of the closed container 5 in FIG. 1(a) by appropriate means. In order to provide the irradiation light IR to the pair of light conversion means 10, in this example, irradiation light sources 6 are respectively disposed in the upper and lower parts of the closed container 5, and a cooling medium is passed through the closed container 5. Cooled by CM. As this irradiation light source 6, in addition to various high-output discharge lamps and incandescent lamps, sunlight can also be used as described above, but in this embodiment, the emission intensity I of the wavelength characteristic shown in Fig. 4 0)) can be used. Assume that a krypton discharge lamp with a distribution of is used.

さて、第4図(a)の光励起効率ηをもつレーザ媒質1
に対しては、図の範囲A内の波長とくに光励起効率lの
最大ピークがある810n園の波長をもつ蛍光を発する
光変換手段10が有利であるから、光変換手段10用の
半導体としてのAlGaAs中のAIとGaの組成比を
これに適合させるように選択する。いまAIの成分比を
Xとすると、AらGa、l1As半導体のエネルギギャ
ップI!、は次式で表される。
Now, the laser medium 1 with the optical excitation efficiency η shown in FIG. 4(a)
For this reason, it is advantageous to use a light conversion means 10 that emits fluorescence with a wavelength within the range A shown in the figure, especially at a wavelength of 810 nm, where the maximum peak of the light excitation efficiency l occurs. The composition ratio of AI and Ga in the material is selected to match this. Now, if the component ratio of AI is X, then the energy gap I of A, Ga, and I1As semiconductors is I! , is expressed by the following formula.

8g−1,424+ 1.247x (eV)    
 (21前述の(1)式の波長λを81on−とするエ
ネルギギャップEgは1.53eVであるから、これを
上の(2)式に入れるとx−0,086となり、この組
成をAlGaAs半導体に持たせることにより、Nd”
°ドープのYAGを用いたレーザ媒11の最大光励起効
率に適合した波長の蛍光をレーザ媒質10に発生させる
ことができ、かつA1の成分比が低い組成領域のAlG
aAsは前述の直接遷移形半導体である。もっとも、こ
れから発生される蛍光の波長λには実際には若干の温度
依存性があるが、その程度はふつう0.3nm/’(:
であるから、第4図(alの波長範囲の幅の1100n
と比べて蛍光の波長の変化幅は充分小さく実用上あまり
問題はない。
8g-1,424+ 1.247x (eV)
(21 The energy gap Eg when the wavelength λ in equation (1) above is 81on- is 1.53 eV, so if this is inserted into equation (2) above, it becomes x-0,086, and this composition is By holding it, Nd”
AlG in a composition range that can cause the laser medium 10 to generate fluorescence with a wavelength that matches the maximum optical excitation efficiency of the laser medium 11 using doped YAG, and has a low component ratio of A1.
aAs is the aforementioned direct transition type semiconductor. However, the wavelength λ of the fluorescence emitted from this actually has some temperature dependence, but the degree is usually 0.3 nm/' (:
Therefore, in Fig. 4 (1100n of the width of the wavelength range of al
Compared to this, the range of change in fluorescence wavelength is sufficiently small and poses no practical problem.

以上のように構成された本発明による固体レーザ装置で
は、照射光源6からの照射光IR中の第4図(b)の範
囲AおよびB内の波長成分を光変換手段10の半導体が
吸収して、第4図(a)の光励起効率ηの最高ピークに
対応する波長の蛍光に変換してレーザ媒fflに与える
ことができる。光変換手段IOは従来利用できなかった
範囲Bの波長成分をも有効利用し、かつそれをレーザ活
性物質の最高光励起効率に対応する波長の蛍光に変換す
るので、固体レーザ装置の光励起効率を従来よりも格段
に向上することができる0、また、光変換手段10は従
来の半導体レーザと異なり、その全面が照射光IRを励
起光ELとしての蛍光に変換する役目を果たすので、大
きなエネルギの励起光をレーザ媒質lに与えることがで
き、従うで本発明により大出力の固体レーザ装置を提供
することができる。
In the solid-state laser device according to the present invention configured as described above, the semiconductor of the light conversion means 10 absorbs the wavelength components within the ranges A and B in FIG. 4(b) in the irradiation light IR from the irradiation light source 6. Then, the fluorescent light can be converted into fluorescence having a wavelength corresponding to the highest peak of the optical excitation efficiency η shown in FIG. 4(a), and can be applied to the laser medium ffl. The optical conversion means IO effectively utilizes the wavelength component in range B, which could not be used conventionally, and converts it into fluorescence of a wavelength corresponding to the highest optical excitation efficiency of the laser active substance, so that the optical excitation efficiency of the solid-state laser device is lower than that of the conventional one. In addition, unlike a conventional semiconductor laser, the light conversion means 10 has a role of converting the irradiation light IR into fluorescence as the excitation light EL, so it can excite with a large amount of energy. Light can be applied to the laser medium l, and therefore, the present invention can provide a high-output solid-state laser device.

第2図は単層の半導体を用いた光変換手段10の構成例
を示すもので、同図(a)に製作中の状態が同図(ロ)
に完成時の状態がそれぞれ一部拡大断面で示されている
。同図(a)に示すように、まずGaAs基板11上に
上述の組成のAlGaAs層14を例えば液相エピタキ
シャル法により例えば0.3閣の厚みに成長させ、Ga
As基板11の部分を研磨またはエツチング法により除
去した上で所定寸法に形状を整え、同図(b)のように
ガラス等の透明!1lOaO間に並べて挟持させて光変
換手段10を構成する。
FIG. 2 shows an example of the configuration of the light conversion means 10 using a single layer of semiconductor, and FIG.
The completed state is shown in partially enlarged cross-section. As shown in FIG. 2A, first, an AlGaAs layer 14 having the above-mentioned composition is grown on a GaAs substrate 11 to a thickness of, for example, 0.3 cm by, for example, a liquid phase epitaxial method.
After removing a portion of the As substrate 11 by polishing or etching, the shape is adjusted to a predetermined size, and as shown in FIG. The light conversion means 10 is constructed by arranging and sandwiching them between 110aO and 11OaO.

第3図はダブルへテロ接合構造をもつ複合層の半導体を
用いた光変換手段10を第2図と同じ要領で示すもので
ある。同図(alに示すように、GaAs基Fill上
にまずx−0,2の組成をもつAlGaAs層12を液
相エピタキシャル法により厚目に成長させた後に、気相
エピタキシャル法によりx=0.45の組成のAIGa
AsFfJ 13.  x −0,08の組成のAlG
aAs層14およびX率0.45の組成のAlGaAs
層15を順次成長させ、AlGaAs層12〜15の全
体の厚みを前と同じ0.3mm程度とした上でGaAs
基板12を前と同様に除去する。
FIG. 3 shows a light conversion means 10 using a composite layer semiconductor having a double heterojunction structure in the same manner as FIG. 2. In FIG. As shown in the same figure (al), first an AlGaAs layer 12 having a composition of x-0.2 is grown thickly on the GaAs-based fill by liquid phase epitaxial method, and then x=0.2 is grown by vapor phase epitaxial method. AIGa with composition of 45
AsFfJ 13. AlG with a composition of x −0,08
aAs layer 14 and AlGaAs composition with an X ratio of 0.45
The layers 15 are grown one after another, and the total thickness of the AlGaAs layers 12 to 15 is about 0.3 mm, which is the same as before, and then the GaAs layers are grown.
Substrate 12 is removed as before.

この複合半導体層を1対の透明板10aおよび10b間
に挟持して光変換手段IOを構成するのも第2図の場合
と同様である。
Similarly to the case of FIG. 2, this composite semiconductor layer is sandwiched between a pair of transparent plates 10a and 10b to constitute the light conversion means IO.

以上のように構成された複合半導体層は、図でハツチラ
グを施されたAIGaAsq 14とその上下のAI成
分比の異なるAlGaAs層13および15の間にそれ
ぞれへテロ接合が形成されたダブルへテロ接合構造をも
ち、照射光を例えば透明板10aの側から受けたときそ
の吸収によって複合半導体層内に発生する励起電子ない
しキャリアがエネルギギャップの小なARGaAsN 
14に集められ、その価電帯への遷移の際に発せられる
蛍光が例えば透明板tab側から励起光としてレーザ媒
質1に与えられる。この励起電子のAlGaAs層14
への集中は複合半導体層内の各層間に電位差を適宜に与
えることによって促進することも可能である。
The composite semiconductor layer configured as described above is a double heterojunction in which a heterojunction is formed between the AIGaAsq 14 which has been subjected to a hatchet lug and the AlGaAs layers 13 and 15 above and below which have different AI component ratios. ARGaAsN has a small energy gap structure, and when irradiation light is received from the side of the transparent plate 10a, excited electrons or carriers generated in the composite semiconductor layer by absorption of the light are
14, and the fluorescence emitted during the transition to the valence band is applied to the laser medium 1 as excitation light from, for example, the transparent plate tab side. This excited electron AlGaAs layer 14
The concentration can also be promoted by appropriately applying a potential difference between each layer in the composite semiconductor layer.

この第3図の実施例における複合半導体層は、蛍光発生
上の量子効率は第2図の場合はど必ずしも良好ではない
が、実際面ではそれよりもAl1GaAs眉14のA1
成分の管理が容品なので、光変換手段用半導体の製作上
有利な利点を有する。
Although the quantum efficiency of the composite semiconductor layer in the embodiment shown in FIG. 3 is not necessarily as good as that in FIG.
Since the components can be managed as a container, it has advantages in manufacturing semiconductors for light conversion means.

以上説明した実施例からも推察されるように、本発明は
かかる例に限らず種々の態様で実施をすることができる
As can be inferred from the embodiments described above, the present invention is not limited to these embodiments, and can be implemented in various embodiments.

(発明の効果) 以上説明したとおり本発明によれば、固体のレーザ媒質
中のレーザ活性物質を光励起してレーザ発光させる固体
レーザ装置において、照射光を吸収してレーザ活性物質
の光励起に適する波長の蛍光を発する半導体からなる光
変換手段を設け、この光変換手段に照射光を与えてそれ
から発せられる蛍光を励起光としてレーザ媒質中のレー
ザ活性物質を光励起するようにしたので、照射光中の従
来レーザ媒質のレーザ活性物質の光励起効率が低くてほ
とんど吸収できなかった範囲の波長成分をも光変換手段
の半導体に吸収させ、この半導体を種類や組成をレーザ
活性物質に適合させることにより、この吸収した照射光
を光励起効率が良好な波長の蛍光に変換して励起光とし
てレーザ媒質に与えることができ、この照射光の波長成
分の有効利用とレーザ活性物質の光励起効率の改善とに
よって、固体レーザ装置の光励起効率を従来よりも格段
に向上することができる。
(Effects of the Invention) As explained above, according to the present invention, in a solid-state laser device that optically excites a laser active substance in a solid laser medium to emit laser light, a wavelength suitable for optical excitation of the laser active substance by absorbing irradiation light is provided. A light conversion means made of a semiconductor that emits fluorescence is provided, and irradiation light is applied to this light conversion means, and the fluorescence emitted from the light conversion means is used as excitation light to optically excite the laser active substance in the laser medium. By making the semiconductor of the light conversion means absorb wavelength components that could hardly be absorbed due to the low optical excitation efficiency of the laser active material of the laser medium, and by matching the type and composition of this semiconductor to the laser active material, this can be achieved. The absorbed irradiation light can be converted into fluorescence having a wavelength with good optical excitation efficiency and can be applied to the laser medium as excitation light. By effectively utilizing the wavelength components of this irradiation light and improving the optical excitation efficiency of the laser active substance, solid-state The optical excitation efficiency of the laser device can be significantly improved compared to the conventional method.

また、本発明における光変換手段はその全面が照射光を
光励起用の蛍光に変換する役目を果たすので、光変換手
段から大きなエネルギをもつ励起光をレーザ媒質に与え
ることができ、かつこの励起光が効率よくレーザ活性物
質の光励起に使われるので、レーザ媒質内の励起光によ
る発熱を従来より格段に減少させることができ、これら
の複合効果により大出力の固体レーザ装置を提供するこ
とが本発明の実施により可能になる。
Furthermore, since the entire surface of the light conversion means in the present invention serves to convert the irradiation light into fluorescence for optical excitation, excitation light with large energy can be applied to the laser medium from the light conversion means, and this excitation light can be applied to the laser medium. is efficiently used for optical excitation of the laser active substance, the heat generated by the excitation light in the laser medium can be significantly reduced compared to the conventional method, and the present invention provides a high-output solid-state laser device by combining these effects. This becomes possible through the implementation of

さらに、光変換手段用に直接遷移形の半導体を用いるこ
とにより、上述の効果を一層高めることができる。
Furthermore, by using a direct transition type semiconductor for the light conversion means, the above-mentioned effects can be further enhanced.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図から第4図までが本発明に関し、第1図は本発明
による固体レーザ装置の実施例の縦および横断面図、第
2図および第3図は光変換手段のそれぞれ異なる実施例
の一部拡大断面図、第4図はレーザ活性物質の光励起効
率および照射光の光強度分布の波長特性を例示する線図
である。第5図は従来の代表的な固体レーザ装置の縦お
よび横断面図である0図において、 l:レーザ媒質、2:部分反射鏡、3:全反射鏡、5:
固体レーザ装置の閉鎖容器、6:照射光源、10:光変
換手段、10a、 10b :光変換手段用透明板、1
1 : GaAs基板、12.13.15 : AlG
aAs層、14】光変換手段用半導体としてのAlGa
As層、BL:励起光、■:照射光の光強度、■R:照
射光、LLjレーザ光、λ:波長、η:レーザ活性物質
の光励起効零1図 第2図 ′$3図
1 to 4 relate to the present invention; FIG. 1 is a longitudinal and cross-sectional view of an embodiment of a solid-state laser device according to the invention, and FIGS. 2 and 3 are views of different embodiments of the light conversion means. FIG. 4, a partially enlarged sectional view, is a diagram illustrating the optical excitation efficiency of a laser active substance and the wavelength characteristics of the light intensity distribution of irradiated light. FIG. 5 is a longitudinal and cross-sectional view of a typical conventional solid-state laser device.
Closed container of solid-state laser device, 6: Irradiation light source, 10: Light conversion means, 10a, 10b: Transparent plate for light conversion means, 1
1: GaAs substrate, 12.13.15: AlG
aAs layer, 14] AlGa as semiconductor for light conversion means
As layer, BL: excitation light, ■: light intensity of irradiation light, ■R: irradiation light, LLj laser light, λ: wavelength, η: zero photoexcitation effect of laser active material Figure 1 Figure 2 '$3 Figure

Claims (1)

【特許請求の範囲】[Claims] 固体のレーザ媒質中のレーザ活性物質を光励起してレー
ザ発光させる固体レーザ装置において、照射光を吸収し
てレーザ活性物質の光励起に適する波長の蛍光を発する
半導体からなる光変換手段を設け、光変換手段に照射光
を与えてそれから発せられる蛍光を励起光としてレーザ
媒質中のレーザ活性物質を光励起するようにしたことを
特徴とする固体レーザ装置。
In a solid-state laser device that optically excites a laser active material in a solid laser medium to emit laser light, a light conversion means made of a semiconductor that absorbs irradiated light and emits fluorescence at a wavelength suitable for optical excitation of the laser active material is provided to perform optical conversion. A solid-state laser device characterized in that a means is provided with irradiation light and fluorescence emitted from the means is used as excitation light to optically excite a laser active substance in a laser medium.
JP27832888A 1988-11-02 1988-11-02 Solid-state laser device Expired - Lifetime JPH0821743B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27832888A JPH0821743B2 (en) 1988-11-02 1988-11-02 Solid-state laser device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27832888A JPH0821743B2 (en) 1988-11-02 1988-11-02 Solid-state laser device

Publications (2)

Publication Number Publication Date
JPH02123776A true JPH02123776A (en) 1990-05-11
JPH0821743B2 JPH0821743B2 (en) 1996-03-04

Family

ID=17595798

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27832888A Expired - Lifetime JPH0821743B2 (en) 1988-11-02 1988-11-02 Solid-state laser device

Country Status (1)

Country Link
JP (1) JPH0821743B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007048979A (en) * 2005-08-10 2007-02-22 Ricoh Co Ltd LASER OSCILLATION METHOD, LASER DEVICE, AND LASER DEVICE ARRAY
JP2008210999A (en) * 2007-02-27 2008-09-11 Okamoto Kogaku Kakosho:Kk White light exciting laser device
JP2017168662A (en) * 2016-03-16 2017-09-21 トヨタ自動車株式会社 Sunlight excitation laser device
JP2018018981A (en) * 2016-07-28 2018-02-01 トヨタ自動車株式会社 Fluorescent light confinement structure of sunlight excitation laser device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007048979A (en) * 2005-08-10 2007-02-22 Ricoh Co Ltd LASER OSCILLATION METHOD, LASER DEVICE, AND LASER DEVICE ARRAY
JP2008210999A (en) * 2007-02-27 2008-09-11 Okamoto Kogaku Kakosho:Kk White light exciting laser device
JP2017168662A (en) * 2016-03-16 2017-09-21 トヨタ自動車株式会社 Sunlight excitation laser device
JP2018018981A (en) * 2016-07-28 2018-02-01 トヨタ自動車株式会社 Fluorescent light confinement structure of sunlight excitation laser device

Also Published As

Publication number Publication date
JPH0821743B2 (en) 1996-03-04

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