JPH02132871A - 無声放電式レーザ - Google Patents

無声放電式レーザ

Info

Publication number
JPH02132871A
JPH02132871A JP23374689A JP23374689A JPH02132871A JP H02132871 A JPH02132871 A JP H02132871A JP 23374689 A JP23374689 A JP 23374689A JP 23374689 A JP23374689 A JP 23374689A JP H02132871 A JPH02132871 A JP H02132871A
Authority
JP
Japan
Prior art keywords
gas
discharge
laser
silent
silent discharge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23374689A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0542839B2 (de
Inventor
Shigenori Yagi
重典 八木
Shuji Ogawa
小川　周治
Norikazu Tabata
田畑　則一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP23374689A priority Critical patent/JPH02132871A/ja
Publication of JPH02132871A publication Critical patent/JPH02132871A/ja
Publication of JPH0542839B2 publication Critical patent/JPH0542839B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
JP23374689A 1989-09-08 1989-09-08 無声放電式レーザ Granted JPH02132871A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23374689A JPH02132871A (ja) 1989-09-08 1989-09-08 無声放電式レーザ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23374689A JPH02132871A (ja) 1989-09-08 1989-09-08 無声放電式レーザ

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP55034593A Division JPS6035838B2 (ja) 1980-03-18 1980-03-18 無声放電式レ−ザ

Publications (2)

Publication Number Publication Date
JPH02132871A true JPH02132871A (ja) 1990-05-22
JPH0542839B2 JPH0542839B2 (de) 1993-06-29

Family

ID=16959930

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23374689A Granted JPH02132871A (ja) 1989-09-08 1989-09-08 無声放電式レーザ

Country Status (1)

Country Link
JP (1) JPH02132871A (de)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4979799A (de) * 1972-11-15 1974-08-01
JPS52115690A (en) * 1976-03-24 1977-09-28 Mitsubishi Electric Corp Laser device
JPS53113496A (en) * 1977-03-15 1978-10-03 Mitsubishi Electric Corp Gas laser device
JPS5424591A (en) * 1977-07-26 1979-02-23 Mitsubishi Electric Corp Gas laser unit

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4979799A (de) * 1972-11-15 1974-08-01
JPS52115690A (en) * 1976-03-24 1977-09-28 Mitsubishi Electric Corp Laser device
JPS53113496A (en) * 1977-03-15 1978-10-03 Mitsubishi Electric Corp Gas laser device
JPS5424591A (en) * 1977-07-26 1979-02-23 Mitsubishi Electric Corp Gas laser unit

Also Published As

Publication number Publication date
JPH0542839B2 (de) 1993-06-29

Similar Documents

Publication Publication Date Title
EP0152084B1 (de) Gaslaservorrichtung
US20170222389A1 (en) Gas laser
Christensen et al. High efficiency microwave discharge XeCl laser
CN120377039A (zh) 一种大功率电晕预电离准分子激光器
JPH0141263B2 (de)
JPH02132871A (ja) 無声放電式レーザ
JPS603170A (ja) 無声放電式ガスレ−ザ装置
JPS6037189A (ja) 無声放電励起同軸型レ−ザ発振器
US3396301A (en) Gas laser tube having a hollow elongated cathode electrode
Dyer et al. Miniature 250 Hz, TEA CO2 laser using H2 buffered gas mixture
JPS61280689A (ja) ガスレ−ザ装置
US3935547A (en) High pressure gas laser using uniform field electrode configuration with irradiation by corona discharge
Zhou et al. XeCl excimer laser excited by longitudinal discharge
JPS6035838B2 (ja) 無声放電式レ−ザ
Khare et al. Operational characteristics and power scaling of a transverse flow transversely excited CW CO2 laser
JPH0234196B2 (ja) Gasureezasochi
Johnson Excitation of an atmospheric-pressure CO 2-N 2-He laser by capacitor discharges
Smith et al. High repetition-rate and quasi-cw operation of a waveguide CO2 TE laser
CN108933377B (zh) 一种脉冲co2激光器放电腔
CN224204577U (zh) 一种电晕预电离大功率准分子激光器
JPS61159780A (ja) 無声放電式ガスレ−ザ装置
US5095490A (en) Asymmetric rf excited gas laser electrode configuration
Bahrampour et al. A compact simple structure TEA CO {sub 2} laser with dielectric corona preionization
JPS5917871B2 (ja) ガスレ−ザ装置
JPS6235278B2 (de)