JPH0215725U - - Google Patents
Info
- Publication number
- JPH0215725U JPH0215725U JP9338588U JP9338588U JPH0215725U JP H0215725 U JPH0215725 U JP H0215725U JP 9338588 U JP9338588 U JP 9338588U JP 9338588 U JP9338588 U JP 9338588U JP H0215725 U JPH0215725 U JP H0215725U
- Authority
- JP
- Japan
- Prior art keywords
- shaft
- gas introduction
- main body
- nozzle
- introduction passage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010884 ion-beam technique Methods 0.000 claims description 6
- 238000007789 sealing Methods 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 1
Landscapes
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Drying Of Semiconductors (AREA)
Description
第１図は本考案の一実施例に係る集束イオンビ
ーム装置のガス導入装置のガス供給動作中におけ
る構成を示す図、第１ａ図は第１図におけるａ
―ａ線におけるアジヤストナツトの回転調節機
構を示す図、第２図は前記実施例におけるガス供
給遮断作動における構成を示す図、第３図は従来
のガス導入装置を備えた集束イオンビーム装置の
概略構成図である。
１……試料、２……ステージ、８……集束イオ
ンビーム、９……イオンビーム照射光学系、２１
……筐体、２３……支持部材、２４……本体、２
５……シヤフト、２６……ノズル、２８……エア
シリンダー（駆動部材）、２９……ストローク調
整部材、３９……ガス導入通路、４２……リリー
フノズル、４３……ガス導通孔、４４……リング
状溝（連絡通路）、４５，４６，４７……Ｏリン
グ（シール部材）、４９……噴出孔、５３……可
動ブロツク、５６……アジヤストナツト、５７…
…目盛、５８……矢印、５９……ストツパー。
FIG. 1 is a diagram showing the configuration of a gas introduction device of a focused ion beam device according to an embodiment of the present invention during gas supply operation, and FIG.
- A diagram showing the rotation adjustment mechanism of the adjuster nut in the a-line, FIG. 2 is a diagram showing the configuration in the gas supply cutoff operation in the above embodiment, and FIG. 3 is a schematic configuration of a focused ion beam device equipped with a conventional gas introduction device. It is a diagram. DESCRIPTION OF SYMBOLS 1... Sample, 2... Stage, 8... Focused ion beam, 9... Ion beam irradiation optical system, 21
... Housing, 23 ... Supporting member, 24 ... Main body, 2
5... Shaft, 26... Nozzle, 28... Air cylinder (driving member), 29... Stroke adjustment member, 39... Gas introduction passage, 42... Relief nozzle, 43... Gas conduction hole, 44... Ring-shaped groove (communication passage), 45, 46, 47...O ring (sealing member), 49...Blowout hole, 53...Movable block, 56...Adjustment nut, 57...
...Scale, 58...Arrow, 59...Stopper.
Claims (1)
体と、 本体内に摺動可能に取付けられ、且つ先端部分
にノズルを有するシヤフトと、 シヤフトの後端に連結され、当該シヤフトを前
進、後退運動させる駆動部材と、 この駆動部材によるノズルの前進位置を規制す
るストローク調整部材と、 本体に形成されたガス導入通路と、 ガス導入通路と接続、遮断可能にシヤフトに設
けられ、ノズル出口に連通するガス誘導孔と、 ガス導入通路と接続、遮断可能に本体に設けら
れたリリーフノズルと、 シヤフトに形成され、当該シヤフト後退時に、
ガス導入通路とリリーフノズルとを連通させる連
絡通路と、 連絡通路の前後位置にて、シヤフトと本体との
間に設けられたシール部材と、 から成る集束イオンビーム装置のガス導入装置。[Claims for Utility Model Registration] A main body attached to a housing of a focused ion beam device, a shaft slidably attached to the main body and having a nozzle at its tip, connected to the rear end of the shaft, A drive member that moves the shaft forward and backward; a stroke adjustment member that regulates the forward position of the nozzle by the drive member; a gas introduction passage formed in the main body; and a drive member provided on the shaft so as to be connectable to and disconnectable from the gas introduction passage. a relief nozzle provided on the main body so as to be able to connect to and shut off the gas introduction passage; and a relief nozzle formed on the shaft that communicates with the nozzle outlet;
A gas introduction device for a focused ion beam device, comprising: a communication passage that communicates a gas introduction passage with a relief nozzle; and a sealing member provided between a shaft and a main body at front and rear positions of the communication passage.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9338588U JPH0726840Y2 (en) | 1988-07-13 | 1988-07-13 | Focused ion beam device gas introduction device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9338588U JPH0726840Y2 (en) | 1988-07-13 | 1988-07-13 | Focused ion beam device gas introduction device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0215725U true JPH0215725U (en) | 1990-01-31 |
| JPH0726840Y2 JPH0726840Y2 (en) | 1995-06-14 |
Family
ID=31317841
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9338588U Expired - Lifetime JPH0726840Y2 (en) | 1988-07-13 | 1988-07-13 | Focused ion beam device gas introduction device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0726840Y2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019208049A (en) * | 2013-03-12 | 2019-12-05 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ | Multiple zone insufflation assembly with azimuth direction and radial direction distribution control |
-
1988
- 1988-07-13 JP JP9338588U patent/JPH0726840Y2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019208049A (en) * | 2013-03-12 | 2019-12-05 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ | Multiple zone insufflation assembly with azimuth direction and radial direction distribution control |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0726840Y2 (en) | 1995-06-14 |
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