JPH02140948A - Vacuum processor - Google Patents
Vacuum processorInfo
- Publication number
- JPH02140948A JPH02140948A JP63293560A JP29356088A JPH02140948A JP H02140948 A JPH02140948 A JP H02140948A JP 63293560 A JP63293560 A JP 63293560A JP 29356088 A JP29356088 A JP 29356088A JP H02140948 A JPH02140948 A JP H02140948A
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- vacuum processing
- preparation
- atmosphere
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の目的〕
(産業上の利用分野)
本発明は半導体製造装置をはじめとして、液晶デバイス
等の各種表示デバイス、感熱記録ヘッド、太am池およ
び光ディスクなどの高密度記録媒体等の種々の薄II!
製造装置に代表される真空処理装置に関する。[Detailed Description of the Invention] [Objective of the Invention] (Industrial Field of Application) The present invention is applicable to semiconductor manufacturing equipment, various display devices such as liquid crystal devices, thermal recording heads, thick AM chips, optical discs, and other high-density devices. Various types of recording media, etc.
It relates to vacuum processing equipment, typified by manufacturing equipment.
(従来の技術)
半導体ウェハ等のエツヂング装置、スパッタ装置、減圧
CVD装置等の真空処理装置は、バッチ式とロードロッ
ク式に分類される。(Prior Art) Vacuum processing apparatuses such as etching apparatuses for semiconductor wafers, sputtering apparatuses, and low-pressure CVD apparatuses are classified into batch type and load-lock type.
バッチ式真空処理装置は、1つの真空処理室を備え、そ
の真空処理室を大気圧開放した後、被処理物の取り出し
、装着を行い、しかる後真空処理室を真空排気して、真
空プロセス処理を行うものである。また、ロードロツタ
式真空処理装置は、1つの真空処理室に対し、2つの準
備室を有しており、処理室と準備室とは2つの仕切弁で
仕切られ、2つの準備室と大気とは2つの大気弁で仕切
られる。Batch-type vacuum processing equipment is equipped with one vacuum processing chamber, and after opening the vacuum processing chamber to atmospheric pressure, the workpiece is taken out and mounted, and then the vacuum processing chamber is evacuated and the vacuum process is performed. This is what we do. In addition, the load rotor type vacuum processing equipment has two preparation chambers for one vacuum processing chamber, and the processing chamber and preparation chamber are separated by two gate valves, and the two preparation chambers and the atmosphere are separated from each other by two gate valves. Separated by two atmospheric valves.
(5fe明が解決しようとする課題)
上記バッチ式真空処理装置は真空排気に時間が掛かるた
め、タクトタイムが悪い欠点がある。(Problem to be solved by 5fe Ming) The above-mentioned batch type vacuum processing apparatus has the drawback of poor takt time because it takes time to evacuation.
また、ロードロック式真空処理装置は、装置構成が複雑
となり、高価になるとともに、装置設置に必要な面積も
大きくなる欠点がある。Further, the load-lock type vacuum processing apparatus has the disadvantage that the apparatus configuration is complicated and expensive, and the area required for installing the apparatus is large.
本発明は上記の事情を考慮してなされたもので、真空処
理室を真空に保ったまま、連続的な処理が可能で、装置
構成が単純でかつ安価で、しかも装置設置に必要な面積
の少ない真空処理装置を提供することを目的とする。The present invention was made in consideration of the above circumstances, and allows continuous processing while keeping the vacuum processing chamber in a vacuum, has a simple and inexpensive device configuration, and has a small area required for installing the device. The purpose is to provide less vacuum processing equipment.
(発明の構成〕
(課題を解決するための手段)
本発明に係る真空処理装置は常時真空に保持される真空
処理室と、この真空処理室に仕切弁を介して隣接設置さ
れる準備室とを備え、この準備室を大気弁により大気開
放可能に形成するとともに、その準備室に準備室と真空
処理室との間の被処理物の搬送を行う搬送手段と、準備
室と外部との間の被処理物の搬送を行う搬送手段とを備
えたものである。(Structure of the Invention) (Means for Solving the Problems) The vacuum processing apparatus according to the present invention includes a vacuum processing chamber that is always kept in a vacuum, and a preparation chamber that is installed adjacent to the vacuum processing chamber via a gate valve. The preparation chamber is configured to be able to be opened to the atmosphere by an atmospheric valve, and the preparation chamber is provided with a transport means for transporting the processed material between the preparation chamber and the vacuum processing chamber, and a means for transporting the processing material between the preparation chamber and the outside. and conveying means for conveying the objects to be processed.
(作用)
準備室が大気圧の状態で処理流みの被処理物を大気中に
取り出すとともに、未処理の被処理物を大気中から準備
室内に搬入する。搬入俊大気弁を1mじて準備室を真空
とし、その後仕切弁を問いて、真空処理室内の処理済み
の被処理物を真空処理室から準備室に搬出するとともに
、未処理の被処理物を準備室から真空処理室内に搬入す
る。その後、仕切弁を閉じ、大気弁を問いて準備室を大
気開放し、準備室内の被処理物を大気中に取り出すとと
もに未処理の被処理物を大気中から準備室内に搬入する
。(Function) While the preparation chamber is at atmospheric pressure, the processed material in the process flow is taken out into the atmosphere, and the unprocessed material is brought into the preparation chamber from the atmosphere. The loading air valve is moved 1m away to create a vacuum in the preparation chamber, and then the gate valve is activated to transport the processed objects in the vacuum processing chamber from the vacuum processing chamber to the preparation chamber, and to remove unprocessed objects. Transport from the preparation room into the vacuum processing chamber. Thereafter, the gate valve is closed, the atmosphere valve is opened to open the preparation chamber to the atmosphere, and the objects to be processed in the preparation chamber are taken out into the atmosphere, and the unprocessed objects are brought into the preparation chamber from the atmosphere.
かくして、真空処理室を常に真空に保持したまま、真空
プロセス処理を連続的に行うことができる。In this way, vacuum processing can be performed continuously while the vacuum processing chamber is always maintained in a vacuum state.
(実施例) 本発明の実施例について添付図面を参照して説明する。(Example) Embodiments of the present invention will be described with reference to the accompanying drawings.
第1図は本発明に係る真空処理装置の第1実施例を示す
断面図である。この図は真空処理装置を上方から見たも
ので、常時真空に保持される真空処理室1が設けられ、
この真空処理室1に隣接して準Ia室2が設置される。FIG. 1 is a sectional view showing a first embodiment of a vacuum processing apparatus according to the present invention. This figure shows the vacuum processing equipment viewed from above, and is equipped with a vacuum processing chamber 1 that is constantly maintained in a vacuum.
A quasi-Ia chamber 2 is installed adjacent to the vacuum processing chamber 1.
真空処理室1と準備室2との間には密閉jI■敢が自在
な仕切ブP3が設けられる。準備室2の1側面には′f
!!閉・大気開放が自在な大気弁4が設けられる。A partition P3 that can be sealed is provided between the vacuum processing chamber 1 and the preparation chamber 2. On one side of the preparation room 2 is 'f
! ! An atmospheric valve 4 that can be closed and opened to the atmosphere is provided.
準備室2には準備室2と真空処理室1との間の被処理物
の搬送を行う搬送手段5と、準備室2と外部の大気開放
台6との間の被処理物の搬送を行う搬送手段7とが備え
られる。搬送手段5は旋回回転アーム8が準備室2の床
に取り付けられた支点9を中心として回転自在に設けら
れ、この旋回回転アーム8の先端にハンド10が設りら
れる。The preparation room 2 includes a transport means 5 for transporting the workpiece between the preparation room 2 and the vacuum processing chamber 1, and a transport means 5 for transporting the workpiece between the preparation room 2 and the external atmosphere opening table 6. A conveyance means 7 is provided. The conveying means 5 is provided with a swivel arm 8 rotatable about a fulcrum 9 attached to the floor of the preparation room 2, and a hand 10 is provided at the tip of the swivel arm 8.
搬送手段7にも同様に旋回回転アーム11、支点12お
よびハンド13が設けられる。The conveying means 7 is similarly provided with a turning arm 11, a fulcrum 12, and a hand 13.
次に上記実施例の作用について第2図を参照して説明す
る。Next, the operation of the above embodiment will be explained with reference to FIG.
第2図においてハツチング部分は真空状態であり、ハツ
チングされていない部分は大気圧の部分であるとψる。In FIG. 2, the hatched areas are in a vacuum state, and the unhatched areas are at atmospheric pressure.
まず、準備室2を大気圧にし、大気弁4を開き、被処理
物イを準備室2内に搬入する(第2図(A))。次に、
大気弁4を閉じ、準備室2内を真空排気する(同(B)
)。準N室2内が真空排気されると、仕切弁3を間ぎ、
搬送手段5により被処理物イを処理室1内に搬入づる(
同(C))。First, the preparation chamber 2 is brought to atmospheric pressure, the atmospheric valve 4 is opened, and the object to be processed is carried into the preparation chamber 2 (FIG. 2(A)). next,
Close the atmospheric valve 4 and evacuate the preparation room 2 (same (B))
). When the inside of the semi-N room 2 is evacuated, the gate valve 3 is closed,
The object to be processed is carried into the processing chamber 1 by the transport means 5 (
Same (C)).
次に、仕切弁3を閉じ、処理室1内では被処理物イの処
理を開始する。一方、準備室2は大気圧に戻した後、大
気弁4を聞ぎ、次に処理を行う被処理物口を準@室2内
に搬入する(同(D))。Next, the gate valve 3 is closed, and processing of the object to be processed in the processing chamber 1 is started. On the other hand, after the preparation chamber 2 is returned to atmospheric pressure, the atmospheric pressure valve 4 is turned on, and the opening of the object to be processed next is carried into the semi-@ chamber 2 ((D)).
その後大気弁4を閉じ、準備室2内を真空排気するとと
もに、処理室1内での被処理物イの処理の終了を祐つ(
同(E))。準備室2内が真空排気され、かつ処理室1
内での被処理物イの処理が終了づると、仕切弁3を開き
、搬送手段7により、処理室1内の被処理物イを準備室
2内に搬出しく同(F))、次に処理を行う被処理物口
を処理室1内に搬入する(同(G))。Thereafter, the atmospheric valve 4 is closed, the preparation chamber 2 is evacuated, and the processing of the object to be processed in the processing chamber 1 is completed (
Same (E)). Preparation chamber 2 is evacuated, and processing chamber 1
When the processing of the object to be processed in the processing chamber 1 is completed, the gate valve 3 is opened, and the object to be processed in the processing chamber 1 is carried out to the preparation room 2 by the conveying means 7 (F)). The opening of the object to be processed is carried into the processing chamber 1 ((G)).
次に、仕切弁3を閉じ、真空処理室1内で被処理物口の
処理を開始する。一方、準備室2内を大気圧に戻し、処
理の終了した被処理物イを大気中に搬出するとともに、
次に処理を行う被処理物へをItA備室2内に搬入する
(同(H))。そして、大気弁4を閉じ、準備室2内を
真空排気し、被処理物口の処理の終了を持つ(同(I)
)。Next, the gate valve 3 is closed and processing of the object to be processed in the vacuum processing chamber 1 is started. Meanwhile, the inside of the preparation room 2 is returned to atmospheric pressure, and the processed material A is carried out into the atmosphere.
Next, the objects to be processed are carried into the ItA room 2 ((H)). Then, the atmospheric valve 4 is closed, the interior of the preparation chamber 2 is evacuated, and the processing of the object to be processed is completed (see (I)
).
第2図(1)と(E)の状態は被処理物が一つ送られて
はいるが、他は同一の状態であり、以下第2図の(E)
から(1)までを繰り返して、次々に被処理物の処理を
行う。この間、大気中の被処理物の準備室2を介した真
空処理室1への搬入と、真空処理室1内の被処理物の準
備室2を介した大気中への搬出とが平行して行われてお
り、また真空処理室1は常に真空に保たれたままで、真
空ブ0セス処理を連続的に行うことができる。In the states shown in Fig. 2 (1) and (E), one object is being sent, but the other conditions are the same, and below (E) in Fig. 2
Steps from (1) to (1) are repeated to process the objects one after another. During this time, the workpieces in the atmosphere are carried into the vacuum processing chamber 1 via the preparation room 2, and the workpieces in the vacuum processing chamber 1 are carried out into the atmosphere via the preparation room 2 in parallel. Furthermore, the vacuum processing chamber 1 can be continuously maintained while being kept in a vacuum state.
このように、上記実施例によれば、単一の準備室2で真
空処理室1を真空に保持したまま連続的に処理をするこ
とが可能であり、安価で、装置設躍に必要な面積の少な
い真空処理装置を提供することができる。また、未処理
の被処理物の供給装置と処理の終了した被処理物の収納
装置とをS!置の手前に並べて配置することができるた
め、装置仝休がコンパクトで、使いやすい真空処理装置
を提供することができる。As described above, according to the above embodiment, it is possible to perform continuous processing in the single preparation chamber 2 while maintaining the vacuum processing chamber 1 in a vacuum, and it is inexpensive and reduces the area required for equipment setup. It is possible to provide a vacuum processing apparatus with less In addition, the unprocessed material supply device and the processed material storage device are connected to S! Since the vacuum processing equipment can be arranged side by side in front of the equipment, it is possible to provide a vacuum processing equipment that is compact in equipment downtime and easy to use.
第3図は本発明の第2実施例を示すもので、四節回転連
鎖からなる搬送手段5A、7△が備えられる。すなわち
、搬送手段5Aは固定リンクとしての準備室2Aの床に
形成された支点15.16を中心として回転自在なリン
ク17..18の先端に、それぞれ支点19.20を介
して回転自在にリンク21が接続され、このリンク21
の一端にハンド22が設けられる。FIG. 3 shows a second embodiment of the present invention, which is equipped with conveying means 5A and 7Δ consisting of a four-bar rotating chain. That is, the conveyance means 5A is a link 17. which is rotatable around a fulcrum 15.16 formed on the floor of the preparation room 2A as a fixed link. .. Links 21 are rotatably connected to the tips of 18 via fulcrums 19 and 20, respectively.
A hand 22 is provided at one end.
同様に、搬送手段7Aにも支点23; 24,25.2
6、リンク27,28.29、ハンド30が備えられる
。Similarly, the transport means 7A also has fulcrums 23; 24, 25.2
6, links 27, 28, 29, and a hand 30 are provided.
第4図は本発明の第3実施例を示すもので、搬送手段5
Bは第2実施例と同様に四節回転連鎖からなり、支点3
1.32.33,34、リンク35.36,37、ハン
ド38が備えられる。この搬送手段5Bは真空処理室1
Bと準備室2Bとの間の搬送を行うもので、F¥(!1
5室2Bと大気開放台6Bとの間の搬送を行う搬送手段
は図示しない準備室2Bの天井部分に備えられる。FIG. 4 shows a third embodiment of the present invention, in which the conveying means 5
B consists of a four-node rotating chain as in the second embodiment, with fulcrum 3
1.32, 33, 34, links 35, 36, 37, and a hand 38 are provided. This conveying means 5B is the vacuum processing chamber 1
This is used for transportation between B and preparation room 2B, and costs F ¥ (!1
A transport means for transporting between the 5th room 2B and the atmosphere opening table 6B is provided on the ceiling of the preparation room 2B (not shown).
第5図は本発明の第4実施例を示づもので、搬送手段7
Cは五節回転連鎖からなる。すなわら、県[−^全2C
の床に設けられた支持板40に支点41.42を中心と
して回転自在なリンク43,44がそれぞれ設けられ、
リンク43は支点45を介して回転自在にリンク46に
接続され、このリンク46は支点47を介して回転自在
にリンク48に接続される。一方、リンク44の先端は
支点40を介してリンク48に回転自在に接続され、リ
ンク48にはハンド50が一体または一体的に設(〕ら
れる。FIG. 5 shows a fourth embodiment of the present invention, in which the conveying means 7
C consists of a five-node rotation chain. In other words, the prefecture [-^ Total 2C
Links 43 and 44 that are rotatable around fulcrums 41 and 42 are respectively provided on a support plate 40 provided on the floor of the
The link 43 is rotatably connected to a link 46 via a fulcrum 45, and this link 46 is rotatably connected to a link 48 via a fulcrum 47. On the other hand, the tip of the link 44 is rotatably connected to a link 48 via a fulcrum 40, and a hand 50 is integrally or integrally provided with the link 48.
第6図は搬送手段7Cをポリ−斜視図ひある。支持板4
0の裏側には、駆動源としてのモータ51が備えられ、
この七−夕の回転力が回転伝達機構52を介して各リン
ク43.44に回転を伝える回転軸53.54に伝達さ
れる。この搬送手段7c c、i準備室20と外部との
間の搬送を行うもので、準りAa室2Cと真空処理室1
Cと゛の間の搬送を行う。FIG. 6 is a poly perspective view of the conveying means 7C. Support plate 4
0 is equipped with a motor 51 as a drive source,
This rotational force of Tanabata is transmitted via the rotation transmission mechanism 52 to the rotation shaft 53.54 which transmits rotation to each link 43.44. This transport means 7c, i is used to transport between the preparation chamber 20 and the outside, and is used to transport between the Aa chamber 2C and the vacuum processing chamber 1.
Carry out transportation between C and .
搬送手段5Cは、第7図に示すように、準備室2Cの天
井56に取り(d【−Jられる。搬送手段5Cも同様に
五節回転連鎖からなり、支点57,58゜59.60.
61.リンク62,63.64.65、ハンド66が備
えられる。また、天1[56の上部には駆動源としての
モータ67とリンク62゜63に回転を伝える回転伝達
機構68とが備えられる。As shown in FIG. 7, the conveying means 5C is mounted on the ceiling 56 of the preparation room 2C.The conveying means 5C is similarly composed of a five-joint rotating chain, with supporting points 57, 58 degrees, 59 degrees, 60 degrees.
61. Links 62, 63, 64, 65 and a hand 66 are provided. Furthermore, a motor 67 as a drive source and a rotation transmission mechanism 68 for transmitting rotation to the links 62 and 63 are provided at the upper part of the top 1 [56].
これら第2実施例から第4実施例についても、第1実施
例と同様の作用効果がある。These second to fourth embodiments also have the same effects as the first embodiment.
第8図は本発明の第5実施例を示ず縦断面図である。こ
の実施例では仕切弁は設けられず、真空処理室1Dと準
備室2Dとは被処理物とともに大気中から搬入されるト
レイ70により仕切られる。FIG. 8 is a longitudinal cross-sectional view, not showing the fifth embodiment of the present invention. In this embodiment, no gate valve is provided, and the vacuum processing chamber 1D and the preparation chamber 2D are partitioned off by a tray 70 that is carried in from the atmosphere together with the objects to be processed.
未処理の被処理物は搬送手段5Dにより真空処理室1D
の真下のブツシャ71上に搬送され、しかる後ブツシャ
71が上昇して真空処理?I D、!:準備室2Dとを
仕切る。処理が終了するどプツシV71が下降し、ブツ
シャ71上から処理の終了した被処理物を搬送手段6D
により搬出する。この実施例では、搬送手段5D、6D
は準備室2Dから被処理物を直接真空処理室1D内に搬
入・搬出することはないが、ブツシャ71との組み合わ
け動作で、真空処理室1Dと準備室2Dとの間の被処理
物の搬入・搬出を行っている。The unprocessed workpiece is transferred to the vacuum processing chamber 1D by the conveyance means 5D.
It is conveyed onto the bushing 71 directly below the bushing, and then the bushing 71 is raised to perform vacuum processing. ID,! : Separates from preparation room 2D. As soon as the processing is completed, the pusher V71 descends and transfers the processed object from above the pusher 71 to the transport means 6D.
Transported by. In this embodiment, the conveying means 5D, 6D
Although the workpieces are not directly transported into and out of the vacuum processing chamber 1D from the preparation chamber 2D, the workpieces are moved between the vacuum processing chamber 1D and the preparation chamber 2D by the assembly operation with the pusher 71. Carrying in and out.
この場合、最襖の被処理物の搬入の後、被処理物を乗せ
ないトレイを搬入し、また、最初の被処理物の搬入時に
既に真空処理室1Dと準備室2Dとを仕切っているトレ
イを搬出する必要があるが、その途中は第1実施例の作
用の説明において、仕切弁3が閉の状態がプツシ117
1が上昇した状態、仕切弁3が開の状態がブツシャ71
が下降した状態に対応し、第1実施例と同様の手順で被
処理物を搬送することができ、ブツシャ71の上昇・下
降で、準備室2Dと真空処理室1Dを仕切ることができ
、第1実施例と同様の作用効果がある。なお、符号ハ、
口はトレイ70上に乗せられた被処理物を示ず。In this case, after carrying in the most fusuma workpiece, a tray on which no workpiece is placed is carried in, and when the first workpiece is brought in, a tray that has already partitioned the vacuum processing chamber 1D and the preparation room 2D is used. In the explanation of the operation of the first embodiment, during this process, the gate valve 3 is closed when the push button 117 is
1 is raised and the gate valve 3 is open.
Corresponding to the state in which the button is lowered, the workpiece can be transported in the same manner as in the first embodiment, and the preparation chamber 2D and the vacuum processing chamber 1D can be partitioned by raising and lowering the bushing 71. It has the same effect as the first embodiment. In addition, the code C,
The opening does not show the object to be processed placed on the tray 70.
その他、第1実施例から第5実施例において、搬送手段
5,5A〜5Dにより大気中から準備室2.2八〜2D
を介して真空処理室1.1八〜1Dまで被処理物を搬送
することが可能であり、搬送手段7.7A〜7Dにより
被処理物を真空処理室1.1八〜1Dから準備室2,2
A〜2Dを介して大気中まで搬送することが可能である
が、これらの実施例に示した搬送手段と異なる搬送手段
を用いても、同様の作用効果がある。In addition, in the first to fifth embodiments, the preparation chambers 2.28 to 2D are
It is possible to transport the workpiece to the vacuum processing chambers 1.18 to 1D via the transport means 7.7A to 7D. ,2
Although it is possible to convey it to the atmosphere through A to 2D, the same effects can be obtained even if a conveying means different from the conveying means shown in these examples is used.
(発明の効果〕
本発明に係る真空処理装置は、常時真空に保持される真
空処理室と、この真空処理室に仕切弁を介して隣接設置
される準備室とを備え、この準備室を大気弁により大気
開放可能に形成するとともに、その準備室に準備室と真
空処理室との間の被処理物の搬送を行う搬送手段と、準
備室と外部との間の被処理物の搬送を行う搬送手段とを
備えたから、真空処理室を真空に保ったまま、連続的な
処理が可能で、装置構成が単純でかつ安価で、しかも装
置設置に必要な面積の少ない真空処理装置を提供するこ
とができる。(Effects of the Invention) The vacuum processing apparatus according to the present invention includes a vacuum processing chamber that is always maintained at a vacuum, and a preparation chamber that is installed adjacent to this vacuum processing chamber via a gate valve, and the preparation chamber is connected to the atmosphere. The preparation room is configured to be openable to the atmosphere with a valve, and the preparation room is equipped with a transport means for transporting the workpiece between the preparation room and the vacuum processing chamber, and a transport means for transporting the workpiece between the preparation room and the outside. To provide a vacuum processing device which is equipped with a conveying means, enables continuous processing while keeping a vacuum processing chamber in a vacuum, has a simple and inexpensive device configuration, and requires a small area for installing the device. Can be done.
第1図は本発明に係る真空処理装置の第1実施例を示す
断面図、第2図(A>から(Nは上記実施例の作用を示
す図、第3図から第5図はそれぞれ本発明の第2から第
4実施例を示す断面図、第6図および第7図は本発明の
第4実施例における搬送手段を示す斜視図、第8図は本
発明の第5実施例を示す縦断面図である。
1・・・真空処理室、2・・・準備室、3・・・仕切弁
、4・・・大気弁、5・・・搬送手段、6・・・大気開
放台。FIG. 1 is a sectional view showing the first embodiment of the vacuum processing apparatus according to the present invention, FIG. 2 (A> to N is a diagram showing the operation of the above embodiment, and FIGS. 6 and 7 are perspective views showing the conveying means in the fourth embodiment of the invention, and FIG. 8 shows the fifth embodiment of the invention. It is a vertical cross-sectional view. 1... Vacuum processing chamber, 2... Preparation room, 3... Gate valve, 4... Atmospheric valve, 5... Transfer means, 6... Atmospheric opening table.
Claims (1)
仕切弁を介して隣接設置される準備室とを備え、この準
備室を大気弁により大気開放可能に形成するとともに、
その準備室に準備室と真空処理室との間の被処理物の搬
送を行う搬送手段と、準備室と外部との間の被処理物の
搬送を行う搬送手段とを備えたことを特徴とする真空処
理装置。It is equipped with a vacuum processing chamber that is always maintained in a vacuum state, and a preparation chamber that is installed adjacent to the vacuum processing chamber via a gate valve, and the preparation chamber is formed so that it can be opened to the atmosphere by means of an atmospheric valve.
The preparation room is characterized by being equipped with a transport means for transporting the workpiece between the preparation room and the vacuum processing chamber, and a transport means for transporting the workpiece between the preparation room and the outside. vacuum processing equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63293560A JPH02140948A (en) | 1988-11-22 | 1988-11-22 | Vacuum processor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63293560A JPH02140948A (en) | 1988-11-22 | 1988-11-22 | Vacuum processor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02140948A true JPH02140948A (en) | 1990-05-30 |
Family
ID=17796329
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63293560A Pending JPH02140948A (en) | 1988-11-22 | 1988-11-22 | Vacuum processor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02140948A (en) |
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|---|---|---|---|---|
| USD824525S1 (en) | 2014-09-25 | 2018-07-31 | Ethicon Llc | Release paper for wound treament devices |
| US10398800B2 (en) | 2004-07-12 | 2019-09-03 | Ethicon, Inc. | Adhesive-containing wound closure device and method |
| US10398802B2 (en) | 2004-02-18 | 2019-09-03 | Ethicon, Inc. | Adhesive-containing wound closure device and method |
| US10470935B2 (en) | 2017-03-23 | 2019-11-12 | Ethicon, Inc. | Skin closure systems and devices of improved flexibility and stretchability for bendable joints |
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| US10792024B2 (en) | 2016-09-28 | 2020-10-06 | Ethicon, Inc. | Scaffolds with channels for joining layers of tissue at discrete points |
| USD907217S1 (en) | 2016-09-29 | 2021-01-05 | Ethicon, Inc. | Release paper for wound treatment devices |
| US10993708B2 (en) | 2018-07-31 | 2021-05-04 | Ethicon, Inc. | Skin closure devices with interrupted closure |
| US11504446B2 (en) | 2017-04-25 | 2022-11-22 | Ethicon, Inc. | Skin closure devices with self-forming exudate drainage channels |
-
1988
- 1988-11-22 JP JP63293560A patent/JPH02140948A/en active Pending
Cited By (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10398802B2 (en) | 2004-02-18 | 2019-09-03 | Ethicon, Inc. | Adhesive-containing wound closure device and method |
| US10434211B2 (en) | 2004-02-18 | 2019-10-08 | Ethicon, Inc. | Adhesive-containing wound closure device and method |
| US11413370B2 (en) | 2004-02-18 | 2022-08-16 | Ethicon, Inc. | Adhesive-containing wound closure device and method |
| US10398800B2 (en) | 2004-07-12 | 2019-09-03 | Ethicon, Inc. | Adhesive-containing wound closure device and method |
| US11446407B2 (en) | 2004-07-12 | 2022-09-20 | Ethicon, Inc. | Adhesive-containing wound closure device and method |
| USD824525S1 (en) | 2014-09-25 | 2018-07-31 | Ethicon Llc | Release paper for wound treament devices |
| USD854171S1 (en) | 2014-09-25 | 2019-07-16 | Ethicon Llc | Release paper for wound treatment devices |
| US10792024B2 (en) | 2016-09-28 | 2020-10-06 | Ethicon, Inc. | Scaffolds with channels for joining layers of tissue at discrete points |
| USD907217S1 (en) | 2016-09-29 | 2021-01-05 | Ethicon, Inc. | Release paper for wound treatment devices |
| US10687986B2 (en) | 2016-09-29 | 2020-06-23 | Ethicon, Inc. | Methods and devices for skin closure |
| USD979768S1 (en) | 2016-09-29 | 2023-02-28 | Ethicon, Inc. | Release paper for wound treatment devices |
| US11679034B2 (en) | 2016-09-29 | 2023-06-20 | Ethicon, Inc. | Methods and devices for skin closure |
| US10470935B2 (en) | 2017-03-23 | 2019-11-12 | Ethicon, Inc. | Skin closure systems and devices of improved flexibility and stretchability for bendable joints |
| US11883264B2 (en) | 2017-03-23 | 2024-01-30 | Ethicon, Inc. | Skin closure systems and devices of improved flexibility and stretchability for bendable joints |
| US11504446B2 (en) | 2017-04-25 | 2022-11-22 | Ethicon, Inc. | Skin closure devices with self-forming exudate drainage channels |
| US10993708B2 (en) | 2018-07-31 | 2021-05-04 | Ethicon, Inc. | Skin closure devices with interrupted closure |
| US11974734B2 (en) | 2018-07-31 | 2024-05-07 | Ethicon, Inc. | Skin closure devices with interrupted closure |
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