JPH0214189B2 - - Google Patents
Info
- Publication number
- JPH0214189B2 JPH0214189B2 JP59163894A JP16389484A JPH0214189B2 JP H0214189 B2 JPH0214189 B2 JP H0214189B2 JP 59163894 A JP59163894 A JP 59163894A JP 16389484 A JP16389484 A JP 16389484A JP H0214189 B2 JPH0214189 B2 JP H0214189B2
- Authority
- JP
- Japan
- Prior art keywords
- composite material
- copper
- ceramic substrate
- carbon fiber
- ceramic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/05—Insulated conductive substrates, e.g. insulated metal substrate
Landscapes
- Laminated Bodies (AREA)
- Electroplating Methods And Accessories (AREA)
- Die Bonding (AREA)
Description
〔発明の利用分野〕
本発明は、セラミツク基板及びその製造方法に
係わり、特に好ましくは、セラミツク基板の表層
に半導体素子であるシリコンや放熱板との接合を
阻害しない金属層を被覆した半導体素子搭載用セ
ラミツク基板及びその製造方法に関する。
〔発明の背景〕
炭化ケイ素に少量のベリリアを含むセラミツク
は、高熱伝導性と高電気絶縁性を兼ね備えた新し
いタイプのセラミツクである。このように優れた
特性を有するセラミツクは、半導体素子搭載用基
板等に用いられるが、半導体素子のシリコン等と
接合するため、表層を金属化する必要がある。
従来、セラミツク表層を金属化する方法は、用
途及び目的によつて種々ある。例えば、アルミナ
セラミツクへの金属化法は、特開昭55−113683号
にも述べられているように金属用組成物ペースト
をセラミツク上に塗布し、水素中あるいは水素と
窒素の混合気中で焼結して金属化層を作り、しか
る後ニツケルめつき等を施す方法が一般的に行わ
れている。そこで従来の方法で炭化ケイ素を主成
分とするセラミツク表層を金属化、すなわち、モ
リブデン粉末ペーストを印刷し、1300〜1500℃の
湿潤水素雰囲気及び乾燥水素雰囲気中で焼成して
金属化し電気ニツケルめつきする構造では、熱処
理による信頼性がニツケルめつき厚みに左右され
ると言う問題がある。
ここで、従来製造法の問題点について考察す
る。第2図に示すように、炭化ケイ素を主成分と
するセラミツク基体1表層を金属化22して電気
ニツケルめつき23した従来構造は、金属化層と
セラミツク境界からはく離を起しやすい。そし
て、第2図に示す従来構造の金属化層がはく離す
る原因は、炭化ケイ素、モリブデン及びニツケル
の熱膨張率が異なることにある。すなわち、炭化
ケイ素は3.5×10-6/℃、モリブデン4.9×10-6/
℃と炭化ケイ素とモリブデンとの熱膨張率は大差
ないのに比べ、ニツケルの熱膨張率は13.6×
10-6/℃と大きいため、熱処理の際の冷却時にお
いて、ニツケル層の収縮がセラミツク及びモリブ
デン層に比べ大となり、収縮小なモリブデン層と
セラミツクを引張り、相対的強さから金属化層と
セラミツク境界にはく離を起してしまうことにあ
る。特に、ニツケルめつき膜厚分布が不均一であ
つたり厚目であつたりすると、熱処理による収縮
応力が大きくなり、金属化層はよりはく離しやす
くなつてしまう。そのため、ニツケルめつき膜は
薄目に均一に分布しなければならないとの制約が
ある。
他方、半導体素子搭載用基板に用いられるセラ
ミツクは小形であり、大量に生産される。一般
に、小形物を一度に多数めつきする方法にバレル
めつき法がある。しかし、バレルめつきは、ダミ
ーを介して通電するため、めつき電流密度が一定
でなく、めつき膜厚分布もまた均一でない。した
がつて、炭化ケイ素を主成分とするセラミツク表
層を金属化し、バレル電気ニツケルめつきする
と、ニツケルめつき膜厚分布が不均一であるため
に、熱処理の際の収縮応力の不均一から金属化層
がはく離しやすくなつてしまう。
[Field of Application of the Invention] The present invention relates to a ceramic substrate and a method for manufacturing the same, and particularly preferably to a ceramic substrate mounted with a semiconductor element whose surface layer is coated with a metal layer that does not inhibit bonding with silicon, which is a semiconductor element, or a heat sink. The present invention relates to a ceramic substrate and a method for manufacturing the same. [Background of the Invention] Ceramic containing a small amount of beryllia in silicon carbide is a new type of ceramic that has both high thermal conductivity and high electrical insulation. Ceramics having such excellent properties are used for substrates for mounting semiconductor elements, etc., but the surface layer must be metallized in order to bond with silicon or the like of the semiconductor element. Conventionally, there are various methods for metallizing ceramic surface layers depending on the use and purpose. For example, the metallization method for alumina ceramic is as described in JP-A No. 55-113683, in which a metal composition paste is applied onto the ceramic, and then sintered in hydrogen or a mixture of hydrogen and nitrogen. A commonly used method is to bond the metal to form a metallized layer, and then apply nickel plating or the like. Therefore, we used a conventional method to metallize the surface layer of ceramics whose main component is silicon carbide, that is, we printed molybdenum powder paste, fired it in a wet hydrogen atmosphere and a dry hydrogen atmosphere at 1300 to 1500°C to metallize it, and then electro-nickel plated it. In this structure, there is a problem in that the reliability of heat treatment depends on the thickness of the nickel plating. Here, problems with conventional manufacturing methods will be discussed. As shown in FIG. 2, the conventional structure in which the surface layer of a ceramic substrate 1 mainly composed of silicon carbide is metallized 22 and electronickel plated 23 tends to peel off from the boundary between the metallized layer and the ceramic. The reason why the metallized layer of the conventional structure shown in FIG. 2 peels off is that silicon carbide, molybdenum, and nickel have different coefficients of thermal expansion. That is, silicon carbide is 3.5×10 -6 /℃, molybdenum is 4.9×10 -6 /℃
℃ and the coefficient of thermal expansion of silicon carbide and molybdenum are not much different, but the coefficient of thermal expansion of nickel is 13.6 ×
10 -6 /℃, the contraction of the nickel layer is greater than that of the ceramic and molybdenum layers during cooling during heat treatment, and the molybdenum layer and the ceramic, which shrink less, are pulled together, and due to their relative strength, the nickel layer shrinks more than the ceramic and molybdenum layers. The problem is that it causes delamination at the ceramic boundary. In particular, if the nickel plating thickness distribution is uneven or thick, the shrinkage stress due to heat treatment will increase, making the metallized layer more likely to peel off. Therefore, there is a restriction that the nickel plating film must be thin and uniformly distributed. On the other hand, ceramics used for semiconductor element mounting substrates are small and produced in large quantities. Generally, barrel plating is a method for plating many small objects at once. However, in barrel plating, since electricity is applied through a dummy, the plating current density is not constant, and the plating film thickness distribution is also not uniform. Therefore, when the surface layer of a ceramic whose main component is silicon carbide is metallized and barrel electroplated with nickel, the nickel plating film thickness distribution is uneven, and metallization occurs due to uneven shrinkage stress during heat treatment. The layers tend to peel off easily.
本発明の目的は、熱処理による信頼性が高く、
また、生産性を高めたセラミツク基板及びその製
造方法を提供することにある。
〔発明の概要〕
本発明を概説すれば、本発明の第1の発明はセ
ラミツク基板に関する発明であつて、絶縁性炭化
ケイ素からなるセラミツク製基体と、この基体上
に接合される銅又はアルミニウム−炭素繊維複合
材料層と、この複合材料層上に形成される金属被
覆層を備えていることを特徴とする。
そして、本発明の第2の発明は、セラミツク基
板の製造方法に関する発明であつて、絶縁性炭化
ケイ素からなるセラミツク製基体に、銅又はアル
ミニウム−炭素繊維複合材料層を接合させる工
程、該工程の前又は後で該複合材料層表面に該炭
素繊維が露出しないように処理する工程、及び最
後に金属めつきを行う工程の各工程を包含するこ
とを特徴とする。
本発明方法において使用する銅又はアルミニウ
ムマトリツクスに炭素繊維を埋め込んだ形態の銅
又はアルミニウム−炭素繊維複合材料は、熱伝導
性及び導電性が良く、熱膨張率が低い等の特性を
有すると共に、銅又はアルミニウムマトリツクス
は柔軟性を有するので応力緩和材にもなる。
本発明者等は、本発明によるセラミツク基板で
は、熱処理により金属めつき層に生じる収縮応力
が銅(又はアルミニウム)−炭素繊維複合材料に
よつて緩和されるので、金属化層のはく離を防止
できることを見出した。
本発明において使用する前記複合材料は公知の
材料であり、例えば銅−炭素繊維複合材料は、特
開昭53−128274号公報に、他方アルミニウム−炭
素繊維複合材料は、特開昭49−18891号公報に記
載されている。
しかし、前述したように、銅(又はアルミニウ
ム)−炭素繊維複合材料は、銅(又はアルミニウ
ム)マトリツクスに炭素繊維を埋め込んだ形態で
あり、表面に炭素繊維が露出していると均一な金
属めつきができない。そこで、銅(又はアルミニ
ウム)−炭素繊維複合材料の表面に炭素繊維が露
出しない形態にすることにより均一な金属めつき
層が得られる。
また、セラミツク製基体に接合した銅(又はア
ルミニウム)−炭素繊維複合材料は、金属めつき
膜に悪影響を及ばさないばかりでなく、本発明の
セラミツク基板の1用途である半導体素子搭載用
基板としての特性にも何ら悪影響を及ぼさない。
したがつて、本発明のセラミツク基板は、セラ
ミツク本来の特性を損わないばかりでなく、銅
(又はアルミニウム)−炭素繊維複合材料の特性を
も兼ね備えた新規構造を有する。そして、金属め
つきをする手段としてバレルめつき法を用いて
も、熱処理による信頼性を低下させないので、該
基板の量産ができることも見出した。
しかして、本発明方法において重要なる、炭素
繊維が露出しないように処理する工程は、それ自
体公知の方法で行つてよく、例えば、該複合材料
を接合する前又は後で、該複合材料を銅箔をつけ
るか、めつきで覆えばよく、あるいは、ホツトプ
レスで複合材料をサンドイツチすればよい。
〔発明の実施例〕
以下、本発明を実施例によつて更に具体的に説
明するが、本発明はこれら実施例に限定されな
い。
なお、第1図は、本発明のセラミツク基板の1
例の構造を示す断面概略図である。第1図におい
て、符号1はセラミツク基体、2は銅(又はアル
ミニウム)−炭素繊維複合材、3は接合材、4は
めつきした金属材を意味する。
実施例 1
造粒−ホツトプレス−切断・研削した厚み0.6
mm、幅9mm、長さ13mmの炭化ケイ素に少量のベリ
リアを含むセラミツク基体と、直径6μmの炭素
繊維を45%含み表面を厚み20μmの銅箔で覆つた
厚み0.1mm、幅8mm、長さ12mmの銅−炭素繊維複
合材料を、厚み25μmのマンガンろうを用いアル
ゴン雰囲気中、温度870℃、保持時間1秒の条件
で接合し、酸性浴中で表面活性化処理した後、硫
酸ニツケル240g/、塩化ニツケル45g/、
ホウ酸30g/から成るワツト浴又はスルフアミ
ン酸ニツケル375g/、ホウ酸30g/、ラウ
リル硫酸ナトリウム0.4g/から成るスルフア
ミン酸ニツケルめつき浴を用い、温度50℃、めつ
き電流密度1A/dm2、回転速度5rpmで平均厚み
2、5、10μmにバレルニツケルめつきしてセラ
ミツク/銅−炭素繊維複合材料/ニツケルの複合
板を作製した。
以上の方法で作製したセラミツク/銅−炭素繊
維複合材料/ニツケル複合板を、水素雰囲気中、
温度500℃、保持時間5分の熱処理をした結果、
第2表に示すように金属化層がはく離する等の変
形は認められなかつた。表中○印は金属化層に変
形のないことを示す。
The purpose of the present invention is to achieve high reliability through heat treatment,
Another object of the present invention is to provide a ceramic substrate with improved productivity and a method for manufacturing the same. [Summary of the Invention] To summarize the present invention, the first invention of the present invention relates to a ceramic substrate, which includes a ceramic substrate made of insulating silicon carbide, and a copper or aluminum substrate bonded onto this substrate. It is characterized by comprising a carbon fiber composite material layer and a metal coating layer formed on this composite material layer. A second invention of the present invention relates to a method for manufacturing a ceramic substrate, which includes a step of bonding a copper or aluminum-carbon fiber composite material layer to a ceramic substrate made of insulating silicon carbide; It is characterized by including the following steps: a step of treating the surface of the composite material layer so that the carbon fibers are not exposed before or after, and a step of finally performing metal plating. The copper or aluminum-carbon fiber composite material in the form of carbon fiber embedded in a copper or aluminum matrix used in the method of the present invention has characteristics such as good thermal conductivity and electrical conductivity, and a low coefficient of thermal expansion. The flexibility of the copper or aluminum matrix also makes it a stress reliever. The present inventors have discovered that in the ceramic substrate according to the present invention, the shrinkage stress generated in the metal plating layer due to heat treatment is alleviated by the copper (or aluminum)-carbon fiber composite material, so that peeling of the metal plating layer can be prevented. I found out. The composite materials used in the present invention are known materials; for example, the copper-carbon fiber composite material is described in Japanese Patent Application Laid-Open No. 128274/1982, and the aluminum-carbon fiber composite material is described in Japanese Patent Application Laid-Open No. 49-18891. It is stated in the official gazette. However, as mentioned above, copper (or aluminum)-carbon fiber composite materials are in the form of carbon fibers embedded in a copper (or aluminum) matrix, and when the carbon fibers are exposed on the surface, uniform metal plating occurs. I can't. Therefore, by forming the copper (or aluminum)-carbon fiber composite material so that the carbon fibers are not exposed on the surface, a uniform metal plating layer can be obtained. In addition, the copper (or aluminum)-carbon fiber composite material bonded to the ceramic substrate not only does not have a negative effect on the metal plating film, but also can be used as a substrate for mounting semiconductor elements, which is one use of the ceramic substrate of the present invention. It does not have any adverse effect on the characteristics of Therefore, the ceramic substrate of the present invention has a novel structure that not only does not impair the original characteristics of ceramic, but also has the characteristics of a copper (or aluminum)-carbon fiber composite material. It has also been found that even if barrel plating is used as a means for metal plating, the substrates can be mass-produced because the reliability due to heat treatment is not reduced. Therefore, the step of treating the carbon fibers so that they are not exposed, which is important in the method of the present invention, may be carried out by a method known per se. For example, before or after joining the composite material, the composite material may be It can be foiled or covered with plating, or the composite can be sandwiched in a hot press. [Examples of the Invention] Hereinafter, the present invention will be explained in more detail with reference to Examples, but the present invention is not limited to these Examples. Note that FIG. 1 shows one of the ceramic substrates of the present invention.
FIG. 2 is a cross-sectional schematic diagram showing an example structure. In FIG. 1, reference numeral 1 means a ceramic substrate, 2 means a copper (or aluminum)-carbon fiber composite material, 3 means a bonding material, and 4 means a plated metal material. Example 1 Granulation - Hot press - Cutting and grinding thickness 0.6
Ceramic substrate containing a small amount of beryllia in silicon carbide with a thickness of 0.1 mm, a width of 8 mm, and a length of 12 mm with a surface covered with a 20 μm thick copper foil containing 45% carbon fiber with a diameter of 6 μm. Copper-carbon fiber composite materials of 25 μm thick were bonded together in an argon atmosphere at a temperature of 870°C for a holding time of 1 second, and after surface activation treatment in an acidic bath, 240 g of nickel sulfate was added to the composite material. Nickel chloride 45g/,
Using a Watts bath consisting of 30 g of boric acid or a nickel sulfamate plating bath consisting of 375 g of nickel sulfamate, 30 g of boric acid, and 0.4 g of sodium lauryl sulfate, the temperature was 50°C and the plating current density was 1 A/dm 2 . Ceramic/copper-carbon fiber composite material/nickel composite plates were prepared by barrel nickel plating to average thicknesses of 2, 5, and 10 μm at a rotation speed of 5 rpm. The ceramic/copper-carbon fiber composite material/nickel composite plate produced by the above method was heated in a hydrogen atmosphere.
As a result of heat treatment at a temperature of 500℃ and a holding time of 5 minutes,
As shown in Table 2, no deformation such as peeling of the metallized layer was observed. The circle mark in the table indicates that there is no deformation in the metallized layer.
以上説明したように、本発明によれば、熱処理
による信頼性が高く、工程省略等により生産性の
高いセラミツク基板及びその製造方法が提供され
た点で、顕著な効果が奏せられた。
As explained above, according to the present invention, remarkable effects have been achieved in that a ceramic substrate and a method for manufacturing the same are provided which have high reliability through heat treatment and high productivity due to omission of steps and the like.
第1図は本発明のセラミツク基板の1例の構造
を示す断面概略図、第2図は従来のセラミツク基
板の1例の構造を示す断面概略図である。
1:セラミツク基体、2:銅(又はアルミニウ
ム)−炭素繊維複合材、3:接合材、4:めつき
した金属材、22:金属化層、23:ニツケルめ
つき材。
FIG. 1 is a schematic cross-sectional view showing the structure of an example of a ceramic substrate of the present invention, and FIG. 2 is a schematic cross-sectional view showing the structure of an example of a conventional ceramic substrate. 1: ceramic substrate, 2: copper (or aluminum)-carbon fiber composite material, 3: bonding material, 4: plated metal material, 22: metallized layer, 23: nickel plated material.
Claims (1)
と、この基体上に接合される銅又はアルミニウム
−炭素繊維複合材料層と、この複合材料層上に形
成される金属被覆層を備えていることを特徴とす
るセラミツク基板。 2 絶縁性炭化ケイ素からなるセラミツク製基体
に、銅又はアルミニウム−炭素繊維複合材料層を
接合させる工程、該工程の前又は後で該複合材料
層表面に該炭素繊維が露出しないように処理する
工程、及び最後に金属めつきを行う工程の各工程
を包含することを特徴とするセラミツク基板の製
造方法。[Scope of Claims] 1. A ceramic substrate made of insulating silicon carbide, a copper or aluminum-carbon fiber composite material layer bonded to the substrate, and a metal coating layer formed on the composite material layer. A ceramic substrate characterized by: 2. A step of bonding a copper or aluminum-carbon fiber composite material layer to a ceramic substrate made of insulating silicon carbide, and a step of treating the surface of the composite material layer so that the carbon fibers are not exposed before or after this step. , and finally metal plating.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59163894A JPS6141538A (en) | 1984-08-06 | 1984-08-06 | Ceramic substrate and manufacture thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59163894A JPS6141538A (en) | 1984-08-06 | 1984-08-06 | Ceramic substrate and manufacture thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6141538A JPS6141538A (en) | 1986-02-27 |
| JPH0214189B2 true JPH0214189B2 (en) | 1990-04-06 |
Family
ID=15782826
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59163894A Granted JPS6141538A (en) | 1984-08-06 | 1984-08-06 | Ceramic substrate and manufacture thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6141538A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2667313B2 (en) * | 1991-07-15 | 1997-10-27 | 三菱電機株式会社 | Hybrid integrated circuit device |
| DE10320838B4 (en) * | 2003-05-08 | 2014-11-06 | Rogers Germany Gmbh | Fiber-reinforced metal-ceramic / glass composite material as a substrate for electrical applications, method for producing such a composite material and use of this composite material |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55113683A (en) * | 1979-02-21 | 1980-09-02 | Kyoto Ceramic | Method and composition of metallizing carbide type ceramic body |
| JPS55127044A (en) * | 1979-03-26 | 1980-10-01 | Hitachi Ltd | Electric circuit substrate and its manufacture |
| JPS5745248A (en) * | 1980-09-01 | 1982-03-15 | Hitachi Ltd | Manufacture of semiconductor device |
-
1984
- 1984-08-06 JP JP59163894A patent/JPS6141538A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6141538A (en) | 1986-02-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN1184866C (en) | Thermal management device and method of making such device | |
| JPH0810710B2 (en) | Method for manufacturing good thermal conductive substrate | |
| JPH0684546B2 (en) | Electronic parts | |
| TW360626B (en) | Metallized ceramic substrate having smooth plating layer and method for producing the same | |
| JP3132493B2 (en) | Wiring board manufacturing method and conductor paste used therefor | |
| EP0485176B1 (en) | Metal thin film having excellent transferability and method of preparing the same | |
| JPH0214189B2 (en) | ||
| JPH0568877B2 (en) | ||
| JPS59121175A (en) | Manufacture of heat radiator | |
| US6007652A (en) | Method of preparing metal thin film having excellent transferability | |
| JPS62189790A (en) | Ceramic wiring circuit board | |
| JP7141864B2 (en) | Electronic component mounting substrate and manufacturing method thereof | |
| JPS60107845A (en) | Circuit substrate for semiconductor | |
| JPH0286189A (en) | Manufacture of large current substrate | |
| JPS61121489A (en) | Cu wiring sheet for manufacture of substrate | |
| JP2623640B2 (en) | Heat-resistant composite Ni-plated member | |
| JPS63242985A (en) | Aluminum nitride substrate | |
| JPS59184586A (en) | Circuit board for placing semiconductor element | |
| JPH01240676A (en) | Manufacture of metallic base substrate | |
| JPH03166788A (en) | Hybrid integrated circuit board and manufacturing method | |
| JPS60120592A (en) | Ceramic circuit board and method of producing ceramic circuit board | |
| JP4653272B2 (en) | Method for manufacturing aluminum nitride substrate | |
| KR20260021207A (en) | Ceramic circuit boards | |
| JPH08107140A (en) | Electrostatic chuck | |
| JPS63318794A (en) | Ceramic circuit board |