JPH02145384A - Forming method for optical recording medium - Google Patents

Forming method for optical recording medium

Info

Publication number
JPH02145384A
JPH02145384A JP63302040A JP30204088A JPH02145384A JP H02145384 A JPH02145384 A JP H02145384A JP 63302040 A JP63302040 A JP 63302040A JP 30204088 A JP30204088 A JP 30204088A JP H02145384 A JPH02145384 A JP H02145384A
Authority
JP
Japan
Prior art keywords
recording medium
optical recording
target
film forming
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63302040A
Other languages
Japanese (ja)
Inventor
Yoshiaki Suzuki
良明 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP63302040A priority Critical patent/JPH02145384A/en
Publication of JPH02145384A publication Critical patent/JPH02145384A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material

Landscapes

  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Optical Record Carriers (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、光を利用して少なくとも記録もしくは再生を
行う光学的記録媒体の作成方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for producing an optical recording medium that performs at least recording or reproduction using light.

[従来の技術] 従来、光学的記録媒体の作成方法において、ターゲット
と呼ばれる母材を基に、スパッタリング等により薄膜作
成を行う方法が知られている。
[Prior Art] Conventionally, as a method for producing an optical recording medium, a method is known in which a thin film is produced by sputtering or the like based on a base material called a target.

このように作成された薄膜の特性についてよく調べてみ
ると、微量の酸素、水分で非常に大きな特性の影響が発
生することがあることが判ってきた。
A careful study of the properties of the thin films produced in this way has revealed that even trace amounts of oxygen and moisture can have a very large effect on the properties.

例えば、光るn気記録媒体として、各所で確実されてい
る希土類−遷移金属合金膜は、1%以下の酸素が膜中に
存在しても、耐久特性に悪影響が出る。又、このような
光磁気記録の保i膜として知られる、スパッタリングで
作成される話電体膜も、その光学特性や接している記録
膜である希土類−遷移金属合金への酸素の拡散等の影響
があり、やはり酸素や水分の存在が耐久性を低下させる
For example, even if 1% or less of oxygen exists in the rare earth-transition metal alloy film, which is widely used as a luminous n-air recording medium, the durability characteristics are adversely affected. In addition, the telephone film produced by sputtering, which is known as the i-retaining film for magneto-optical recording, is also sensitive to its optical properties and the diffusion of oxygen into the rare earth-transition metal alloy that is the recording film in contact with it. The presence of oxygen and moisture also reduces durability.

これらは、極めて少量の酸素や水分の影響であるが、更
に、その含有量が数%以上となると、基体特性として記
録・再生にも影響が出る。
These are the effects of extremely small amounts of oxygen and moisture, but if the content exceeds a few percent, recording and reproduction will also be affected as substrate properties.

次に、このような問題の対策として、通常行われている
方法を説明する。
Next, a method commonly used as a countermeasure for such problems will be explained.

まず、ターゲットメーカーにおいて、アルゴン若しくは
窒素雰囲気中でポリビニール等から成る容器に真空封入
されたターゲットを、でき゛るだけ短時間にバッキング
プレートと呼ばれる銅基板に、ろう剤等で付加させる。
First, at a target manufacturer, a target vacuum-sealed in a container made of polyvinyl or the like in an argon or nitrogen atmosphere is applied to a copper substrate called a backing plate using a brazing agent or the like in as short a time as possible.

次に、これを成膜室の真空をやぶり直接セットするか或
いは成膜予備室からセットする。
Next, this is set directly by breaking the vacuum in the film forming chamber or from the pre-film forming chamber.

これらは、できるだけ手短かに行うようにしているが、
それでもターゲットが多結晶であれば結晶粒界が、ター
、ゲットが焼結体であれば空孔部に接したところが、表
面からおよそ数十ミクロン程度まで深く、酸化される。
I try to do these as quickly as possible, but
Even so, if the target is polycrystalline, the grain boundaries will be oxidized, and if the target is a sintered body, the areas in contact with the pores will be oxidized to a depth of approximately several tens of microns from the surface.

そして、このような酸化層を除去するため、いわゆるプ
レスパツタといわれる、ターゲット表面のスパッタリン
グが行われる。
In order to remove such an oxide layer, the target surface is sputtered, which is so-called pre-sputtering.

[発明が解決しようとしている問題点]しかしながら、
上記の方法においては、プレスパツタに数時間を要する
こともあり、作成時間が長いといった問題点があった。
[Problem that the invention seeks to solve] However,
The above method has a problem in that the press sputtering may take several hours and the production time is long.

また、ターゲットのプレスパツタで除去した分は、無駄
に捨てることになり、作成コストを上げる原因にもなっ
た。
In addition, the portion removed by press sputtering of the target was wasted and was a cause of increased manufacturing costs.

実際に、厚さ2mmのターゲット0.1mmの表面の除
去は、5%の利用効率の減少があり、けっして無視でき
ない。
In fact, removing 0.1 mm of the surface of a 2 mm thick target has a reduction in utilization efficiency of 5%, which cannot be ignored.

本発明の目的は、上記従来技術の問題点を解決し、作成
時間やコストを増大させることなく、良好な特性の光学
的記録媒体を作成し得る方法を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a method that solves the problems of the prior art described above and can produce an optical recording medium with good characteristics without increasing production time or cost.

[問題点を解決する為の手段] 本発明の上記目的は、ターゲット材料を、密封された容
器から取り出して真空成膜室内に用意し、このターゲッ
ト材料を母材として基板上に薄膜を形成する光学的記録
媒体の作成方法において、 前記容器の開封を、前記真空成膜室につながる室の不活
性ガス雰囲気中で行ない、前記ターゲット材料を、酸素
及び水分に晒すことなく真空酸]摸室に搬送することに
よって達成される。
[Means for Solving the Problems] The above object of the present invention is to take out a target material from a sealed container, prepare it in a vacuum film forming chamber, and form a thin film on a substrate using this target material as a base material. In the method for producing an optical recording medium, the container is opened in an inert gas atmosphere in a chamber connected to the vacuum film forming chamber, and the target material is placed in a vacuum acid printing chamber without being exposed to oxygen and moisture. This is achieved by transporting.

[実施例・] 以下、本発明に基づく光学的記録媒体の作成過程を、第
1図を参照しながら、順を追って説明する。
[Example] Hereinafter, the process of creating an optical recording medium based on the present invention will be explained step by step with reference to FIG.

■ アルゴン置換雰囲気中で、容器内に真空封入された
ターゲツト材を、アルゴン雰囲気のグローブボックス1
内で開封する。
■ In an argon-substituted atmosphere, the target material vacuum-sealed in a container is transferred to glove box 1 in an argon atmosphere.
Open it inside.

■ そのまま、アルゴン雰囲気のガス中で搬送し、雰囲
気調整洗浄槽2内で、 イワプロビル アルコール 超音波洗浄  3分 フロン      〃    3分 フロン    洗 浄 を行い、アルゴン雰囲気のグローブボックス1内に戻す
■ Transport it as it is in an argon atmosphere, perform Iwaprobil alcohol ultrasonic cleaning 3 minutes CFC cleaning in the atmosphere adjustment cleaning tank 2, and return it to the glove box 1 in an argon atmosphere.

■ グローブボックス1内で、アルゴン雰囲気中で、バ
ッキングプレート、ボンディング剤、ターゲットを積み
重ねる。
■ Stack the backing plate, bonding agent, and target in an argon atmosphere in glove box 1.

■ アルゴン雰囲気の雰囲気調整ボンディング炉3に搬
送し、ボンディングを行う。
■ Transported to atmosphere-controlled bonding furnace 3 with argon atmosphere and bonded.

■ グローブボックスl内に戻し、グローブボックス中
で、連続成膜機4まで搬送する。
■ Return it to the glove box 1 and transport it to the continuous film forming machine 4 in the glove box.

■ 成膜準備室をアルゴン雰囲気にした後、グローブボ
ックスと連結し、ターゲット固定の作業をアルゴン雰囲
気中で行う。
■ After creating an argon atmosphere in the film deposition preparation room, connect it to the glove box and perform the work of fixing the target in an argon atmosphere.

ここで、第1図に概略図で示す作成装置において、各々
の機器の接合部は、同形の断面を有し、ゴム製バッキン
グ等により密封状態で接続出来るように構成されている
Here, in the production apparatus shown schematically in FIG. 1, the connecting parts of each device have the same cross section and are configured so that they can be connected in a sealed state using a rubber backing or the like.

次に、本発明の効果を調べる為の媒体の評価方法と結果
を述べる。
Next, a method and results for evaluating a medium for examining the effects of the present invention will be described.

ターゲット設置後、30分単位でスパッタリングを行い
、30分毎に以下の構成の膜をもつ積層膜をガラス基板
上に作成した。
After setting the target, sputtering was performed every 30 minutes, and a laminated film having the following composition was formed on a glass substrate every 30 minutes.

膜                膜厚アモルファス
窒化シリコン   700人TbFeCo      
    800人アモルファス窒化シリコン   70
0人ターゲット表面の酸化層の影響が無くなったかどう
かという評価は、この積層膜が面内方向に成分を持って
いるかどうか、角型がきれいかどうかをもって判断した
Film Thickness: Amorphous silicon nitride 700 TbFeCo
800 people Amorphous silicon nitride 70
The evaluation of whether the influence of the oxidized layer on the surface of the 0-person target was eliminated was determined based on whether the laminated film had components in the in-plane direction and whether the square shape was clean.

従来の方法で実験を行ったところ、6時間スパッタした
後のサンプルから変化がみられず、特性が飽和した。
When an experiment was conducted using the conventional method, no change was observed in the sample after 6 hours of sputtering, and the characteristics were saturated.

一方本発明で述べた方法で実験を行ったところ、約1時
間後には特性は飽和し、従来法と同じ角型をもつサンプ
ルが得られた。
On the other hand, when an experiment was conducted using the method described in the present invention, the characteristics were saturated after about one hour, and a sample having the same square shape as the conventional method was obtained.

これらのサンプルの内部に含有される酸素量を調べたと
ころ、特性が飽和するには、内部酸素量が0.7%まで
減少すれば良いことがわかった。
When the amount of oxygen contained inside these samples was investigated, it was found that in order for the characteristics to be saturated, the amount of internal oxygen should be reduced to 0.7%.

尚、膜中に存在するカーボン量の減少も本発明によりみ
られ、このことが膜の耐久性能の向上をもたらしている
ことも推定された。
Incidentally, the amount of carbon present in the film was also reduced by the present invention, and it was also presumed that this resulted in an improvement in the durability performance of the film.

本発明は、以上説明した実施例の他にも、種々の応用が
可能である。例えば、実施例ではグローブボックスが用
いられる手作業による方法を述べたが、ロボットによる
作業でも同じ効果が得られる。
The present invention can be applied in various ways in addition to the embodiments described above. For example, in the embodiment, a manual method using a glove box has been described, but the same effect can be obtained by using a robot.

[発明の効果] 以上説明したように、本発明の方法により、酸化層の薄
い清浄なターゲットを準備することができた。
[Effects of the Invention] As explained above, by the method of the present invention, a clean target with a thin oxide layer could be prepared.

又、カーボン化合物の汚染も減少するという2次的効果
も生じることが判った。
It has also been found that a secondary effect of reducing carbon compound contamination also occurs.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の方法を実施する為の作成装置の一例を
示す概略斜視図である。 l・・・搬送用グローブボックス、 2・・・雰囲気調整洗浄槽、 3・・・雰囲気調整ボンディング炉、 4・・・連続成膜機。
FIG. 1 is a schematic perspective view showing an example of a production apparatus for carrying out the method of the present invention. l...Glove box for transportation, 2...Atmosphere adjustment cleaning tank, 3...Atmosphere adjustment bonding furnace, 4...Continuous film forming machine.

Claims (1)

【特許請求の範囲】[Claims] (1)ターゲット材料を、密封された容器から取り出し
て真空成膜室内に用意し、このターゲット材料を母材と
して基板上に薄膜を形成する光学的記録媒体の作成方法
において、前記容器の開封を、前記真空成膜室につなが
る室の不活性ガス雰囲気中で行ない、前記ターゲット材
料を、酸素及び水分に晒すことなく真空成膜室に搬送す
ることを特徴とする光学的記録媒体の作成方法。
(1) In a method for producing an optical recording medium in which a target material is taken out of a sealed container and prepared in a vacuum film forming chamber, and a thin film is formed on a substrate using this target material as a base material, opening the container is performed. A method for producing an optical recording medium, characterized in that the method is carried out in an inert gas atmosphere in a chamber connected to the vacuum film forming chamber, and the target material is transported to the vacuum film forming chamber without being exposed to oxygen or moisture.
JP63302040A 1988-11-28 1988-11-28 Forming method for optical recording medium Pending JPH02145384A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63302040A JPH02145384A (en) 1988-11-28 1988-11-28 Forming method for optical recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63302040A JPH02145384A (en) 1988-11-28 1988-11-28 Forming method for optical recording medium

Publications (1)

Publication Number Publication Date
JPH02145384A true JPH02145384A (en) 1990-06-04

Family

ID=17904185

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63302040A Pending JPH02145384A (en) 1988-11-28 1988-11-28 Forming method for optical recording medium

Country Status (1)

Country Link
JP (1) JPH02145384A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003317955A (en) * 2002-02-22 2003-11-07 Semiconductor Energy Lab Co Ltd Light emitting device, method of manufacturing the same, and method of operating manufacturing device
US8138670B2 (en) 2002-02-22 2012-03-20 Semiconductor Energy Laboratory Co., Ltd. Light-emitting device and method of manufacturing the same, and method of operating manufacturing apparatus
CN106082117A (en) * 2016-07-26 2016-11-09 中国科学院声学研究所 The method that electrostatic bonding equipment and electrostatic bonding produce

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003317955A (en) * 2002-02-22 2003-11-07 Semiconductor Energy Lab Co Ltd Light emitting device, method of manufacturing the same, and method of operating manufacturing device
US8138670B2 (en) 2002-02-22 2012-03-20 Semiconductor Energy Laboratory Co., Ltd. Light-emitting device and method of manufacturing the same, and method of operating manufacturing apparatus
US8536784B2 (en) 2002-02-22 2013-09-17 Semiconductor Energy Laboratory Co., Ltd. Light-emitting device and method of manufacturing the same, and method of operating manufacturing apparatus
CN106082117A (en) * 2016-07-26 2016-11-09 中国科学院声学研究所 The method that electrostatic bonding equipment and electrostatic bonding produce

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