JPH02171285A - Optical recording medium - Google Patents
Optical recording mediumInfo
- Publication number
- JPH02171285A JPH02171285A JP63325389A JP32538988A JPH02171285A JP H02171285 A JPH02171285 A JP H02171285A JP 63325389 A JP63325389 A JP 63325389A JP 32538988 A JP32538988 A JP 32538988A JP H02171285 A JPH02171285 A JP H02171285A
- Authority
- JP
- Japan
- Prior art keywords
- selenium
- recording
- tellurium
- nitrogen
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
- G11B2007/24302—Metals or metalloids
- G11B2007/24312—Metals or metalloids group 14 elements (e.g. Si, Ge, Sn)
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
- G11B2007/24302—Metals or metalloids
- G11B2007/24316—Metals or metalloids group 16 elements (i.e. chalcogenides, Se, Te)
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
- G11B2007/24318—Non-metallic elements
- G11B2007/2432—Oxygen
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
- G11B2007/24318—Non-metallic elements
- G11B2007/24322—Nitrogen
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/253—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates
- G11B7/2533—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates comprising resins
- G11B7/2534—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates comprising resins polycarbonates [PC]
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、レーザ光によって情報を記録再生することの
できる光ディスク等の光記録媒体に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to an optical recording medium such as an optical disk on which information can be recorded and reproduced using laser light.
[従来の技術]
従来、この種の技術としては、レーザ光によって情報を
媒体に記録し、かつ再生する光デイスクメモリがあり、
記録密度が高いことから大容量記録装置として優れた特
徴を有している。この光記録媒体の材料としては、はじ
めタンタルと鉛が使用されていた(サイエンス(Sci
ence) 154,1550.1966 ) 、それ
以来、種々の材料が使用されているが、テルル等のカル
コゲン元素又はこれらの化合物は一般によく使用されて
おり(特公昭47−26897号公報)、その中でもテ
ルル−セレン系合金は特によく使用されている(特公昭
54−41902号公報、特公昭57−7919号公報
、特公昭57−5Ei058号公報)、このテルル−セ
レン系合金を光記録層として用いた光記録媒体の例とし
ては、第6図に示すような構成になっている。すなわち
基板11の表面上に、テルル−゛セレン系合金よりなる
記録層21が形成されている。該記録層21は、記録用
レーザ光を基板11を通して集光照射することによりピ
ット22を形成する。基板11としてはポリカーボネー
ト、ポリオレフィン、ポリメチルペンテン、アクリル、
エポキシ樹脂等の合成樹脂やガラスが使用される。また
基板11にはピット22が同心円状あるいはスパイラル
状に一定間隔で精度よく記録されるように通常、案内溝
が設けられている。[Prior Art] Conventionally, as this type of technology, there is an optical disk memory that records and reproduces information on a medium using laser light.
Because of its high recording density, it has excellent characteristics as a large-capacity recording device. Initially, tantalum and lead were used as materials for this optical recording medium (Science).
ence) 154, 1550.1966), various materials have been used since then, but chalcogen elements such as tellurium or their compounds are generally often used (Japanese Patent Publication No. 47-26897), and among them, Tellurium-selenium alloys are particularly commonly used (Japanese Patent Publications No. 41902/1982, 7919/1982, and 5Ei058/1983).This tellurium-selenium alloy is used as an optical recording layer. An example of a conventional optical recording medium has a structure as shown in FIG. That is, on the surface of the substrate 11, a recording layer 21 made of a tellurium-selenium alloy is formed. In the recording layer 21, pits 22 are formed by condensing and irradiating a recording laser beam through the substrate 11. As the substrate 11, polycarbonate, polyolefin, polymethylpentene, acrylic,
Synthetic resins such as epoxy resins and glass are used. Further, guide grooves are usually provided on the substrate 11 so that the pits 22 are recorded concentrically or spirally at regular intervals with high accuracy.
このような光デイスクメモリにおいて、レーザビーム径
程度の幅の溝に光が入射すると光は回折され、ビーム中
心が溝からずれるにつれて回折光強度の空間分布が変化
する。これを検出してレーザビームを溝の中心に入射さ
せるようにサーボ系を構成するようにしている。溝の幅
は通常0.3〜1.3gmであり、溝の深さは使用する
レーザ波長の1720から1/4の範囲に設定される。In such an optical disk memory, when light enters a groove having a width approximately the diameter of a laser beam, the light is diffracted, and as the beam center deviates from the groove, the spatial distribution of the intensity of the diffracted light changes. A servo system is configured to detect this and direct the laser beam to the center of the groove. The width of the groove is usually 0.3 to 1.3 gm, and the depth of the groove is set in the range of 1720 to 1/4 of the laser wavelength used.
集光に関しても同様にサーボ系が構成されている。A servo system is similarly configured for condensing light.
光デイスクメモリの情報の読み出しは、記録のときより
も弱いパワーのレーザ光をビット上を通過するように照
射することにより、ピットの有無に起因する反射率の変
化を検出して行う。Information is read from the optical disk memory by irradiating a laser beam with a power weaker than that used during recording so as to pass over the bits, and detecting changes in reflectance caused by the presence or absence of pits.
なお、記録装置を小型化するため、レーザ光源としては
半導体レーザが使用されてきている。半導体レーザは発
振波長が8000人前後であるが、テルル−セレン系合
金はこの波長帯にも比較的よく適合し、適度な反射率と
適度な吸収率が得られる(フィジカ拳スティタス・ンリ
ダイ、 7,189,11164(phys−stat
−sol−7,189,19f14) ) 。Note that in order to downsize recording devices, semiconductor lasers have been used as laser light sources. Semiconductor lasers have an oscillation wavelength of around 8,000 nm, and tellurium-selenium alloys are relatively well suited to this wavelength range, and can provide moderate reflectance and moderate absorption (Physica Fistitus Nridai, 7). , 189, 11164 (phys-stat
-sol-7,189,19f14) ).
上述したテルル−セレン系合金では、比較的記録再生特
性が良好である。しかしながら高温高湿環境における酸
化劣化がはげしいので実用には供せず、又、感度的にも
やや不足であるという欠点がある。このため、感度不足
を解決する1つとして、加熱時に窒素が遊離して高感度
化するようにテルル膜に窒素を含ませることが提案され
ている(特開昭57−58250) 、本発明者らはこ
の実施例を追試して光記録媒体を作製し記録再生特性を
評価したところ、本発明者らが目的とする小型大容量記
録装置の光源である半導体レーザ波長(およそ8300
人)ではほとんど吸収がないため感度不足である。又、
窒素が遊離しやすいため、高温高湿環境における保存性
が十分ではない、又、上記提案のように窒素ガス中でス
パッタリングして成膜するのではなく、アルゴンと窒素
との混合ガス中でスパッタリングして成膜するというこ
とも提案されている(アプライド壷フィジックス番しタ
ーズCAppI−Phys−Lett、45,202.
1984) ) 。The above-mentioned tellurium-selenium alloy has relatively good recording and reproducing characteristics. However, it cannot be put to practical use because of severe oxidative deterioration in high-temperature, high-humidity environments, and it also has the disadvantage of being somewhat insufficient in sensitivity. Therefore, as one solution to the lack of sensitivity, it has been proposed to include nitrogen in the tellurium film so that nitrogen is liberated during heating and increases sensitivity (Japanese Patent Application Laid-open No. 57-58250). They fabricated an optical recording medium based on this example and evaluated the recording and reproducing characteristics, and found that the semiconductor laser wavelength (approximately 8300
In humans, there is almost no absorption, resulting in insufficient sensitivity. or,
Since nitrogen is easily liberated, storage stability in high temperature and high humidity environments is not sufficient.Also, instead of forming a film by sputtering in nitrogen gas as proposed above, sputtering is performed in a mixed gas of argon and nitrogen. It has also been proposed to form a film by applying the same method (Applied Physics Reference CAppI-Phys-Lett, 45, 202.
1984) ).
しかしながら、これでもまだ充分な記録感度と充分な信
号品質は得ることは難しい。However, even with this, it is still difficult to obtain sufficient recording sensitivity and sufficient signal quality.
このため、本発明者らはテルルセレン合金ターゲットを
アルゴンと窒素との混合ガスでスパッタリングすること
により記録層がテルルとセレンと窒素とからなり、耐候
性がよく高感度で信号品質の良好な光記録媒体が得られ
ることを見出し、既に提案している(特願昭61−10
1388 ) 。For this reason, the present inventors developed a recording layer consisting of tellurium, selenium, and nitrogen by sputtering a tellurium selenium alloy target with a mixed gas of argon and nitrogen, thereby achieving optical recording with good weather resistance, high sensitivity, and signal quality. He discovered that a medium could be obtained and has already proposed it (patent application 1986-10).
1388).
[発明が解決しようとする課題]
しかしながら、上述した従来の光記録媒体では、記録層
をテルルとセレンと窒素により形成するようになってお
り、耐候性および感度の面では聞届はないが、光記録媒
体を、温度85℃で湿度90%の高温高湿度の環境に2
00時間保存した後では、保存データのピット誤り率に
変化はないが、記録感度が変化し、膜表面には0.01
〜0、IILm程度の粒状の突起物が発生するという欠
点がある。[Problems to be Solved by the Invention] However, in the conventional optical recording medium described above, the recording layer is formed of tellurium, selenium, and nitrogen, and although it is not satisfactory in terms of weather resistance and sensitivity, The optical recording medium is placed in a high temperature and high humidity environment with a temperature of 85°C and a humidity of 90%.
After 00 hours of storage, there is no change in the pit error rate of the stored data, but the recording sensitivity changes, and the film surface has 0.01
There is a drawback that granular protrusions of about 0.0, IILm are generated.
[課題を解決するための手段]
本発明の記録媒体は上述した従来の課題を解決するため
になされたものであり、基板と、該基板上に形成される
と共に、レーザ光により一部を選択的に除去して情報を
記録する記録層とを有する光記録媒体において、上記記
録層は、テルルとセレンと鉛と窒素と酸素とを主成分と
する結晶質からなる構成としている。[Means for Solving the Problems] The recording medium of the present invention has been made to solve the above-mentioned conventional problems, and includes a substrate, a portion of which is formed on the substrate, and a portion of which is selected by a laser beam. In an optical recording medium having a recording layer from which information is recorded by removing the information, the recording layer is made of a crystalline material whose main components are tellurium, selenium, lead, nitrogen, and oxygen.
[実施例]
以下、本発明の実施例について図面を参照して説明する
。[Examples] Examples of the present invention will be described below with reference to the drawings.
第1図は本発明の一実施例を示す部分断面図、第2図は
第2の実施例を示す部分断面図、第3図は第3の実施例
を示す部分断面図、第4図は第1の実施例でセレンの含
有率を変えたときの特性を示す図、第5図は第1の実施
例で鉛の含有率を変えたときの特性を示す図である。Fig. 1 is a partial sectional view showing one embodiment of the present invention, Fig. 2 is a partial sectional view showing the second embodiment, Fig. 3 is a partial sectional view showing the third embodiment, and Fig. 4 is a partial sectional view showing the third embodiment. FIG. 5 is a diagram showing the characteristics when the selenium content is changed in the first example, and FIG. 5 is a diagram showing the characteristics when the lead content is changed in the first example.
第1の実施例の光記録媒体としては、光ディスクを例に
とる。この光ディスクは、基本的に基板1と、記録層2
とからなる。An optical disk is taken as an example of the optical recording medium of the first embodiment. This optical disc basically consists of a substrate 1 and a recording layer 2.
It consists of
上記記録層2は、テルルとセレンと鉛と、窒素と、酸素
とを主成分とする結晶質からなる。The recording layer 2 is made of a crystalline material whose main components are tellurium, selenium, lead, nitrogen, and oxygen.
次に、第1の実施例の光ディスクの製造方法について説
明する。Next, a method for manufacturing the optical disc of the first embodiment will be explained.
まず、基板lは、内径15層層、外径130m肩。First, the board 1 has an inner diameter of 15 layers and an outer diameter of 130 m.
厚さ1.21腸の案内溝付き射出成形ポリカーボネート
樹脂ディスク基板として形成する。そして、基板1t7
t100℃で2時間アニール処理した後、13.56M
H7の高周波電源を有するマグネトロンスパッタ装置内
に装着して排気する。Formed as an injection molded polycarbonate resin disc substrate with guide grooves 1.21 mm thick. And the board 1t7
After annealing at t100℃ for 2 hours, 13.56M
It is installed in a magnetron sputtering device having an H7 high frequency power source and evacuated.
次に、2X I O−’Torr以下に排気した後、ア
ルゴンガスと窒素ガスを導入し9 、5X 10−3T
orrとする。このときの窒素ガス分圧は0.35%。Next, after exhausting to 2X IO-'Torr or less, argon gas and nitrogen gas were introduced, and 5X 10-3T
orr. The nitrogen gas partial pressure at this time was 0.35%.
窒素ガス流量は0 、3 B’;CCNである。そして
、原子%で73 : 20 : 7のテルルセレン鉛合
金の焼結体の8インチターゲットをこの混合ガスで投入
パワー150Wでスパッタリングすることにより、約2
40人厚の膜をディスク基板である基板1上に形成する
。The nitrogen gas flow rate was 0.3 B'; CCN. Then, by sputtering an 8-inch target made of a sintered body of tellurium selenium lead alloy with an atomic percent ratio of 73:20:7 using this mixed gas at an input power of 150 W, approximately 2.
A film having a thickness of 40 mm is formed on a substrate 1 which is a disk substrate.
しかる後、温度85℃相対湿度90%の環境に12時間
保存してテルル−セレン−鉛−窒素層からなる記録層2
を結晶化させ、結晶粒界を酸化させることにより、光記
録媒体を製造する。Thereafter, the recording layer 2 consisting of the tellurium-selenium-lead-nitrogen layer was stored for 12 hours in an environment at a temperature of 85° C. and a relative humidity of 90%.
An optical recording medium is manufactured by crystallizing and oxidizing the grain boundaries.
この記録層2の各特性を分析すると次の結果が得られた
。When each characteristic of this recording layer 2 was analyzed, the following results were obtained.
まず、テルルとセレンと鉛と窒素と酸素との原子数比は
略64:18:6:1:11であった。First, the atomic ratio of tellurium, selenium, lead, nitrogen, and oxygen was approximately 64:18:6:1:11.
また、この光ディスクの波長83oo人における基板入
射のランド部の反射率は、略31%であった。Further, the reflectance of the land portion of this optical disk at a wavelength of 83 OO was approximately 31% when the light was incident on the substrate.
また、バンド幅30KH2のキャリアーとノイズの比(
C/N値)を測定する。このとき、波長8300Aの半
導体レーザ光を基板を通して入射して記録層上で1.6
.mφ程度に絞り、媒体線速度5 、65s/sec
、記録周波数3.77MHz、記録パルス輻70n s
ea、記録パワー5.4wの条件でランド部に記録し、
0.7層Wの一定パワーで再生するものとする。これに
より、C/N値は、50dBという良好な値が安定して
得られた。この値は、多数枚の光ディスクを測定しても
この結果は、安定して得られた。また記録再生装置を変
更することにより生ずる記録パワー変動に対しても安定
に得られた。Also, the carrier-to-noise ratio (
C/N value). At this time, a semiconductor laser beam with a wavelength of 8300A is incident on the recording layer through the substrate.
.. Narrow down to about mφ, medium linear velocity 5, 65s/sec
, recording frequency 3.77MHz, recording pulse width 70ns
ea, recorded on the land section under the conditions of recording power 5.4W,
It is assumed that reproduction is performed at a constant power of 0.7 layer W. As a result, a good C/N value of 50 dB was stably obtained. This value was stably obtained even when a large number of optical disks were measured. Furthermore, stability was obtained even against fluctuations in recording power caused by changing the recording/reproducing device.
次に、再生信号の零レベルに対して固定値のスライスレ
ベルを設けて、各々のビット3に対して正常に記録再生
が行われたか否かを判定する方式のビット誤り率測定方
式で評価する。これにより、多数枚の光ディスクで、安
定して10−6%台のビット誤り率が得られた。Next, a fixed value slice level is set for the zero level of the reproduced signal, and evaluation is performed using a bit error rate measurement method that determines whether recording and reproduction have been performed normally for each bit 3. . As a result, a stable bit error rate on the order of 10-6% was obtained for a large number of optical discs.
次に、この光ディスクを温度85℃で湿度90%の高温
高湿度の環境に保存した場合、膜表面に粒状の突起物が
発生しないことを確認した。Next, when this optical disk was stored in a high temperature and high humidity environment of 85° C. and 90% humidity, it was confirmed that no granular protrusions were generated on the film surface.
このとき温度85℃湿度90%の高温高湿度の環境に1
000時間保存した後に記録感度特性。At this time, 1.
Sensitivity characteristics recorded after storage for 000 hours.
ビット誤り率の各々を調べたが、実用上変化はないこと
が確認された。The bit error rates were examined, and it was confirmed that there was no change in practical use.
次に、記録層2の厚みおよび各成分比の変化による特性
試験の結果を以下に示す。Next, the results of a characteristic test based on changes in the thickness of the recording layer 2 and the ratio of each component are shown below.
記録層2の厚さは、薄くするほど高感度となるが、ビッ
ト3の周囲に形成されるリムが不連続となり記i後ノイ
ズが大きくなり、反射率が低下しキャリアーが小さくな
る。このため、良好なC/N値は得られなくなる。他方
、記録層2を厚くすると、記録感度が悪くなり、被照射
部から溶融除去される記録層材料の量が多くなることか
らリムが均一に形成されなくなりC/N値が低下する。The thinner the recording layer 2 is, the higher the sensitivity becomes, but the rim formed around the bit 3 becomes discontinuous, resulting in increased noise, lower reflectance, and smaller carriers. For this reason, a good C/N value cannot be obtained. On the other hand, if the recording layer 2 is made thicker, the recording sensitivity deteriorates and the amount of recording layer material that is melted and removed from the irradiated area increases, so the rim is not formed uniformly and the C/N value decreases.
したがって、記録層2の厚さは、160Aから400人
の範囲が望ましい。Therefore, the thickness of the recording layer 2 is preferably in the range of 160A to 400A.
記録層2の各成分の組成比の特性変化は次にようになる
。Characteristic changes in the composition ratio of each component of the recording layer 2 are as follows.
セレンと鉛の含有量変化による効果はスパッタリングタ
ーゲットの組成をかえて実験した。このとき製造された
記録層2のテルルとセレンと鉛との比率はスパッタリン
グターゲットのテルルとセレンと鉛の比率に略等しい条
件で行った。The effect of changing the content of selenium and lead was tested by changing the composition of the sputtering target. The ratio of tellurium, selenium, and lead in the recording layer 2 produced at this time was approximately equal to the ratio of tellurium, selenium, and lead in the sputtering target.
第4図にセレン含有量をかえたときの特性を示す。Figure 4 shows the characteristics when the selenium content is changed.
セレン含有量が少すぎる場合、高温高湿度環境に長時間
保存すると腐食が発生するという問題が生じた。他方セ
レンが多すぎる場合、ミクロンオーダーの凹凸が生じて
、未記録ノイズが大きくなり、実用に供せる状態ではな
くなる。したがって、セレン含有量としては原子%で9
%以上35%未満が望ましい。When the selenium content is too low, corrosion occurs when stored in a high temperature and high humidity environment for a long time. On the other hand, if there is too much selenium, unevenness on the order of microns will occur and unrecorded noise will become large, making it impossible to put it into practical use. Therefore, the selenium content is 9 atomic%.
% or more and less than 35%.
第5図に鉛含有量を変化させたときの高温高湿度環境保
存下の粒状突起物抑止効果を示す、このように、鉛の含
有量が少ないと、粒状突起物抑止効果がない、したがっ
て鉛含有量は5原子%以上が望ましい、しかしながら、
鉛含有量が多すぎると高温高湿度環境に長時間保存した
後の媒体特性が劣化するので、鉛含有量としては15原
子%以下が望ましい。Figure 5 shows the effect of suppressing granular protrusions under storage in a high temperature and high humidity environment when the lead content is varied. The content is preferably 5 at% or more, however,
If the lead content is too high, the medium properties will deteriorate after being stored in a high temperature and high humidity environment for a long time, so the lead content is preferably 15 at % or less.
なお、高温高湿度環境に長時間保存したときに発生する
微小な粒状突起物が従来のテルル−セレン−鉛−窒素(
−酸素)からなる記録層2で発生し、鉛を含有させるこ
とにより抑止できる理由は、次のように考えられる。高
温高湿度環境下ではテルルセレンはイオン化され移動し
やすく、そのため粒状突起物が発生しやすいが、鉛を含
有させると、このイオンの移動度が低下するため、粒状
突起物の発生が抑止されるためである。It should be noted that microscopic granular protrusions that occur when stored in a high-temperature, high-humidity environment for a long time are different from the conventional tellurium-selenium-lead-nitrogen (
The reason why this occurs in the recording layer 2 consisting of (-oxygen) and can be suppressed by containing lead is considered to be as follows. In a high temperature, high humidity environment, tellurium selenium is easily ionized and moves, resulting in the generation of granular protrusions; however, when lead is added, the mobility of these ions decreases, thereby suppressing the generation of granular protrusions. It is.
なお、テルル−セレン−鉛(−酸素)からなる記録膜よ
りも、窒素を含有させた方が粒状突起物の発生の程度が
小さくなる。Note that the degree of generation of granular protrusions is smaller when nitrogen is included than in a recording film made of tellurium-selenium-lead (-oxygen).
次に、窒素の含有量について窒素ガス分圧を変化させる
ことにより実験を行った。Next, an experiment was conducted regarding the nitrogen content by changing the nitrogen gas partial pressure.
窒素の含有量の少ない記録層2では、記録感度が悪い、
又、トラック1周にわたって均一に記録できず、部分的
にピット3の欠落が観察された。Recording layer 2 with a low nitrogen content has poor recording sensitivity.
Further, it was not possible to record uniformly over one lap of the track, and some pits 3 were observed to be missing.
したがってピット誤り率は非常に悪く、C/N値も悪い
、他方、記録パワーをあげていくと良好なC/N値が得
られる場合もある(多数のトラックに記録すると良好な
C/N値が得られるトラックもあったという意味であり
、平均的なC/N値としては悪い)、シかしながら、さ
らに記録パワーをあげていくとトラッキングサーボが誤
動作してしまうので、記録パワーの余裕度が非常に狭く
、実用に供せない。このとき、良好なC/N値が得られ
る場合においても、ピット3の部分的欠落があり、ピッ
ト誤り率は悪い、この理由は、テルル−セレン−鉛(−
酸素)膜は融点が低いものの、被照射溶融部に小穴が形
成されにくいのでピットが開きにくく、したがって、ビ
ット形成に大きな記録パワーが必要になるためである。Therefore, the pit error rate is very bad and the C/N value is also bad.On the other hand, if you increase the recording power, you may be able to obtain a good C/N value. However, if you increase the recording power further, the tracking servo will malfunction, so it is important to have enough recording power. The degree is very narrow and cannot be used for practical purposes. At this time, even when a good C/N value is obtained, pit 3 is partially missing and the pit error rate is poor.The reason for this is that tellurium-selenium-lead (-
This is because although the melting point of the (oxygen) film is low, it is difficult to form small holes in the irradiated melted part, making it difficult for pits to open, and therefore, a large recording power is required to form bits.
また大きな記録パワーを負荷するので、溶融部の面積が
大きくなり、−度ビット3が開くと大きなどット3にな
り、トラッキングサーボが誤動作しやすくなるためであ
る。In addition, since a large recording power is applied, the area of the melted portion becomes large, and when the -degree bit 3 opens, it becomes a large dot 3, making it easy for the tracking servo to malfunction.
本実施例の光記録媒体のようにテルル、セレンの一部を
窒化した場合、窒化テルル、窒化セレンの爆発性のため
、被照射溶融部に小穴が容易にかつ安定に形成され、記
録感度がよくなり、かつピットの欠落がないのでピット
誤り率は小さい。When part of tellurium and selenium is nitrided as in the optical recording medium of this example, small holes are easily and stably formed in the irradiated melted part due to the explosive nature of tellurium nitride and selenium nitride, resulting in a decrease in recording sensitivity. The pit error rate is small because there are no missing pits.
さらに、大きな面積にわたって溶融しないでピット3が
開くため、ピット3はあまり大きくならないので、トラ
ッキングサーボの誤動作がない。Furthermore, since the pits 3 open without melting over a large area, the pits 3 do not become very large, so there is no tracking servo malfunction.
しかし、窒素含有量が多すぎる膜では、膜の表面性が悪
くなり、ピット周囲のリムがきれいに形成されなくなる
ので記録後ノイズが大きくなり、実用に供せなくなる。However, if the nitrogen content is too high, the surface properties of the film will deteriorate, and the rims around the pits will not be formed neatly, resulting in increased noise after recording, making the film impractical.
又、さらに窒素含有量を多くすると、アルゴンレーザ波
長(5000入前後)では吸収があるものの、小型記録
装置の光源である半導体レーザ波長(8000λ前後)
ではほとんど吸収のない膜となる。したがって、窒素含
有量としては、原子%で0.5%以上lO%以下が望ま
しい。Furthermore, if the nitrogen content is further increased, although there is absorption at the argon laser wavelength (around 5,000 λ), it is absorbed at the semiconductor laser wavelength (around 8,000 λ), which is the light source of small recording devices.
This results in a film with almost no absorption. Therefore, the nitrogen content is desirably 0.5% or more and 10% or less in atomic %.
また、記録層2に酸素を含有させることは、記録パワー
の余裕度を大きくなり、さらに又、高温高湿度環境で長
時間保存した後でも記録感度が変化しなくすることに効
果がある。Furthermore, the inclusion of oxygen in the recording layer 2 increases the margin of recording power and is also effective in preventing changes in recording sensitivity even after long-term storage in a high-temperature, high-humidity environment.
しかし、酸素含有量が少ないと、記録パワーの余裕度お
よび記録感度が悪くなり、多すぎると記録感度が低下す
るとともに、良好な形状のリムが形成されなくなるため
、C/N値が低下する。However, if the oxygen content is too low, the margin of recording power and the recording sensitivity will deteriorate, and if it is too high, the recording sensitivity will decrease and a rim with a good shape will not be formed, resulting in a decrease in the C/N value.
このため、酸素含有量は、原子%で略5%から25%の
範囲において良好な効果があることが確認された。Therefore, it was confirmed that a good effect is obtained when the oxygen content is in the range of about 5% to 25% in atomic percent.
このように、第1の実施例では、テルルとセレンと鉛と
窒素と酸素とを主成分とする結晶質の記録膜を用いるこ
とにより、膜表面の突起物の発生を抑止し得ることがで
きる。As described above, in the first embodiment, by using a crystalline recording film whose main components are tellurium, selenium, lead, nitrogen, and oxygen, the generation of protrusions on the film surface can be suppressed. .
また、本実施例の記録層2としては、テルル−セレン−
鉛−窒素の多結晶膜を用い、その結晶粒界が酸化されて
いるものを用いている。Further, as the recording layer 2 of this example, tellurium-selenium-
A polycrystalline film of lead-nitrogen is used, the grain boundaries of which are oxidized.
これは、記録層2を多結晶にすることにより、ピット3
の形成メカニズムの初期段階である記録層2が溶液状態
のときの小穴の形成が、容易に安定に生じるため、記録
感度が安定する。また、多結晶のため、上記小穴の拡張
が結晶粒界で阻害されやすくなり必要以上に拡張しにく
くなるので、記録パワーの余裕度が大きくなる。By making the recording layer 2 polycrystalline, the pits 3
Since the formation of small holes when the recording layer 2 is in a solution state, which is the initial stage of the formation mechanism, occurs easily and stably, the recording sensitivity is stabilized. Furthermore, since the material is polycrystalline, the expansion of the small hole is likely to be inhibited by grain boundaries, making it difficult to expand more than necessary, resulting in a greater margin of recording power.
他方、結晶粒界を酸化させるのは、上記の膜を多結晶に
することによって得られる記録感度および耐候性の効果
をさらに確実なものにするためである。On the other hand, the purpose of oxidizing the grain boundaries is to further ensure the recording sensitivity and weather resistance effects obtained by making the film polycrystalline.
なお、本実施例では、基板l上に直接記録層2を形成す
るようにしたが、予め基板lの上面に下地層を形成した
後に記録層2を形成するようにしても良い、以下、下地
層を有する光ディスクについて説明する。In this example, the recording layer 2 was formed directly on the substrate l, but the recording layer 2 may be formed after forming a base layer on the upper surface of the substrate l in advance. An optical disc having a geological layer will be explained.
本発明の第2の実施例では、第2図に示すように、下地
層3として二無水3,4,9.10−ペリレン・テトラ
・カルボン酸(以下、PTODAと称す)を使用する。In the second embodiment of the present invention, as shown in FIG. 2, 3,4,9.10-perylene tetracarboxylic dianhydride (hereinafter referred to as PTODA) is used as the underlayer 3.
次に、製造方法を説明する。Next, the manufacturing method will be explained.
第1図と同様の基板1であるポリカーボネート樹脂ディ
スク基板にPTCDAからなる下地層3を約1ooA厚
形成する。続いてこの下地層3上に、テルル−セレン−
鉛合金ターゲットをアルゴンと窒素の混合ガスでマグネ
トロンスパッタして約240人厚形成する。しかる後7
0℃90%の環境に24時間保存してテルル−セレン−
鉛−窒素層を結晶化させ、結晶粒界を酸化させることに
より、テルル−セレン−鉛−窒素−酸素層の記録層2を
形成する。A base layer 3 made of PTCDA is formed to a thickness of about 100 mm on a polycarbonate resin disk substrate, which is a substrate 1 similar to that shown in FIG. Next, on this base layer 3, tellurium-selenium-
A lead alloy target is formed to a thickness of approximately 240 mm by magnetron sputtering using a mixed gas of argon and nitrogen. After that 7
Store tellurium-selenium in an environment of 0℃90% for 24 hours
The recording layer 2 of the tellurium-selenium-lead-nitrogen-oxygen layer is formed by crystallizing the lead-nitrogen layer and oxidizing the grain boundaries.
次に、第2の実施例について特性を分析した結果を示す
。Next, the results of analyzing the characteristics of the second example will be shown.
このときのテルルとセレンと鉛と窒素と酸素との原子数
比は第1の実施例と同じく略64:18:6:1:11
であった。At this time, the atomic ratio of tellurium, selenium, lead, nitrogen, and oxygen is approximately 64:18:6:1:11, the same as in the first embodiment.
Met.
第1の実施例と同条件で、基板入射のランド部の反射率
を測定したところ、略28%であった。When the reflectance of the land portion of the substrate was measured under the same conditions as in the first example, it was approximately 28%.
また、バンド[30KHzのキャリアーとノイズの比(
C/N値)は第1の実施例と同条件で48dBと良好な
値が安定に得られた。この値は、多数枚の光ディスクを
測定しても安定して得られ、記録再生装置を変更するこ
とにより生ずる記録パワー変動に対しても安定に得られ
た0次に、ビット誤り率測定方式で評価したところ、多
数枚のディスクで安定して第1の実施例と同じく略10
−6%台のビット誤り率が得られた。In addition, the band [30KHz carrier-to-noise ratio (
A good value of 48 dB (C/N value) was stably obtained under the same conditions as in the first example. This value is obtained stably even when measuring a large number of optical disks, and is obtained stably even with recording power fluctuations caused by changing the recording/playback device. When evaluated, it was stable with a large number of discs, and the performance was about 10 as in the first embodiment.
A bit error rate of -6% was obtained.
また、記録感度のばらつきは、PTODAの下地層3が
ない場合には標準偏差でおよそ0゜2mWである。これ
に対し、本実施例ではおよそ0.1mWであり、記録感
度のばらつきが小さくなることが確認された。Further, the standard deviation of the variation in recording sensitivity is approximately 0.2 mW in the absence of the PTODA underlayer 3. On the other hand, in this example, it was approximately 0.1 mW, and it was confirmed that the variation in recording sensitivity was reduced.
PTCDAからなる下地層3の厚さとしては、5人から
1oooAの範囲が望ましい。The thickness of the base layer 3 made of PTCDA is preferably in the range of 5 to 100A.
なお、記録層2の厚さおよび各成分の組成比は第1の実
施例と同じものとする。Note that the thickness of the recording layer 2 and the composition ratio of each component are the same as in the first embodiment.
第2の実施例では、PTCDAの下地層3を設けること
により、記録感度のばらつきを小さくすることができる
。この理由は、次のように考えられる。第1の実施例の
ように基板1上に直接に記録層2をつける場合では、基
板lを処理する前工程の工程変動により、基板表面の全
域、およびすべての基板で、同じ界面状態で記録層2を
形成することが困難となる。このため本実施例では、P
TCDAの下地層3と記録層2とを連続して形成するの
で、記録感度のばらつきに最も影響を与える記録層2と
下地層3との付着状態が、成膜前工程の影響をうけない
ので、記録感度がばらつきがなくなる。また、下地層3
としてPTODAとしたのは、記録層2がレーザ照射を
うけて溶融する温度でPTCDAが分解するため、ビッ
ト形成メカニズムの初期段階である小穴の形成を確実に
生ぜしめるためである。In the second embodiment, by providing the PTCDA underlayer 3, variations in recording sensitivity can be reduced. The reason for this is thought to be as follows. In the case where the recording layer 2 is directly attached to the substrate 1 as in the first embodiment, recording is performed in the same interface state over the entire substrate surface and on all substrates due to process variations in the pre-processing process for the substrate 1. It becomes difficult to form layer 2. Therefore, in this embodiment, P
Since the TCDA base layer 3 and the recording layer 2 are formed continuously, the adhesion state between the recording layer 2 and the base layer 3, which has the greatest effect on variations in recording sensitivity, is not affected by the pre-film formation process. , there is no variation in recording sensitivity. In addition, base layer 3
The reason why PTODA was selected as the material is that since PTCDA decomposes at the temperature at which the recording layer 2 is melted by laser irradiation, it ensures the formation of small holes, which is the initial stage of the bit formation mechanism.
以下、本発明の第3の実施例として、
下地層4に、酸化アンチモンを使用したものについて説
明する。A third embodiment of the present invention in which antimony oxide is used as the base layer 4 will be described below.
次に、製造方法について説明する。Next, the manufacturing method will be explained.
第1の実施例と同様の基板lであるポリカーボネート樹
脂ディスク基板に酸化アンチモン(Sb20s)からな
る下地層4を約24OA厚形成する。続いてこの下地層
4上に、テルル−セレン−鉛合金ターゲットをアルゴン
と窒素の混合ガスでマグネトロンスパッタして約24O
A厚形成する。しかる@85℃90%の環境に121I
間保存してテルル−セレン−鉛−窒素層を結晶化させ、
結晶粒界を酸化させることにより、テルル−セレン−鉛
−窒素−酸素層の記録層2を形成する。An underlayer 4 made of antimony oxide (Sb20s) is formed to a thickness of about 24 OA on a polycarbonate resin disk substrate 1 similar to that of the first embodiment. Subsequently, a tellurium-selenium-lead alloy target was magnetron sputtered onto the base layer 4 using a mixed gas of argon and nitrogen to give an approximately 24O
Form A thickness. 121I in an environment of 85°C and 90%
to crystallize the tellurium-selenium-lead-nitrogen layer,
By oxidizing the grain boundaries, the recording layer 2 of tellurium-selenium-lead-nitrogen-oxygen layer is formed.
次に第3の実施例について特性を分析した結果を示す。Next, the results of analyzing the characteristics of the third example will be shown.
テルルとセレンと鉛と窒素と酸素との原子数比は第1の
実施例と同じく略64:18:6:1:11であった。The atomic ratio of tellurium, selenium, lead, nitrogen, and oxygen was approximately 64:18:6:1:11, as in the first example.
この光デイスク基板入射のランド部の反射率を第1の実
施例と同様の条件で測定したところ、略29%であった
。When the reflectance of the land portion of the optical disk substrate was measured under the same conditions as in the first embodiment, it was approximately 29%.
またバンド@30KHzのキャリアーとノイズの比(C
/N値)は48dBと良好な値が安定に得られた。この
値は、多数枚の光ディスクを測定しても安定して得られ
、記録再生装置を変更することにより生ずる記録パワー
変動に対しても安定に得られた。Also, the carrier to noise ratio (C
/N value) was stably obtained at a good value of 48 dB. This value was stably obtained even when a large number of optical disks were measured, and was stably obtained even when the recording power fluctuated due to changing the recording/reproducing device.
次に、ビット誤り率測定方式で同様に評価したところ、
多数枚の光ディスクで安定して第1の実施例と同様に略
1O−6%台のビット誤り率が得られた。Next, when similarly evaluated using the bit error rate measurement method,
A bit error rate of approximately 10-6% was stably obtained with a large number of optical disks, similar to the first embodiment.
記録感度のばらつきは、略0.1脂Wであり、記録感度
のばらつきが小さくなることが確認された。これは、第
2の実施例と同様の値である。The variation in recording sensitivity was approximately 0.1 fat W, and it was confirmed that the variation in recording sensitivity was reduced. This is the same value as in the second embodiment.
なお、酸化アンチモン層の厚さとしては、5人から25
0OAの範囲が望ましい。In addition, the thickness of the antimony oxide layer ranges from 5 to 25
A range of 0OA is desirable.
また、記録層2の厚さおよび成分組成比は第1の実施例
と同じものとする。Further, the thickness and composition ratio of the recording layer 2 are the same as in the first embodiment.
本実施例では、酸化アンチモンの下地層4を設けること
により、記録感度のばらつきを小さくすることができる
。この理由は、第2の実施例と同様に、酸化アンチモン
の下地層4と記録層2とを連続して形成するためである
。記録感度のばらつきに最も影響を与える記録層2と下
地層4との付着状態が、成膜前工程の影響をうけないの
で、記録感度がばらつきがなくなる。また、下地層4と
して酸化アンチモンとしたのは、記録層2がレーザ照射
をうけて溶融する温度で酸化アンチモンが分解するため
、ピット形成メカニズムの初期段階である小穴の形成を
確実に生ぜしめるためである。In this embodiment, by providing the antimony oxide underlayer 4, variations in recording sensitivity can be reduced. The reason for this is that the antimony oxide underlayer 4 and the recording layer 2 are formed continuously, similar to the second embodiment. Since the adhesion state between the recording layer 2 and the underlayer 4, which has the greatest influence on variations in recording sensitivity, is not affected by the pre-film formation process, variations in recording sensitivity are eliminated. Furthermore, antimony oxide was used as the underlayer 4 because antimony oxide decomposes at the temperature at which the recording layer 2 melts when irradiated with a laser, thereby ensuring the formation of small holes, which is the initial stage of the pit formation mechanism. It is.
なお、第2および第3の実施例において下地層3.4と
してPTCDA層および酸化アンチモンを使用したが、
記録感度のばらつきが少なくなるようなものであれば、
他のものであってももちろん良い。Note that in the second and third embodiments, a PTCDA layer and antimony oxide were used as the base layer 3.4;
If it is something that reduces the variation in recording sensitivity,
Of course, it is also possible to use something else.
[発明の効果]
以上説明したように、本発明の光記録媒体は、記録層を
、テルルとセレンと鉛と窒素と酸素とを主成分とする結
晶質にすることにより、耐候性、信号品質および記録パ
ワーの余裕度が向上し、かつ高感度となる効果がある。[Effects of the Invention] As explained above, the optical recording medium of the present invention has improved weather resistance and signal quality by making the recording layer a crystalline material whose main components are tellurium, selenium, lead, nitrogen, and oxygen. Also, there is an effect that the recording power margin is improved and the sensitivity is increased.
さらに、高温高湿度環境に長時間保存した場合において
も、従来のような膜表面の突起物の発生を防止すること
ができ、媒体特性を良好に維持できる効果がある。Furthermore, even when stored in a high temperature, high humidity environment for a long time, the generation of protrusions on the surface of the film as in the prior art can be prevented and the medium properties can be maintained favorably.
第1図は本発明の光記録媒体の一実施例を示す部分断面
図、第2図は本発明の第2の実施例を示す部分断面図、
第3図は本発明の第3の実施例を示す部分断面図、第4
図は第1の実施例でセレンの含有率を変えたときの特性
を示す図、第5図は第1の実施例で鉛の含有率を変えた
ときの特性を示す図、第6図は従来例の部分断面図であ
る。
l二基板 2:記録層3:ピット
4 : PTCDA層5二酸化ア
ンチモン層
第1図FIG. 1 is a partial cross-sectional view showing an embodiment of the optical recording medium of the present invention, FIG. 2 is a partial cross-sectional view showing a second embodiment of the present invention,
FIG. 3 is a partial sectional view showing a third embodiment of the present invention;
The figure shows the characteristics when the selenium content rate is changed in the first example. Figure 5 is a graph showing the characteristics when the lead content rate is changed in the first example. It is a partial sectional view of a conventional example. l Two substrates 2: Recording layer 3: Pit
4: PTCDA layer 5 antimony dioxide layer Figure 1
Claims (1)
一部を選択的に除去して情報を記録する記録層とを有す
る光記録媒体において、 上記記録層は、テルルとセレンと鉛と窒素と酸素とを主
成分とする結晶質からなることを特徴とする光記録媒体
。[Claims] An optical recording medium comprising a substrate and a recording layer formed on the substrate and recording information by selectively removing a portion with a laser beam, wherein the recording layer is made of tellurium. An optical recording medium characterized by being made of a crystalline material whose main components are selenium, lead, nitrogen, and oxygen.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63325389A JPH0798423B2 (en) | 1988-12-23 | 1988-12-23 | Optical recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63325389A JPH0798423B2 (en) | 1988-12-23 | 1988-12-23 | Optical recording medium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02171285A true JPH02171285A (en) | 1990-07-02 |
| JPH0798423B2 JPH0798423B2 (en) | 1995-10-25 |
Family
ID=18176288
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63325389A Expired - Fee Related JPH0798423B2 (en) | 1988-12-23 | 1988-12-23 | Optical recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0798423B2 (en) |
-
1988
- 1988-12-23 JP JP63325389A patent/JPH0798423B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0798423B2 (en) | 1995-10-25 |
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